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    • 3. 发明申请
    • MANUFACTURING METHOD OF A THIN FILM TRANSISTOR ARRAY PANEL
    • 薄膜晶体管阵列的制造方法
    • US20080299712A1
    • 2008-12-04
    • US12192531
    • 2008-08-15
    • Woo-Geun LEEHye-Young RYUSang-Gab KIMJang-Soo KIM
    • Woo-Geun LEEHye-Young RYUSang-Gab KIMJang-Soo KIM
    • H01L21/336
    • H01L27/1288H01L21/32134H01L21/76838H01L27/1214H01L29/66765
    • A method of manufacturing a thin film transistor array panel includes forming a gate line including a gate electrode, forming a gate insulating layer on the gate line, forming a semiconductor stripe on the gate insulating layer; forming ohmic contacts on the semiconductor stripe, forming a data line including a source electrode and a drain electrode on the ohmic contacts, depositing a passivation layer on the data line and the drain electrode, and forming a pixel electrode connected to the drain electrode. The formation of the data line and the drain electrode, the ohmic contacts, and the semiconductor stripe includes depositing an intrinsic silicon layer, an extrinsic silicon layer, and a conductor layer on the gate insulating layer, forming a photoresist including a second portion corresponding to a channel area between the source electrode and the drain electrode, and a first portion corresponding to a wire area on the data line and the drain electrode, wherein the first portion is thicker than the second portion, etching the conductor layer corresponding to a remaining area except for the wire and the channel area using the photoresist as an etch mask, removing the second portion to expose the conductor layer on the channel areas, etching the intrinsic silicon layer and the extrinsic silicon layer on the remaining area, etching the conductor layer and the extrinsic silicon layer on the channel areas, and removing the first portion.
    • 制造薄膜晶体管阵列面板的方法包括:形成包括栅电极的栅极线,在栅极线上形成栅绝缘层,在栅绝缘层上形成半导体条; 在半导体条上形成欧姆接触,在欧姆接触上形成包括源电极和漏电极的数据线,在数据线和漏电极上沉积钝化层,并形成连接到漏电极的像素电极。 数据线和漏电极,欧姆接触和半导体条纹的形成包括在栅绝缘层上沉积本征硅层,非本征硅层和导体层,形成光致抗蚀剂,其包括对应于 源极电极和漏极电极之间的沟道区域,以及对应于数据线和漏极电极的导线区域的第一部分,其中第一部分比第二部分厚,蚀刻对应于剩余区域的导体层 除了使用光致抗蚀剂作为蚀刻掩模的导线和沟道区域之外,去除第二部分以暴露沟道区域上的导体层,蚀刻剩余区域上的本征硅层和非本征硅层,蚀刻导体层和 在通道区域上的非本征硅层,以及去除第一部分。
    • 4. 发明申请
    • THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY APPARATUS HAVING THE SAME
    • 薄膜晶体管基板,其制造方法和具有该薄膜晶体管基板的显示装置
    • US20070187741A1
    • 2007-08-16
    • US11690702
    • 2007-03-23
    • Woo-Geun LEEHye-Young RYU
    • Woo-Geun LEEHye-Young RYU
    • H01L29/94
    • G02F1/1368H01L27/1255
    • In a thin film transistor substrate, a method of manufacturing the same, and a display apparatus having the same, a thin film transistor, a gate member, and a storage member are formed on an insulating substrate. The gate member has a gate line and a gate electrode electrically connected to the gate line, and the storage member has a storage line, a first storage electrode, and a second storage electrode. A data member is formed on an active layer. The data member includes a data line crossing the gate line, a third storage electrode overlapped with the first storage electrode and a fourth storage electrode overlapped with the second storage electrode. Thus, a capacitance variation of a storage capacitor may be prevented, thereby improving display quality of a display apparatus.
    • 在绝缘基板上形成薄膜晶体管基板及其制造方法及具有该薄膜晶体管基板的显示装置,薄膜​​晶体管,栅极部件和存储部件。 栅极部件具有与栅极线电连接的栅极线和栅电极,并且存储部件具有存储线,第一存储电极和第二存储电极。 在有源层上形成数据元件。 数据构件包括与栅极线交叉的数据线,与第一存储电极重叠的第三存储电极和与第二存储电极重叠的第四存储电极。 因此,可以防止存储电容器的电容变化,从而提高显示装置的显示质量。