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1. 发明授权

US08968668B2 Arrays of metal and metal oxide microplasma devices with defect free oxide 有权
标题翻译：具有缺陷氧化物的金属和金属氧化物微质体装置阵列
公开(公告)号：US08968668B2
公开(公告)日：2015-03-03
申请号：US13527842
申请日：2012-06-20
申请人： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Seung Hoon Sung , Min Hwan Kim
发明人： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Seung Hoon Sung , Min Hwan Kim
IPC分类号： B01J19/08 , H01J37/32 , C25D11/02 , H01J11/18 , C25D11/12 , C25D11/18 , C25D11/26 , H01J17/16
CPC分类号： B01J19/0093 , B01J2219/00783 , B01J2219/00842 , B01J2219/00853 , B01J2219/00891 , C01B13/115 , C25D11/02 , C25D11/022 , C25D11/026 , C25D11/12 , C25D11/18 , C25D11/26 , H01J11/18 , H01J11/22 , H01J11/34 , H01J17/066 , H01J17/16 , H01J37/32055 , H05H2001/2412 , H05H2001/2418
摘要： A microplasma device of the invention includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown.
摘要翻译：本发明的微血管装置包括至少部分地限定在基本上由无缺氧氧化物组成的厚金属氧化物层内的微腔或微通道。电极相对于微腔或微通道布置，以在施加适当电压时刺激所述微腔或微通道中的等离子体产生，并且至少一个电极被封装在厚金属氧化物层内。可以形成大阵列，并且由于在氧化物中缺少微裂纹以避免电介质击穿，因此它们具有很强的鲁棒性。

2. 发明申请

US20130071297A1 ARRAYS OF METAL AND METAL OXIDE MICROPLASMA DEVICES WITH DEFECT FREE OXIDE 有权
标题翻译：金属和金属氧化物微孔器件与无氧氧化物的阵列
公开(公告)号：US20130071297A1
公开(公告)日：2013-03-21
申请号：US13527842
申请日：2012-06-20
申请人： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Seung Hoon Sung , Min Hwan Kim
发明人： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Seung Hoon Sung , Min Hwan Kim
IPC分类号： H01J37/32 , C25D11/02
CPC分类号： B01J19/0093 , B01J2219/00783 , B01J2219/00842 , B01J2219/00853 , B01J2219/00891 , C01B13/115 , C25D11/02 , C25D11/022 , C25D11/026 , C25D11/12 , C25D11/18 , C25D11/26 , H01J11/18 , H01J11/22 , H01J11/34 , H01J17/066 , H01J17/16 , H01J37/32055 , H05H2001/2412 , H05H2001/2418
摘要： A microplasma device includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel. At least one of the electrodes is encapsulated within the thick metal oxide layer. A method of fabricating a microcavity or microchannel plasma device includes anodizing a flat or gently curved or gently sloped metal substrate to form a thick layer of metal oxide consisting essentially of nanopores that are perpendicular to the surface of the metal substrate. Material removal is conducted to remove metal oxide material to form a microcavity or microchannel in the thick layer of metal oxide.
摘要翻译：微型装置包括至少部分地在基本上由无缺陷氧化物组成的厚金属氧化物层内限定的微腔或微通道。电极相对于微腔或微通道布置以刺激所述微腔或微通道中的血浆产生。至少一个电极被封装在厚的金属氧化物层内。一种制造微腔或微通道等离子体装置的方法包括阳极氧化平坦或轻柔地弯曲或缓慢倾斜的金属基底，以形成基本上由纳米孔组成的厚层，金属氧化物垂直于金属基底的表面。进行材料去除以除去金属氧化物材料以在金属氧化物的厚层中形成微腔或微通道。

3. 发明申请

US20100072893A1 ELLIPSOIDAL MICROCAVITY PLASMA DEVICES AND POWDER BLASTING FORMATION 有权
标题翻译： ELLIPSOIDAL微波等离子体装置和粉末喷砂形成
公开(公告)号：US20100072893A1
公开(公告)日：2010-03-25
申请号：US12235796
申请日：2008-09-23
申请人： J. Gary Eden , Sung-Jin Park , Seung Hoon Sung
发明人： J. Gary Eden , Sung-Jin Park , Seung Hoon Sung
IPC分类号： H01J17/49 , H01J9/24
CPC分类号： H01J65/046 , H01J9/241 , H01J11/18
摘要： The invention provides microcavity plasma devices and arrays that are formed in layers that also seal the plasma medium, i.e., gas(es) and/or vapors. No separate packaging layers are required and additional packaging can be omitted if it is desirable to do so. A preferred microcavity plasma device includes first and second thin layers that are joined together. A half ellipsoid microcavity or plurality of half ellipsoid microcavities is defined in one or both of the first and second thin layers, and electrodes are arranged with respect to the microcavity to excite a plasma within said microcavities upon application of a predetermined voltage to the electrodes. A method for forming a microcavity plasma device having a plurality of half or full ellipsoid microcavities in one or both of first and second thin layers is also provided by a preferred embodiment. The method includes defining a pattern of protective polymer on the first thin layer. Powder blasting forms half ellipsoid microcavities in the first thin layer. The second thin layer is joined to the first layer. The patterning can be conducted lithographically or can be conduced with a simple screen.
摘要翻译：本发明提供了形成为也密封等离子体介质即气体和/或蒸汽的层的微腔等离子体装置和阵列。不需要单独的包装层，如果要这样做，可以省略额外的包装。优选的微腔等离子体装置包括连接在一起的第一和第二薄层。半椭圆形微腔或多个半椭圆形微腔被限定在第一和第二薄层中的一个或两个中，并且相对于微腔布置电极，以在对电极施加预定电压时在所述微腔内激发等离子体。优选实施例也提供了一种在第一和第二薄层中的一个或两个中形成具有多个半或全椭圆形微腔的微腔等离子体装置的方法。该方法包括在第一薄层上限定保护性聚合物的图案。粉末喷射在第一薄层中形成半椭圆形微腔。第二薄层连接到第一层。图案化可以光刻地进行，或者可以用简单的屏幕进行。

4. 发明授权

US07615926B2 Low voltage microcavity plasma device and addressable arrays 有权
标题翻译：低电压微腔等离子体器件和可寻址阵列
公开(公告)号：US07615926B2
公开(公告)日：2009-11-10
申请号：US11811892
申请日：2007-06-12
申请人： J. Gary Eden , Sung-Jin Park , Paul A. Tchertchian , Seung Hoon Sung
发明人： J. Gary Eden , Sung-Jin Park , Paul A. Tchertchian , Seung Hoon Sung
IPC分类号： H01J17/49
CPC分类号： H01J11/12
摘要： Microcavity plasma devices and arrays of microcavity plasma devices are provided that have a reduced excitation voltage. A trigger electrode disposed proximate to a microcavity reduce the excitation voltage required between first and second electrodes to ignite a plasma in the microcavity when gas(es) or vapor(s) (or combinations thereof) are contained within the microcavity. The invention also provides symmetrical microplasma devices and arrays of microcavity plasma devices for which current waveforms are the same for each half-cycle of the voltage driving waveform. Additionally, the invention also provides devices that have standoff portions and voids that can reduce cross talk. The devices are preferably also used with a trigger electrode.
摘要翻译：提供微腔等离子体器件和微腔等离子体器件的阵列，其具有降低的激发电压。在微腔内包含气体或蒸汽（或其组合）时，靠近微腔设置的触发电极减小了第一和第二电极之间所需的激发电压，以点燃微腔中的等离子体。本发明还提供对称的微等离子体装置和微腔等离子体装置的阵列，其电流波形对于电压驱动波形的每个半周期是相同的。此外，本发明还提供了具有能够减少串扰的间隔部分和空隙的装置。这些装置优选地也与触发电极一起使用。

5. 发明授权

US08179032B2 Ellipsoidal microcavity plasma devices and powder blasting formation 有权
标题翻译：椭球微腔等离子体装置和粉末爆破形成
公开(公告)号：US08179032B2
公开(公告)日：2012-05-15
申请号：US12235796
申请日：2008-09-23
申请人： J. Gary Eden , Sung-Jin Park , Seung Hoon Sung
发明人： J. Gary Eden , Sung-Jin Park , Seung Hoon Sung
IPC分类号： H01J1/00 , H01J1/88
CPC分类号： H01J65/046 , H01J9/241 , H01J11/18
摘要： The invention provides microcavity plasma devices and arrays that are formed in layers that also seal the plasma medium, i.e., gas(es) and/or vapors. No separate packaging layers are required and additional packaging can be omitted if it is desirable to do so. A preferred microcavity plasma device includes first and second thin layers that are joined together. A half ellipsoid microcavity or plurality of half ellipsoid microcavities is defined in one or both of the first and second thin layers, and electrodes are arranged with respect to the microcavity to excite a plasma within said microcavities upon application of a predetermined voltage to the electrodes. A method for forming a microcavity plasma device having a plurality of half or full ellipsoid microcavities in one or both of first and second thin layers is also provided by a preferred embodiment. The method includes defining a pattern of protective polymer on the first thin layer. Powder blasting forms half ellipsoid microcavities in the first thin layer. The second thin layer is joined to the first layer. The patterning can be conducted lithographically or can be conduced with a simple screen.
摘要翻译：本发明提供了形成为也密封等离子体介质即气体和/或蒸汽的层的微腔等离子体装置和阵列。不需要单独的包装层，如果要这样做，可以省略额外的包装。优选的微腔等离子体装置包括连接在一起的第一和第二薄层。半椭圆形微腔或多个半椭圆形微腔被限定在第一和第二薄层中的一个或两个中，并且相对于微腔布置电极，以在对电极施加预定电压时在所述微腔内激发等离子体。优选实施例也提供了一种在第一和第二薄层中的一个或两个中形成具有多个半或全椭圆形微腔的微腔等离子体装置的方法。该方法包括在第一薄层上限定保护性聚合物的图案。粉末喷射在第一薄层中形成半椭圆形微腔。第二薄层连接到第一层。图案化可以光刻地进行，或者可以用简单的屏幕进行。

6. 发明申请

US20080129185A1 Low voltage microcavity plasma device and addressable arrays 有权
标题翻译：低电压微腔等离子体器件和可寻址阵列
公开(公告)号：US20080129185A1
公开(公告)日：2008-06-05
申请号：US11811892
申请日：2007-06-12
申请人： J.Gary Eden , Sung-Jin Park , Paul A. Tchertchian , Seung Hoon Sung
发明人： J.Gary Eden , Sung-Jin Park , Paul A. Tchertchian , Seung Hoon Sung
IPC分类号： H05H1/24
CPC分类号： H01J11/12
摘要： Microcavity plasma devices and arrays of microcavity plasma devices are provided that have a reduced excitation voltage. A trigger electrode disposed proximate to a microcavity reduce the excitation voltage required between first and second electrodes to ignite a plasma in the microcavity when gas(es) or vapor(s) (or combinations thereof) are contained within the microcavity. The invention also provides symmetrical microplasma devices and arrays of microcavity plasma devices for which current waveforms are the same for each half-cycle of the voltage driving waveform. Additionally, the invention also provides devices that have standoff portions and voids that can reduce cross talk. The devices are preferably also used with a trigger electrode.
摘要翻译：提供微腔等离子体器件和微腔等离子体器件的阵列，其具有降低的激发电压。在微腔内包含气体或蒸汽（或其组合）时，靠近微腔设置的触发电极减小了第一和第二电极之间所需的激发电压，以点燃微腔中的等离子体。本发明还提供对称的微等离子体装置和微腔等离子体装置的阵列，其电流波形对于电压驱动波形的每个半周期是相同的。此外，本发明还提供了具有能够减少串扰的间隔部分和空隙的装置。这些装置优选地也与触发电极一起使用。

7. 发明授权

US09659737B2 Phosphor coating for irregular surfaces and method for creating phosphor coatings 有权
公开(公告)号：US09659737B2
公开(公告)日：2017-05-23
申请号：US13183255
申请日：2011-07-14
申请人： J. Gary Eden , Sung-Jin Park , JeKwon Yoon , Kwang-Soo Kim
发明人： J. Gary Eden , Sung-Jin Park , JeKwon Yoon , Kwang-Soo Kim
IPC分类号： H01J1/62 , B05D3/02 , B32B17/00 , H01J29/20 , H01J9/22 , H01J61/44
CPC分类号： H01J29/20 , H01J9/222 , H01J61/44 , Y10T428/24421
摘要： Microstructured, irregular surfaces pose special challenges but coatings of the invention can uniformly coat irregular and microstructured surfaces with one or more thin layers of phosphor. Preferred embodiment coatings are used in microcavity plasma devices and the substrate is, for example, a device electrode with a patterned and microstructured dielectric surface. A method for forming a thin encapsulated phosphor coating of the invention applies a uniform paste of metal or polymer layer to the substrate. In another embodiment, a low temperature melting point metal is deposited on the substrate. Polymer particles are deposited on a metal layer, or a mixture of a phosphor particles and a solvent are deposited onto the uniform glass, metal or polymer layer. Sequential soft and hard baking with temperatures controlled to drive off the solvent will then soften or melt the lowest melting point constituents of the glass, metal or polymer layer, partially or fully embed the phosphor particles into glass, polymer, or metal layers, which partially or fully encapsulate the phosphor particles and/or serve to anchor the particles to a surface.

8. 发明申请

US20150008825A1 MICROPLASMA JET DEVICES, ARRAYS, MEDICAL DEVICES AND METHODS 有权
标题翻译： MICROPLASMA喷射装置，阵列，医疗装置和方法
公开(公告)号：US20150008825A1
公开(公告)日：2015-01-08
申请号：US13532390
申请日：2012-06-25
申请人： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Jeffrey H. Ma
发明人： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Jeffrey H. Ma
IPC分类号： H01J37/32 , H01J9/18
CPC分类号： H01J37/32467 , H01J9/18 , H01J37/3244 , H01J37/32513 , H01J37/32568 , H05H1/2406 , H05H2001/2418 , H05H2001/2462
摘要： Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.
摘要翻译：本发明的优选实施例包括各种材料中的微血管射流装置和阵列，以及低温微血浆喷射装置和阵列。这些包括优选的实施方案，单个微血浆喷射装置和在具有细长微腔的整体式聚合物嵌段中形成的装置阵列。阵列可以被密集地包装，例如在几平方厘米的区域中具有100个喷嘴。另外的实施方案包括在金属氧化物本身中具有微喷嘴的金属/金属氧化物微量喷射装置。本发明还提供了微型喷射装置的制造方法，并且已经证明这些方法能够产生与材料绝缘电极整体的定制的微型喷嘴轮廓。

9. 发明授权

US08442091B2 Microchannel laser having microplasma gain media 有权
标题翻译：具有微质增益介质的微通道激光器
公开(公告)号：US08442091B2
公开(公告)日：2013-05-14
申请号：US12682977
申请日：2008-10-27
申请人： Sung-Jin Park , J. Gary Eden , Paoyei Chen , Paul A. Tchertchian , Thomas M. Spinka
发明人： Sung-Jin Park , J. Gary Eden , Paoyei Chen , Paul A. Tchertchian , Thomas M. Spinka
IPC分类号： H01S3/091
CPC分类号： H01S3/05 , H01S3/03 , H01S3/063 , H01S3/09 , H01S3/0971
摘要： The invention provides microchannel lasers having a microplasma gain medium. Lasers of the invention can be formed in semiconductor materials, and can also be formed in polymer materials. In a microlaser of the invention, high density plasmas are produced in microchannels. The microplasma acts as a gain medium with the electrodes sustaining the plasma in the microchannel. Reflectors are used with the microchannel for obtaining optical feedback to obtain lasing in the microplasma gain medium in devices of the invention for a wide range of atomic and molecular species. Several atomic and molecular gain media will produce sufficiently high gain coefficients that reflectors (mirrors) are not necessary. Microlasers of the invention are based on microplasma generation in channels of various geometries. Preferred embodiment microlaser designs can be fabricated in semiconductor materials, such as Si wafers, by standard photolithographic techniques, or in polymers by replica molding.
摘要翻译：本发明提供了具有微质增益介质的微通道激光器。本发明的激光器可以形成在半导体材料中，也可以形成在聚合物材料中。在本发明的微型激光器中，在微通道中产生高密度等离子体。微量体作为增益介质，其中电极在微通道中维持等离子体。反射器与微通道一起使用以获得光学反馈，以在广泛的原子和分子物种的本发明装置中的微量级增益介质中获得激光。几个原子和分子增益介质将产生足够高的增益系数，反射器（反射镜）不是必需的。本发明的微型扫描器基于各种几何形状的通道中的微量生成。优选实施例微激光器设计可以通过标准光刻技术在半导体材料（例如Si晶片）中或通过复制成型制成聚合物。

10. 发明授权

US08221179B2 Method of making arrays of thin sheet microdischarge devices 有权
标题翻译：制备薄片微放电器件阵列的方法
公开(公告)号：US08221179B2
公开(公告)日：2012-07-17
申请号：US11981412
申请日：2007-10-31
申请人： J. Gary Eden , Sung-Jin Park , Clark J. Wagner
发明人： J. Gary Eden , Sung-Jin Park , Clark J. Wagner
IPC分类号： H01J17/49
CPC分类号： H01J17/49 , H01J1/025 , H01J9/00 , H01J9/02 , H01J25/50 , H01J61/09 , H01J61/305 , H01J61/62 , H01J63/04 , H01J65/046
摘要： The cavity 102 defines an empty volume formed in the insulator 108 has its walls defined by the insulator 108 and may extend through either (or both) the first electrode 106 or the second electrode 104, in which case the first electrode and/or second electrode also define the walls of the cavity 102. The cavity 102 is preferably cylindrical and has a diameter of 0.1 μm-1 mm. More preferably, the diameter ranges from 0.1 μm-500 μm, 1 μm-100 μm, or 100 μm-500 μm. The cavity 102 will be filled with a gas that contacts the cavity walls, fills the entire cavity 102 and is selected for its breakdown voltage or light emission properties at breakdown. Light is produced when the voltage difference between the first electrode 106 and the second electrode 104 creates an electric field sufficiently large to electrically break down the gas (nominally about 104 V-cm). This light escapes from the microcavity 102 through at least one end of the cavity 102.
摘要翻译：空腔102限定在绝缘体108中形成的空的体积具有由绝缘体108限定的壁，并且可延伸穿过第一电极106或第二电极104（或两者）中的一个或两者，在这种情况下，第一电极和/或第二电极还限定空腔102的壁。空腔102优选是圆柱形的并且具有0.1μm-1mm的直径。更优选的是，直径为0.1μm〜500μm，1μm〜100μm或100μm〜500μm。空腔102将填充有与空腔壁接触的气体，填充整个空腔102，并且在击穿时选择其击穿电压或发光特性。当第一电极106和第二电极104之间的电压差产生足够大的电场以电气分解气体（标称约为104V-cm）时产生光。该光通过空腔102的至少一端从微腔102逸出。

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