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1. 发明申请

US20110169027A1 Patterning Method of Metal Oxide Thin Film Using Nanoimprinting, and Manufacturing Method of Light Emitting Diode 有权
标题翻译：使用纳米印刷的金属氧化物薄膜的图案化方法和发光二极管的制造方法
公开(公告)号：US20110169027A1
公开(公告)日：2011-07-14
申请号：US12698194
申请日：2010-02-02
申请人： Hyeong-Ho Park , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Ji-Hye Lee , Soon-Won Lee
发明人： Hyeong-Ho Park , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Ji-Hye Lee , Soon-Won Lee
IPC分类号： H01L33/58 , C23C14/28 , D06N7/04 , B29C59/16 , H05B6/00
CPC分类号： H01L33/42 , H01L2924/0002 , H01L2933/0016 , Y10T428/24802 , H01L2924/00
摘要： Disclosed are a patterning method of a metal oxide thin film using nanoimprinting, and a manufacturing method of a light emitting diode (LED). The method for forming a metal oxide thin film pattern using nanoimprinting includes: coating a photosensitive metal-organic material precursor solution on a substrate; preparing a mold patterned to have a protrusion and depression structure; pressurizing the photosensitive metal-organic material precursor coating layer with the patterned mold; forming a cured metal oxide thin film pattern by heating the pressurized photosensitive metal-organic material precursor coating layer or by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer while being heated; and removing the patterned mold from the metal oxide thin film pattern, and selectively further includes annealing the metal oxide thin film pattern. Within this, there is provided a method for forming a metal dioxe thin film pattern using nano imprinting, which makes it possible to simplify the process for forming the pattern since the process of separately applying the ultraviolet resin to be used as the resist can be omitted, and forms a micro/nano composite pattern through a single imprint process.
摘要翻译：公开了使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管（LED）的制造方法。使用纳米压印形成金属氧化物薄膜图案的方法包括：将光敏金属 - 有机材料前体溶液涂覆在基底上; 制备图案化的具有突起和凹陷结构的模具; 用图案化的模具对感光金属 - 有机材料前体涂层进行加压; 通过加热加压的感光金属 - 有机材料前体涂层或通过在被加热时向加压的感光金属 - 有机材料前体涂层照射紫外线来形成固化的金属氧化物薄膜图案; 并且从金属氧化物薄膜图案移除图案化的模具，并且还包括退火金属氧化物薄膜图案。其中，提供了使用纳米压印形成金属二氧化物薄膜图案的方法，由于可以省略分离施加用作抗蚀剂的紫外线树脂的工艺，所以可以简化形成图案的工艺，并通过单个压印工艺形成微/纳复合图案。

2. 发明授权

US07994053B2 Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode 有权
公开(公告)号：US07994053B2
公开(公告)日：2011-08-09
申请号：US12655435
申请日：2009-12-30
申请人： Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-Hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
发明人： Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-Hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
IPC分类号： H01L21/44
CPC分类号： H01L33/44 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L2933/0083
摘要： A method for forming a metal oxide thin film pattern using nanoimprinting according to one embodiment of the present invention includes: coating a photosensitive metal-organic material precursor solution on a substrate; pressurizing the photosensitive metal-organic material precursor coating layer to a mold patterned to have a protrusion and depression structure; forming the metal oxide thin film pattern by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer to cure it; and removing the patterned mold from the metal oxide thin film pattern.

3. 发明申请

US20110049548A1 Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode 有权
标题翻译：使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管的制造方法
公开(公告)号：US20110049548A1
公开(公告)日：2011-03-03
申请号：US12655435
申请日：2009-12-30
申请人： Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
发明人： Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
IPC分类号： H01L33/00 , H01L21/30 , B05D3/06
CPC分类号： H01L33/44 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L2933/0083
摘要： A method for forming a metal oxide thin film pattern using nanoimprinting according to one embodiment of the present invention includes: coating a photosensitive metal-organic material precursor solution on a substrate; pressurizing the photosensitive metal-organic material precursor coating layer to a mold patterned to have a protrusion and depression structure; forming the metal oxide thin film pattern by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer to cure it; and removing the patterned mold from the metal oxide thin film pattern.
摘要翻译：根据本发明的一个实施方案，使用纳米压印形成金属氧化物薄膜图案的方法包括：将感光金属 - 有机材料前体溶液涂布在基底上; 将感光金属 - 有机材料前体涂层加压至图案化以具有突出和凹陷结构的模具; 通过向加压感光金属 - 有机材料前体涂层照射紫外线以使其固化来形成金属氧化物薄膜图案; 以及从所述金属氧化物薄膜图案移除所述图案化模具。

4. 发明授权

US08247962B2 Organic light emitting device and manufacturing method thereof 有权
标题翻译：有机发光器件及其制造方法
公开(公告)号：US08247962B2
公开(公告)日：2012-08-21
申请号：US12273654
申请日：2008-11-19
申请人： Jong-Youp Shim , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Eung-Sug Lee , So-Hee Jeon , Jae-R Youn , Jang-Joo Kim
发明人： Jong-Youp Shim , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Eung-Sug Lee , So-Hee Jeon , Jae-R Youn , Jang-Joo Kim
IPC分类号： H01L51/50
CPC分类号： H01L51/5275
摘要： An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.
摘要翻译：提供了具有光子晶体结构的有机发光器件及其制造方法。有机发光器件包括：光通过的衬底; 形成在基板上并具有光子晶体结构的光子晶体层; 与光子晶体层相比形成在光子晶体层上并具有大折射率的中间层; 形成在所述中间层上的第一电极层; 形成在所述第一电极层上并根据电流流动发光的发光层; 以及形成在发光层上的第二电极层。

5. 发明申请

US20120100773A1 ORGANIC LIGHT EMITTING DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：有机发光装置及其制造方法
公开(公告)号：US20120100773A1
公开(公告)日：2012-04-26
申请号：US13342287
申请日：2012-01-03
申请人： Jong-Youp SHIM , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Eung-Sug Lee , So-Hee Jeon , Jae-R. Youn , Jang-Joo Kim
发明人： Jong-Youp SHIM , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Eung-Sug Lee , So-Hee Jeon , Jae-R. Youn , Jang-Joo Kim
IPC分类号： H01J9/00
CPC分类号： H01L51/5275
摘要： An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.
摘要翻译：提供了具有光子晶体结构的有机发光器件及其制造方法。有机发光器件包括：光通过的衬底; 形成在基板上并具有光子晶体结构的光子晶体层; 与光子晶体层相比形成在光子晶体层上并具有大折射率的中间层; 形成在所述中间层上的第一电极层; 形成在所述第一电极层上并根据电流流动发光的发光层; 以及形成在发光层上的第二电极层。

6. 发明授权

US09692015B2 Organic light emitting device and manufacturing method thereof 有权
公开(公告)号：US09692015B2
公开(公告)日：2017-06-27
申请号：US13342287
申请日：2012-01-03
申请人： Jong-Youp Shim , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Eung-Sug Lee , So-Hee Jeon , Jae-R. Youn , Jang-Joo Kim
发明人： Jong-Youp Shim , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Eung-Sug Lee , So-Hee Jeon , Jae-R. Youn , Jang-Joo Kim
IPC分类号： B05D5/12 , H01L51/52
CPC分类号： H01L51/5275
摘要： An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.

7. 发明申请

US20090128022A1 ORGANIC LIGHT EMITTING DEVICE AND MANUFACTURING METHOD THEREOF 有权
标题翻译：有机发光装置及其制造方法
公开(公告)号：US20090128022A1
公开(公告)日：2009-05-21
申请号：US12273654
申请日：2008-11-19
申请人： Jong-Youp SHIM , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Eung-Sug Lee , So-Hee Jeon , Jae-R Youn , Jang-Joo Kim
发明人： Jong-Youp SHIM , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Eung-Sug Lee , So-Hee Jeon , Jae-R Youn , Jang-Joo Kim
IPC分类号： H01L27/32 , H01L21/02 , H01L51/50
CPC分类号： H01L51/5275
摘要： An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.
摘要翻译：提供了具有光子晶体结构的有机发光器件及其制造方法。有机发光器件包括：光通过的衬底; 形成在基板上并具有光子晶体结构的光子晶体层; 与光子晶体层相比形成在光子晶体层上并具有大折射率的中间层; 形成在所述中间层上的第一电极层; 形成在所述第一电极层上并根据电流流动发光的发光层; 以及形成在发光层上的第二电极层。

8. 发明申请

US20070158872A1 Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same 有权
标题翻译：用于使用类金刚石碳的微/纳刻蚀平版印刷及其制造方法
公开(公告)号：US20070158872A1
公开(公告)日：2007-07-12
申请号：US11582461
申请日：2006-10-18
申请人： Jun-Ho Jeong , Young-Suk Sim , Ki-Don Kim , Dae-Geun Choi , Eung-Sug Lee
发明人： Jun-Ho Jeong , Young-Suk Sim , Ki-Don Kim , Dae-Geun Choi , Eung-Sug Lee
IPC分类号： B29C33/40 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention relates to a micro/nano imprint lithography technique and in particular, to a stamp that is used in an UV-micro/nano imprint lithography process or thermal micro/nano imprint lithography process and a method for fabricating the stamp. The method for fabricating a stamp for micro/nano imprint lithography of the present invention includes i) depositing a thin film of diamond-like carbon on a substrate, ii) applying resist on the diamond-like carbon thin film, iii) patterning the resist, iv) etching the diamond-like carbon thin film by using the resist as a protective layer, and v) removing the resist.
摘要翻译：微型/纳米压印光刻技术本发明涉及一种微/纳米压印光刻技术，尤其涉及一种用于UV-微/纳刻印版光刻工艺或热微/纳印版光刻工艺的印模，以及一种用于制造印模的方法。制造本发明的微/纳刻印光刻用印模的方法包括：i）在基板上沉积类金刚石碳薄膜，ii）在金刚石状碳薄膜上涂布抗蚀剂，iii）使抗蚀剂图案化，iv）通过使用抗蚀剂作为保护层来蚀刻类金刚石碳薄膜，以及v）除去抗蚀剂。

9. 发明授权

US07914693B2 Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same 有权
标题翻译：用于使用类金刚石碳的微/纳刻蚀平版印刷及其制造方法
公开(公告)号：US07914693B2
公开(公告)日：2011-03-29
申请号：US11582461
申请日：2006-10-18
申请人： Jun-Ho Jeong , Young-Suk Sim , Ki-Don Kim , Dae-Geun Choi , Eung-Sug Lee
发明人： Jun-Ho Jeong , Young-Suk Sim , Ki-Don Kim , Dae-Geun Choi , Eung-Sug Lee
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention relates to a micro/nano imprint lithography technique and in particular, to a stamp that is used in an UV-micro/nano imprint lithography process or thermal micro/nano imprint lithography process and a method for fabricating the stamp.The method for fabricating a stamp for micro/nano imprint lithography of the present invention includes i) depositing a thin film of diamond-like carbon on a substrate, ii) applying resist on the diamond-like carbon thin film, iii) patterning the resist, iv) etching the diamond-like carbon thin film by using the resist as a protective layer, and v) removing the resist.
摘要翻译：微型/纳米压印光刻技术本发明涉及一种微/纳米压印光刻技术，尤其涉及一种用于UV-微/纳刻印版光刻工艺或热微/纳印版光刻工艺的印模，以及一种用于制造印模的方法。制造本发明的微/纳刻印光刻用印模的方法包括：i）在基板上沉积类金刚石碳薄膜，ii）在金刚石状碳薄膜上涂布抗蚀剂，iii）使抗蚀剂图案化，iv）通过使用抗蚀剂作为保护层来蚀刻类金刚石碳薄膜，以及v）除去抗蚀剂。

10. 发明授权

US08334148B2 Methods of forming pattern structures 有权
标题翻译：形成图案结构的方法
公开(公告)号：US08334148B2
公开(公告)日：2012-12-18
申请号：US13184127
申请日：2011-07-15
申请人： Jun-Ho Jeong , Jang-Eun Lee , Woo-Jin Kim , Hee-Ju Shin , Yong-Hwan Ryu
发明人： Jun-Ho Jeong , Jang-Eun Lee , Woo-Jin Kim , Hee-Ju Shin , Yong-Hwan Ryu
IPC分类号： H01L21/00
CPC分类号： H01L27/228 , H01L43/12
摘要： An example embodiment relates to a method of forming a pattern structure, including forming an object layer on a substrate, and forming a hard mask on the object layer. A plasma reactive etching process is performed on the object layer using an etching gas including a fluorine containing gas and ammonia (NH3) gas together with oxygen gas to form a pattern. The oxygen gas is used for suppressing the removal of the hard mask during the etching process.
摘要翻译：示例性实施例涉及一种形成图案结构的方法，包括在基底上形成物体层，并在物体层上形成硬掩模。使用包含含氟气体和氨（NH 3）气体的蚀刻气体与氧气一起在物体层上进行等离子体反应蚀刻工艺以形成图案。氧气用于在蚀刻过程中抑制硬掩模的去除。

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