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    • 7. 发明申请
    • Method for providing a subscriber-based ringback tone sound stored in a mobile exchanger
    • 用于提供存储在移动交换机中的基于用户的回铃音的方法
    • US20060109968A1
    • 2006-05-25
    • US10530020
    • 2003-08-22
    • Hee HahmKi Mun KimSang Yun LeeYeong NoJae Young Park
    • Hee HahmKi Mun KimSang Yun LeeYeong NoJae Young Park
    • H04M3/42H04Q7/38
    • H04W4/16H04M3/42017H04M3/4211H04M3/42153H04M19/041H04W8/20
    • The present invention relates to a method for providing a caller with an arbitrary sound pre-stored in an exchanger that is chosen by a called subscriber instead of a conventional RBT (RingBack Tone). The present method comprises: a first step, conducted by an HLR (Home Location Register) when a location request message is received from a call-originating exchanger because of call connection request to a terminal, of furnishing a call-terminating exchanger with information on whether or not an RBT is to be replaced for the terminal through a routing information request message that is sent to the call-terminating exchanger; and a second step, conducted by the call-terminating exchanger when a trunk connection request from a call-originating exchanger is recognized, of searching for a sound code assigned to the terminal based on the information, and providing a caller with a pre-stored RBT-replacing sound associated with the found sound code as an RBT.
    • 本发明涉及一种用于向呼叫者提供预先存储在由被叫用户而不是常规RBT(RingBack Tone))选择的交换机中的任意声音的方法。 本方法包括:第一步骤,当由呼叫连接请求向终端接收来自呼叫始发交换机的位置请求消息时,由HLR(归属位置寄存器)进行,为呼叫终止交换机提供关于 是否通过发送到呼叫终接交换机的路由信息​​请求消息为终端替换RBT; 以及第二步骤,当来自呼叫始发交换机的中继连接请求被识别时,由呼叫终接交换机进行的第二步骤是基于该信息搜索分配给终端的声音代码,并向主叫方提供预存储 将发现的声码与RBT相关联的RBT替换声音。
    • 9. 发明授权
    • Method for manufacturing a silicon structure
    • 硅结构的制造方法
    • US07141116B2
    • 2006-11-28
    • US11095496
    • 2005-04-01
    • Yong Hoon SonJae Young ParkCha Dong YeoJong Wook LeeYu Gyun Shin
    • Yong Hoon SonJae Young ParkCha Dong YeoJong Wook LeeYu Gyun Shin
    • C30B25/12
    • C30B1/023
    • Provided are improved methods for forming silicon films, particularly single-crystal silicon films from amorphous silicon films in which a single-crystal silicon substrate is prepared by removing any native oxide, typically using an aqueous HF solution, and placed in a reaction chamber. The substrate is then heated from about 350° C. to a first deposition temperature under a first ambient to induce single-crystal epitaxial silicon deposition primarily on exposed silicon surfaces. The substrate is then heated to a second deposition temperature under a second ambient that will maintain the single-crystal epitaxial silicon deposition on exposed single-crystal silicon while inducing amorphous epitaxial silicon deposition on insulating surfaces. The amorphous epitaxial silicon can then be converted to single-crystal silicon using a solid phase epitaxy process to form a thin, high quality silicon layer. The first and second ambients include at least one silicon source gas and may include a non-oxidizing carrier gas.
    • 提供了用于形成硅膜,特别是来自非晶硅膜的单晶硅膜的改进方法,其中通过除去任何天然氧化物(通常使用HF水溶液)并置于反应室中制备单晶硅衬底。 然后将衬底在第一个环境下从约350℃加热到第一沉积温度,以主要在暴露的硅表面上引发单晶外延硅沉积。 然后将衬底在第二环境下被加热到第二沉积温度,其将在暴露的单晶硅上保持单晶外延硅沉积,同时在绝缘表面上诱导非晶外延硅沉积。 然后可以使用固相外延工艺将非晶外延硅转化为单晶硅,以形成薄的,高质量的硅层。 第一和第二环境包括至少一个硅源气体并且可以包括非氧化性载气。