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1. 发明专利

DE602006002948D1 未知
公开(公告)号：DE602006002948D1
公开(公告)日：2008-11-13
申请号：DE602006002948
申请日：2006-08-30
申请人： JTEKT CORP
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAKAI TOSHIFUMI , SAITO TOSHIYUKI , FUKAMI HAJIME , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO
IPC分类号： F16D13/64 , F16D69/02
摘要： A drive force transmission device (6) has an outer clutch plate (19) and an inner clutch plate (18), which are rotatable relative to each other about a common rotational axis. The inner (18) and outer (19) clutch plates become frictionally engaged with each other with lubricant oil provided in between. The outer (19) and inner (18) clutch plates each have a sliding surface. The sliding surfaces face each other. A diamond-like carbon film is formed on the sliding surface of the outer clutch plate (19). Fine grooves (42) are formed in the sliding surface of the inner clutch plate (18). The proportion of the sliding area to the sliding surface of the inner clutch plate (18) at the initial stage of use is 55 to 90%.

2. 发明专利

DE60334753D1 Reibkupplungsscheibenbelag und mit einer solchen ausgerüsteter Kupplung 未知
公开(公告)号：DE60334753D1
公开(公告)日：2010-12-16
申请号：DE60334753
申请日：2003-04-08
申请人： JTEKT CORP
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAKAI TOSHIFUMI , FUKAMI HAJIME , SAITO TOSHIYUKI , NISHI KOJI , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO
IPC分类号： F16D13/62 , F16D13/64 , F16D27/00 , F16D27/115 , F16D69/00 , F16D69/02 , F16D69/04

3. 发明公开

EP1598442A4 AMORPHOUS CARBON FILM FORMING METHOD AND DEVICE 有权
标题翻译： VERFAHREN UND VORRICHTUNG ZUR AUSBILDUNG EINES AMORPHEN KOHLENSTOFFFILMS
公开(公告)号：EP1598442A4
公开(公告)日：2012-12-19
申请号：EP04710480
申请日：2004-02-12
申请人： JTEKT CORP
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAITO TOSHIYUKI , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO , ITOU KYOUJI , FUJIOKA MIKIO , FUNAKI YOSHIYUKI
IPC分类号： C23C16/26 , C23C16/27 , C23C16/44 , C23C16/455 , C23C16/458 , C23C16/503 , C23C16/509 , C23C16/52 , F16D13/64 , H01J37/00
CPC分类号： C23C16/4583 , C23C16/272 , C23C16/277 , C23C16/45563 , C23C16/45578 , C23C16/4587 , C23C16/509 , C23C16/52 , F16D13/64 , F16D2250/0046 , H01J37/3244 , H01J37/32779

4. 发明专利

JP2007064289A Driving force transmission device 有权
标题翻译：驱动力传动装置
公开(公告)号：JP2007064289A
公开(公告)日：2007-03-15
申请号：JP2005248894
申请日：2005-08-30
申请人： Jtekt Corp , Toyota Central Res & Dev Lab Inc , 株式会社ジェイテクト , 株式会社豊田中央研究所
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAKAI TOSHIBUMI , SAITO TOSHIYUKI , FUKAMI HAJIME , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO
IPC分类号： F16D27/115
CPC分类号： F16D13/64 , F16D13/648 , F16D13/74 , F16D27/004 , F16D27/115 , F16D2027/008 , F16D2065/132 , F16D2069/004 , F16D2200/0008 , F16D2200/0039 , F16D2200/0052 , F16D2300/10
摘要： PROBLEM TO BE SOLVED: To provide a driving force transmission device capable of suppressing change of driving force transmission properties with time by reducing friction of sliding surfaces of driving force transmission members which rotate relatively. SOLUTION: A DLC coat (diamond-like carbon coat) is formed on an outer clutch plate which is one of the driving force transmission members and a plurality of fine grooves 42 are formed on a sliding surface 28a of an inner clutch plate 28 side which is the other of the driving force transmission members. The respective fine grooves 42 are formed so that the rate of slide-contacting area of the sliding surface of the inner clutch plate 28 is 55 to 90% in an initial period of using the driving force transmission device. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题：提供一种能够通过减少相对旋转的驱动力传递部件的滑动面的摩擦来抑制驱动力传递特性随时间的变化的驱动力传递装置。解决方案：在作为驱动力传递部件之一的外离合器板上形成DLC涂层（类金刚石碳涂层），并且在内离合器板的滑动表面28a上形成多个细槽42 28侧，其是驱动力传递构件中的另一个。各个细槽42形成为在使用驱动力传递装置的初始期间内部离合器板28的滑动面的滑动接触面积的比率为55〜90％。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2009179885A Amorphous carbon film forming apparatus 有权
标题翻译：非晶碳膜成型设备
公开(公告)号：JP2009179885A
公开(公告)日：2009-08-13
申请号：JP2009123347
申请日：2009-05-21
申请人： Jtekt Corp , Nippon Denshi Kogyo Kk , Toyota Central R&D Labs Inc , 日本電子工業株式会社 , 株式会社ジェイテクト , 株式会社豊田中央研究所
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAITO TOSHIYUKI , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO , ITO KYOJI , FUJIOKA MIKIO , FUNAKI YOSHIYUKI
IPC分类号： C23C16/509 , C23C16/26 , C23C16/44 , C23C16/455 , C23C16/458
CPC分类号： C23C16/4583 , C23C16/272 , C23C16/277 , C23C16/45563 , C23C16/45578 , C23C16/4587 , C23C16/509 , C23C16/52 , F16D13/64 , F16D2250/0046 , H01J37/3244 , H01J37/32779
摘要： PROBLEM TO BE SOLVED: To provide a technology capable of forming amorphous carbon films at a low cost.
SOLUTION: An amorphous carbon film forming apparatus is characterized by being provided with a film forming furnace 11; a plurality of workpiece fixtures 23 for supporting a plurality of plate-like workpieces 22 in a state that the same are piled up vertically in parallel with the interval between facing surfaces of two vertically adjoining of the plate-like workpieces 22 being in a range of 2 to 30 millimeters, the plurality of workpiece fixtures 23 being annularly arranged within the furnace chamber of the film forming furnace 11 at equal intervals and being connected to a negative electrode; nozzles 31, 32 provided for supplying a supply gas, one or more of which are disposed in the centers of the annularly disposed workpiece fixtures 23, the rest being annularly disposed at equal intervals on the centrifugal side; and a plasma power supply 16 connected to at least the workpiece fixture 23. Since the plurality of plate-like workpieces are vertically supported in a piled-up state to the workpiece fixtures, a film forming area remarkably increases. Further, the ununiformity of a film distribution and a film composition distribution is suppressed, and uniform film forming can be performed to all the plate-like workpieces.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够以低成本形成无定形碳膜的技术。解决方案：无定形碳膜形成装置的特征在于设置有成膜炉11; 多个工件固定件23用于支撑多个板状工件22，其状态与垂直于板状工件22的两个垂直相邻的相对表面之间的间隔垂直堆叠，处于一定范围内 2〜30毫米，多个工件固定件23以相等的间隔环形地布置在成膜炉11的炉室内并连接到负极; 用于供应供气的喷嘴31,32，其一个或多个设置在环形设置的工件固定件23的中心，其余部分以相等的间隔环形设置在离心侧; 以及与至少工件夹具23连接的等离子体电源16.由于多个板状工件以堆叠状态垂直地支撑在工件夹具上，所以成膜区域显着增加。此外，膜分布和膜组成分布的不均匀性被抑制，并且可以对所有的板状工件进行均匀的成膜。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2014098214A Method of producing amorphous carbon coating film member 有权
标题翻译：生产非晶碳涂层薄膜的方法
公开(公告)号：JP2014098214A
公开(公告)日：2014-05-29
申请号：JP2014006396
申请日：2014-01-17
申请人： Jtekt Corp , 株式会社ジェイテクト , Toyota Central R&D Labs Inc , 株式会社豊田中央研究所
发明人： SAITO TOSHIYUKI , ANDO JUNJI , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO
IPC分类号： C23C16/27 , C23C16/02 , C23C16/503 , C23C16/52
CPC分类号： C23C16/26 , C23C16/029 , Y10T428/265 , Y10T428/30
摘要： PROBLEM TO BE SOLVED: To provide an amorphous carbon coating film member combining excellent wear resistance and low counterpart aggressiveness.SOLUTION: An amorphous carbon coating film consists of a conductive substrate and an amorphous carbon coating film fixed to at least a part of the surface of the substrate, the amorphous carbon coating film is based on carbon and is a gradient composition coating film containing silicon whose concentration is continuously gradient in such a manner that the concentration silicon is highest on the substrate side and hydrogen whose concentration is continuously gradient in such a manner that the concentration of hydrogen is lowest on the substrate side. Since the amorphous carbon coating film is a gradient composition coating film containing silicon whose concentration is continuously gradient in such a manner that the concentration of silicon is highest on the substrate side, the substrate side has high hardness, securing strength of the amorphous carbon coating film. In addition, since the amorphous carbon coating film is a gradient composition coating film containing hydrogen whose concentration is continuously gradient in such a manner that the concentration of hydrogen is lowest on the substrate side, the hardness of the amorphous carbon coating film is low on the front surface side, resulting in reduction of counterpart aggressiveness.
摘要翻译：要解决的问题：提供一种具有优异的耐磨性和低对应物侵蚀性的无定形碳涂膜构件。解决方案：无定形碳涂膜由导电基材和固定在表面的至少一部分的无定形碳涂层基体，无定形碳涂膜基于碳，是含有浓度连续梯度的硅的梯度组合物涂膜，其浓度硅在基板侧最高，浓度为浓度连续梯度的氢氢的浓度在衬底侧最低的方式。由于无定形碳涂膜是含有浓度连续梯度的硅的梯度组合物涂膜，因此在基板侧硅的浓度最高，基板侧具有高硬度，确保无定形碳涂膜的强度。此外，由于无定形碳涂膜是含有氢的梯度组合物涂膜，其浓度以基板侧的氢浓度最低的浓度连续梯度，因此无定形碳涂膜的硬度低前表面侧，导致对应的侵蚀性降低。

7. 发明专利

JP2006257466A Method for producing coated member 有权
标题翻译：生产涂层成员的方法
公开(公告)号：JP2006257466A
公开(公告)日：2006-09-28
申请号：JP2005074129
申请日：2005-03-15
申请人： Jtekt Corp , Toyota Central Res & Dev Lab Inc , 株式会社ジェイテクト , 株式会社豊田中央研究所
发明人： ANDO JUNJI , KUWABARA HIROBUMI , FURUHASHI TADATAKE , MORI HIROYUKI , NAKANISHI KAZUYUKI , TACHIKAWA HIDEO
IPC分类号： C23C8/36 , C23C16/02 , C23C28/04
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a coated member where a coated member having excellent adhesion between a base material and a coating film can be obtained.
SOLUTION: The method for producing a coated member comprises: a nitride intermediate layer forming stage where a nitride intermediate layer 10 composed of nitride is formed on the surface part of a base material 1; and a coating film forming stage where a coating film 2 is formed on the nitride intermediate layer 10. In the nitride intermediate layer forming stage, the nitride intermediate layer 10 is formed ≥1 μm in thickness, and the surface of the nitride intermediate layer 10 is made into a rugged face 11 having projecting parts in which the average height is 10 to 100 nm and the average width is 10 to 500 nm. In the nitride intermediate layer forming stage, by forming the nitride intermediate layer ≥1 μm in thickness, the surface of the base material is nitrided, and further, the rugged face sufficient for holding high adhesion with the coating film can be formed.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种涂覆部件的制造方法，其中可以获得在基材和涂膜之间具有优异粘附性的涂布部件。解决方案：涂覆部件的制造方法包括：氮化物中间层形成阶段，其中在基材1的表面部分上形成由氮化物构成的氮化物中间层10; 以及在氮化物中间层10上形成涂膜2的涂膜形成阶段。在氮化物中间层形成阶段，氮化物中间层10的厚度形成为≥1μm以上，氮化物中间层10的表面制成具有平均高度为10〜100nm，平均宽度为10〜500nm的突出部的粗糙面11。在氮化物中间层形成阶段，通过形成厚度为1μm以上的氮化物中间层，使基材的表面氮化，并且可以形成足以与涂膜保持高粘合性的粗糙面。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2007113788A Friction clutch and drive power transmission 有权
标题翻译：摩擦离合器和驱动电力传输
公开(公告)号：JP2007113788A
公开(公告)日：2007-05-10
申请号：JP2006340580
申请日：2006-12-18
申请人： Jtekt Corp , Toyota Central Res & Dev Lab Inc , 株式会社ジェイテクト , 株式会社豊田中央研究所
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAKAI TOSHIBUMI , FUKAMI HAJIME , SAITO TOSHIYUKI , NISHI KOJI , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO
IPC分类号： F16D13/62 , F16D13/52 , F16D27/115 , F16D65/12 , F16D69/00
摘要： PROBLEM TO BE SOLVED: To provide a friction clutch and a drive power transmission with the durable clutch plate which is hard to be worn out. SOLUTION: The DLC-Si film D is applied to the sliding face S2 of an outer clutch plate 34b, by the well known method such as CVD (Chemical Vapor Deposition) method, PVD (Physical Vapor Deposition) method, ion vapor deposition method, and so on. The friction clutch 34 is composed so that the outer clutch plate 34b and an inner clutch plate 34a are frictionally engaged with each other in the lubricating oil. Furthermore, the friction clutch 34 is applied to the drive power transmission. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种难以磨损的耐用离合器片的摩擦离合器和驱动力传递。解决方案：通过诸如CVD（化学气相沉积）法，PVD（物理气相沉积）法，离子蒸气等的公知方法将DLC-Si膜D施加到外离合器片34b的滑动面S2 沉积法等。摩擦离合器34构成为使离合器板34b和内侧离合器片34a在润滑油中摩擦接合。此外，摩擦离合器34被施加到驱动力传递。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2006291355A Amorphous-carbon coated member 有权
标题翻译：非晶碳涂层成员
公开(公告)号：JP2006291355A
公开(公告)日：2006-10-26
申请号：JP2006071701
申请日：2006-03-15
申请人： Jtekt Corp , Toyota Central Res & Dev Lab Inc , 株式会社ジェイテクト , 株式会社豊田中央研究所
发明人： SAITO TOSHIYUKI , ANDO JUNJI , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO
IPC分类号： C23C16/26
摘要： PROBLEM TO BE SOLVED: To provide an amorphous-carbon coated member exhibiting not only good wear resistance but also low aggressiveness against mating member simultaneously.
SOLUTION: The amorphous-carbon coated member according to the present invention comprises a conductive substrate, and an amorphous carbon film fixed onto a part of a surface of the substrate at least. Moreover, the amorphous carbon film comprises a compositionally gradient film. The compositionally gradient film is composed of carbon as a major component, silicon whose concentration inclines continuously so that the silicon concentration is the highest on the substrate side, and hydrogen whose concentration inclines continuously so that the hydrogen concentration is the lowest on the substrate side. Since the amorphous carbon film comprises the compositionally gradient film in which the silicon concentration inclines gradually so that the silicon concentration is the highest on the substrate side, the amorphous carbon film exhibits the highest hardness on the substrate side so that the substrate side can secure the strength of the amorphous carbon film. Additionally, since the amorphous carbon film comprises the compositionally gradient film in which the hydrogen concentration inclines continuously so that the hydrogen concentration is the lowest on the substrate side, the amorphous carbon film exhibits the lowest hardness on the outer side so that the aggressiveness against mating member is reduced.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供不仅具有良好的耐磨性，而且对配合构件同时具有低侵蚀性的非晶碳涂层构件。解决方案：根据本发明的无定形碳涂覆部件至少包括固定到基板的一部分表面上的导电基板和无定形碳膜。此外，无定形碳膜包括组成梯度膜。组成梯度膜由碳作为主要成分，其浓度连续倾斜，硅浓度在基板侧最高，其浓度连续倾斜，使得氢浓度在基板侧最低。由于无定形碳膜包含其中硅浓度逐渐倾斜的组成梯度膜，使得硅衬底侧的硅浓度最高，所以无定形碳膜在衬底侧表现出最高的硬度，使得衬底侧可以固定无定形碳膜的强度。此外，由于无定形碳膜包含其中氢浓度连续倾斜以使得在基板侧上的氢浓度最低的组成梯度膜，所以非晶碳膜在外侧表现出最低的硬度，使得对配合的侵蚀性会员减少版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2006283134A Amorphous carbon film deposition method 有权
标题翻译：非晶碳膜沉积法
公开(公告)号：JP2006283134A
公开(公告)日：2006-10-19
申请号：JP2005105005
申请日：2005-03-31
申请人： Jtekt Corp , Nippon Denshi Kogyo Kk , Toyota Central Res & Dev Lab Inc , 日本電子工業株式会社 , 株式会社ジェイテクト , 株式会社豊田中央研究所
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAKAI TOSHIBUMI , SAITO TOSHIYUKI , FUKAMI HAJIME , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO , KONDO KYOJI , FUJIOKA MIKIO , FUNAKI YOSHIYUKI
IPC分类号： C23C16/26 , F16D13/62 , F16D69/00
摘要： PROBLEM TO BE SOLVED: To provide a film deposition method by which satisfactory amorphous carbon films can be deposited using a DC plasma CVD process by suppressing the occurrence of sooting.
SOLUTION: The amorphous carbon film deposition method is provided by which each amorphous carbon film is deposited on a plurality of electrically conductive works by a DC plasma CVD process, wherein the plurality of works are fixed to a work fixing tool in such a manner that the spacing between the confronted faces in the confronted surfaces of the adjoining two works reaches 5 to 40 mm, the work fixing tool being arranged inside a film deposition furnace and connected to a minus pole, and wherein treatment gas is fed in such a manner that the amount of Si to be fed per unit film deposition time and unit film deposition area reaches ≥0.0006 mol×h
-1 ×m
-2 , and the film deposition is performed.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过抑制烟灰的发生使用DC等离子体CVD工艺可以沉积令人满意的无定形碳膜的成膜方法。解决方案：提供通过DC等离子体CVD工艺将每个非晶碳膜沉积在多个导电工件上的非晶碳膜沉积方法，其中多个工件固定到这样的工件固定工具中相邻的两个工件的相对表面中的面对面之间的间隔达到5至40mm的方式，工件固定工具布置在成膜炉内并连接到负极，并且其中处理气体被供给到每单位成膜时间和单位膜沉积面积供给的Si的量达到≥0.0006mol×h -1 ×m -2 ，并且膜沉积被执行。版权所有（C）2007，JPO＆INPIT

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