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1. 发明申请

US20060112999A1 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US20060112999A1
公开(公告)日：2006-06-01
申请号：US11270595
申请日：2005-11-10
申请人： Hiroyuki Nagura , Ikuo Ueda , Masakazu Murakami
发明人： Hiroyuki Nagura , Ikuo Ueda , Masakazu Murakami
IPC分类号： D03D25/00
CPC分类号： D21F1/0036 , Y10T442/3195
摘要： An industrial two-layer fabric composed of an upper surface side fabric having an upper surface side warp and an upper surface side weft and a lower surface side fabric having a lower surface side warp and a lower surface side weft, the upper surface side warp and lower surface side warp being arranged vertically and constituting a pair, and the upper surface side fabric and lower surface side fabric being bound with a yarn in a warp direction. The lower surface side fabric is made of a repeating design unit in which one of warp binding yarns constituting a pair to be woven with an upper surface side weft and a lower surface side weft or a lower surface side warp passes under one lower surface side weft and then passes over a plurality of lower surface side wefts; a warp on one adjacent side to the above-described warp has the same design and passes over and under the same lower surface side wefts. A complete design repeating unit of the lower surface side fabric is formed by shifting the design of a set of these two warps and then arranging the shifted design one after another; and a lower surface side weft has a design in which the weft passes over two successive warps and then passes under a plurality of warps to form a long crimp on the lower surface side surface.
摘要翻译：一种由具有上表面侧经线和上表面侧纬纱的上表面侧织物和具有下表面侧经纱和下表面侧纬纱的下表面侧织物组成的工业双层织物，上表面侧经纱和下表面侧经线垂直排列并构成一对，上表面侧织物和下表面侧织物在经纱方向上与纱线结合。下表面侧织物由重复设计单元制成，其中构成一对织物的经线结合纱线与上表面侧纬纱和下表面侧纬纱或下表面侧经纱之一经过一个下表面侧纬纱然后经过多个下表面纬纱; 与上述翘曲相邻的一侧的翘曲具有相同的设计，并且在相同的下表面侧纬纱下方经过。通过移动一组这两个经纱的设计，然后一个接一个地布置移位的设计，形成下表面织物的完整设计重复单元。并且下表面侧纬纱具有这样的设计，其中纬纱经过两个连续的经纱，然后在多个经纱下通过，以在下表面侧表面上形成长卷曲。

2. 发明申请

US20060260708A1 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US20060260708A1
公开(公告)日：2006-11-23
申请号：US11431007
申请日：2006-05-10
申请人： Ikuo Ueda , Masakazu Murakami
发明人： Ikuo Ueda , Masakazu Murakami
IPC分类号： D03D25/00
CPC分类号： D21F1/0036 , Y10S162/902
摘要： An industrial two-layer fabric having eight upper side warps and eight lower warps are stacked vertically forming upper and lower layers which are bound by a warp binding yarn of these warps. In a repeating unit of the upper layer, one of the warps has repetition of a design in which it passes over one upper side weft, passes under four successive upper side wefts, passes over one upper side weft, and passes under two upper side wefts, and an upper side weft has a design in which it passes over three upper side warps and then passes under one upper side warp to form, on the upper side, a weft long crimp corresponding to three warps, whereby forming an industrial fabric excellent in running stability, surface property and wear resistance.
摘要翻译：具有八个上侧经纱和八个下经纱的工业双层织物垂直地堆叠形成由这些经纱的经纱结合纱线结合的上层和下层。在上层的重复单元中，一个经纱具有重复的设计，其中它经过一个上侧纬纱，经过四个连续的上侧纬纱，经过一个上侧纬纱，并经过两个上侧纬纱并且上侧纬纱具有其经过三个上侧经纱然后经过一个上侧经纱的设计，在上侧上形成对应于三个经纱的纬纱长卷曲，由此形成优良的工业织物运行稳定性，表面性能和耐磨性。

3. 发明授权

US07357156B2 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US07357156B2
公开(公告)日：2008-04-15
申请号：US11431007
申请日：2006-05-10
申请人： Ikuo Ueda , Masakazu Murakami
发明人： Ikuo Ueda , Masakazu Murakami
IPC分类号： D21F7/08 , D03D25/00
CPC分类号： D21F1/0036 , Y10S162/902
摘要： An industrial two-layer fabric having eight upper side warps and eight lower warps are stacked vertically forming upper and lower layers which are bound by a warp binding yarn of these warps. In a repeating unit of the upper layer, one of the warps has repetition of a design in which it passes over one upper side weft, passes under four successive upper side wefts, passes over one upper side weft, and passes under two upper side wefts, and an upper side weft has a design in which it passes over three upper side warps and then passes under one upper side warp to form, on the upper side, a weft long crimp corresponding to three warps, whereby forming an industrial fabric excellent in running stability, surface property and wear resistance.
摘要翻译：具有八个上侧经纱和八个下经纱的工业双层织物垂直地堆叠形成由这些经纱的经纱结合纱线结合的上层和下层。在上层的重复单元中，一个经纱具有重复的设计，其中它经过一个上侧纬纱，经过四个连续的上侧纬纱，经过一个上侧纬纱，并经过两个上侧纬纱并且上侧纬纱具有其经过三个上侧经纱然后经过一个上侧经纱的设计，在上侧形成对应于三个经纱的纬纱长卷曲，由此形成优异的工业织物运行稳定性，表面性能和耐磨性。

4. 发明授权

US07412991B2 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US07412991B2
公开(公告)日：2008-08-19
申请号：US11270595
申请日：2005-11-10
申请人： Keiichi Takimoto , Ikuo Ueda , Masakazu Murakami
发明人： Keiichi Takimoto , Ikuo Ueda , Masakazu Murakami
IPC分类号： D21F7/08 , D03D25/00
CPC分类号： D21F1/0036 , Y10T442/3195
摘要： In an industrial two-layer fabric, either one of an upper side binding yarn and a lower surface binding yarn constituting a pair to be woven with an upper surface weft and a lower side weft passes under one lower surface weft and then passes over a plurality of lower surface wefts. A warp on one adjacent side of the one of the upper and lower surface binding yarns has a similar design thereto and passes over and under the same lower surface wefts. The design of a set of the two warps adjacent to each other is shifted and arranged one after another to form a complete design of the lower surface fabric and a lower surface weft has a design in which the weft passes over two successive warps and then passes under a plurality of warps to form a long crimp on the lower surface.
摘要翻译：在工业双层织物中，构成一对上面纬纱和下侧纬纱的上侧粘合纱和下表面捆扎纱中的任一个在一个下表面纬纱下通过，然后通过多个的下表面纬纱。上表面和下表面装订纱之一的一个相邻侧上的经线具有类似的设计，并且在相同的下表面纬纱下方经过。相邻的两个经线的设计被一个接一个地移位和排列，以形成下表面织物的完整设计，并且下表面纬纱具有其中纬纱经过两个连续经线然后通过的设计在多个经纱下，在下表面形成长卷曲。

5. 发明授权

US08937731B2 Image processing apparatus for receiving a request relating to image processing from an external source and executing the received request 有权
标题翻译：图像处理装置，用于从外部源接收与图像处理相关的请求并执行所接收的请求
公开(公告)号：US08937731B2
公开(公告)日：2015-01-20
申请号：US10772436
申请日：2004-02-06
申请人： Koichi Shibata , Masakazu Murakami
发明人： Koichi Shibata , Masakazu Murakami
IPC分类号： G06F15/00 , H04N1/00 , H04N1/32
CPC分类号： H04N1/00204 , H04N1/00954 , H04N1/32561 , H04N2201/0024 , H04N2201/0046 , H04N2201/0074 , H04N2201/0094
摘要： Disclosed is an image processing apparatus composed in a hierarchical architecture of a hardware resource, a first control program over the hardware resource, a second control program and an application program over the first control program. The first control program includes a first API for receiving a first request relating to image processing from the second control program and a second request relating to image processing from the application program, and controls, on receiving either of the first and second requests, the hardware resource to perform image processing based on the received request. The second control program includes a second API publicly released in advance for receiving a third request relating to image processing from an external source, converts the received third request to a command supported by the first API, and passes the command as the first request to the first control program.
摘要翻译：公开了一种图像处理装置，其以硬件资源的分层结构，硬件资源上的第一控制程序，第二控制程序和第一控制程序上的应用程序组成。第一控制程序包括用于从第二控制程序接收与图像处理有关的第一请求的第一API和与应用程序相关的图像处理的第二请求，并且在接收到第一和第二请求中的任何一个时，控制硬件基于接收到的请求执行图像处理的资源。第二控制程序包括预先公开发布的用于从外部源接收与图像处理相关的第三请求的第二API，将接收到的第三请求转换为由第一API支持的命令，并将该命令作为第一请求传递给第一控制程序。

6. 发明授权

US08625124B2 Image forming device capable of transmitting document to another device 有权
标题翻译：能够将文件传送到另一设备的图像形成装置
公开(公告)号：US08625124B2
公开(公告)日：2014-01-07
申请号：US11594727
申请日：2006-11-09
申请人： Masakazu Murakami , Mitsuzo Iwaki , Tomonari Yoshimura , Okihisa Yoshida
发明人： Masakazu Murakami , Mitsuzo Iwaki , Tomonari Yoshimura , Okihisa Yoshida
IPC分类号： G06F3/12
CPC分类号： H04N1/32438 , G06F3/1207 , G06F3/1259 , G06F3/1274 , G06F3/1291 , G06F3/1294 , H04N1/32368 , H04N1/32395 , H04N1/32614 , H04N1/32641 , H04N1/32667 , H04N2201/0039 , H04N2201/0094 , H04N2201/3219 , H04N2201/3222 , H04N2201/3274 , H04N2201/3278 , H04N2201/3295
摘要： An MFP (A) on a document transmission side transmits a document to an MFP (B) on a document reception side. The MFP (A) stores the transmitted document. The MFP (A) acquires a status of the transmitted document from the MFP (B). If the MFP (B) deletes the document in an unread state, the MFP (A) retransmits the stored document to the MFP (B).
摘要翻译：文件传送侧的MFP（A）将文件发送到文件接收侧的MFP（B）。 MFP（A）存储发送的文档。 MFP（A）从MFP（B）获取所发送的文档的状态。如果MFP（B）以未读状态删除文档，MFP（A）将存储的文档重新发送到MFP（B）。

7. 发明授权

US08582137B2 Method and system for managing security of a remote device using a multifunction peripheral 有权
标题翻译：使用多功能外围设备管理远程设备的安全性的方法和系统
公开(公告)号：US08582137B2
公开(公告)日：2013-11-12
申请号：US12635858
申请日：2009-12-11
申请人： Tomonari Yoshimura , Atsushi Ohshima , Masami Yamada , Masakazu Murakami
发明人： Tomonari Yoshimura , Atsushi Ohshima , Masami Yamada , Masakazu Murakami
IPC分类号： G06K15/00
CPC分类号： H04N1/0023 , H04N1/00225 , H04N1/00233 , H04N1/32106 , H04N1/4406 , H04N1/4433 , H04N2201/0094 , H04N2201/3204 , H04N2201/3276
摘要： A multifunction peripheral that can set appropriate criteria of security levels for another device, and improves usability while lowering a risk of data alteration, information leakage and the like by including a holding part 11 holding therein security criteria set for the image processing functions in one-to-one correspondence; a receiver 12 that receives, from an external terminal, a request for an access that is necessary for executing at least one of the image processing functions; an acquisition part 13 that acquires, from the external terminal, security information that is a security indicator regarding the access from the external terminal; a judgment part 15 that judges whether or not one of the security criteria set for the at least one of the image processing functions is met, based on the acquired security information; an access controller 16 that permits the access if the judgment part 15 judges affirmatively, and prohibits the access or permit the access with a limitation if the judgment part 15 judges negatively; and an execution part 19 that executes the at least one of the image processing functions, if the access controller permits the access.
摘要翻译：一种多功能外围设备，可以为另一设备设置适当的安全级别标准，并且通过将保持部件11保持在一维中的图像处理功能设置的安全标准的保持部件11来提高可用性，同时降低数据更改，信息泄漏等风险，一对一的信件; 从外部终端接收执行图像处理功能中的至少一个所必需的访问请求的接收机12; 从外部终端获取作为关于从外部终端的访问的安全指示的安全信息的获取部13; 判定部15，根据所取得的安全信息，判定是否满足对图像处理功能中的至少一个设定的安全准则之一; 访问控制器16，如果判断部分15肯定地判断允许访问，并且如果判断部分15判断为否定则禁止访问或允许访问; 以及如果访问控制器允许访问，则执行图像处理功能中的至少一个的执行部分19。

8. 发明授权

US08377764B2 Manufacturing method for light emitting device 有权
标题翻译：发光装置的制造方法
公开(公告)号：US08377764B2
公开(公告)日：2013-02-19
申请号：US13459122
申请日：2012-04-28
申请人： Shunpei Yamazaki , Hideaki Kuwabara , Masakazu Murakami
发明人： Shunpei Yamazaki , Hideaki Kuwabara , Masakazu Murakami
IPC分类号： H01L21/84
CPC分类号： H01L51/56 , C23C14/046 , C23C14/12 , C23C14/246 , C23C14/564 , H01L27/3244 , H01L33/44
摘要： The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.
摘要翻译：本发明提供一种可以更有效地使用EL材料的成膜系统的气相沉积方法和气相沉积系统，并且形成具有高生产率的均匀性优异的EL材料。根据本发明，在成膜室内部，将密封蒸发材料的多个容器以一定间距移动到基板上的矩形状的蒸发源保持器和蒸发材料蒸镀在基板上。此外，蒸发源保持器的纵向方向可以在基板的一侧倾斜，同时蒸发源保持器被移动。此外，优选的是，蒸镀源夹持器在气相沉积期间的移动方向与形成TFT的激光束的扫描方向不同。

9. 发明授权

US08237164B2 Semiconductor device including magnet 有权
标题翻译：半导体装置包括磁铁
公开(公告)号：US08237164B2
公开(公告)日：2012-08-07
申请号：US12759999
申请日：2010-04-14
申请人： Toru Takayama , Junya Maruyama , Yumiko Ohno , Masakazu Murakami , Toshiji Hamatani , Hideaki Kuwabara , Shunpei Yamazaki
发明人： Toru Takayama , Junya Maruyama , Yumiko Ohno , Masakazu Murakami , Toshiji Hamatani , Hideaki Kuwabara , Shunpei Yamazaki
IPC分类号： H01L29/772
CPC分类号： H01L27/3276 , H01L27/12 , H01L27/1214 , H01L27/124 , H01L27/1266 , H01L27/14634 , H01L27/14643 , H01L27/14683 , H01L27/3272 , H01L29/66757 , H01L29/78603 , H01L31/105 , H01L51/0024 , H01L51/003 , H01L51/5212 , H01L51/5253 , H01L2221/68368
摘要： (OBJECT) The object is to provide a lightened semiconductor device and a manufacturing method thereof by pasting a layer to be peeled to various base materials.(MEANS FOR SOLVING THE PROBLEM) In the present invention, a layer to be peeled is formed on a substrate, then a seal substrate provided with an etching stopper film is pasted with a binding material on the layer to be peeled, followed by removing only the seal substrate by etching or polishing. The remaining etching stopper film is functioned as a blocking film. In addition, a magnet sheet may be pasted as a pasting member.
摘要翻译：（目的）本发明的目的是提供一种减轻半导体器件及其制造方法，该方法是将待剥离的层粘贴到各种基材上。（解决问题的手段）在本发明中，在基板上形成被剥离层，然后将具有蚀刻阻挡膜的密封基板上的粘合材料粘贴在被剥离层上，然后仅除去密封衬底通过蚀刻或抛光。剩余的蚀刻阻挡膜用作阻挡膜。此外，可以将磁片作为粘贴部件粘贴。

10. 发明授权

US08206507B2 Evaporation method, evaporation device and method of fabricating light emitting device 有权
标题翻译：蒸发方法，蒸发装置和制造发光装置的方法
公开(公告)号：US08206507B2
公开(公告)日：2012-06-26
申请号：US12487843
申请日：2009-06-19
申请人： Shunpei Yamazaki , Masakazu Murakami
发明人： Shunpei Yamazaki , Masakazu Murakami
IPC分类号： C23C16/00
CPC分类号： C23C14/00 , C23C14/042 , C23C14/12 , C23C14/24 , C23C14/243 , C23C14/246 , C23C14/505 , C23C14/564 , C23C14/568 , H01L51/001 , H05B33/10
摘要： The invention provides an evaporation apparatus, which is able to improve an efficiency of evaporation materials, uniformity of deposited films, and throughput of the evaporation process. Disclosed is an evaporation source holder, which is installed in an evaporation chamber and configured to hold an evaporation material, and a moving mechanism, which is configured to move the evaporation source holder during evaporation of the evaporation material. The evaporation apparatus is further characterized by a shutter over the evaporation source holder, a filter over the shutter, and a heater surrounding the filter.
摘要翻译：本发明提供一种蒸发装置，其能够提高蒸发材料的效率，沉积膜的均匀性和蒸发过程的通过量。公开了一种蒸发源保持器，其安装在蒸发室中并构造成保持蒸发材料，以及移动机构，其构造成在蒸发材料蒸发期间移动蒸发源保持器。蒸发装置的特征还在于蒸发源支架上的快门，快门上的过滤器和围绕过滤器的加热器。

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