专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08216750B2 Colored composition, color filter and manufacturing method thereof 有权
标题翻译：彩色组合物，滤色器及其制造方法
公开(公告)号：US08216750B2
公开(公告)日：2012-07-10
申请号：US12458383
申请日：2009-07-09
申请人： Isao Shigemori , Morihide Miyamura , Toshio Waku , Yusuke Iida , Kenro Sunahara , Kohei Matsui , Takeshi Ikeda , Hideyo Tanaka , Eishi Aoki , Genki Harada
发明人： Isao Shigemori , Morihide Miyamura , Toshio Waku , Yusuke Iida , Kenro Sunahara , Kohei Matsui , Takeshi Ikeda , Hideyo Tanaka , Eishi Aoki , Genki Harada
IPC分类号： G02B5/20
CPC分类号： C09B67/0065 , G02B5/223 , G03F7/0007 , G03F7/031 , G03F7/105 , Y10T428/24479
摘要： A method of manufacturing a color filter, includes forming a colored coated film on a substrate using a colored composition containing a pigment, a monomer having an ethylenic unsaturated double bond and photo-polymerization initiator, irradiating a filter segment-forming region or a black matrix-forming region of the colored coated film with an excimer laser beam having a wavelength of 308 nm (XeCL) at a dosage sufficient to achieve a cumulative light exposure of 1-150 mJ/cm2, thereby curing the irradiated region, removing uncured portions of the colored coated film to form the filter segment or the black matrix, and repeating the above-described steps plural times, thereby forming filter segments of at least two colors and/or a black matrix.
摘要翻译：一种彩色滤光片的制造方法，其特征在于，使用含有颜料，具有烯属不饱和双键的单体和光聚合引发剂的着色组合物在基板上形成着色涂膜，照射过滤器段形成区域或黑色矩阵具有波长为308nm的准分子激光束（XeCL）的彩色涂膜的成膜区域，其剂量足以实现1-150mJ / cm 2的累积曝光，从而固化照射区域，除去未固化的部分该彩色涂膜形成过滤段或黑色矩阵，多次重复上述步骤，从而形成至少两种颜色和/或黑色矩阵的过滤段。

2. 发明申请

US20090311479A1 Colored composition, color filter and manufacturing method thereof 有权
标题翻译：彩色组合物，滤色器及其制造方法
公开(公告)号：US20090311479A1
公开(公告)日：2009-12-17
申请号：US12458383
申请日：2009-07-09
申请人： Isao Shigemori , Morihide Miyamura , Toshio Waku , Yusuke Iida , Kenro Sunahara , Kohei Matsui , Takeshi Ikeda , Hideyo Tanaka , Eishi Aoki , Genki Harada
发明人： Isao Shigemori , Morihide Miyamura , Toshio Waku , Yusuke Iida , Kenro Sunahara , Kohei Matsui , Takeshi Ikeda , Hideyo Tanaka , Eishi Aoki , Genki Harada
IPC分类号： B32B3/02 , C08F2/46 , C08J7/04
CPC分类号： C09B67/0065 , G02B5/223 , G03F7/0007 , G03F7/031 , G03F7/105 , Y10T428/24479
摘要： A method of manufacturing a color filter, includes forming a colored coated film on a substrate using a colored composition containing a pigment, a monomer having an ethylenic unsaturated double bond and photo-polymerization initiator, irradiating a filter segment-forming region or a black matrix-forming region of the colored coated film with an excimer laser beam having a wavelength of 308 nm (XeCL) at a dosage sufficient to achieve a cumulative light exposure of 1-150 mJ/cm2, thereby curing the irradiated region, removing uncured portions of the colored coated film to form the filter segment or the black matrix, and repeating the above-described steps plural times, thereby forming filter segments of at least two colors and/or a black matrix.
摘要翻译：一种彩色滤光片的制造方法，其特征在于，使用含有颜料，具有烯属不饱和双键的单体和光聚合引发剂的着色组合物在基板上形成着色涂膜，照射过滤器段形成区域或黑色矩阵具有波长为308nm的准分子激光束（XeCL）的彩色涂膜的成膜区域，其剂量足以实现1-150mJ / cm 2的累积曝光，从而固化照射区域，除去未固化的部分该彩色涂膜形成过滤段或黑色矩阵，多次重复上述步骤，从而形成至少两种颜色和/或黑色矩阵的过滤段。

3. 发明授权

US08908302B2 Exposure method for color filter substrate 有权
标题翻译：滤色片基材的曝光方法
公开(公告)号：US08908302B2
公开(公告)日：2014-12-09
申请号：US13521963
申请日：2011-01-07
申请人： Kohei Matsui , Ryosuke Yasui
发明人： Kohei Matsui , Ryosuke Yasui
IPC分类号： G02B5/22 , G02B7/00 , G02F1/1339 , G02F1/1335 , G03F7/00 , G03F7/20 , G02B5/20 , G02F1/1333
CPC分类号： G02F1/13394 , G02B5/201 , G02F1/133516 , G02F2001/133388 , G03F7/0007 , G03F7/203 , G03F7/70466 , G03F7/70791
摘要： An exposure method for color filter substrate is provided. As shown in FIG. 7(a), exposure is performed while a substrate 20 to which a photoresist has been applied is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 (regions indicated by hatching sloping upward to the right) and the display region, respectively, on the substrate 20. Next, as shown in (b), the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52 (regions indicated by hatching sloping upward to the right). Thus, dummy PSs 71 and dummy PSs 72 arranged with desired pitches and having desired shapes can be formed in the first non-display regions 51 and the second non-display regions 52, respectively.
摘要翻译：提供了一种滤色器基板的曝光方法。如图所示。如图7（a）所示，在施加了光致抗蚀剂的基板20在Y方向上传送的同时进行曝光，同时在第一非显示区域51（由阴影向上倾斜所示的区域）同时形成第一层81和层91 向右）和显示区域。接下来，如（b）所示，将基板20旋转90度，并且在沿X方向输送基板20的同时进行曝光，以在第二非显示区域52（由向右倾斜的阴影指示的区域）上形成第二层82。因此，可以分别在第一非显示区域51和第二非显示区域52中形成设置有期望的间距并具有期望形状的虚拟PS 71和虚拟PS 72。

4. 发明申请

US20120258390A1 EXPOSURE METHOD AND EXPOSURE DEVICE 失效
标题翻译：曝光方法和曝光装置
公开(公告)号：US20120258390A1
公开(公告)日：2012-10-11
申请号：US13518201
申请日：2010-12-20
申请人： Kohei Matsui , Kaoru Hatta
发明人： Kohei Matsui , Kaoru Hatta
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/203 , G02B5/201 , G02F1/133516 , G03F7/0007 , G03F7/70466 , G03F7/70475 , G03F7/70725
摘要： In an exposure method, a photomask and a substrate having a resist applied thereto are positioned so as to be opposed to a blinking light source that repeatedly emits light and emits no light. The blinking light source is caused to blink with the substrate being continuously conveyed in a direction orthogonal to a direction in which openings in the photomask are aligned, so that multiple exposures are intermittently performed. In each exposure, a speed at which the substrate is conveyed is controlled such that the openings of the photomask overlap a portion of exposed patterns having been obtained by an immediately preceding exposure, thereby obtaining colored layers which are formed into a striped-shape and extend in the direction in which the substrate is conveyed.
摘要翻译：在曝光方法中，将光掩模和施加有抗蚀剂的基板定位成与重复发光的闪烁光源相对照而不发光。使闪烁的光源与基板在与光掩模中的开口对齐的方向正交的方向上连续输送，从而间歇地进行多次曝光。在每次曝光中，控制基板被输送的速度，使得光掩模的开口与通过紧接在前的曝光获得的曝光图案的一部分重叠，从而获得形成为条纹状并延伸的着色层在基板被输送的方向上。

5. 发明申请

US20090097189A1 LITHIUM ION CAPACITOR 有权
标题翻译：锂离子电容器
公开(公告)号：US20090097189A1
公开(公告)日：2009-04-16
申请号：US12063696
申请日：2006-07-28
申请人： Shinichi Tasaki , Mitsuru Nagai , Hiromoto Taguchi , Kohei Matsui , Risa Takahata , Kenji Kojima , Nobuo Ando , Yukinori Hato , Osamu Hatozaki
发明人： Shinichi Tasaki , Mitsuru Nagai , Hiromoto Taguchi , Kohei Matsui , Risa Takahata , Kenji Kojima , Nobuo Ando , Yukinori Hato , Osamu Hatozaki
IPC分类号： H01G9/048
CPC分类号： H01G11/70 , H01G11/06 , H01G11/12 , H01G11/24 , H01G11/26 , H01G11/34 , H01G11/52 , Y02E60/13 , Y02T10/7022
摘要： A lithium ion capacitor having high energy density, high output density, high capacity and high safety is provided.A lithium ion capacitor comprising a positive electrode 1 made of a material capable of being reversibly doped with lithium ions and/or anions, a negative electrode 2 made of a material capable of being reversively doped with lithium ions, and an aprotic organic solution of a lithium salt as an electrolytic solution, wherein the positive electrode 1 and the negative electrode 2 are laminated or wound with a separator interposed between them, the area of the positive electrode 1 is smaller than the area of the negative electrode 2, and the face of the positive electrode 1 is substantially covered by the face of the negative electrode 2 when they are laminated or wound.
摘要翻译：提供了具有高能量密度，高输出密度，高容量和高安全性的锂离子电容器。一种锂离子电容器，其包括由能够可逆地掺杂锂离子和/或阴离子的材料制成的正极1，由能够被锂离子反向掺杂的材料制成的负极2和非极性有机溶液锂盐作为电解液，其中正极1和负极2以介于它们之间的隔膜层叠或缠绕，正极1的面积小于负极2的面积，面积正极1在层叠或卷绕时基本上被负极2的表面覆盖。

6. 发明授权

US08830610B2 Exposure method for color filter substrate 有权
标题翻译：滤色片基材的曝光方法
公开(公告)号：US08830610B2
公开(公告)日：2014-09-09
申请号：US13522626
申请日：2011-01-11
申请人： Kohei Matsui , Ryosuke Yasui , Keiichi Tanaka , Takenori Yoshizawa
发明人： Kohei Matsui , Ryosuke Yasui , Keiichi Tanaka , Takenori Yoshizawa
IPC分类号： G02B5/22 , G02B5/20 , G02F1/1339 , G02F1/1335
CPC分类号： G02B5/201 , G02F1/133516 , G02F1/13394
摘要： An exposure method is provided. In (a) of FIG. 8, exposure is performed while a substrate 20 is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 and the display region, respectively, on the substrate 20. Next, in (b) of FIG. 8, the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52. Subsequently, in (c) of FIG. 8, proximity exposure is performed once on the substrate 20 to simultaneously form third layers 83 on the first layers 81 in the first non-display regions 51, fourth layers 84 on the second layers 82 in the second non-display regions 52, and layers 92 in the display region 40.
摘要翻译：提供曝光方法。在图1（a）中，如图8所示，在基板20沿Y方向传送的同时进行曝光，同时在基板20上分别在第一非显示区域51和显示区域形成第一层81和第91层。接着，在（b ）。如图8所示，基板20旋转90度，并且在基板20沿X方向传送的同时进行曝光，以在第二非显示区域52中形成第二层82。如图8所示，在基板20上进行一次接近曝光，同时在第一非显示区域51中的第一层81上形成第三层83，在第二非显示区域52中形成第二层82上的第四层84， 92。

7. 发明授权

US08804075B2 Color filter and color filter manufacturing method 有权
标题翻译：滤色片和滤色片制造方法
公开(公告)号：US08804075B2
公开(公告)日：2014-08-12
申请号：US13138479
申请日：2010-02-24
申请人： Kohei Matsui , Kaoru Hatta , Ryosuke Yasui
发明人： Kohei Matsui , Kaoru Hatta , Ryosuke Yasui
IPC分类号： G02F1/1335 , G02B5/20 , G02F1/1339
CPC分类号： G02B5/201 , G02F1/133516 , G02F1/13394
摘要： A color filter having excellent display quality is provided by a continuous exposure method using a compact photomask. The color filter includes: a substrate; a black matrix formed on the substrate, for dividing the substrate into rectangular display regions in which the plurality of pixels are arrayed, and non-display regions surrounding the display regions; a stripe pattern; a plurality of columnar spacers disposed in the display regions; and a plurality of dummy columnar spacers. The stripe pattern includes a plurality of colored layers extending in one direction. Each colored layer intersects with a pair of sides of the display region in a direction perpendicular to the direction in which the colored layers extend. The thickness of both end portions of each colored layer disposed on the non-display region is not uniform. The dummy columnar spacers are disposed in portions of the non-display regions, where the colored layers are absent.
摘要翻译：通过使用紧凑型光掩模的连续曝光方法提供具有优异显示质量的滤色器。滤色器包括：基板; 形成在所述基板上的黑色矩阵，用于将所述基板分割成排列有所述多个像素的矩形显示区域和围绕所述显示区域的非显示区域; 条纹图案设置在显示区域中的多个柱状间隔物; 以及多个虚拟柱状间隔物。条纹图案包括在一个方向上延伸的多个着色层。每个着色层在与着色层延伸的方向垂直的方向上与显示区域的一对相交。设置在非显示区域上的各着色层的两端部的厚度不均匀。虚拟柱状间隔物设置在不显示着色层的非显示区域的部分中。

8. 发明授权

US08698984B2 Color filter, liquid crystal display device, and color filter production method 失效
标题翻译：滤色片，液晶显示装置和滤色片制作方法
公开(公告)号：US08698984B2
公开(公告)日：2014-04-15
申请号：US13138929
申请日：2010-04-28
申请人： Kohei Matsui , Ryosuke Yasui
发明人： Kohei Matsui , Ryosuke Yasui
IPC分类号： G02F1/1335
CPC分类号： G02B5/201 , G02F1/133514 , G02F1/133516 , G03F7/0007
摘要： A color filter is provided which is formed by using a small mask continuous exposure method in which a portion between adjacent exposed areas is shielded from light by a blind shutter, and which has dummy photo spacers formed on a colored layer outside a display pixel area at a uniform height. Firstly, by using the small mask continuous exposure method, a colored layer is formed which extends in the X-axis direction astride the display pixel area and a frame area. At this time, the edges of the blind shutter which are parallel to the Y axis are each positioned so as to be distant by 500 μm to 1000 μm from a side which forms the outer circumference of the outermost opening and which is closest to the frame area extending in the Y-axis direction. Next, photo spacers are formed on the colored layer such that the central axis of each photo spacer is positioned in a range of positions that are distant by 300 μm or less from a side which is closest to the frame area extending in the Y-axis direction.
摘要翻译：提供一种滤色器，其通过使用小掩模连续曝光方法形成，其中相邻的曝光区域之间的部分被遮光板遮挡光，并且在显示像素区域外的着色层上形成有虚拟的光隔离物均匀的高度。首先，通过使用小掩模连续曝光法，形成了沿X轴方向跨越显示像素区域和框架区域延伸的着色层。此时，与Y轴平行的遮光板的边缘分别定位成从形成最外侧开口的外周的一侧离开框架500μm至1000μm 区域沿Y轴方向延伸。接下来，在着色层上形成光隔离物，使得每个光电间隔物的中心轴线位于从最靠近Y轴延伸的框架区域的一侧距离300μm以下的位置的范围内方向。

9. 发明授权

US08697319B2 Exposure method, color filter manufacturing method, and exposure device 失效
标题翻译：曝光方法，滤色片制造方法和曝光装置
公开(公告)号：US08697319B2
公开(公告)日：2014-04-15
申请号：US13138340
申请日：2010-02-04
申请人： Kohei Matsui , Yasuhiro Shibata , Ryosuke Yasui
发明人： Kohei Matsui , Yasuhiro Shibata , Ryosuke Yasui
IPC分类号： G02B5/20 , G03F7/20
CPC分类号： G03F7/0007 , G02B5/201 , G03F1/50 , G03F7/2022
摘要： An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomask to an irradiation area in an exposure device. A photomask, having a first mask pattern for exposing a portion of colored pixels constituting a first color filter and a second mask pattern for exposing a portion of colored pixels constituting a second color filter, is fixed with respect to a light source. A light beam from a light source is selectively directed to the first mask pattern while transferring the substrate, to continuously expose a resist in a first region, and the light beam from the light source is selectively directed to the second mask pattern while transferring the substrate, to continuously expose a resist in a second region.
摘要翻译：提供一种曝光方法，其中当使用具有多个掩模图案的光掩模进行曝光时，对应于各种不同滤色器的各种掩模图案在基板上的不同区域中曝光，而不将光掩模移动到曝光装置相对于光源固定具有用于曝光构成第一滤色器的彩色像素的一部分的第一掩模图案和用于曝光构成第二滤色器的彩色像素的一部分的第二掩模图案的光掩模。来自光源的光束在转印衬底的同时选择性地导向第一掩模图案，以连续地暴露第一区域中的抗蚀剂，并且来自光源的光束被选择性地导向第二掩模图案同时传送衬底以在第二区域中连续地曝光抗蚀剂。

10. 发明申请

US20120038863A1 COLOR FILTER, LIQUID CRYSTAL DISPLAY DEVICE,AND COLOR FILTER PRODUCTION METHOD 失效
标题翻译：彩色滤光片，液晶显示装置和彩色滤光片制作方法
公开(公告)号：US20120038863A1
公开(公告)日：2012-02-16
申请号：US13138929
申请日：2010-04-28
申请人： Kohei Matsui , Ryosuke Yasui
发明人： Kohei Matsui , Ryosuke Yasui
IPC分类号： G02F1/1335 , G03F1/00 , G02B5/22
CPC分类号： G02B5/201 , G02F1/133514 , G02F1/133516 , G03F7/0007
摘要： A color filter is provided which is formed by using a small mask continuous exposure method in which a portion between adjacent exposed areas is shielded from light by a blind shutter, and which has dummy photo spacers formed on a colored layer outside a display pixel area at a uniform height. Firstly, by using the small mask continuous exposure method, a colored layer is formed which extends in the X-axis direction astride the display pixel area and a frame area. At this time, the edges of the blind shutter which are parallel to the Y axis are each positioned so as to be distant by 500 μm to 1000 μm from a side which forms the outer circumference of the outermost opening and which is closest to the frame area extending in the Y-axis direction. Next, photo spacers are formed on the colored layer such that the central axis of each photo spacer is positioned in a range of positions that are distant by 300 μm or less from a side which is closest to the frame area extending in the Y-axis direction.
摘要翻译：提供一种滤色器，其通过使用小掩模连续曝光方法形成，其中相邻的曝光区域之间的部分被遮光板遮挡光，并且在显示像素区域外的着色层上形成有虚拟的光隔离物均匀的高度。首先，通过使用小掩模连续曝光法，形成了沿X轴方向跨越显示像素区域和框架区域延伸的着色层。此时，与Y轴平行的遮光板的边缘分别定位成从形成最外侧开口的外周的一侧离开框架500μm至1000μm 区域沿Y轴方向延伸。接下来，在着色层上形成光隔离物，使得每个光电间隔物的中心轴线位于从最靠近Y轴延伸的框架区域的一侧距离300μm以下的位置的范围内方向。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式