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    • 7. 发明授权
    • Photolithography exposure apparatus having blinding plates and method of driving the same
    • 具有盲板的光刻曝光装置及其驱动方法
    • US08564762B2
    • 2013-10-22
    • US13086293
    • 2011-04-13
    • Chang-Hoon KimBo-Kyoung AhnHong-Suk Yoo
    • Chang-Hoon KimBo-Kyoung AhnHong-Suk Yoo
    • G02B26/02G03B27/32G03B27/42G03B27/54G03B27/72
    • G03F7/2008G03F7/7055
    • An exposure apparatus includes a light source for providing bursts of photolithographic exposure light, a mask for applying a pattern to the photolithographic exposure light, a variable length blind for blocking parts of an exposure window from receiving the photolithographic exposure light and a blind driver for controllably driving the variable length blind. The blind includes a plurality of movable blocking plates. The blind driver includes a plurality of motors and a motor control unit which are structured to rapidly return one or more of the blocking plates through the exposure window in a time duration between the bursts of photolithographic exposure light so that a return stain is not formed on the substrate. In one embodiment, the substrate is a mother substrate having a plurality of LCD daughter substrates being formed thereon.
    • 曝光装置包括用于提供光刻曝光光的脉冲的光源,用于向光刻曝光灯施加图案的掩模,用于阻挡曝光窗口的部分的可变长度遮光板接收光刻曝光灯和盲控制器 驾驶可变长度盲人。 盲板包括多个可移动阻挡板。 盲驱动器包括多个电动机和电动机控制单元,其被构造为在光刻曝光光的脉冲之间的时间段内快速返回一个或多个阻挡板通过曝光窗,使得不会在 底物。 在一个实施例中,基板是在其上形成有多个LCD子基板的母基板。
    • 8. 发明申请
    • BLIND, EXPOSURE APPARATUS HAVING THE BLIND AND METHOD OF DRIVING THE EXPOSURE APPARATUS
    • 黑色,具有黑色的曝光装置和驱动曝光装置的方法
    • US20130088700A1
    • 2013-04-11
    • US13438389
    • 2012-04-03
    • Chang-Hoon KIMHong-Suk YOOKab-Jong SEO
    • Chang-Hoon KIMHong-Suk YOOKab-Jong SEO
    • G03F7/20
    • G03F7/7055G03F7/70066
    • An exposure apparatus includes a light source, a mask and a blind. The light source is disposed over a substrate. The light source cyclically radiates light. The mask is disposed between the light source and the substrate. The mask includes an exposure region and a peripheral region. The peripheral region surrounds the exposure region. A pattern is formed in the exposure region. A plurality of first alignment marks is disposed in the peripheral region. The blind is disposed between the light source and the mask. The blind includes a blocking plate and an adjusting part. The blocking part may move across the substrate. The blocking plate includes second alignment marks disposed at end portions of the blocking plate, opposite to each other. The adjusting part adjusts a position of the blocking plate.
    • 曝光装置包括光源,掩模和盲人。 光源设置在基板上。 光源周期性地辐射光。 掩模设置在光源和基板之间。 掩模包括曝光区域和周边区域。 周边区域围绕曝光区域。 在曝光区域中形成图案。 多个第一对准标记设置在周边区域中。 盲板设置在光源和掩模之间。 盲人包括挡板和调节部。 阻挡部分可以跨过衬底移动。 阻挡板包括设置在阻挡板的彼此相对的端部处的第二对准标记。 调节部调节挡板的位置。