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    • 2. 发明申请
    • Method of manufacturing a vertically-structured GaN-based light emitting diode
    • 制造垂直结构的GaN基发光二极管的方法
    • US20070290225A1
    • 2007-12-20
    • US11892445
    • 2007-08-23
    • Jae Hoon LeeHee Seok ChoiJeong Tak OhSu Yeol Lee
    • Jae Hoon LeeHee Seok ChoiJeong Tak OhSu Yeol Lee
    • H01L33/00
    • H01L33/20H01L33/0079H01L33/22H01L2933/0083
    • The present invention relates to a method of manufacturing a vertically-structured GaN-based light emitting diode. The method of manufacturing a vertically-structured GaN-based light emitting diode includes forming a GaN layer on a substrate; patterning the compound layer in a predetermined shape; forming an n-type GaN layer on the patterned compound layer through the epitaxial lateral over-growth process and sequentially forming an active layer and a p-type GaN layer on the n-type GaN layer; forming a structure supporting layer on the p-type GaN layer; sequentially removing the substrate and the GaN layer formed on the substrate after forming the structure supporting layer; removing the patterned compound layer exposed after removing the GaN layer so as to form an n-type GaN layer patterned in a concave shape; and forming an n-type electrode on the n-type GaN layer patterned in a concave shape.
    • 本发明涉及一种垂直构造的GaN基发光二极管的制造方法。 制造垂直结构的GaN基发光二极管的方法包括在衬底上形成GaN层; 将化合物层图案化成预定的形状; 通过外延横向过度生长工艺在图案化的化合物层上形成n型GaN层,并在n型GaN层上依次形成有源层和p型GaN层; 在p型GaN层上形成结构支撑层; 在形成结构支撑层之后,依次去除衬底和形成在衬底上的GaN层; 去除在去除GaN层之后暴露的图案化合物层,以形成图案化为凹形的n型GaN层; 在形成凹形的n型GaN层上形成n型电极。
    • 4. 发明授权
    • Method of manufacturing a vertically-structured GaN-based light emitting diode
    • 制造垂直结构的GaN基发光二极管的方法
    • US08686450B2
    • 2014-04-01
    • US11892445
    • 2007-08-23
    • Jae Hoon LeeHee Seok ChoiJeong Tak OhSu Yeol Lee
    • Jae Hoon LeeHee Seok ChoiJeong Tak OhSu Yeol Lee
    • H01L33/00
    • H01L33/20H01L33/0079H01L33/22H01L2933/0083
    • The present invention relates to a method of manufacturing a vertically-structured GaN-based light emitting diode. The method of manufacturing a vertically-structured GaN-based light emitting diode includes forming a GaN layer on a substrate; patterning the compound layer in a predetermined shape; forming an n-type GaN layer on the patterned compound layer through the epitaxial lateral over-growth process and sequentially forming an active layer and a p-type GaN layer on the n-type GaN layer; forming a structure supporting layer on the p-type GaN layer; sequentially removing the substrate and the GaN layer formed on the substrate after forming the structure supporting layer; removing the patterned compound layer exposed after removing the GaN layer so as to form an n-type GaN layer patterned in a concave shape; and forming an n-type electrode on the n-type GaN layer patterned in a concave shape.
    • 本发明涉及一种垂直构造的GaN基发光二极管的制造方法。 制造垂直结构的GaN基发光二极管的方法包括在衬底上形成GaN层; 将化合物层图案化成预定的形状; 通过外延横向过度生长工艺在图案化的化合物层上形成n型GaN层,并在n型GaN层上依次形成有源层和p型GaN层; 在p型GaN层上形成结构支撑层; 在形成结构支撑层之后,依次去除衬底和形成在衬底上的GaN层; 去除在去除GaN层之后暴露的图案化合物层,以形成图案化为凹形的n型GaN层; 在形成凹形的n型GaN层上形成n型电极。
    • 8. 发明申请
    • Semiconductor light emitting diode and method of manufacturing the same
    • 半导体发光二极管及其制造方法
    • US20070267640A1
    • 2007-11-22
    • US11436651
    • 2006-05-19
    • Jae Hoon LeeHee Seok ChoiSeok Beom ChoiJeong Tak OhSu Yeol Lee
    • Jae Hoon LeeHee Seok ChoiSeok Beom ChoiJeong Tak OhSu Yeol Lee
    • H01L33/00
    • H01L33/14H01L33/22H01L33/32H01L33/42H01L2933/0083
    • The present invention relates to a semiconductor light emitting diode. The semiconductor light emitting diode includes a substrate; an n-type nitride semiconductor layer that is formed on the substrate; an active layer that is formed on the n-type nitride semiconductor layer; a p-type nitride semiconductor layer that is formed on the active layer; a first undoped GaN layer that is formed on the p-type nitride semiconductor layer; an AlGaN layer that is formed on the first undoped GaN layer so as to provide a two-dimensional electron gas layer to the interface with the first undoped GaN layer; a second undoped GaN layer that is formed on the AlGaN layer and has irregularities such that the light generated in the active layer is not internally reflected toward the active layer; a p-type transparent electrode that is formed on the second undoped GaN layer; and an n-type electrode and p-type electrode that are formed to be respectively connected onto the n-type nitride semiconductor layer and the p-type transparent electrode.
    • 本发明涉及一种半导体发光二极管。 半导体发光二极管包括基板; 形成在所述基板上的n型氮化物半导体层; 形成在n型氮化物半导体层上的有源层; 形成在有源层上的p型氮化物半导体层; 在p型氮化物半导体层上形成的第一未掺杂GaN层; AlGaN层,形成在第一未掺杂的GaN层上,以便向与第一未掺杂GaN层的界面提供二维电子气层; 第二未掺杂的GaN层,其形成在AlGaN层上并且具有凹凸,使得在有源层中产生的光不向有源层内部反射; 形成在第二未掺杂GaN层上的p型透明电极; 以及形成为分别连接在n型氮化物半导体层和p型透明电极上的n型电极和p型电极。