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    • 7. 发明申请
    • Laser irradiation apparatus
    • 激光照射装置
    • US20120012568A1
    • 2012-01-19
    • US13067611
    • 2011-06-14
    • Won-Kyu LeeJae-Beom ChoiJae-Hwan OhYoung-Jin ChangSeong-Hyun Jin
    • Won-Kyu LeeJae-Beom ChoiJae-Hwan OhYoung-Jin ChangSeong-Hyun Jin
    • B23K26/00
    • H01L21/268B23K26/06
    • A laser irradiation apparatus for irradiating a laser beam to a semiconductor layer including a plurality of pixel areas, the apparatus includes a laser generator generating the laser beam, and an optical switching unit time-dividing the laser beam generated from the laser generator and transmitting a plurality of time-divided laser beams to a plurality of optical systems. The apparatus includes a first optical system of the plurality of optical systems that receives a first time-divided laser beam and irradiates a first laser slit beam along a first irradiation direction, and a second optical system of the plurality of optical systems that receives a second time-divided laser beam and irradiates a second laser slit beam along a second irradiation direction that is parallel with the first irradiation direction. The first laser slit beam and the second laser slit beam crystallize partial areas at a same location in the respective pixel areas.
    • 一种用于将激光照射到包括多个像素区域的半导体层的激光照射装置,该装置包括产生激光束的激光发生器和对从激光发生器产生的激光束进行时分的光开关单元, 多个时分激光束到多个光学系统。 该装置包括:多个光学系统的第一光学系统,其接收第一分时激光束并沿着第一照射方向照射第一激光狭缝光束;以及所述多个光学系统中的第二光学系统, 并且沿着与第一照射方向平行的第二照射方向照射第二激光狭缝光束。 第一激光狭缝光束和第二激光狭缝光束在相应像素区域中的相同位置处结晶部分区域。