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1. 发明专利

JP2006146169A System and method for protecting micro-structure of display array by using spacer in gap within display device 有权
标题翻译：通过在显示设备中使用间隙来保护显示器阵列微结构的系统和方法
公开(公告)号：JP2006146169A
公开(公告)日：2006-06-08
申请号：JP2005276442
申请日：2005-09-22
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： PALMATEER LAUREN , CUMMINGS WILLIAM J , GALLY BRIAN J , CHUI CLARENCE
IPC分类号： G09F9/00 , G02B26/08 , G02F1/21 , G09F9/30 , G09G3/20 , G09G3/34
CPC分类号： B81B7/0058 , B81B2201/045 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a system and a method for protecting a micro-structure of a display array by using a spacer in a gap within a display device. SOLUTION: A packaging system of an electronic device 700 includes one or more spacers 730 that prevent or reduce damage to the electronic device 700 arising from contact of an array 720 with a back plate 750. In some embodiments, the packaged electronic device comprising spacers is thinner than a comparable electronic device manufactured without spacers. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过在显示装置内的间隙中使用间隔物来保护显示阵列的微结构的系统和方法。解决方案：电子设备700的包装系统包括一个或多个间隔物730，其防止或减少由阵列720与背板750的接触引起的电子设备700的损坏。在一些实施例中，封装的电子设备包括间隔物比不用间隔物制造的可比电子器件更薄。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2006098391A Electro-optical measurement of hysteresis in interference modulator 审中-公开
标题翻译：干涉调制器中电磁光度测量
公开(公告)号：JP2006098391A
公开(公告)日：2006-04-13
申请号：JP2005219836
申请日：2005-07-29
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： G01M11/00 , G02B26/08
CPC分类号： G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a correct and convenient method of an interference modulator with respect to a micro electricity mechanical system (MEMS).
SOLUTION: A time-variation voltage waveform is applied to the interference modulator in a block 150, the reflectivity of light from the interference modulator is detected in a block 152, the reflectivity is determined as a function of electric voltage in a block 160, and sufficient quality for use as a display is recognized in a block 162. When there are a plurality of interference modulators, it is determined whether the repetition is required in a block 164, and the block 152 and after are repeated, thereby recognizing the quality of the plurality of interference modulators.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供关于微电机械系统（MEMS）的干扰调制器的正确和方便的方法。解决方案：在块150中对干扰调制器施加时变电压波形，在块152中检测来自干扰调制器的光的反射率，反射率被确定为块中的电压的函数 160，并且在块162中识别出用作显示器的足够的质量。当存在多个干扰调制器时，确定在块164中是否需要重复，并且块152和之后被重复，从而识别多个干扰调制器的质量。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2008046603A Process control monitor for interferometric modulator 审中-公开
标题翻译：干涉仪调制器的过程控制监视器
公开(公告)号：JP2008046603A
公开(公告)日：2008-02-28
申请号：JP2007150880
申请日：2007-06-06
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： B81C99/00 , G02B26/08 , G09F9/00
CPC分类号： B81C99/004 , B81B2201/042 , G01N21/55 , G01N21/9501 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a process control monitor for interferometric modulators for reasons that errors can occur during the manufacturing of MEMS devices, that detecting the errors and the source of the errors can present a problem in the quality control and optimization of MEMS devices, and that accordingly there is a need for structures and methods for monitoring manufacturing processes and their results. SOLUTION: Process control monitors 100, 102, 104 are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device 108. Analysis of the process control monitors 100, 102, 104 can provide information regarding properties of the MEMS device 108 and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device 108. In some embodiments, analysis of the process control monitors 100, 102, 104 may utilize optical measurements. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了在MEMS器件制造过程中发生错误的原因提供干涉式调制器的过程控制监视器，检测误差和误差源可能会导致质量控制和优化中的问题的MEMS器件，因此，需要用于监测制造工艺及其结果的结构和方法。公开了使用用于制造MEMS器件108的至少一些相同工艺步骤生产的过程控制监视器100,102,104。过程控制监视器100,102,104的分析可以提供关于 MEMS器件108的特性以及器件中的部件或子部件。该信息可用于识别处理中的错误或优化MEMS器件108.在一些实施例中，过程控制监视器100,102,104的分析可以利用光学测量。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008026877A Process control monitor for interferometric modulator 有权
标题翻译：干涉仪调制器的过程控制监视器
公开(公告)号：JP2008026877A
公开(公告)日：2008-02-07
申请号：JP2007150868
申请日：2007-06-06
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： B81C99/00 , G02B26/02 , B81C1/00
CPC分类号： B81C99/004 , B81B2201/042 , G01N21/55 , G01N21/9501 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide process control monitors for interferometric modulators. SOLUTION: Process control monitors 100, 102 and 104 are manufactured by using at least some of the same process steps as those used to manufacture an MEMS device 108. Analysis of the process control monitors 100, 102 and 104 can provide information regarding properties of the MEMS device 108 and components or subcomponents in the device. The information can be used to identify errors in processing or to optimize the MEMS device 108. In some embodiments, analysis of the process control monitors 100, 102 and 104 can utilize optical measurement values. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供干涉式调制器的过程控制监视器。解决方案：过程控制监视器100,102和104通过使用至少一些与制造MEMS器件108相同的处理步骤来制造。过程控制监视器100,102和104的分析可以提供关于 MEMS器件108的特性以及器件中的部件或子部件。该信息可用于识别处理中的错误或优化MEMS器件108.在一些实施例中，过程控制监视器100,102和104的分析可以利用光学测量值。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2007301719A Process control monitor regarding interferometric modulator 有权
标题翻译：关于干涉仪调制器的过程控制监视器
公开(公告)号：JP2007301719A
公开(公告)日：2007-11-22
申请号：JP2007150861
申请日：2007-06-06
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： B81C99/00
CPC分类号： B81C99/004 , B81B2201/042 , G01N21/55 , G01N21/9501 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a process control monitor regarding an interferometric modulator. SOLUTION: Process control monitors 100, 102 and 104 manufactured by using at least a part of the same process step as that used for manufacturing a MEMS device 108 are disclosed. By analyzing the process control monitors 100, 102 and 104, information on properties of the MEMS device 108 and components or sub components in the device 108 can be provided. The information can be used to identify an error in processing or optimize the MEMS device 108. In some embodiments, optical measured values can be used in the analysis of the process control monitors 100, 102 and 104. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供关于干涉式调制器的过程控制监视器。解决方案：公开了通过使用与用于制造MEMS器件108的工艺步骤相同的工艺步骤的至少一部分制造的工艺控制监视器100,102和104。通过分析过程控制监视器100,102和104，可以提供关于MEMS设备108的属性和设备108中的组件或子组件的信息。该信息可用于识别处理或优化MEMS器件108中的错误。在一些实施例中，光学测量值可用于过程控制监视器100,102和104的分析。（C） 2008年，日本特许厅和INPIT

6. 发明专利

JP2006099113A Method and device for manipulating color in display 审中-公开
标题翻译：用于在显示器中操作颜色的方法和装置
公开(公告)号：JP2006099113A
公开(公告)日：2006-04-13
申请号：JP2005276235
申请日：2005-09-22
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： GALLY BRIAN J , CUMMINGS WILLIAM J
IPC分类号： G02B26/00 , B81B3/00
CPC分类号： G02B26/001 , G09G3/3466 , H04M1/73 , H04W52/027 , Y02D70/00 , Y02D70/1222 , Y02D70/142 , Y02D70/144 , Y02D70/164 , Y02D70/26 , Y10T29/49002
摘要： PROBLEM TO BE SOLVED: To provide a method for manipulating color and a structure of a display device in a display by a microelectromechanical system (MEMS) interferometric modulator. SOLUTION: In one embodiment, a display comprises interferometric display elements formed to have spectral responses that produce white light. In another embodiment, the produced white light is interferingly produced that is characterized by a standardized white point. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过微机电系统（MEMS）干涉式调制器来操纵显示器中的显示装置的颜色和结构的方法。解决方案：在一个实施例中，显示器包括形成为具有产生白光的光谱响应的干涉式显示元件。在另一个实施例中，所产生的白光被干涉地产生，其特征在于标准化的白点。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006099069A System and method for protecting microelectromechanical system array using structurally reinforced back-plate 审中-公开
标题翻译：使用结构强化后板保护微电子系统系统的系统和方法
公开(公告)号：JP2006099069A
公开(公告)日：2006-04-13
申请号：JP2005235798
申请日：2005-08-16
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： GALLY BRIAN J , PALMATEER LAUREN , CUMMINGS WILLIAM J
IPC分类号： G02B26/08 , B81B3/00 , B81B7/04
CPC分类号： B81B3/007 , B81B7/0058 , B81C2203/0163 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To protect microelectromechanical systems from damage by increasing rigidity of a back-plate. SOLUTION: The packaged device includes a substrate 101, an interferometric modulation display array 111 formed on the substrate 101, and a back-plate. The back-plate is placed over the display array 111 with a gap 124 between the back-plate and the display array. The device further includes reinforcing structures which are integrated with the back-plate. The reinforcing structures add stiffness to the back-plate. The back-plate may have a thickness varying along an edge thereof. A driving space is processed by drying, sealing, gas filling, etc., for the purpose of preventing interference of the operation. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过增加背板的刚度来保护微机电系统免受损坏。解决方案：封装器件包括衬底101，形成在衬底101上的干涉式调制显示阵列111和背板。背板被放置在显示器阵列111上，在背板和显示器阵列之间具有间隙124。该装置还包括与后板一体化的加强结构。加强结构增加了背板的刚度。背板可以具有沿其边缘变化的厚度。为了防止操作的干扰，驱动空间通过干燥，密封，充气等进行处理。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2006099055A Portable type etching chamber 审中-公开
标题翻译：便携式蚀刻室
公开(公告)号：JP2006099055A
公开(公告)日：2006-04-13
申请号：JP2005218128
申请日：2005-07-28
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , ARBUCKLE BRIAN W , FLOYD PHILIP D
IPC分类号： G02B26/08 , B81C99/00
CPC分类号： H01L21/67069
摘要： PROBLEM TO BE SOLVED: To provide a system and method for a portable type etching chamber, and a method for using them, especially a method for etching a microelectromechanical (MEMS) system substrate like an optical interferometric modulator substrate. SOLUTION: An etching chamber is constituted so as to support the MEMS substrate inside the chamber. The etching chamber is constituted so as to be moved to an etching station containing a steam or gas phase etching agent source, a purge gas source and/or a vacuum source and to be attached thereto. The portable etching chamber facilitate a process for etching the MEMS substrate held therein. For example, the MEMS substrate in such an etching chamber can be etched by connecting the chamber to the etching station and exposing the MEMS substrate to an etching agent for etching the MEMS substrate. The substrate can be conveyed to/from the etching station inside the portable type etching chamber. In a preferred embodiment, the MEMS substrate is an optical interferometric modulator, and the etching agent is XFe 2 . COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供便携式蚀刻室的系统和方法及其使用方法，特别是用于蚀刻诸如光学干涉式调制器基板的微机电（MEMS）系统基板的方法。解决方案：蚀刻室被构造成在室内支撑MEMS基板。蚀刻室被构造成移动到包含蒸汽或气相蚀刻剂源，吹扫气体源和/或真空源并附接到其的蚀刻站。便携式蚀刻室促进蚀刻保持在其中的MEMS基板的工艺。例如，可以通过将腔室连接到蚀刻站并将MEMS衬底暴露于用于蚀刻MEMS衬底的蚀刻剂来蚀刻这种蚀刻室中的MEMS衬底。衬底可以被输送到便携式蚀刻室内的蚀刻工位。在优选实施例中，MEMS衬底是光学干涉式调制器，并且蚀刻剂是XFe 2 。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2006091848A Electrical characterization of interferometric modulator 审中-公开
标题翻译：干涉仪调制器的电气特性
公开(公告)号：JP2006091848A
公开(公告)日：2006-04-06
申请号：JP2005211655
申请日：2005-07-21
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J , KOTHARI MANISH
IPC分类号： G09G3/20 , G01M11/00 , G01R31/00 , G01R31/02 , G02B26/08 , G09G3/34
CPC分类号： G09G3/006 , G02B26/001 , G09G3/3466
摘要： PROBLEM TO BE SOLVED: To perform further development of an accurate and convenient method for testing operations of a MEMS device.
SOLUTION: In one embodiment of methods and systems for testing electric characteristics of a reflective display device including an interferometric modulator display device, a controlled voltage is applied to conductive leads in the display device, and a current resulting from this application is measured. This voltage is so controlled that an interferometric modulator is not operated during resistance measurement. A method is also disclosed which conditions the interferometric modulator display device by applying a voltage waveform for operating the interferometric modulator in the display device.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：进一步开发用于MEMS器件的测试操作的精确和方便的方法。解决方案：在用于测试包括干涉式调制器显示装置的反射显示装置的电特性的方法和系统的一个实施例中，将受控电压施加到显示装置中的导电引线，并且测量由该应用产生的电流。该电压被如此控制，使得干扰调制器在电阻测量期间不工作。还公开了一种通过在显示装置中施加用于操作干涉式调制器的电压波形来调节干涉式调制器显示装置的方法。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2010211208A Spatial light modulator with integrated optical compensation structure 审中-公开
标题翻译：具有综合光学补偿结构的空间光调制器
公开(公告)号：JP2010211208A
公开(公告)日：2010-09-24
申请号：JP2010050799
申请日：2010-03-08
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CHUI CLARENCE , SAMPSELL JEFFREY B , CUMMINGS WILLIAM J , TUNG MING-HAU
IPC分类号： G02B26/02 , B81B3/00 , G02B26/00 , G02F1/1335 , G02F1/136
CPC分类号： G02F1/21 , G02B26/001 , G02F1/1335 , G02F2001/13356
摘要： PROBLEM TO BE SOLVED: To provide a spatial light modulator with an integrated optical compensation structure. SOLUTION: An optical compensation structure is fabricated over a substrate, and a plurality of light-modulating elements are fabricated over the optical compensation structure. The light-modulating elements are configured to modulate light which is individually addressable and transmitted through or reflected from the transparent substrate. Further, the optical compensation structure includes one or more of a supplemental frontlighting source, a diffuser, a black mask, a diffractive optical element, a color filter, an anti-reflective layer, a structure that scatters light, a microlens array, and a holographic film. COPYRIGHT: (C)2010,JPO&INPIT

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