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    • 1. 发明专利
    • Portable type etching chamber
    • 便携式蚀刻室
    • JP2006099055A
    • 2006-04-13
    • JP2005218128
    • 2005-07-28
    • Idc Llcアイディーシー、エルエルシー
    • CUMMINGS WILLIAM JARBUCKLE BRIAN WFLOYD PHILIP D
    • G02B26/08B81C99/00
    • H01L21/67069
    • PROBLEM TO BE SOLVED: To provide a system and method for a portable type etching chamber, and a method for using them, especially a method for etching a microelectromechanical (MEMS) system substrate like an optical interferometric modulator substrate. SOLUTION: An etching chamber is constituted so as to support the MEMS substrate inside the chamber. The etching chamber is constituted so as to be moved to an etching station containing a steam or gas phase etching agent source, a purge gas source and/or a vacuum source and to be attached thereto. The portable etching chamber facilitate a process for etching the MEMS substrate held therein. For example, the MEMS substrate in such an etching chamber can be etched by connecting the chamber to the etching station and exposing the MEMS substrate to an etching agent for etching the MEMS substrate. The substrate can be conveyed to/from the etching station inside the portable type etching chamber. In a preferred embodiment, the MEMS substrate is an optical interferometric modulator, and the etching agent is XFe 2 . COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供便携式蚀刻室的系统和方法及其使用方法,特别是用于蚀刻诸如光学干涉式调制器基板的微机电(MEMS)系统基板的方法。 解决方案:蚀刻室被构造成在室内支撑MEMS基板。 蚀刻室被构造成移动到包含蒸汽或气相蚀刻剂源,吹扫气体源和/或真空源并附接到其的蚀刻站。 便携式蚀刻室促进蚀刻保持在其中的MEMS基板的工艺。 例如,可以通过将腔室连接到蚀刻站并将MEMS衬底暴露于用于蚀刻MEMS衬底的蚀刻剂来蚀刻这种蚀刻室中的MEMS衬底。 衬底可以被输送到便携式蚀刻室内的蚀刻工位。 在优选实施例中,MEMS衬底是光学干涉式调制器,并且蚀刻剂是XFe 2 。 版权所有(C)2006,JPO&NCIPI
    • 5. 发明专利
    • Selectable capacitance circuit
    • 可选电容电路
    • JP2006100821A
    • 2006-04-13
    • JP2005275828
    • 2005-09-22
    • Idc Llcアイディーシー、エルエルシー
    • FLOYD PHILIP D
    • H01G5/01B81B3/00H01G5/00H01G5/04
    • G02B26/001Y10T29/49124
    • PROBLEM TO BE SOLVED: To provide a selectable capacitance circuit that can have a pair of electrically conductive plates having at least one plate that can carry out a relative motion if an adequate electrical control signal is given wherein the relative motion can change the capacitor's capacitance to use the capacitor for various ends (such as a filtering circuit, a tuning circuit, a phase-shifting circuit, an attenuator circuit, etc.). SOLUTION: The mechanical conductive film of the capacitor controlled by voltage is movable to a first position and to a second position, and it further can move from the first position and from the second position onward. The capacitance amount is changeable in accordance with the movement of the mechanical conductive film. The capacitor, which is controlled by a minute electro-mechanical (MEMS) voltage, can be used for various ends (e.g., for RF switches, and RF attenuators, but not limited to these uses). COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供可选择的电容电路,其可以具有一对导电板,其具有至少一个板,其可以执行相对运动,如果给出足够的电控制信号,其中相对运动可以改变 电容器的电容用于各种端部使用电容器(如滤波电路,调谐电路,移相电路,衰减器电路等)。 解决方案:由电压控制的电容器的机械导电膜可移动到第一位置和第二位置,并且其还可以从第一位置和第二位置向前移动。 电容量可以根据机械导电膜的移动而改变。 由微机电(MEMS)电压控制的电容器可用于各种端部(例如,用于RF开关和RF衰减器,但不限于这些用途)。 版权所有(C)2006,JPO&NCIPI
    • 6. 发明专利
    • Method and system for fluorinated xenon etching with improved efficiency
    • 用于氟化氙蚀刻的方法和系统具有改进的效率
    • JP2006100795A
    • 2006-04-13
    • JP2005227383
    • 2005-08-05
    • Idc Llcアイディーシー、エルエルシー
    • FLOYD PHILIP DCUMMINGS WILLIAM J
    • H01L21/302B81C99/00G02B26/00
    • H01L21/3065B81B2201/047B81C1/00531B81C2201/0142B81C2201/056G02B26/001H01L21/32135H01L21/67069
    • PROBLEM TO BE SOLVED: To provide a method and a system for fluorinated xenon etching with improved efficiency. SOLUTION: A device and a method useful for manufacturing a MEMS device are provided. One mode of the disclosed device provides a substrate which is exposed to a solid state etchant and provided with a material enabled to be etched. Here, the substrate and the solid state etchant are arranged in an etching chamber. In a plurality of embodiments, the solid state etchant is moved to a position near the substrate. In the other embodiments, a variable barrier exists between the substrate and the solid state etchant, to be opened. The solid state etchant generates a vapor phase etchant suitable for etching the material enabled to be etched. In a plurality of desirable embodiments, the solid state etchant is solid 2 fluorinated xenon. The device and the method are advantageously used in executing release etching in manufacturing of an optical modulator. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种提高效率的氟化氙蚀刻方法和系统。 提供了一种用于制造MEMS器件的器件和方法。 所公开的装置的一种模式提供了暴露于固体蚀刻剂并且具有能够被蚀刻的材料的衬底。 这里,衬底和固态蚀刻剂布置在蚀刻室中。 在多个实施例中,固态蚀刻剂被移动到靠近基板的位置。 在其他实施例中,在基板和固态蚀刻剂之间存在可打开的可变屏障。 固态蚀刻剂产生适于蚀刻能够蚀刻的材料的气相蚀刻剂。 在多个理想的实施例中,固态蚀刻剂是固体2氟化氙。 该装置和方法有利地用于在光学调制器的制造中执行释放蚀刻。 版权所有(C)2006,JPO&NCIPI
    • 8. 发明专利
    • Method and system for sealing substrate
    • 密封基板的方法和系统
    • JP2006095673A
    • 2006-04-13
    • JP2005236246
    • 2005-08-17
    • Idc Llcアイディーシー、エルエルシー
    • FLOYD PHILIP D
    • B81C3/00B81B3/00G02B26/00H01L23/02
    • B81C1/00269B81C2203/019G02B26/001
    • PROBLEM TO BE SOLVED: To especially provide a method for sealing an MEMS device from ambient conditions regarding a microelectromechanical system (michroelectromechanical systems) (MEMS).
      SOLUTION: Hereinafter, the method for sealing the microelectromechanical system (MEMS) device 76 from the ambient conditions is described. The MEMS device 76 is formed on a substrate 72. Hermetic sealing 78 is substantially formed as a part of an MEMS manufacturing process. The method includes formation of a metallic seal 78 on the substrate adjacent to the periphery of the MEMS device 76 by using a method like photolithography. The metallic seal 78 is formed on the substrate while holding a sacrifice layer between conductive members of an MEMS element in the MEMS device 76. The sacrifice layer is removed after the formation of the seal and before mounting a backplane 74.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了特别提供一种用于将微机电系统器件与微机电系统(微机电系统)(MEMS))的环境条件密封的方法。 解决方案:在下文中,描述了从环境条件密封微机电系统(MEMS)装置76的方法。 MEMS器件76形成在衬底72上。密封件78基本形成为MEMS制造工艺的一部分。 该方法包括通过使用诸如光刻法的方法在与MEMS器件76的周边相邻的衬底上形成金属密封件78。 金属密封件78形成在基板上,同时在MEMS装置76中的MEMS元件的导电构件之间保持牺牲层。在形成密封件之后并且在安装背板74之前,将牺牲层移除。版权所有: (C)2006,JPO&NCIPI
    • 9. 发明专利
    • Method and system to package mems device
    • 包装MEMS器件的方法和系统
    • JP2006091849A
    • 2006-04-06
    • JP2005211852
    • 2005-07-21
    • Idc Llcアイディーシー、エルエルシー
    • MILES MARK WSAMPSELL JEFFREY BPALMATEER LAURENARBUCKLE BRIAN WFLOYD PHILIP D
    • G02B26/00
    • B81C1/0023G02B26/001Y10T29/49002
    • PROBLEM TO BE SOLVED: To use and/or improve the features of various types of devices while improving existing products and producing new products that have not been developed. SOLUTION: A display device is constituted using MEMS as the base and an interferometric modulator array is constituted so that light beams are reflected through a transparent substrate. The transparent substrate is sealed to a back plate and the back plate can incorporate an electronic circuit which controls the interferometric modulator array. The back plate can provide a physical support for the device components (for example, electronic components or the like) which are used to control the conditions of the display. Moreover, the back plate can also be used as a main structural support for the device. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:在改进现有产品和生产尚未开发的新产品的同时,使用和/或改进各种类型的设备的特征。 解决方案:使用MEMS作为基底构成显示装置,并且构成干涉式调制器阵列,使得光束通过透明基板反射。 透明基板被密封到背板,背板可以包括控制干涉式调制器阵列的电子电路。 背板可以为用于控制显示器的状况的设备部件(例如,电子部件等)提供物理支撑。 此外,背板也可以用作该装置的主要结构支撑。 版权所有(C)2006,JPO&NCIPI
    • 10. 发明专利
    • Method and device for reflectance with predetermined spectral response
    • 用预测光谱响应反射的方法和装置
    • JP2006113560A
    • 2006-04-27
    • JP2005260798
    • 2005-09-08
    • Idc Llcアイディーシー、エルエルシー
    • FLOYD PHILIP D
    • G02B26/08G02B26/00G09G3/20G09G3/34
    • G02B26/001
    • PROBLEM TO BE SOLVED: To provide a display device with at least an interferometric light modulating device so composed to reflect light and a light source. SOLUTION: In various embodiments of the invention, a display device comprises an illumination apparatus configured to emit light of a different color at different times and at least one interferometric light modulating device illuminated by the illumination apparatus. In certain preferred embodiments, interferometric light modulating devices are illuminated for short durations with different color light, the durations of the time being sufficiently short to produce color fusion or blending of colors as perceived by the human eye. The interferometric light modulating device may comprise a white interferometric light modulating device that reflects white light in one state. The interferometric light modulating device may also have a reflectivity spectrum that includes at least two color peaks. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供一种显示装置,至少具有如下组合以反射光和光源的干涉光调制装置。 解决方案:在本发明的各种实施例中,显示装置包括配置成在不同时间发射不同颜色的光的照明装置和由照明装置照亮的至少一个干涉光调制装置。 在某些优选实施例中,干涉光调制装置用不同颜色的光照射短持续时间,其持续时间足够短以产生颜色融合或由人眼感知的颜色的混合。 干涉光调制装置可以包括在一种状态下反射白光的白色干涉光调制装置。 干涉光调制装置还可以具有包括至少两个颜色峰的反射光谱。 版权所有(C)2006,JPO&NCIPI