专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07625689B2 Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07625689B2
公开(公告)日：2009-12-01
申请号：US11303925
申请日：2005-12-19
申请人： Ichiki Takemoto , Satoshi Yamaguchi , Hiromu Sakamoto
发明人： Ichiki Takemoto , Satoshi Yamaguchi , Hiromu Sakamoto
IPC分类号： G03C1/00 , C07C69/74
CPC分类号： G03F7/0045 , C07C67/11 , C07C67/14 , C07C69/75 , C07C69/753 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D493/04 , G03F7/0397
摘要： The present invention provides a chemically amplified positive resist composition comprising (i) a polymer which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, (ii) an acid generator, and (iii) a compound of the formula (I). The present invention also provides an ester derivative useful as a component of the chemically amplified positive resist composition, and process for producing the ester derivative.
摘要翻译：本发明提供了一种化学放大正性抗蚀剂组合物，其包含（i）在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱水溶液的聚合物，（ii）酸产生剂，和（iii）式（I）的化合物。本发明还提供可用作化学增幅正型抗蚀剂组合物的成分的酯衍生物，以及酯衍生物的制造方法。

2. 发明申请

US20060160017A1 Chemically amplified positive resist composition 失效
公开(公告)号：US20060160017A1
公开(公告)日：2006-07-20
申请号：US11303925
申请日：2005-12-19
申请人： Ichiki Takemoto , Satoshi Yamaguchi , Hiromu Sakamoto
发明人： Ichiki Takemoto , Satoshi Yamaguchi , Hiromu Sakamoto
IPC分类号： G03C1/76
CPC分类号： G03F7/0045 , C07C67/11 , C07C67/14 , C07C69/75 , C07C69/753 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D493/04 , G03F7/0397
摘要： The present invention provides a chemically amplified positive resist composition comprising (i) a polymer which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, (ii) an acid generator, and (iii) a compound of the formula (I). The present invention also provides an ester derivative useful as a component of the chemically amplified positive resist composition, and process for producing the ester derivative.

3. 发明授权

US08663899B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08663899B2
公开(公告)日：2014-03-04
申请号：US13551855
申请日：2012-07-18
申请人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
发明人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, R2, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, and Z1+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，R2，Rb1，Rb2，Lb1，环Wb1，Rb3，Rb4和Z1 +在本说明书中定义。

4. 发明授权

US08557500B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08557500B2
公开(公告)日：2013-10-15
申请号：US13406634
申请日：2012-02-28
申请人： Koji Ichikawa , Hiromu Sakamoto , Takahiro Yasue
发明人： Koji Ichikawa , Hiromu Sakamoto , Takahiro Yasue
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C07C309/17 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2603/74 , C07D303/16 , C07D305/06 , C07D307/33 , C07D307/77 , C07D327/04 , C07D333/46 , C07D497/18 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，L 2表示单键或C 1 -C 6烷二基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，Y代表C3-C18 可以具有一个或多个取代基的脂环族烃基，脂环族烃基中的一个或多个-CH 2 - 可以被-O - ， - CO-或-SO 2 - 代替，Z +代表有机抗衡离子。

5. 发明授权

US08753796B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08753796B2
公开(公告)日：2014-06-17
申请号：US13443155
申请日：2012-04-10
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, R3 represents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (Z1)+ represents an organic cation,a salt represented by the formula (II-0): wherein R4 represents a C1-C24 hydrocarbon group etc., X2 represents a C1-C6 alkanediyl group etc., and (Z2)+ represents an organic cation, anda resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供了包含式（I）表示的盐的光致抗蚀剂组合物：其中R1和R2各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基等， s1表示1或2，t1表示0或1，条件是s1和t1之和为1或2，R3表示C1-C12饱和烃基等，u1表示0〜8的整数，（ Z1）+表示有机阳离子，式（II-0）表示的盐：其中，R4表示C1-C24烃基等，X2表示C1-C6烷二基等，（Z2）+表示有机阳离子和在碱性水溶液中不溶或难溶的树脂，但通过酸的作用变得可溶于碱性水溶液。

6. 发明授权

US08753795B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08753795B2
公开(公告)日：2014-06-17
申请号：US13428555
申请日：2012-03-23
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： C07D411/12 , C07D305/06 , C07D307/93 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其含有：含有来自具有酸不稳定基团的化合物的结构单元的树脂，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过酸; 酸产生剂和由式（I）表示的化合物：其中R1，X1，R2，u1，s1，t1各自在说明书中定义，条件是s1和t1的和为1或2。

7. 发明授权

US5935278A Abrasive composition for magnetic recording disc substrate 失效
标题翻译：磁记录盘基片磨料组合物
公开(公告)号：US5935278A
公开(公告)日：1999-08-10
申请号：US890330
申请日：1997-07-09
申请人： Ken Ishitobi , Takanori Kido , Hiromu Sakamoto
发明人： Ken Ishitobi , Takanori Kido , Hiromu Sakamoto
IPC分类号： C09G1/02 , C09K3/14 , B24B1/00
CPC分类号： C09K3/1463 , C09G1/02
摘要： An abrasive composition for polishing a substrate for a magnetic recording disc is described, which comprises finely divided zirconium oxide particles, an abrasion promoter, an optional water-soluble oxidizing agent, and water. This abrasive composition is used for polishing a substrate for a magnetic recording disc by a process wherein the substrate is polished with a pad while the abrasive composition is supplied between the substrate and the pad, and at least one of the pad and the substrate is rotated. The contents of the finely divided zirconium oxide particles, the abrasion promoter and the optional water-soluble oxidizing agent are 2-20 wt. %, 1-20 wt. % and up to 10 wt. %, respectively, based on the weight of the abrasive composition as used for polishing the substrate.
摘要翻译：描述了一种用于抛光用于磁记录盘的基底的研磨组合物，其包括细碎的氧化锆颗粒，磨损促进剂，任选的水溶性氧化剂和水。这种研磨组合物用于通过其中衬底在衬底和衬垫之间被提供的衬底抛光的过程中用于抛光磁记录盘的衬底，并且衬垫和衬底中的至少一个旋转。细碎的氧化锆颗粒，磨耗助剂和任选的水溶性氧化剂的含量为2-20wt。％，1-20重量％％和高达10wt。％，分别基于用于研磨基材的磨料组合物的重量。

8. 发明授权

US09429841B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09429841B2
公开(公告)日：2016-08-30
申请号：US13552315
申请日：2012-07-18
申请人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
发明人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, m and Z1+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，A13，A14，X12，Rb1，Rb2，Lb1，环Wb1，Rb3，Rb4，m和Z1 +在本说明书中定义。

9. 发明授权

US08367298B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08367298B2
公开(公告)日：2013-02-05
申请号：US12835427
申请日：2010-07-13
申请人： Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
发明人： Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/40
CPC分类号： C07C25/18 , C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A salt having a divalent group represented by the formula (aa): wherein Xa and Xb independently each represent —O— or —S—, Ra, Rb, Rc and Rd independently each represent a hydrogen atom, a C1-C4 alkyl group or a C1-C4 alkoxy group, and m represents 1 or 2.
摘要翻译：具有由式（aa）表示的二价基团的盐：其中Xa和Xb各自独立地表示-O-或-S-，Ra，Rb，Rc和Rd各自独立地表示氢原子，C1-C4烷基或 C1-C4烷氧基，m表示1或2。

10. 发明授权

US08993210B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08993210B2
公开(公告)日：2015-03-31
申请号：US13027575
申请日：2011-02-15
申请人： Koji Ichikawa , Hiromu Sakamoto
发明人： Koji Ichikawa , Hiromu Sakamoto
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07D303/17 , C07D303/40 , C07D305/06 , C07D317/72 , C07C381/12 , G03F7/039 , C07D303/12
CPC分类号： C07C381/12 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07D303/12 , C07D303/17 , C07D303/40 , C07D305/06 , C07D317/72 , G03F7/0045 , G03F7/0397 , G03F7/38 , Y10S430/122 , Y10S430/123
摘要： A salt represented by the formula (I): wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH2— can be replaced by —O— or —CO—, R3 represents a group having a cyclic ether structure, and Z1+ represents an organic cation.
摘要翻译：由式（I）表示的盐：其中R 1和R 2各自独立地表示氟原子或C 1 -C 6全氟烷基，X 1表示可具有一个或多个氟原子的C 1 -C 17二价饱和烃基，或更多的-CH 2 - 可以被-O-或-CO-代替，R 3表示具有环醚结构的基团，Z 1 +表示有机阳离子。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式