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    • 2. 发明申请
    • Manufacturing method of a liquid crystal display
    • 液晶显示器的制造方法
    • US20060281204A1
    • 2006-12-14
    • US11397972
    • 2006-04-05
    • Jae-hyuk ChangMun-pyo HongNam-seok RohDae-jin Park
    • Jae-hyuk ChangMun-pyo HongNam-seok RohDae-jin Park
    • H01L21/00
    • H01L27/12H01L27/1248
    • A manufacturing method of an LCD comprises forming an insulating substrate; forming a gate line extending in a horizontal direction and a data line insulatively crossing the gate line to define a pixel area on the insulating substrate; forming a TFT disposed at an intersection of the gate line and the data line and comprising a drain electrode; forming an organic passivation layer on the TFT; forming a drain contact hole exposing the drain electrode and forming an embossing pattern in the organic passivation layer by disposing and pressurizing a mold having an intaglio pattern corresponding to the pixel area and a projection corresponding to the drain electrode on the organic passivation layer; and forming a pixel electrode connected to the drain electrode through the drain contact hole.
    • LCD的制造方法包括:形成绝缘基板; 形成沿水平方向延伸的栅极线和与栅极线绝缘交叉的数据线,以在绝缘基板上限定像素区域; 形成设置在所述栅极线和所述数据线的交叉点并且包括漏电极的TFT; 在TFT上形成有机钝化层; 形成漏极接触孔,通过在有机钝化层上设置并加压具有对应于像素区域的凹版图案的模具和对应于漏电极的突起来形成有机钝化层中的凹凸图案,从而形成压花图案; 以及通过漏极接触孔形成连接到漏电极的像素电极。
    • 3. 发明授权
    • Manufacturing method of an LCD comprising a mold and a mask
    • 包括模具和面罩的LCD的制造方法
    • US07817228B2
    • 2010-10-19
    • US11397972
    • 2006-04-05
    • Jae-hyuk ChangMun-pyo HongNam-seok RohDae-jin Park
    • Jae-hyuk ChangMun-pyo HongNam-seok RohDae-jin Park
    • G02F1/1335G02F1/13
    • H01L27/12H01L27/1248
    • A manufacturing method of an LCD comprises forming an insulating substrate; forming a gate line extending in a horizontal direction and a data line insulatively crossing the gate line to define a pixel area on the insulating substrate; forming a TFT disposed at an intersection of the gate line and the data line and comprising a drain electrode; forming an organic passivation layer on the TFT; forming a drain contact hole exposing the drain electrode and forming an embossing pattern in the organic passivation layer by disposing and pressurizing a mold having an intaglio pattern corresponding to the pixel area and a projection corresponding to the drain electrode on the organic passivation layer; and forming a pixel electrode connected to the drain electrode through the drain contact hole.
    • LCD的制造方法包括:形成绝缘基板; 形成沿水平方向延伸的栅极线和与栅极线绝缘交叉的数据线,以在绝缘基板上限定像素区域; 形成设置在所述栅极线和所述数据线的交叉点并且包括漏电极的TFT; 在TFT上形成有机钝化层; 形成漏极接触孔,通过在有机钝化层上设置并加压具有对应于像素区域的凹版图案的模具和对应于漏电极的突起来形成有机钝化层中的凹凸图案,从而形成压花图案; 以及通过漏极接触孔形成连接到漏电极的像素电极。