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    • 2. 发明申请
    • Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof
    • 透明,高耐热聚酰亚胺前体及其感光性聚酰亚胺组合物
    • US20070093640A1
    • 2007-04-26
    • US10550591
    • 2004-03-24
    • Dong-seok KimYong-sik AhnKyung-jun KimMi-hie Yi
    • Dong-seok KimYong-sik AhnKyung-jun KimMi-hie Yi
    • C08G69/26
    • C08G69/26C08G73/10C08G73/1007G03F7/037G03F7/0387Y10T428/10
    • The present invention relates to an aqueous alkali-developable photosensitive polyimide precursor resin composition that is appropriate for highly heat-resistant transparent protection layers and insulation layers for liquid crystal display devices. In more detail, the present invention relates to a negative-type photosensitive transparent polyimide precursor resin composition manufactured in two steps. The first step is the manufacture of a transparent linear polyamic acid (A) from (a-1) one or more kinds of tetracarboxylic acid dianhydrides selected from alicyclic tetracarboxylic acid dianhydrides having 3 to 30 carbon atoms; and (a-2) one or more kinds of diamines selected from aliphatic, alicyclic, or non-conjugated aromatic diamines, having 3 to 30 carbon atoms, having one or more ethylenically unsaturated bonds at side chains as essential components; and the second step is the manufacture of reactive transparent polyimide precursors shown in the following Chemical Formula 1 according to the esterification reaction of the above polyamic acid (A) with ethylenically unsaturated compound (B) containing an epoxy group in the same molecule as the main component. The photosensitive transparent polyimide precursor resin compositions according to the present invention have a superior photosensitivity, and thus, may be used for transparent protection layers and insulation layers of liquid crystal display devices having superior heat resistance, chemical resistance, mechanical strength, and electricity insulation.
    • 本发明涉及适用于高耐热性透明保护层和液晶显示装置用绝缘层的碱性显影用感光性聚酰亚胺前体树脂组合物。 更详细地说,本发明涉及两步制造的负型光敏透明聚酰亚胺前体树脂组合物。 第一步是从(a-1)由选自具有3-30个碳原子的脂环族四羧酸二酐的一种或多种四羧酸二酐制造透明的线性聚酰胺酸(A) 和(a-2)选自碳原子数为3〜30的脂肪族,脂环族或非共轭芳族二胺的一种或多种二胺,作为必需成分在侧链具有一个以上的烯键式不饱和键; 第二步是根据上述聚酰胺酸(A)与与主要相同分子中含有环氧基的烯键式不饱和化合物(B)的酯化反应,制备如下化学式1所示的反应性透明聚酰亚胺前体 零件。 根据本发明的感光性透明聚酰亚胺前体树脂组合物具有优异的光敏性,因此可用于具有优异的耐热性,耐化学性,机械强度和电绝缘性的液晶显示装置的透明保护层和绝缘层。
    • 3. 发明授权
    • Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof
    • 透明,高耐热聚酰亚胺前体及其感光性聚酰亚胺组合物
    • US08232366B2
    • 2012-07-31
    • US10550591
    • 2004-03-24
    • Dong-seok KimYong-sik AhnKyung-jun KimMi-hie Yi
    • Dong-seok KimYong-sik AhnKyung-jun KimMi-hie Yi
    • C08G69/26
    • C08G69/26C08G73/10C08G73/1007G03F7/037G03F7/0387Y10T428/10
    • The present invention relates to an aqueous alkali-developable photosensitive polyimide precursor resin composition that is appropriate for highly heat-resistant transparent protection layers and insulation layers for liquid crystal display devices. In more detail, the present invention relates to a negative-type photosensitive transparent polyimide precursor resin composition manufactured in two steps. The first step is the manufacture of a transparent linear polyamic acid (A) from (a-1) one or more kinds of tetracarboxylic acid dianhydrides selected from alicyclic tetracarboxylic acid dianhydrides having 3 to 30 carbon atoms; and (a-2) one or more kinds of diamines selected from aliphatic, alicyclic, or non-conjugated aromatic diamines, having 3 to 30 carbon atoms, having one or more ethylenically unsaturated bonds at side chains as essential components; and the second step is the manufacture of reactive transparent polyimide precursors shown in the following Chemical Formula 1 according to the esterification reaction of the above polyamic acid (A) with ethylenically unsaturated compound (B) containing an epoxy group in the same molecule as the main component. The photosensitive transparent polyimide precursor resin compositions according to the present invention have a superior photosensitivity, and thus, may be used for transparent protection layers and insulation layers of liquid crystal display devices having superior heat resistance, chemical resistance, mechanical strength, and electricity insulation.
    • 本发明涉及适用于高耐热性透明保护层和液晶显示装置用绝缘层的碱性显影用感光性聚酰亚胺前体树脂组合物。 更详细地说,本发明涉及两步制造的负型光敏透明聚酰亚胺前体树脂组合物。 第一步是从(a-1)由选自具有3-30个碳原子的脂环族四羧酸二酐的一种或多种四羧酸二酐制造透明的线性聚酰胺酸(A) 和(a-2)选自碳原子数为3〜30的脂肪族,脂环族或非共轭芳族二胺的一种或多种二胺,作为必需成分在侧链具有一个以上的烯属不饱和键; 第二步是根据上述聚酰胺酸(A)与与主要相同分子中含有环氧基的烯键式不饱和化合物(B)的酯化反应,制备如下化学式1所示的反应性透明聚酰亚胺前体 零件。 根据本发明的感光性透明聚酰亚胺前体树脂组合物具有优异的光敏性,因此可用于具有优异的耐热性,耐化学性,机械强度和电绝缘性的液晶显示装置的透明保护层和绝缘层。