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1. 发明授权

US07357156B2 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US07357156B2
公开(公告)日：2008-04-15
申请号：US11431007
申请日：2006-05-10
申请人： Ikuo Ueda , Masakazu Murakami
发明人： Ikuo Ueda , Masakazu Murakami
IPC分类号： D21F7/08 , D03D25/00
CPC分类号： D21F1/0036 , Y10S162/902
摘要： An industrial two-layer fabric having eight upper side warps and eight lower warps are stacked vertically forming upper and lower layers which are bound by a warp binding yarn of these warps. In a repeating unit of the upper layer, one of the warps has repetition of a design in which it passes over one upper side weft, passes under four successive upper side wefts, passes over one upper side weft, and passes under two upper side wefts, and an upper side weft has a design in which it passes over three upper side warps and then passes under one upper side warp to form, on the upper side, a weft long crimp corresponding to three warps, whereby forming an industrial fabric excellent in running stability, surface property and wear resistance.
摘要翻译：具有八个上侧经纱和八个下经纱的工业双层织物垂直地堆叠形成由这些经纱的经纱结合纱线结合的上层和下层。在上层的重复单元中，一个经纱具有重复的设计，其中它经过一个上侧纬纱，经过四个连续的上侧纬纱，经过一个上侧纬纱，并经过两个上侧纬纱并且上侧纬纱具有其经过三个上侧经纱然后经过一个上侧经纱的设计，在上侧形成对应于三个经纱的纬纱长卷曲，由此形成优异的工业织物运行稳定性，表面性能和耐磨性。

2. 发明授权

US07412991B2 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US07412991B2
公开(公告)日：2008-08-19
申请号：US11270595
申请日：2005-11-10
申请人： Keiichi Takimoto , Ikuo Ueda , Masakazu Murakami
发明人： Keiichi Takimoto , Ikuo Ueda , Masakazu Murakami
IPC分类号： D21F7/08 , D03D25/00
CPC分类号： D21F1/0036 , Y10T442/3195
摘要： In an industrial two-layer fabric, either one of an upper side binding yarn and a lower surface binding yarn constituting a pair to be woven with an upper surface weft and a lower side weft passes under one lower surface weft and then passes over a plurality of lower surface wefts. A warp on one adjacent side of the one of the upper and lower surface binding yarns has a similar design thereto and passes over and under the same lower surface wefts. The design of a set of the two warps adjacent to each other is shifted and arranged one after another to form a complete design of the lower surface fabric and a lower surface weft has a design in which the weft passes over two successive warps and then passes under a plurality of warps to form a long crimp on the lower surface.
摘要翻译：在工业双层织物中，构成一对上面纬纱和下侧纬纱的上侧粘合纱和下表面捆扎纱中的任一个在一个下表面纬纱下通过，然后通过多个的下表面纬纱。上表面和下表面装订纱之一的一个相邻侧上的经线具有类似的设计，并且在相同的下表面纬纱下方经过。相邻的两个经线的设计被一个接一个地移位和排列，以形成下表面织物的完整设计，并且下表面纬纱具有其中纬纱经过两个连续经线然后通过的设计在多个经纱下，在下表面形成长卷曲。

3. 发明申请

US20060260708A1 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US20060260708A1
公开(公告)日：2006-11-23
申请号：US11431007
申请日：2006-05-10
申请人： Ikuo Ueda , Masakazu Murakami
发明人： Ikuo Ueda , Masakazu Murakami
IPC分类号： D03D25/00
CPC分类号： D21F1/0036 , Y10S162/902
摘要： An industrial two-layer fabric having eight upper side warps and eight lower warps are stacked vertically forming upper and lower layers which are bound by a warp binding yarn of these warps. In a repeating unit of the upper layer, one of the warps has repetition of a design in which it passes over one upper side weft, passes under four successive upper side wefts, passes over one upper side weft, and passes under two upper side wefts, and an upper side weft has a design in which it passes over three upper side warps and then passes under one upper side warp to form, on the upper side, a weft long crimp corresponding to three warps, whereby forming an industrial fabric excellent in running stability, surface property and wear resistance.
摘要翻译：具有八个上侧经纱和八个下经纱的工业双层织物垂直地堆叠形成由这些经纱的经纱结合纱线结合的上层和下层。在上层的重复单元中，一个经纱具有重复的设计，其中它经过一个上侧纬纱，经过四个连续的上侧纬纱，经过一个上侧纬纱，并经过两个上侧纬纱并且上侧纬纱具有其经过三个上侧经纱然后经过一个上侧经纱的设计，在上侧上形成对应于三个经纱的纬纱长卷曲，由此形成优良的工业织物运行稳定性，表面性能和耐磨性。

4. 发明申请

US20060112999A1 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US20060112999A1
公开(公告)日：2006-06-01
申请号：US11270595
申请日：2005-11-10
申请人： Hiroyuki Nagura , Ikuo Ueda , Masakazu Murakami
发明人： Hiroyuki Nagura , Ikuo Ueda , Masakazu Murakami
IPC分类号： D03D25/00
CPC分类号： D21F1/0036 , Y10T442/3195
摘要： An industrial two-layer fabric composed of an upper surface side fabric having an upper surface side warp and an upper surface side weft and a lower surface side fabric having a lower surface side warp and a lower surface side weft, the upper surface side warp and lower surface side warp being arranged vertically and constituting a pair, and the upper surface side fabric and lower surface side fabric being bound with a yarn in a warp direction. The lower surface side fabric is made of a repeating design unit in which one of warp binding yarns constituting a pair to be woven with an upper surface side weft and a lower surface side weft or a lower surface side warp passes under one lower surface side weft and then passes over a plurality of lower surface side wefts; a warp on one adjacent side to the above-described warp has the same design and passes over and under the same lower surface side wefts. A complete design repeating unit of the lower surface side fabric is formed by shifting the design of a set of these two warps and then arranging the shifted design one after another; and a lower surface side weft has a design in which the weft passes over two successive warps and then passes under a plurality of warps to form a long crimp on the lower surface side surface.
摘要翻译：一种由具有上表面侧经线和上表面侧纬纱的上表面侧织物和具有下表面侧经纱和下表面侧纬纱的下表面侧织物组成的工业双层织物，上表面侧经纱和下表面侧经线垂直排列并构成一对，上表面侧织物和下表面侧织物在经纱方向上与纱线结合。下表面侧织物由重复设计单元制成，其中构成一对织物的经线结合纱线与上表面侧纬纱和下表面侧纬纱或下表面侧经纱之一经过一个下表面侧纬纱然后经过多个下表面纬纱; 与上述翘曲相邻的一侧的翘曲具有相同的设计，并且在相同的下表面侧纬纱下方经过。通过移动一组这两个经纱的设计，然后一个接一个地布置移位的设计，形成下表面织物的完整设计重复单元。并且下表面侧纬纱具有这样的设计，其中纬纱经过两个连续的经纱，然后在多个经纱下通过，以在下表面侧表面上形成长卷曲。

5. 发明授权

US08205644B2 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US08205644B2
公开(公告)日：2012-06-26
申请号：US12733482
申请日：2008-10-06
申请人： Ikuo Ueda
发明人： Ikuo Ueda
IPC分类号： D21F1/10 , D21F7/08 , D03D25/00
CPC分类号： D21F1/0036 , Y10T428/24612
摘要： An industrial two-layer fabric constituted by at least one upper surface side warp to be woven with at least one upper surface side weft, at least one lower surface side warp to be woven with at least one lower surface side weft, and at least one warp binding yarn to be woven with the at least one upper surface side weft and the at least one lower surface side weft having at least one pair of upper and lower warps in which the upper and lower surface side warps are located to be upper and lower, respectively, and at least one pair of warp binding yarns in which at least one yarn constitutes a warp binding yarn.
摘要翻译：一种工业双层织物，由至少一个上表面侧经纱与至少一个上表面侧纬纱组成，至少一个下表面侧经纱与至少一个下表面侧纬纱织造，至少一个具有至少一个上表面侧纬纱和至少一个下表面侧纬纱的经编结合纱线具有至少一对上下翘曲，其中上表面侧经线和下表面侧经线位于其上下以及至少一对经纱结合纱线，其中至少一根纱线构成经纱结合纱线。

6. 发明申请

US20100252137A1 INDUSTRIAL TWO-LAYER FABRIC 有权
标题翻译：工业两层织物
公开(公告)号：US20100252137A1
公开(公告)日：2010-10-07
申请号：US12591704
申请日：2009-11-30
申请人： Ikuo Ueda
发明人： Ikuo Ueda
IPC分类号： D03D11/00
CPC分类号： D21F1/0036
摘要： A two layer fabric has first, second, third and fourth upper side wefts contiguously and repeatedly arranged. Each of three contiguously arranged warps forms a knuckle over second, over third, and over second upper side wefts respectively to form a separation portion. At both sides of the separation portion, both the second and third upper side wefts form a float portion by passing over two or more warps. Adjacent to the float portion, one warp passes over the second and third upper side wefts successively and one or two warps adjacent thereto pass over the second or the third upper side weft to form an approach portion where the second and third upper side wefts approach. Crimp portions are formed to sandwich the separation portion where the first and fourth upper side wefts pass over warps which are common to those of the separation portion.
摘要翻译：双层织物具有连续重复布置的第一，第二，第三和第四上侧纬纱。三个连续布置的经纱中的每一个分别在第二，第三和第二上侧纬纱上形成转向节，以形成分离部分。在分离部分的两侧，第二和第三上侧纬纱都经过两个或多个经纱而形成浮子部分。相邻于浮子部分，一个经纱依次穿过第二和第三上侧纬纱，并且与其相邻的一个或两个经纱穿过第二或第三上侧纬纱，以形成第二和第三上侧纬纱接近的接近部分。压接部形成为夹着第一和第四上侧纬纱经过与分离部的纬纱共同的经纱的分离部。

7. 发明申请

US20060278295A1 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US20060278295A1
公开(公告)日：2006-12-14
申请号：US11435095
申请日：2006-05-17
申请人： Ikuo Ueda , Hiromi Tsutsue
发明人： Ikuo Ueda , Hiromi Tsutsue
IPC分类号： D03D25/00
CPC分类号： D21F1/0036
摘要： An industrial two-layer fabric comprises pairs of warps obtained by vertically stacking an upper side warp to be woven with an upper side weft and a lower side warp to be woven with a lower side weft and having, as at least one of the pairs. A pair of binding warps composed of warp binding yarns to be woven with both an upper side weft and a lower side weft constitutes a portion of an upper side surface design and a portion of a lower side surface design. As a lower side surface warp design formed by the weaving of a warp binding yarn and a lower side warp with a lower side weft, two or three designs different from each other and has, as a weft design, a design of passing over two warps adjacent to each other and then passing under a plurality of warps to form a long crimp on the lower side surface.
摘要翻译：工业双层织物包括通过垂直地堆叠上下纬纱的上侧经纱和下侧纬纱编织的下侧经纱而获得的经纱，并且具有至少一对成对。由与上侧纬纱和下侧纬纱两者编织的经纱结合纱组成的一对装订经线构成上侧面设计的一部分和下侧面设计的一部分。作为通过编织经向结合纱和具有下侧纬纱的下侧经纱形成的下侧面经纱设计，两个或三个不同的设计彼此不同，并且具有作为纬纱设计的经过两个经纱的设计彼此相邻，然后在多个经纱下通过，以在下侧表面上形成长卷曲。

8. 发明授权

US5521292A Compositions comprising neutralized polysaccharide derivatives 失效
标题翻译：包含中和多糖衍生物的组合物
公开(公告)号：US5521292A
公开(公告)日：1996-05-28
申请号：US389079
申请日：1995-02-13
申请人： Ikuo Ueda , Nomura Tadanori
发明人： Ikuo Ueda , Nomura Tadanori
IPC分类号： C08B13/00 , C08B37/08 , C08L1/32 , C08L35/06 , C09D101/32 , A61K31/715 , C07H13/02 , C08B5/02 , C08B37/00
CPC分类号： C08L1/32 , C08B13/00 , C08B37/003 , C09D101/32 , C08L35/06
摘要： The present invention provides:(1) a polysaccharide derivative having hydrophilic functional groups and nitrate groups per one repeating unit in the following range:0.2.ltoreq.X.ltoreq.1.5, 0.4.ltoreq.Y.ltoreq.2.2, X+Y
摘要翻译：本发明提供：（1）每一个重复单元具有亲水性官能团和硝酸根的多糖衍生物，其范围为：0.2≤X≤1.5,0.4≤Y≤2.2，X + Y <3; 其中X和Y分别表示亲水官能团和硝酸根基团的数目; （2）中和的多糖衍生物; （3）用作含有中和的多糖和水的粘合剂的组合物; 和（4）作为含有中和的多糖，树脂，有机溶剂和水的载体的组合物。车辆组合物具有优异的性能，如干燥特性，颜料分散性，与水溶性树脂的相容性和触变性，并且可以形成具有优异的耐热性和抗粘连性的透明连续膜。

9. 发明授权

US5192774A Substituted acetamide derivatives, process for their preparation and antiulcer drug containing same 失效
标题翻译：取代的乙酰胺衍生物，其制备方法和含有其的抗微生物药物
公开(公告)号：US5192774A
公开(公告)日：1993-03-09
申请号：US465238
申请日：1990-05-07
申请人： Katsuo Shinozaki , Katsuyuki Ishii , Ikuo Ueda
发明人： Katsuo Shinozaki , Katsuyuki Ishii , Ikuo Ueda
IPC分类号： C07D207/12 , C07D233/54 , C07D295/096 , C07D317/22 , C08B37/00
CPC分类号： A61K47/48969 , B82Y5/00 , C07D207/12 , C07D233/64 , C07D295/096 , C07D317/22 , C08B37/0015
摘要： A substituted acetamide derivative of general formula (I): ##STR1## [in which Y represents as piperidino group, 1-pyrrolidinyl group or 3-hydroxy-1-pyrrolidinyl group, and Z represents a group selected from the group consisting of (a) to (e): (a) a cyano group, ##STR2## its salts, its cyclodextrin inclusion compounds and antiulcer drugs comprising them as their active ingredient are disclosed. Compounds (I) have excellent antiulcer actions and are highly safe, thus the antiulcer drugs containing the compounds are useful as a preventive and curative medicine against acute and chronic gastric ulcers, duodenal ulcers and gastric hyperacidities.

10. 发明授权

US4742057A Antiallergic thiazole compounds 失效
标题翻译：抗过敏型噻唑化合物
公开(公告)号：US4742057A
公开(公告)日：1988-05-03
申请号：US932592
申请日：1986-11-20
申请人： Ikuo Ueda , Masaaki Matsuo , Takashi Manabe , Hiroshi Matsuda
发明人： Ikuo Ueda , Masaaki Matsuo , Takashi Manabe , Hiroshi Matsuda
IPC分类号： C07D417/12 , A61K31/40 , A61K31/404 , A61K31/425 , A61K31/427 , A61K31/44 , A61K31/445 , A61K31/4523 , A61P11/00 , A61P27/16 , A61P37/08 , C07D401/04 , C07D401/14 , C07D417/14 , A61K31/535
CPC分类号： C07D401/04 , C07D417/14
摘要： A thiazole compound of allergically activity of the formula: ##STR1## wherein R.sup.1 is amino optionally having suitable substituent(s),R.sup.2 is hydrogen, lower alkyl or aryl,R.sup.3 is hydrogen, nitro, amino optionally having suitable substituent(s), hydroxy or lower alkoxy,A is lower alkylene,Q is hydrogen or halogen, anda heavy solid line means a single or double bond,or a pharmaceutically acceptable salt thereof, processes for the preparation thereof and pharmaceutical composition comprising the same.
摘要翻译：下式的具有过敏活性的噻唑化合物：其中R 1为任选具有适当取代基的氨基，R 2为氢，低级烷基或芳基，R 3为氢，硝基，任选具有合适取代基的氨基，羟基或低级烷氧基，A为低级亚烷基，Q为氢或卤素，重实线表示单键或双键或其药学上可接受的盐，其制备方法和包含其的药物组合物。

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