会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明授权
    • MEMS/NEMS structure comprising a partially monocrystalline anchor and method for manufacturing same
    • 包括部分单晶锚的MEMS / NEMS结构及其制造方法
    • US07981715B2
    • 2011-07-19
    • US12498598
    • 2009-07-07
    • Philippe Robert
    • Philippe Robert
    • H01L21/00
    • B81C1/00039B81B2203/0307
    • The invention relates to a method for producing a MEMS/NEMS structure from a substrate made in a monocrystalline semiconductor material, the structure comprising a flexible mechanical element connected to the substrate by at least one anchoring zone, the method comprising the following steps: the formation of a protection layer on one face of the substrate, the protection layer being made in a monocrystalline material different from the material of the substrate, etching of the protection layer and the substrate in order to produce at least one cavity, the etching being done so as to leave an overhang made in the material of the protection layer on the edges of the cavity, filling in of the cavity with an electrically insulating material in order to obtain an insulating anchoring portion, epitaxy of a semiconductor material from the protection layer and the electrically insulating material in order to obtain a layer designed to produce the flexible mechanical element, liberation of the flexible mechanical element while allowing at least a portion of said overhang to remain.
    • 本发明涉及从由单晶半导体材料制成的衬底制造MEMS / NEMS结构的方法,该结构包括通过至少一个锚定区连接到衬底的柔性机械元件,该方法包括以下步骤:形成 在衬底的一个表面上的保护层,保护层制成不同于衬底的材料的单晶材料,蚀刻保护层和衬底以产生至少一个空腔,蚀刻是这样做的 为了在空腔的边缘留下在保护层的材料上产生的悬垂,用电绝缘材料填充空腔,以便获得绝缘锚固部分,从保护层和半导体材料的外延生长 电绝缘材料,以获得设计用于生产柔性机械元件的层,释放 柔性机械元件,同时允许所述突出部的至少一部分保留。