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1. 发明申请

US20040119021A1 Electron optics for multi-beam electron beam lithography tool 审中-公开
标题翻译：多光束电子束光刻工具的电子光学
公开(公告)号：US20040119021A1
公开(公告)日：2004-06-24
申请号：US10630349
申请日：2003-07-29
申请人： Ion Diagnostics , Multibeam Systems, Inc. , Motorola, Inc.
发明人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
IPC分类号： H01J003/14
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177
摘要： A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, individually focused charge particle beams; telecentric scanning of all beams simultaneously on a wafer for increased depth of field; and conjugate blanking of the charged particle beams for reduced beam blur. An electron gun is disclosed that uses microfabricated, field emission sources and a microfabricated aperture-deflector assembly. The aperture-deflector assembly acts as a perfect lens in focusing, steering and blanking a multipicity of electron beams through the back focal plane of an immersion lens located at the bottom of the column. Beam blanking can be performed using a gating signal to decrease beam blur during writing on the wafer.
摘要翻译：本文公开了一种能够在高通量，多列，多光束电子束光刻系统中使用的电荷粒子光学列。该柱具有以下特性：纯静电成分; 小柱占地面积（20平方米）; 多个单独聚焦的电荷粒子束; 同时在晶圆上同时扫描所有光束以增加景深; 并且用于减少光束模糊的带电粒子束的共轭消隐。公开了一种电子枪，其使用微制造的场致发射源和微加工的孔径 - 偏转器组件。孔径偏转器组件用作聚焦，转向和消隐通过位于塔底部的浸没透镜的后焦平面的多个电子束的完美透镜。可以使用门控信号进行光束消隐，以减少在晶片上写入期间的光束模糊。

2. 发明申请

US20030085360A1 ELECTRON OPTICS FOR MULTI-BEAM ELECTRON BEAM LITHOGRAPHY TOOL 失效
标题翻译：多光束电子束光刻工具的电子光学
公开(公告)号：US20030085360A1
公开(公告)日：2003-05-08
申请号：US10243585
申请日：2002-09-12
申请人： Multibeam Systems, Inc.
发明人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
IPC分类号： H01J037/04
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177
摘要： A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, individually focused charge particle beams; telecentric scanning of all beams simultaneously on a wafer for increased depth of field; and conjugate blanking of the charged particle beams for reduced beam blur. An electron gun is disclosed that uses microfabricated field emission sources and a microfabricated aperture-deflector assembly. The aperture-deflector assembly acts as a perfect lens in focusing, steering and blanking a multipicity of electron beams through the back focal plane of an immersion lens located at the bottom of the column. Beam blanking can be performed using a gating signal to decrease beam blur during writing on the wafer.
摘要翻译：本文公开了一种能够在高通量，多列，多光束电子束光刻系统中使用的电荷粒子光学列。该柱具有以下特性：纯静电成分; 小柱占地面积（20平方米）; 多个单独聚焦的电荷粒子束; 同时在晶圆上同时扫描所有光束以增加景深; 并且用于减少光束模糊的带电粒子束的共轭消隐。公开了一种电子枪，其使用微制造的场致发射源和微制造的孔径偏转器组件。孔径偏转器组件用作聚焦，转向和消隐通过位于塔底部的浸没透镜的后焦平面的多个电子束的完美透镜。可以使用门控信号进行光束消隐，以减少在晶片上写入期间的光束模糊。

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