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1. 发明授权

US5256822A Imine derivatives and process for production thereof 失效
标题翻译：亚胺衍生物及其制备方法
公开(公告)号：US5256822A
公开(公告)日：1993-10-26
申请号：US13923
申请日：1993-02-05
申请人： Ichiki Takemoto , Takeo Fujii , Hideyuki Goto , Ritsu Okajima
发明人： Ichiki Takemoto , Takeo Fujii , Hideyuki Goto , Ritsu Okajima
IPC分类号： C07C249/02 , C07C251/04 , C07C251/08 , C07C251/20 , C07C251/24
CPC分类号： C07C251/08 , C07C251/24
摘要： There is disclosed an imine derivative of the general formula: ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and are hydrogen, C.sub.1 -C.sub.6 alkyl or aryl, with the proviso that R.sup.1 and R.sup.2 are not simultaneously hydrogen; or R.sup.1 and R.sup.2 are joined together to form C.sub.4 -C.sub.6 alkylene. Also disclosed is a process for the production of the imine derivative.

2. 发明申请

US20070149702A1 Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的树脂和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US20070149702A1
公开(公告)日：2007-06-28
申请号：US11642628
申请日：2006-12-21
申请人： Nobuo Ando , Ichiki Takemoto , Isao Yoshida , Yukako Harada
发明人： Nobuo Ando , Ichiki Takemoto , Isao Yoshida , Yukako Harada
IPC分类号： C09D5/02
CPC分类号： C08F220/38 , C08F220/18 , C08F220/28 , C08J3/075
摘要： The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
摘要翻译：本发明提供一种通过照射产生酸的树脂，并且是阴离子聚合物不具有碳 - 碳不饱和键的有机阳离子和阴离子聚合物的盐。本发明还提供一种包含其的化学放大抗蚀剂组合物。

3. 发明授权

US4690709A Urea derivatives, and their use as herbicides 失效
标题翻译：尿素衍生物及其作为除草剂的用途
公开(公告)号：US4690709A
公开(公告)日：1987-09-01
申请号：US203485
申请日：1980-11-03
申请人： Ichiki Takemoto , Seizo Sumida , Ryo Yoshida , Katsuzo Kamoshita
发明人： Ichiki Takemoto , Seizo Sumida , Ryo Yoshida , Katsuzo Kamoshita
IPC分类号： A01N47/30 , C07C275/34 , C07C275/64 , C07C127/19 , C07C119/00
CPC分类号： C07C275/64 , A01N47/30 , C07C275/34
摘要： Novel N'-phenyl-N-methylurea derivatives of the formula: ##STR1## wherein R.sub.1 is a hydrogen atom, a methyl group or a methoxy group, R.sub.2 is a hydrogen atom or a lower alkyl group, R.sub.3, which may be the same or different, is a halogen atom, a lower alkyl group, a lower alkoxy group, a lower alkylthio group or a trifluoromethyl group, n is an integer of 0 to 5, X is a hydrogen atom or a halogen atom, Y is an oxygen atom or a sulfur atom and Z is a straight or branched C.sub.1 -C.sub.8 alkylene group which may have no less than one atom of oxygen and/or sulfur at the terminal of and/or inside the carbon chain, which shows a pronounced herbicidal activity against a wide variety of weeds in the cultivation of crop plants as well as a notable fungicidal activity agaist a wide variety of phytopathogenic fungi causing plant diseases to crop plants without any material toxicity to mammals and fish or chemical injury to said crop plants.
摘要翻译：新颖的下式的N-苯基-N-甲基脲衍生物：其中R1是氢原子，甲基或甲氧基，R2是氢原子或低级烷基，R3可以相同或不同的是卤素原子，低级烷基，低级烷氧基，低级烷硫基或三氟甲基，n为0〜5的整数，X为氢原子或卤素原子，Y为氧原子或硫原子，Z是在碳链末端和/或内部可以具有不少于一个氧原子和/或硫原子的直链或支链C 1 -C 8亚烷基，其显示出明显的除草活性种植作物的各种杂草以及显着的杀真菌活性使各种植物病原真菌引起植物病害，对作物没有任何物质毒性，对所述作物的哺乳动物和鱼类或化学损伤没有任何物质毒性。

4. 发明授权

US4563535A Process for producing tetrahydrophthalimides 失效
标题翻译：制备四氢邻苯二酰亚胺的方法
公开(公告)号：US4563535A
公开(公告)日：1986-01-07
申请号：US649698
申请日：1984-09-12
申请人： Ichiki Takemoto
发明人： Ichiki Takemoto
IPC分类号： C07D209/48 , A01N43/38
CPC分类号： C07D209/48
摘要： A compound of the formula: ##STR1## wherein R is an isoproyl group or an n-amyloxycarbonylmethyl group, useful as a herbicide, is effectively produced by reacting a compound of the formula: ##STR2## wherein R is as defined above, with sulfuryl chloride or chlorine in a solvent in the presence of a dehydrohalogenating agent.
摘要翻译：通过使下式化合物（其中R如上所定义）与硫酰基基团反应，可有效地制备下式化合物：其中R是用于除草剂的异丙酰基或正戊氧羰基甲基，氯化物或氯气在溶剂中在脱卤化氢剂存在下进行。

5. 发明授权

US4378992A Urea derivatives, and their production and use 失效
标题翻译：尿素衍生物及其生产和使用
公开(公告)号：US4378992A
公开(公告)日：1983-04-05
申请号：US114746
申请日：1980-01-24
申请人： Ryo Yoshida , Ichiki Takemoto , Seizo Sumida , Katsuzo Kamoshita
发明人： Ryo Yoshida , Ichiki Takemoto , Seizo Sumida , Katsuzo Kamoshita
IPC分类号： A01N47/30 , C07C67/00 , C07C205/37 , C07C205/38 , C07C217/84 , C07C217/86 , C07C217/88 , C07C239/00 , C07C265/12 , C07C275/34 , C07C275/64 , C07C313/00 , C07C319/20 , C07C323/36 , C07C323/44 , C07C69/76 , C07C127/19
CPC分类号： A01N47/30 , C07C205/37 , C07C205/38 , C07C217/84 , C07C217/86 , C07C217/88 , C07C265/12 , C07C275/34 , C07C275/64 , C07C323/36 , C07C2101/08 , C07C2101/14 , C07C2101/16 , C07C2102/10 , C07C2102/42 , C07C2103/68 , C07C2103/74
摘要： Novel N'-phenyl-N-methylurea derivatives of the formula: ##STR1## wherein R is a C.sub.4 -C.sub.10 cycloalkyl group, a C.sub.4 -C.sub.10 cycloalkenyl group, a C.sub.4 -C.sub.10 cycloalkyl group condensed with a benzene ring or substituted with at least one C.sub.1 -C.sub.4 alkyl group or a C.sub.4 -C.sub.10 cycloalkenyl group condensed with a benzene ring or substituted with a C.sub.1 -C.sub.4 alkyl group, Z is a C.sub.1 -C.sub.4 alkylene group which may have an atom of oxygen and/or sulfur at the terminal of and/or inside the carbon chain, Y is an oxygen atom or a sulfur atom, A is a hydrogen atom, a methyl group or a methoxy group and n is an integer of 0 or 1 with the proviso that in the chain consisting of --(Z).sub.n --Y--, oxygen and/or sulfur atoms can not be present in succession, which shows a pronounced herbicidal activity against a wide variety of weeds in the cultivation of crop plants without any material toxicity to mammals and any chemical injury to said crop plants.
摘要翻译：新的N-苯基-N-甲基脲衍生物，其分子式如下：其中R是C 4 -C 10环烷基，C 4 -C 10环烯基，与苯环稠合或至少被取代的C 4 -C 10环烷基一个C1-C4烷基或与苯环缩合或被C1-C4烷基取代的C4-C10环烯基，Z是可以在末端具有氧和/或硫原子的C1-C4亚烷基的碳链和/或内部，Y是氧原子或硫原子，A是氢原子，甲基或甲氧基，n是0或1的整数，条件是在由 - （Z）nY-，氧和/或硫原子不能连续地存在，其显示了在对作物植物的栽培中对各种杂草的显着的除草活性，而对哺乳动物没有任何物质毒性和对所述的作物植物。

6. 发明授权

US08476473B2 Compound, method for preparing the compound and resist composition containing the compound 有权
标题翻译：化合物，制备化合物的方法和含有该化合物的抗蚀剂组合物
公开(公告)号：US08476473B2
公开(公告)日：2013-07-02
申请号：US12552085
申请日：2009-09-01
申请人： Ichiki Takemoto , Nobuo Ando , Mitsuhiro Hata
发明人： Ichiki Takemoto , Nobuo Ando , Mitsuhiro Hata
IPC分类号： C07C69/63 , C07C69/74
CPC分类号： C07C67/08 , C07C67/11 , C07C69/63 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0392
摘要： A compounds represented by the Formula (I) or the Formula (I′). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
摘要翻译：由式（I）或式（I'）表示的化合物。其中Z 1和Z 2独立地表示氢原子，C 1至C 12烷基或C 3至C 12环状饱和烃基，条件是Z 1和Z 2中的至少一个表示C 1至C 12烷基或C 3至C 12环状饱和烃组; 环Y1和Y2独立地表示任选取代的C 3至C 20脂环族烃基; Q1至Q4和Q'1至Q'4独立地表示氟原子或C1至C6全氟烷基; m和n独立地表示0〜5的整数。

7. 发明授权

US08173350B2 Oxime compound and resist composition containing the same 失效
标题翻译：肟化合物和含有它的抗蚀剂组合物
公开(公告)号：US08173350B2
公开(公告)日：2012-05-08
申请号：US12506925
申请日：2009-07-21
申请人： Tatsuro Masuyama , Kazuhiko Hashimoto , Takashi Hiraoka , Ichiki Takemoto
发明人： Tatsuro Masuyama , Kazuhiko Hashimoto , Takashi Hiraoka , Ichiki Takemoto
IPC分类号： G03F7/004 , G03F7/039 , C07C303/28 , C07C309/65 , C08F12/20
CPC分类号： C07C309/00 , C07C2601/14 , C07C2603/18 , C07C2603/74 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1 represents a C1-C30 aliphatic hydrocarbon group etc., R2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.
摘要翻译：由式（I）表示的肟化合物：其中Y表示未取代或取代的n价C6-C14芳族烃基，n表示1〜6的整数，R1表示C1〜C30脂肪族烃基等，R2表示表示直链或支链C 1〜C 20脂族烃基等，W表示-CO-O-等，Q 1和Q 2各自独立地表示氟原子等，Z表示C 1〜C 20卤代脂族烃基等，含有该抗蚀剂组合物的抗蚀剂组合物。

8. 发明授权

US08057983B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08057983B2
公开(公告)日：2011-11-15
申请号：US12425942
申请日：2009-04-17
申请人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
发明人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团，在侧链中具有内酯结构的单元（b4）和酸产生剂，其中树脂（B）的量相对于树脂（A）每100重量份为2重量份以下。

9. 发明申请

US20100151379A1 COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME 失效
标题翻译：化合物和化学抑制剂组合物
公开(公告)号：US20100151379A1
公开(公告)日：2010-06-17
申请号：US12631061
申请日：2009-12-04
申请人： Ichiki Takemoto , Nobuo Ando
发明人： Ichiki Takemoto , Nobuo Ando
IPC分类号： G03F7/004 , C07D311/96 , C07D311/02
CPC分类号： C07D311/02 , C07D311/96 , G03F7/0045 , G03F7/0046 , G03F7/0392 , Y10S430/122 , Y10S430/126
摘要： The present invention provides a compound represented by the formula (I): wherein P1, P2, P3, P4 and P5 each independently represents a hydrogen atom etc., and at least one selected from the group consisting of R1, R2, R3, R4, R5, R6, R7, R8 and R9 is the group represented by the formula (II): wherein X1 and X2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others each independently represent a hydrogen atom, a C1-C6 alkyl group or a hydroxyl group, and a chemically amplified resist composition containing the same.
摘要翻译：本发明提供由式（I）表示的化合物：其中P1，P2，P3，P4和P5各自独立地表示氢原子等，以及选自由R1，R2，R3，R4 ，R 5，R 6，R 7，R 8和R 9为由式（II）表示的基团：其中X 1和X 2各自独立地表示氢原子等，n表示1至4的整数，Z 1表示C 1 -C 6烷基基团等，环Y表示脂环烃基，其余各自独立地表示氢原子，C1-C6烷基或羟基，以及含有该烷氧基的化学放大抗蚀剂组合物。

10. 发明授权

US07625689B2 Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07625689B2
公开(公告)日：2009-12-01
申请号：US11303925
申请日：2005-12-19
申请人： Ichiki Takemoto , Satoshi Yamaguchi , Hiromu Sakamoto
发明人： Ichiki Takemoto , Satoshi Yamaguchi , Hiromu Sakamoto
IPC分类号： G03C1/00 , C07C69/74
CPC分类号： G03F7/0045 , C07C67/11 , C07C67/14 , C07C69/75 , C07C69/753 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D493/04 , G03F7/0397
摘要： The present invention provides a chemically amplified positive resist composition comprising (i) a polymer which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, (ii) an acid generator, and (iii) a compound of the formula (I). The present invention also provides an ester derivative useful as a component of the chemically amplified positive resist composition, and process for producing the ester derivative.
摘要翻译：本发明提供了一种化学放大正性抗蚀剂组合物，其包含（i）在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱水溶液的聚合物，（ii）酸产生剂，和（iii）式（I）的化合物。本发明还提供可用作化学增幅正型抗蚀剂组合物的成分的酯衍生物，以及酯衍生物的制造方法。

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