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1. 发明申请

US20050004773A1 METHOD FOR ANALYZING IN-LINE QC TEST PARAMETERS 失效
标题翻译：用于分析在线QC测试参数的方法
公开(公告)号：US20050004773A1
公开(公告)日：2005-01-06
申请号：US10604244
申请日：2003-07-03
申请人： Hung-En Tai , Haw-Jyue Luo
发明人： Hung-En Tai , Haw-Jyue Luo
IPC分类号： G01R31/26 , G05B19/418 , G06F19/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： A method for analyzing in-line QCtest parameters is used to analyze a plurality of lots of products, each lot of products having a lot number and being formed using a plurality of equipments. At least one wafer of each lot of products is tested by at least one in-line QC test item to generate an in-line QC test parameter. The in-line QC test item, a sample test item and a wafer test item related to the in-line QC test item are stored in a database. The database further stores the in-line QC test parameter and data of a plurality of lots of high-yield product stocks, such as various test items and test parameters. The method includes the following steps: analyzing the in-line QC test parameter to determine whether the in-line QC test parameter corresponds to a predetermined spec or not; searching the database to find out the sample test item or the wafer test item related to the in-line QC test item when the in-line QC test parameter does not correspond to the predetermined spec; searching the database to find out the corresponding test parameters of the high-yield product stocks according to the in-line QC test item and the searched sample test item or the wafer test item; and generating a correlation to illustrate the relationship between the in-line QC test item and the sample test item, or the relationship between the in-line QC test item and the wafer test item according to the searched high-yield product stocks.
摘要翻译：用于分析在线QC测试参数的方法用于分析多批产品，每批产品具有批号并且使用多个设备形成。每批产品的至少一个晶片通过至少一个在线QC测试项目进行测试，以生成在线QC测试参数。在线QC测试项目，样品测试项目和与在线QC测试项目相关的晶片测试项目存储在数据库中。数据库进一步存储多个批量的高收益产品库存的在线QC测试参数和数据，例如各种测试项目和测试参数。该方法包括以下步骤：分析在线QC测试参数，以确定在线QC测试参数是否对应于预定规格; 搜索数据库以查找在线QC测试参数不符合预定规格的样品测试项目或与在线QC测试项目相关的晶片测试项目; 搜索数据库，根据在线QC测试项目和搜索到的样品测试项目或晶片测试项目，找出高产量产品库存的相应测试参数; 并产生相关性，以说明根据所搜索的高产量库存，在线QC测试项目和样本测试项目之间的关系，或者在线QC测试项目与晶片测试项目之间的关系。

2. 发明授权

US06959252B2 Method for analyzing in-line QC test parameters 失效
标题翻译：分析在线QC测试参数的方法
公开(公告)号：US06959252B2
公开(公告)日：2005-10-25
申请号：US10604244
申请日：2003-07-03
申请人： Hung-En Tai , Haw-Jyue Luo
发明人： Hung-En Tai , Haw-Jyue Luo
IPC分类号： G01R31/26 , G05B19/418 , G06F19/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： A method for analyzing in-line QCtest parameters is used to analyze a plurality of lots of products, each lot of products having a lot number and being formed using a plurality of equipments. At least one wafer of each lot of products is tested by at least one in-line QC test item to generate an in-line QC test parameter. The in-line QC test item, a sample test item and a wafer test item related to the in-line QC test item are stored in a database. The database further stores the in-line QC test parameter and data of a plurality of lots of high-yield product stocks, such as various test items and test parameters. The method includes the following steps: analyzing the in-line QC test parameter to determine whether the in-line QC test parameter corresponds to a predetermined spec or not; searching the database to find out the sample test item or the wafer test item related to the in-line QC test item when the in-line QC test parameter does not correspond to the predetermined spec; searching the database to find out the corresponding test parameters of the high-yield product stocks according to the in-line QC test item and the searched sample test item or the wafer test item; and generating a correlation to illustrate the relationship between the in-line QC test item and the sample test item, or the relationship between the in-line QC test item and the wafer test item according to the searched high-yield product stocks.
摘要翻译：用于分析在线QC测试参数的方法用于分析多批产品，每批产品具有批号并且使用多个设备形成。每批产品的至少一个晶片通过至少一个在线QC测试项目进行测试，以生成在线QC测试参数。在线QC测试项目，样品测试项目和与在线QC测试项目相关的晶片测试项目存储在数据库中。数据库进一步存储多个批量的高收益产品库存的在线QC测试参数和数据，例如各种测试项目和测试参数。该方法包括以下步骤：分析在线QC测试参数，以确定在线QC测试参数是否对应于预定规格; 搜索数据库以查找在线QC测试参数不符合预定规格的样品测试项目或与在线QC测试项目相关的晶片测试项目; 搜索数据库，根据在线QC测试项目和搜索到的样品测试项目或晶片测试项目，找出高产量产品库存的相应测试参数; 并产生相关性，以说明根据所搜索的高产量库存，在线QC测试项目和样本测试项目之间的关系，或者在线QC测试项目与晶片测试项目之间的关系。

3. 发明申请

US20060048010A1 DATA ANALYZING METHOD FOR A FAULT DETECTION AND CLASSIFICATION SYSTEM 审中-公开
标题翻译：用于故障检测和分类系统的数据分析方法
公开(公告)号：US20060048010A1
公开(公告)日：2006-03-02
申请号：US10711179
申请日：2004-08-30
申请人： Hung-En Tai , Haw-Jyue Luo
发明人： Hung-En Tai , Haw-Jyue Luo
IPC分类号： G06F11/00
CPC分类号： G06F11/079 , G05B23/0221 , G06F11/0706
摘要： A data analyzing method for a fault detection and classification system. The method includes extracting a set of raw data from a fault detection and classification system, separating the raw data for generating another set of classified data via a predetermined filtering condition, and utilizing a predetermined statistical method for analyzing the classified data.
摘要翻译：一种故障检测和分类系统的数据分析方法。该方法包括从故障检测和分类系统提取一组原始数据，分离用于经由预定滤波条件生成另一组分类数据的原始数据，并利用预定的统计方法分析分类数据。

4. 发明授权

US06999897B2 Method and related system for semiconductor equipment early warning management 失效
标题翻译：半导体设备预警管理方法及相关系统
公开(公告)号：US06999897B2
公开(公告)日：2006-02-14
申请号：US10708573
申请日：2004-03-11
申请人： Hung-En Tai , Chien-Chung Chen , Haw-Jyue Luo , Sheng-Jen Wang
发明人： Hung-En Tai , Chien-Chung Chen , Haw-Jyue Luo , Sheng-Jen Wang
IPC分类号： G11C7/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.
摘要翻译：一种半导体设备预警管理方法及相关系统。该方法包括记录每件设备的处理参数，每台设备处理时记录设备参数，评估和记录半导体产品的质量和相应的测试参数，分析相应工艺参数，相应设备参数之间的关系，以及每件设备的半导体产品的质量。

5. 发明申请

US20050203715A1 METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT EARLY WARNING MANAGEMENT 失效
标题翻译：用于半导体设备的方法和相关系统早期警告管理
公开(公告)号：US20050203715A1
公开(公告)日：2005-09-15
申请号：US10708573
申请日：2004-03-11
申请人： Hung-En Tai , Chien-Chung Chen , Haw-Jyue Luo , Sheng-Jen Wang
发明人： Hung-En Tai , Chien-Chung Chen , Haw-Jyue Luo , Sheng-Jen Wang
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.
摘要翻译：一种半导体设备预警管理方法及相关系统。该方法包括记录每件设备的处理参数，每台设备处理时记录设备参数，评估和记录半导体产品的质量和相应的测试参数，分析相应工艺参数，相应设备参数之间的关系，以及每件设备的半导体产品的质量。

6. 发明授权

US06828776B2 Method for analyzing defect inspection parameters 失效
标题翻译：分析缺陷检查参数的方法
公开(公告)号：US06828776B2
公开(公告)日：2004-12-07
申请号：US10604685
申请日：2003-08-11
申请人： Hung-En Tai , Haw-Jyue Luo
发明人： Hung-En Tai , Haw-Jyue Luo
IPC分类号： G01R104
CPC分类号： G01R31/2831
摘要： The claimed invention method is for analyzing defect inspection parameters. The method includes searching for the defect inspection parameters of a plurality of lots of products from a database, classifying the plurality of lots of products into at least a qualified group and a failed group according to the defect inspection parameters, searching for a process step correlated to a defect inspection item from the database, searching for manufacturing equipment through which the qualified group has passed in the process step and the manufacturing equipment through which the failed group has passed in the process step, and determining the manufacturing equipment through which the probability that the failed group having passed which is greater than that of the qualified group.
摘要翻译：所要求发明的方法是用于分析缺陷检查参数。该方法包括从数据库中搜索多批产品的缺陷检查参数，根据缺陷检查参数将多批产品分类为至少一个合格的组和一个失败的组，搜索相关的处理步骤到数据库中的缺陷检查项目，在处理步骤中寻找合格的组已经通过的制造设备和在过程步骤中已经通过的制造设备，并且确定制造设备，通过该设备，失败的群体已经超过合格群体。

7. 发明授权

US07079677B2 Automatic intelligent yield improving and process parameter multivariate system and the analysis method thereof 失效
标题翻译：自动智能产量提高和过程参数多变量系统及其分析方法
公开(公告)号：US07079677B2
公开(公告)日：2006-07-18
申请号：US10249148
申请日：2003-03-19
申请人： Hung-En Tai , Sheng-Jen Wang
发明人： Hung-En Tai , Sheng-Jen Wang
IPC分类号： G06K9/00 , G06K9/36
CPC分类号： G06Q10/04 , G05B2219/32191 , G05B2219/45031 , H01L21/67276 , Y02P90/22
摘要： An automatic intelligent yield improving and process parameter multivariate analysis system and the analysis method thereof. The system is applied to a computer to set up analysis procedures for analyzing process parameters obtained from each measuring machine in semiconductor testing process by utilizing data mining technology. The system includes a plurality of semiconductor processing nodes having different functions. The system links each of the semiconductor processing node to another semiconductor processing node by a logic means so that the computer can process the semiconductor processing nodes sequentially. The system also links the semiconductor processing nodes by a data connection means to allow microprocessors to load necessary parameter data or wafer lot numbers from corresponding semiconductor processing nodes by a data connection means.
摘要翻译：一种自动智能产量提高和过程参数多变量分析系统及其分析方法。该系统应用于计算机，通过利用数据挖掘技术，在半导体测试过程中设置分析从每台测量机获得的工艺参数的分析程序。该系统包括具有不同功能的多个半导体处理节点。该系统通过逻辑装置将每个半导体处理节点连接到另一个半导体处理节点，使得计算机可以顺序地处理半导体处理节点。该系统还通过数据连接装置连接半导体处理节点，以允许微处理器通过数据连接装置从相应的半导体处理节点加载必要的参数数据或晶片批号。

8. 发明授权

US06968280B2 Method for analyzing wafer test parameters 失效
标题翻译：分析晶圆试验参数的方法
公开(公告)号：US06968280B2
公开(公告)日：2005-11-22
申请号：US10249213
申请日：2003-03-24
申请人： Hung-En Tai , Ching-Ly Yueh
发明人： Hung-En Tai , Ching-Ly Yueh
IPC分类号： G06F19/00 , H01L21/00
CPC分类号： H01L21/67276 , H01L21/67253
摘要： A plurality of lots of wafers, each lot of wafers having a lot number and each wafer of each lot having at least one test parameter generated by performing at least one wafer test item stored in a database, are divided into a high yield group and a low yield group. By analyzing the wafer test parameters of the wafers in the high yield group, a first standard value within a first range is obtained. A first comparison step is then performed to compare each wafer test parameter of each lot in the low yield group with the first standard value and delete lot numbers of lots with wafer test parameters within the first range. Finally, a first amount of residual lots in the low yield group is determined. In response to the first amount of residual lots in the low yield group not equaling to zero, a first searching step is performed to which item of sample test items, in-line QC items and process step items is related to the wafer test item of each residual lot in the low yield group in the database.
摘要翻译：多批晶片，批次数量多的晶片和通过执行存储在数据库中的至少一个晶片测试项目而产生的至少一个测试参数的每个批次的每个晶片被分成高产量组和低产量组。通过分析高收率组中的晶片的晶片测试参数，获得第一范围内的第一标准值。然后执行第一比较步骤，以将低产率组中每批的每个晶片测试参数与第一标准值进行比较，并将晶圆测试参数的批次数量删除在第一范围内。最后，确定低产量组中的第一批剩余批次。响应于低收益组中的第一剩余批量不等于零，执行第一搜索步骤，其中样品测试项目，在线QC项目和处理步骤项目的项目与晶片测试项目数据库中低收益组中的每个剩余批次。

9. 发明申请

US20050203858A1 METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT PREVENTION MAINTENANCE MANAGEMENT 有权
标题翻译：半导体设备预防维护管理方法与相关系统
公开(公告)号：US20050203858A1
公开(公告)日：2005-09-15
申请号：US10708572
申请日：2004-03-11
申请人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
发明人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
IPC分类号： G06F19/00 , G21C17/00
CPC分类号： H01L22/20 , G05B19/41875 , G06Q30/0283 , Y02P90/22
摘要： A method and related system for semiconductor equipment prevention maintenance management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording time and cost of prevention maintenance after each piece of equipment runs prevention maintenance, evaluating the quality of semiconductor products, and analyzing a relationship between the corresponding process parameter, the corresponding equipment parameters, prevention maintenance cost, and semiconductor products of each piece of equipment.
摘要翻译：一种半导体设备预防维护管理方法及相关系统。该方法包括记录每件设备的工艺参数，每台设备的加工记录设备参数，每台设备运行后的预防维护的评估和记录时间和成本预防维护，半导体产品的质量评估和分析相应的过程参数，相应的设备参数，预防维护成本以及每件设备的半导体产品之间的关系。

10. 发明授权

US07218981B1 Dispatch integration system and method based on semiconductor manufacturing 失效
标题翻译：基于半导体制造的调度集成系统和方法
公开(公告)号：US07218981B1
公开(公告)日：2007-05-15
申请号：US11401900
申请日：2006-04-12
申请人： Yu-Wen Ho , Hung-En Tai , Chien-Chung Chen
发明人： Yu-Wen Ho , Hung-En Tai , Chien-Chung Chen
IPC分类号： G06F19/00
CPC分类号： G05B19/4187 , G05B2219/32257 , G05B2219/45031 , Y02P90/12 , Y02P90/205
摘要： A dispatch integration method based on semiconductor manufacturing. When multiple tools are idle, idle messages are sent to a real-time dispatch system through a tool control system and a manufacturing execution system. The real-time dispatch system sorts tool parameters relating to tool efficiency based on a currently executed process using a principal component analysis method, defining weights of each tool according to the defined tool parameters and corresponding factor weights using a linear regression weight formula, calculating tool weights of each tool parameter using a linear regression weight formula, and determining a desired tool for dispatch according to the calculated tool weights.
摘要翻译：基于半导体制造的调度集成方法。当多个工具空闲时，空闲消息通过工具控制系统和制造执行系统发送到实时调度系统。实时调度系统基于使用主成分分析方法的当前执行的过程来分类与工具效率相关的工具参数，根据所定义的工具参数和相应的因子权重使用线性回归权重公式定义每个工具的权重，计算工具使用线性回归权重公式的每个工具参数的权重，以及根据所计算的工具权重确定用于调度的期望工具。

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