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1. 发明专利

JP2010067880A Electron beam lithography system, beam pattern limiting aperture, and design method thereof 审中-公开
标题翻译：电子束光刻系统，光束图案限幅光栅及其设计方法
公开(公告)号：JP2010067880A
公开(公告)日：2010-03-25
申请号：JP2008234389
申请日：2008-09-12
申请人： Multibeam Systems Inc , Tokyo Electron Ltd , マルチビームシステムズインコーポレイテッド , 東京エレクトロン株式会社
发明人： FUSE SATOSHI , TAKEYA KOJI , SHOSHI TADASHI , PARKER N WILLIAM
IPC分类号： H01L21/027 , G03F7/20 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To improve current density distribution characteristics in a beam pattern on a target to be processed, by using an electron optical system having a simple configuration and single-beam pattern limiting apertures.
SOLUTION: For an aperture layout which has been corrected so that it can be physically manufactured, a current density distribution in a beam pattern is obtained (S
5 ). Next, a preset determination threshold is applied to the current density distribution in the beam pattern BP, which is obtained in the above manner, to determine the uniformity of current density (S
6 ). When the uniformity is not within an allowable range, a temporary inside shielding part is set in a temporary electron beam passage region part (S
7 and S
8 ). The steps S
5 to S
8 are properly repeated for the aperture layout changed or updated by the temporary inside shielding part in the above manner to settle the temporary electron beam passage region part and the temporary inside shielding part which satisfy determination criteria (S
8 ).
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过使用具有简单构造的电子光学系统和单束图案限制孔，来改善待加工靶上的束图案中的电流密度分布特性。解决方案：对于已经被校正以使其可以物理地制造的孔径布局，获得波束图案中的电流密度分布（S 5 ）。接下来，将以上述方式获得的波束图案BP中的电流密度分布应用预设的确定阈值，以确定电流密度的均匀性（S 6 ）。当均匀性不在容许范围内时，暂时的电子束通过区域部分（S 7 和S 8 ）中设置临时的内部屏蔽部分。对于以上述方式由临时内屏蔽部分改变或更新的孔径布局，适当地重复步骤S 5 到S 8 ，以将临时电子束通过区域部分和满足判定基准的临时内侧屏蔽部（S 8 ）。版权所有（C）2010，JPO＆INPIT

2. 发明专利

AU2003259857A1 MULTI-COLUMN MULTI-BEAM INSPECTION SYSTEM 未知
公开(公告)号：AU2003259857A1
公开(公告)日：2004-03-03
申请号：AU2003259857
申请日：2003-08-13
申请人： MULTIBEAM SYSTEMS INC
发明人： PARKER WILLIAM N , MILLER DANIEL S
IPC分类号： G01Q20/02 , G01Q30/02 , G21K1/087 , G21K5/10 , H01J37/04 , H01J37/28
摘要： An electron optics assembly for a multi-column electron beam inspection tool comprises a single accelerator structure and a single focus electrode mounting plate for all columns; the electron optical components are one per column and are independently alignable. The accelerator structure comprises first and final accelerator electrodes with a set of accelerator plates in between; the first and final accelerator plates have an aperture for each column and the accelerator plates have a single aperture such that the electron optical axes for all columns pass through the single aperture. Independently alignable focus electrodes are attached to the focus electrode mounting plate, allowing each electrode to be aligned to the electron optical axis of its corresponding column. There is one electron gun per column, mounted on the top of the single accelerator structure. In other embodiments, the electron guns are mounted to a single gun mounting plate positioned above the accelerator structure.

3. 发明申请

WO2007032779A3 APPARATUS AND METHOD FOR INSPECTION AND TESTING OF FLAT PANEL DISPLAY SUBSTRATES 审中-公开
标题翻译：用于检查和测试平板显示基板的装置和方法
公开(公告)号：WO2007032779A3
公开(公告)日：2007-10-11
申请号：PCT/US2006011381
申请日：2006-03-28
申请人： MULTIBEAM SYSTEMS INC
发明人： PARKER WILLIAM N
IPC分类号： H01J37/28 , H01J37/147
CPC分类号： H01J37/256 , H01J9/42 , H01J37/09 , H01J37/147 , H01J37/244 , H01J2237/0492 , H01J2237/1501 , H01J2237/162 , H01J2237/188 , H01J2237/24475 , H01J2237/2448 , H01J2237/2594 , H01J2237/2817
摘要： A charged particle optical system for testing, imaging or inspecting substrates comprises a charged particle optical assembly configure to produce a line of charged particle beams equally spaced along a main scan axis, each beam (2714) being deflectable through a large angle along the main scan axis, and linear detector optics aligned along the main scan axis The detector optics includes a linear secondary electron detector, a field free tube, voltage contrast plates and a linear backscattered electron detector The large beam deflection is achieved using an electrostatic deflector (2713) for which the exit aperture is larger than the entrance aperture One embodiment of the deflector includes two parallel plates (3001, 3005) with chamfered inner surfaces disposed perpendicularly to the main scan axis, and a multiplicity of electrodes (3002, 3003, 3004) positioned peripherally in the gap between the plates, the electrodes being configured to maintain a uniform electric field transverse to the main scan axis.
摘要翻译：用于测试，成像或检查基板的带电粒子光学系统包括被配置为产生沿着主扫描轴等距间隔的带电粒子束线的带电粒子光学组件，每个光束（2714）可沿主扫描偏转大角度轴和线性检测器光学元件沿着主扫描轴对准检测器光学器件包括线性二次电子检测器，无场电子管，电压对比板和线性背散射电子检测器使用静电偏转器（2713）实现大光束偏转其出口孔径大于入口孔径。偏转器的一个实施例包括两个平行板（3001,3005），其具有垂直于主扫描轴线设置的倒角内表面，以及多个沿周向定位的电极（3002,3003,3004）在板之间的间隙中，电极被配置为保持横向t均匀的电场 o主扫描轴。

4. 发明申请

US20030085360A1 ELECTRON OPTICS FOR MULTI-BEAM ELECTRON BEAM LITHOGRAPHY TOOL 失效
标题翻译：多光束电子束光刻工具的电子光学
公开(公告)号：US20030085360A1
公开(公告)日：2003-05-08
申请号：US10243585
申请日：2002-09-12
申请人： Multibeam Systems, Inc.
发明人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
IPC分类号： H01J037/04
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177
摘要： A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, individually focused charge particle beams; telecentric scanning of all beams simultaneously on a wafer for increased depth of field; and conjugate blanking of the charged particle beams for reduced beam blur. An electron gun is disclosed that uses microfabricated field emission sources and a microfabricated aperture-deflector assembly. The aperture-deflector assembly acts as a perfect lens in focusing, steering and blanking a multipicity of electron beams through the back focal plane of an immersion lens located at the bottom of the column. Beam blanking can be performed using a gating signal to decrease beam blur during writing on the wafer.
摘要翻译：本文公开了一种能够在高通量，多列，多光束电子束光刻系统中使用的电荷粒子光学列。该柱具有以下特性：纯静电成分; 小柱占地面积（20平方米）; 多个单独聚焦的电荷粒子束; 同时在晶圆上同时扫描所有光束以增加景深; 并且用于减少光束模糊的带电粒子束的共轭消隐。公开了一种电子枪，其使用微制造的场致发射源和微制造的孔径偏转器组件。孔径偏转器组件用作聚焦，转向和消隐通过位于塔底部的浸没透镜的后焦平面的多个电子束的完美透镜。可以使用门控信号进行光束消隐，以减少在晶片上写入期间的光束模糊。

5. 发明申请

WO2005112043A1 MULTI-COLUMN CHARGED PARTICLE OPTICS ASSEMBLY 审中-公开
标题翻译：多列充电颗粒光学组件
公开(公告)号：WO2005112043A1
公开(公告)日：2005-11-24
申请号：PCT/US2005/015278
申请日：2005-05-03
申请人： MULTIBEAM SYSTEMS, INC.
发明人： PARKER, N., William , MILLER, S., Daniel , GALANDE, Victor
IPC分类号： G21K5/10
CPC分类号： H01J37/065 , H01J37/32862 , H01J2237/0635 , H01J2237/1501 , H01J2237/2817
摘要： A multi-column charged particle optics assembly comprises: a first optical component which is continuous through all columns of the charged particle optics assembly; and a multiplicity of independently alignable second optical components coupled to the first optical component, such that there is one second component for each column in the charged particle optics assembly. The first component provides mechanical integrity to the charged particle optics assembly and each second optical component is independently alignable to the optic axis of its corresponding column. In a further embodiment, the charged particle optics assembly comprises: first and second continuous optical components; and a multiplicity of independently alignable electrodes coupled to the second optical component, such that there is a corresponding independently alignable electrode for each column.
摘要翻译：多列带电粒子光学组件包括：连续穿过带电粒子光学组件的所有列的第一光学部件; 以及耦合到第一光学部件的多个独立对准的第二光学部件，使得在带电粒子光学组件中每一列存在一个第二部件。第一组件为带电粒子光学组件提供机械完整性，并且每个第二光学部件独立地对准其相应色谱柱的光轴。在另一实施例中，带电粒子光学组件包括：第一和第二连续光学部件; 以及耦合到第二光学部件的多个可独立对准的电极，使得对于每个列存在相应的可独立对准的电极。

6. 发明申请

WO2002086941A1 DETECTOR OPTICS FOR ELECTRON BEAM INSPECTION SYSTEM 审中-公开
标题翻译：电子束检测系统的检测器光学
公开(公告)号：WO2002086941A1
公开(公告)日：2002-10-31
申请号：PCT/US2002/012473
申请日：2002-04-18
申请人： MULTIBEAM SYSTEMS, INC.
发明人： PARKER, Norman, William , YIN, Edward, M. , TSAI, Frank, Ching-Feng
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J37/05 , H01J37/28 , H01J2237/057
摘要： An electron beam column includes an electron gun (186), an accelerating region (170), scaning deflectors (160), focusing lenses (150), secondary electron detectors (130), and an asymmetrical detector which is defined by a field-free tube (140) and a voltage contrast plate (120).
摘要翻译：电子束柱包括电子枪（186），加速区域（170），扫描偏转器（160），聚焦透镜（150），二次电子检测器（130）以及由无场区定义的不对称检测器管（140）和电压对比板（120）。

7. 发明申请

WO2002086804A1 IMAGE PROCESSING SYSTEM FOR MULTI-BEAM INSPECTION 审中-公开
标题翻译：用于多光束检测的图像处理系统
公开(公告)号：WO2002086804A1
公开(公告)日：2002-10-31
申请号：PCT/US2002/012265
申请日：2002-04-17
申请人： MULTIBEAM SYSTEMS, INC.
发明人： MILLER, Stephen, Daniel , PARKER, Norman, William , HOBMANN, Steven, B.
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： An image processing system (fig. 1A 200) for use in semiconductor wafer inspection comprises a multiplicity of self-contained image processors for independently performing image cross-correlation and defect detection. The system may also comprise an image normalization engine for performing image brightness and contrast normalization. The self-contained image processors and image normalization engine (fig. 1A 400) access image data from a memory array (fig. 1A 300); the array is fed data from a multiplicity of imaging modules operating in parallel. The memory array is configured to allow simultaneous access for data input, normalization, and cross-correlation and defect detection. Multiple image processing systems can be configured in parallel as a single image processing computer, all sending defect data to a common display module.
摘要翻译：用于半导体晶片检查的图像处理系统（图1A 200）包括用于独立执行图像互相关和缺陷检测的多个自包含图像处理器。该系统还可以包括用于执行图像亮度和对比度归一化的图像归一化引擎。独立的图像处理器和图像归一化引擎（图1A400）从存储器阵列（图1A300）访问图像数据; 该阵列从并行操作的多个成像模块馈送数据。存储器阵列被配置为允许同时访问数据输入，归一化和互相关和缺陷检测。多个图像处理系统可以并行配置为单个图像处理计算机，全部将缺陷数据发送到公共显示模块。

8. 发明申请

WO2007133176A3 FLAT PANEL DISPLAY SUBSTRATE TESTING SYSTEM 审中-公开
标题翻译：平板显示基板测试系统
公开(公告)号：WO2007133176A3
公开(公告)日：2009-04-23
申请号：PCT/US2006014794
申请日：2006-04-19
申请人： MULTIBEAM SYSTEMS INC
发明人： PARKER N WILLIAM , MILLER S DANIEL , RAVI TIRUNELVELI S
IPC分类号： G01R31/00
CPC分类号： G09G3/006 , G01R31/2893 , G01R31/305
摘要： Pallet (100) is supported by bi-directional motor-driven rollers (627) to transport pallet (100) into and out of the process chamber (not shown) along direction (1299). Each column (1211 ) includes an electron source for generating an electron beam (1230), one or more lenses for focusing electron beam (1230) onto the surface of FPDS (120), and a deflector for deflecting electron beam (1230) on the surface of FPDS (120). The design of columns (1211) is optimized to scan beams (1230) substantially along an axis perpendicular to the direction of travel (1299) (X direction) of pallet (100). Five electron beam columns (1211) generate electro beams (1230), each beam (1230) being configured to scan substantially along an axis perpendicular to the direction of travel (1299) of pallet (100). The scan distance of each beam (1230) is typically -125 mm wide and the spacing of columns (1211 ) is less than or equal to the width of the beam scans, thus neighboring scans overlap or abut, enabling the full width of FPDS (120) to be scanned with at least one e-beam 1230 without the need for motion in the Y direction.
摘要翻译：托盘（100）由双向电机驱动辊（627）支撑，以沿着方向（1299）将托盘（100）输送进出处理室（未示出）。每列（1211）包括用于产生电子束（1230）的电子源，用于将电子束（1230）聚焦到FPDS（120）的表面上的一个或多个透镜，以及用于偏转电子束（1230）的偏转器 FPDS表面（120）。柱（1211）的设计被优化为基本上沿着垂直于托盘（100）的行进方向（1299）（X方向）的轴线扫描梁（1230）。五个电子束列（1211）产生电子束（1230），每个光束（1230）被配置为基本上沿垂直于托盘（100）的行进方向（1299）的轴扫描。每个光束（1230）的扫描距离通常为-125mm宽，并且列（1211）的间隔小于或等于光束扫描的宽度，因此相邻的扫描重叠或相邻，使FPDS的全宽度 120）以至少一个电子束1230扫描，而不需要在Y方向上的运动。

9. 发明申请

WO2007111603A1 OPTICS FOR GENERATION OF HIGH CURRENT DENSITY PATTERNED CHARGED PARTICLE BEAMS 审中-公开
标题翻译：用于生成高电流密度图的充电粒子的光学
公开(公告)号：WO2007111603A1
公开(公告)日：2007-10-04
申请号：PCT/US2006/011303
申请日：2006-03-27
申请人： MULTIBEAM SYSTEMS, INC.
发明人： PARKER, William, N.
IPC分类号： H01J37/302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/043 , H01J2237/045 , H01J2237/049 , H01J2237/10 , H01J2237/30472 , H01J2237/30477 , H01J2237/31754 , H01J2237/31761 , H01J2237/31776 , H01J2237/31793
摘要： A charged particle beam lithography system and/or method, which comprises a patterned beam defining aperture (212) for generating a high current density shaped beams (222) without the need for multiple beam shaping apertures, lenses (205, 216) for focusing charged particle beams (222) on a wafer (221), and blanking deflectors (277, 278) for deflecting the charged particle beams (222) without the need for an intermediate crossover between an electron source (201) and the wafer (221).
摘要翻译：一种带电粒子束光刻系统和/或方法，其包括用于产生高电流密度成形梁（222）而不需要多个光束成形孔的图案化光束限定孔（212），用于聚焦带电的透镜（205,216）晶片（221）上的粒子束（222），以及用于偏转带电粒子束（222）而不需要电子源（201）和晶片（221）之间的中间交叉的消隐偏转器（277,278）。

10. 发明申请

WO2004017355A1 MULTI-COLUMN MULTI-BEAM INSPECTION SYSTEM 审中-公开
标题翻译：多柱多波束检测系统
公开(公告)号：WO2004017355A1
公开(公告)日：2004-02-26
申请号：PCT/US2003/025635
申请日：2003-08-13
申请人： MULTIBEAM SYSTEMS, INC.
发明人： PARKER, William, N. , MILLER, Daniel, S.
IPC分类号： H01J37/28
CPC分类号： G21K1/087 , G21K5/10 , H01J37/04 , H01J37/28 , H01J2237/04924 , H01J2237/2817
摘要： An electron optics assembly for a multi-column electron beam inspection tool comprises a single accelerator structure and a single focus electrode mounting plate for all columns; the other electron optical components are one per column and are independently alignable. The accelerator structure comprises first and final accelerator electrodes with a set of accelerator plates in between; the first and final accelerator plates have an aperture for each column and the accelerator plates have a single aperture such that the electron optical axes for all columns pass through the single aperture. Independently alignable focus electrodes are attached to the focus electrode mounting plate, allowing each electrode to be aligned to the electron optical axis of its corresponding column. There is one electron gun per column, mounted on the top of the single accelerator structure. In other embodiments, the electron guns are mounted to a single gun mounting plate positioned above the accelerator structure.
摘要翻译：用于多列电子束检查工具的电子光学组件包括用于所有柱的单个加速器结构和单个聚焦电极安装板; 其他电子光学部件是每列一个，并且可独立对准。加速器结构包括在其间具有一组加速器板的第一和最终加速器电极; 第一和最终的加速器板具有用于每一列的孔，并且加速板具有单个孔，使得所有列的电子光轴通过单个孔。独立地对准的聚焦电极附着到聚焦电极安装板上，允许每个电极与其相应列的电子光轴对准。每列有一个电子枪，安装在单个加速器结构的顶部。在其他实施例中，电子枪安装到位于加速器结构上方的单个枪安装板。

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