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    • 4. 发明授权
    • Continuous-time delta-sigma modulators using distributed resonators
    • 使用分布式谐振器的连续时间Δ-Σ调制器
    • US07307564B1
    • 2007-12-11
    • US10973741
    • 2004-10-25
    • Todd Kaplan
    • Todd Kaplan
    • H03M3/00
    • H03M3/404H03M3/424H03M3/456
    • A distributed resonator or filter in a continuous-time delta-sigma modulator is disclosed, where the transfer function of the resonator or filter repeats every FS, where FS is the sampling frequency of the modulator. On one side, like continuous-time delta-sigma modulators, the disclosed modulator does not require a high-precision track-and-hold, and additionally can take advantage of the high Q of distributed resonators. On the other side, like discrete-time delta-sigma modulators, the disclosed modulator is insensitive to feedback loop delays and can subsample.
    • 公开了连续时间Δ-Σ调制器中的分布式谐振器或滤波器,其中谐振器或滤波器的传递函数在每个F S S S上重复,其中F S S 调制器的采样频率。 一方面,像连续时间Δ-Σ调制器一样,所公开的调制器不需要高精度的跟踪保持,并且还可以利用高Q分布式谐振器。 另一方面,像离散时间Δ-Σ调制器一样,所公开的调制器对反馈回路延迟不敏感并且可以进行子采样。
    • 9. 发明授权
    • Apparatus and method for deposition of thin films
    • 用于沉积薄膜的装置和方法
    • US07569494B2
    • 2009-08-04
    • US10300413
    • 2002-11-19
    • Vladimir MatijasevicTodd Kaplan
    • Vladimir MatijasevicTodd Kaplan
    • H01L21/31
    • C23C14/5853C23C14/087C23C14/505C23C14/541C23C14/568H01L39/2432Y10S505/786Y10S505/826
    • An apparatus for forming a multicomponent thin film, such as a superconducting thin film, on a substrate includes a holder for holding at least one substrate and a deposition/reaction vessel. The deposition/reaction vessel has at least three zones, each zone being separated from adjacent zones by a wall. The zones include at least two deposition zones, where each deposition zone is configured and arranged to deposit a deposition material on the at least one substrate, and at least one reaction zone for reacting the deposition material with a reactant. The apparatus is configured and arranged to rotate the at least one substrate sequentially through the plurality of zones to form a thin film on the substrate. In some embodiments of the apparatus, the deposition/reaction vessel includes a same number of deposition zones and reaction zones which may be alternating deposition and reaction zones.
    • 在基板上形成诸如超导薄膜的多组分薄膜的装置包括用于保持至少一个基板和沉积/反应容器的保持器。 沉积/反应容器具有至少三个区域,每个区域通过壁与相邻区域分离。 这些区域包括至少两个沉积区,其中每个沉积区被配置和布置成在至少一个基底上沉积沉积材料,以及至少一个用于使沉积材料与反应物反应的反应区。 所述装置被配置和布置成使所述至少一个基板顺序地旋转穿过所述多个区域,以在所述基板上形成薄膜。 在装置的一些实施方案中,沉积/反应容器包括相同数量的沉积区和可以是交替沉积和反应区的反应区。