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    • 2. 发明专利
    • Method and apparatus for depositing film
    • 沉积膜的方法和装置
    • JP2012001789A
    • 2012-01-05
    • JP2010139602
    • 2010-06-18
    • Nippon Denshi Kogyo KkToyota Central R&D Labs IncToyota Motor Corpトヨタ自動車株式会社日本電子工業株式会社株式会社豊田中央研究所
    • NAKANISHI KAZUYUKIIZEKI TAKASHIOZAWA YASUHIROYAMADA YUKAMIZUNO SEIJISATO KATSUMIKOIZUMI MASAFUMIFUNAKI YOSHIYUKIKONDO KYOJIKIKUCHI TAKAYUKI
    • C23C16/54C23C16/50
    • C23C16/26C23C16/503C23C16/545
    • PROBLEM TO BE SOLVED: To provide a method and an apparatus for depositing a film which achieve uniform film deposition and an increase in an area where the film is deposited, and achieve simultaneous film deposition on the entire surface of a substrate.SOLUTION: The method for depositing a film adopts plasma-enhanced CVD (Chemical Vapor Deposition) using the apparatus for depositing a film which includes a film depositing furnace 1, a pair of rotary electrode reels 2 comprising a feed-out reel 21 and a take-up reel 22, a plasma source 3, a material gas supplying means 4, and an exhausting means 5. The method includes: applying a negative voltage to the rotary electrode reels 2 from the plasma source 3 while a conductive substrate 6 is fed out from the feed-out reel 21 and is wound on the take-up reel 22 so that the entire surface of the substrate portion 63 between reels contacts the material gas, whereby plasma sheath P is formed along the surface of the substrate portion 63 between reels; and activating the material gas in the plasma sheath P and thus contacting the surface of the substrate, thus depositing the film on the surface of the substrate.
    • 要解决的问题:提供一种沉积膜的方法和装置,其实现均匀的膜沉积和膜的沉积面积的增加,并且在基板的整个表面上实现同时的膜沉积。 解决方案:用于沉积薄膜的方法采用等离子体增强CVD(化学气相沉积),其使用沉积薄膜的装置,该装置包括薄膜沉积炉1,一对旋转电极卷轴2,包括一个馈送卷轴21 卷取卷轴22,等离子体源3,原料气体供给装置4以及排出装置5.该方法包括:从等离子体源3向旋转电极卷轴2施加负电压,同时导电基板6 从送出卷轴21送出,卷绕在收带卷轴22上,使得卷轴与材料气体接触的基板部63的整个表面,沿着基板部的表面形成等离子体护套 卷轴之间63; 并激活等离子体鞘P中的原料气体,从而接触衬底表面,从而将膜沉积在衬底的表面上。 版权所有(C)2012,JPO&INPIT
    • 4. 发明专利
    • Method of producing amorphous carbon coating film member
    • 生产非晶碳涂层薄膜的方法
    • JP2014098214A
    • 2014-05-29
    • JP2014006396
    • 2014-01-17
    • Jtekt Corp株式会社ジェイテクトToyota Central R&D Labs Inc株式会社豊田中央研究所
    • SAITO TOSHIYUKIANDO JUNJINAKANISHI KAZUYUKIMORI HIROYUKITACHIKAWA HIDEO
    • C23C16/27C23C16/02C23C16/503C23C16/52
    • C23C16/26C23C16/029Y10T428/265Y10T428/30
    • PROBLEM TO BE SOLVED: To provide an amorphous carbon coating film member combining excellent wear resistance and low counterpart aggressiveness.SOLUTION: An amorphous carbon coating film consists of a conductive substrate and an amorphous carbon coating film fixed to at least a part of the surface of the substrate, the amorphous carbon coating film is based on carbon and is a gradient composition coating film containing silicon whose concentration is continuously gradient in such a manner that the concentration silicon is highest on the substrate side and hydrogen whose concentration is continuously gradient in such a manner that the concentration of hydrogen is lowest on the substrate side. Since the amorphous carbon coating film is a gradient composition coating film containing silicon whose concentration is continuously gradient in such a manner that the concentration of silicon is highest on the substrate side, the substrate side has high hardness, securing strength of the amorphous carbon coating film. In addition, since the amorphous carbon coating film is a gradient composition coating film containing hydrogen whose concentration is continuously gradient in such a manner that the concentration of hydrogen is lowest on the substrate side, the hardness of the amorphous carbon coating film is low on the front surface side, resulting in reduction of counterpart aggressiveness.
    • 要解决的问题:提供一种具有优异的耐磨性和低对应物侵蚀性的无定形碳涂膜构件。解决方案:无定形碳涂膜由导电基材和固定在表面的至少一部分的无定形碳涂层 基体,无定形碳涂膜基于碳,是含有浓度连续梯度的硅的梯度组合物涂膜,其浓度硅在基板侧最高,浓度为浓度连续梯度的氢 氢的浓度在衬底侧最低的方式。 由于无定形碳涂膜是含有浓度连续梯度的硅的梯度组合物涂膜,因此在基板侧硅的浓度最高,基板侧具有高硬度,确保无定形碳涂膜的强度 。 此外,由于无定形碳涂膜是含有氢的梯度组合物涂膜,其浓度以基板侧的氢浓度最低的浓度连续梯度,因此无定形碳涂膜的硬度低 前表面侧,导致对应的侵蚀性降低。
    • 8. 发明专利
    • Hard amorphous carbon coated member and manufacturing method thereof
    • 硬质不饱和碳涂层成员及其制造方法
    • JP2010031327A
    • 2010-02-12
    • JP2008195841
    • 2008-07-30
    • Toyota Central R&D Labs Inc株式会社豊田中央研究所
    • MORI HIROYUKINAKANISHI KAZUYUKIMATSUI MUNEHISAIGARASHI SHINTARO
    • C23C16/27F16C33/12
    • PROBLEM TO BE SOLVED: To provide a hard amorphous carbon coated member having a novel configuration excellent in adhesion to a rigid amorphous carbon film and a base material. SOLUTION: The hard amorphous carbon coated member is provided with the base material, an intermediate layer containing molybdenum and/or titanium formed on the surface of the base material, and a hard amorphous carbon film formed on the surface of the intermediate layer. In at least the interface between the intermediate layer and the hard amorphous carbon film, the intermediate layer contains oxygen and carbon and the hard amorphous carbon film contains silicon. The production of the hard amorphous carbon coated member is facilitated by forming an oxygen-containing metal layer containing molybdenum and/or titanium on the surface of the base material and containing oxygene in at least a surface region, and depositing carbon and silicon on the surface of the oxygen-containing metal layer to form the hard amorphous carbon film contained with silicon and causing the carbon to diffuse from the surface. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供具有对刚性无定形碳膜和基材的粘附性优异的新型构型的硬质无定形碳涂层构件。 解决方案:硬质无定形碳涂层构件设置有基材,在基材表面上形成有钼和/或钛的中间层,以及形成在中间层的表面上的硬质无定形碳膜 。 至少在中间层和硬质无定形碳膜之间的界面中,中间层含有氧和碳,硬的非晶碳膜含有硅。 通过在基材的表面上形成含有钼和/或钛的含氧金属层并在至少一个表面区域中含有氧基,并且在表面上沉积碳和硅来促进硬的无定形碳涂覆部件的生产 的含氧金属层,以形成含有硅的硬质无定形碳膜,并使碳从表面扩散。 版权所有(C)2010,JPO&INPIT
    • 10. 发明专利
    • Device and method for estimating temperature distribution and simulation device
    • 用于估计温度分布和模拟装置的装置和方法
    • JP2013117059A
    • 2013-06-13
    • JP2011266026
    • 2011-12-05
    • Toyota Motor Corpトヨタ自動車株式会社Toyota Central R&D Labs Inc株式会社豊田中央研究所
    • TOMIYASU JOJIIDA ATSUMIKOIZUMI MASAFUMINAKANISHI KAZUYUKIIZEKI TAKASHI
    • C23C16/02C23C14/02C23C16/46C23C16/52H05H1/00H05H1/46
    • PROBLEM TO BE SOLVED: To provide a technology capable of estimating temperature distribution caused by heat generation of an object due to ion collision.SOLUTION: The device for estimating temperature distribution is provided, which estimates temperature distribution in a predetermined region based on heat generation of an object in ion gas, wherein electric potential, ion velocity, and ion density in the predetermined region are obtained, and based on these obtained values, the number of colliding ions which exist in the predetermined region and collide against the object per unit of time, collision energy which is given to the object when one ion collides against the object, and collision frequency which shows how often the ions existing in the predetermined region collide against the object per unit of time are calculated. Based on the calculated number of colliding ions, collision energy, and collision frequency, distribution of the amount of heat generation of the object due to the ion collision is calculated, the temperature distribution in the predetermined region is calculated based on the distribution of amount of heat generation, and the calculated temperature distribution is outputted to the outside.
    • 要解决的问题:提供一种能够估计由于离子碰撞导致的物体的发热引起的温度分布的技术。 提供了一种用于估计温度分布的装置,其基于离子气体中的物体的发热来估计预定区域中的温度分布,其中获得了预定区域中的电位,离子速度和离子密度, 并且基于这些获得的值,存在于预定区域中并且每单位时间碰撞物体的碰撞离子的数量,当一个离子与物体碰撞时给予物体的碰撞能量以及显示如何 通常计算存在于预定区域中的离子与单位时间内的物体相撞。 根据计算出的撞击离子数量,碰撞能量和碰撞频率,计算出由于离子碰撞导致的物体的发热量的分布,基于该离子碰撞的量的分布,计算预定区域内的温度分布 产生热量,将计算出的温度分布输出到外部。 版权所有(C)2013,JPO&INPIT