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1. 发明专利

JP2012242245A Raman scattering light detection device 审中-公开
标题翻译：拉曼散射光检测装置
公开(公告)号：JP2012242245A
公开(公告)日：2012-12-10
申请号：JP2011112652
申请日：2011-05-19
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： OTA CHIKASHI , NAKADA YASUSHI , UCHIHARA HIROSHI
IPC分类号： G01N21/65
摘要： PROBLEM TO BE SOLVED: To provide a Raman scattering light detection device capable of increasing Raman scattering light without allowing the poor oscillation of a laser and the damage of a sample to occur.SOLUTION: Laser light (an optical beam) is made incident from a laser light source (an incident part) 2 to a hemispherical prism (a translucent member) 1 having a sample surface 11. The laser light is reflected against the sample surface 11, reflected against a mirror (a reflection body) 31, and reflected against the sample surface 11 again. The reflection angle of the mirror 31 is adjusted not to allow optical paths to be coincident before/after the reflection, so that the laser light is reflected at a position different from the preceding time on the sample surface 11. Subsequently, the laser light is repetitively reflected by varying the reflection positions between a spherical surface part 12 with mirror coating performed thereon and the sample surface 11. The laser light is not made incident to the laser light source 2 thereby to prevent the poor oscillation of a laser. The laser light is not converged on one point in the sample S, thereby to prevent the damage of the sample S. The laser light is reflected against the sample surface 11 multiple times, so that the Raman scattering light is increased.
摘要翻译：要解决的问题：提供一种能够增加拉曼散射光的拉曼散射光检测装置，而不允许激光器的不良振荡和样品的损坏发生。
解决方案：激光（光束）从激光源（入射部分）2入射到具有样品表面11的半球形棱镜（透光构件）1上。激光被反射到样品表面11，反射到反射镜（反射体）31，并再次反射到样品表面11。调整反射镜31的反射角度，使得在反射之前/之后不使光路重合，使得激光在与样品表面11上的前一时刻不同的位置被反射。随后，激光为通过改变其上执行的镜面涂覆的球形表面部分12与样品表面11之间的反射位置重复地反射。激光不被入射到激光光源2，从而防止激光器的不良振荡。激光不会聚在样品S的一个点上，从而防止样品S的损伤。激光多次反射在样品表面11上，使得拉曼散射光增加。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2010156556A Incident optical system and raman scattering measurement apparatus 有权
标题翻译：偶发光系统和拉曼散射测量装置
公开(公告)号：JP2010156556A
公开(公告)日：2010-07-15
申请号：JP2008333541
申请日：2008-12-26
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： NAKADA YASUSHI , UCHIHARA HIROSHI
IPC分类号： G01N21/65 , G01N21/64 , G02B5/10 , G02B21/06
摘要： PROBLEM TO BE SOLVED: To provide an incident optical system and a Raman scattering measurement apparatus for correctly controlling an incident angle of totally-reflected light. SOLUTION: The incident optical system includes: a light transmitting member 11 having a planar sample surface 111 and a hemispherical curved surface 112; and a parabolic mirror 12 having a reflection surface 121 as a portion of a rotational parabolic surface 122. The curved surface 112 faces the reflection surface 121. The center of a sphere on the sample surface 111 corresponds to a focus 125 of the rotational parabolic surface 122. A laser light flux (a light flux) L is parallel to a rotational symmetric axis 123 of the rotational parabolic surface 122, reflected by the reflection surface 121, and collected to the focus 125 on the sample surface 111. Raman scattering light is generated from a sample S by evanescent light generated by a total internal reflection of the laser light L on the sample surface 111. Since an optical axis of the laser light L is moved in the direction in which it approaches or leaves the rotational symmetric axis 123, the incident angle of the laser light L to the sample surface 111 can be changed. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于正确控制全反射光的入射角的入射光学系统和拉曼散射测量装置。解决方案：入射光学系统包括：具有平面样品表面111和半球形曲面112的透光构件11; 以及具有作为旋转抛物面122的一部分的反射面121的抛物面镜12.曲面112面向反射面121.样品表面111上的球的中心对应于旋转抛物面的焦点125 激光束（光束）L平行于旋转抛物面122的旋转对称轴123，由反射面121反射，并被聚集到样品表面111上的焦点125上。拉曼散射光通过由样品表面111上的激光L的全内反射产生的ev逝光从样品S产生。由于激光L的光轴在接近或离开旋转对称轴123的方向上移动可以改变激光L到样品表面111的入射角。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2008064460A Elemental analysis method and apparatus of sample melted in inert gas atmosphere 有权
标题翻译：空气分析方法和装置气体大气中的样品
公开(公告)号：JP2008064460A
公开(公告)日：2008-03-21
申请号：JP2006239132
申请日：2006-09-04
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： YOSHIDA TOMOYUKI , UCHIHARA HIROSHI , SAKAKURA SEIJI
IPC分类号： G01N1/22
摘要： PROBLEM TO BE SOLVED: To provide an elemental analysis method and apparatus for measuring by selectively removing and treating a hydrocarbon from coexisting gas components without having influence on the measurement of other coexisting components, in an elemental analysis for measuring nitrogen or a plurality of elements including nitrogen in a sample containing a lot of hydrogen.
SOLUTION: The elemental analysis apparatus for measuring an element in a sample melted in an inert gas atmosphere comprises: a secondary treatment passage for performing a given secondary treatment of a sample gas obtained by the melting treatment; and a decomposition treatment part containing a platinum-carbon catalyst and a heating means in the secondary treatment passage.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：待解决的问题：提供一种元素分析方法和装置，用于通过从共存气体组分中选择性地除去和处理烃而不影响其他共存组分的测量来测量，在用于测量氮或多个元素的元素分析中的元素，包括含有大量氢的样品中的氮。解决方案：用于测量在惰性气体气氛中熔化的样品中的元素的元素分析装置包括：对通过熔融处理获得的样品气体进行二次处理的二次处理通道; 以及在二次处理通道中含有铂 - 碳催化剂和加热装置的分解处理部分。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2007240156A Sample vaporizer for analyzer, and icp analyzer 有权
标题翻译：分析仪样品蒸发器和ICP分析仪
公开(公告)号：JP2007240156A
公开(公告)日：2007-09-20
申请号：JP2006058684
申请日：2006-03-03
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： UCHIHARA HIROSHI , SAKAKURA SEIJI , IKEDA MASAHIKO , HASHIMOTO FUMIHISA , KATAOKA HIROKO
IPC分类号： G01N21/73 , G01N1/00 , G01N1/28 , G01N27/62
摘要： PROBLEM TO BE SOLVED: To provide an excellent sample vaporizer for an analyzer capable of preventing sample gas including a sample component from remaining in a chamber, drawing out the sample gas effectively to the analyzer, and contributing to highly accurate component analysis.
SOLUTION: This vaporizer is equipped with the chamber 1 equipped with an insertion port 111 capable of inserting the tip side of a tweezers P therefrom; a hollow part 231 arranged in the chamber 1, for placing thereon a sample supplied from the tweezers P; a gas introduction port 31 for introducing gas into the chamber 1; and a sample draw-out port 51 facing to just upper side of the hollow part 231, and close approximately to the limit to the hollow part 231 in the degree of not interfering with the tip part of the tweezers P inserted from the insertion port 111, for vaporizing the sample placed on the hollow part 231 by utilizing the gas and drawing it to the outside of the chamber 1.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于能够防止包括样品组分的样品气体留在室中的分析器的优异的样品蒸发器，将样品气体有效地抽出到分析器中，并且有助于高精度的组分分析。解决方案：该蒸发器装备有装有能够从其中插入镊子P的末端侧的插入口111的腔室1; 布置在腔室1中的中空部分231，用于放置从镊子P提供的样品; 用于将气体引入室1中的气体导入口31; 以及面向中空部231的正上方的样品引出口51，并且以不与插入口111插入的镊子P的前端部不干扰的程度接近中空部231的极限，用于通过利用气体将放置在中空部分231上的样品蒸发并将其抽吸到室1的外部。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2005172539A Dipping type ion electrode 审中-公开
标题翻译： DIPPING型离子电极
公开(公告)号：JP2005172539A
公开(公告)日：2005-06-30
申请号：JP2003411242
申请日：2003-12-10
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： UCHIHARA HIROSHI
IPC分类号： G01N27/30 , G01N27/36 , G01N27/414 , G01N27/416
摘要： PROBLEM TO BE SOLVED: To maintain high measurement precision even for long-term use by decreasing wetting properties with liquid to be measured on the outer surface of an electrode body for suppressing adhesion, and easily and reliably removing an adhesive residual liquid. SOLUTION: In a dipping type glass electrode 10, an internal liquid 2 and an internal electrode 3 are enclosed in the electrode body 1, a glass thin-film section (response section) 4 is formed at the tip of the electrode body 1, and the pH concentration of the liquid to be measured is measured by dipping the electrode body 1 into the liquid to be measured. In the dipping type glass electrode 10, the outer surface section of the electrode body 1 excluding the glass thin-film section 4 at the tip is covered with a coating film (water repellent film) 7 made of fluororesin. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：即使长期使用，通过在电极体的外表面上减少被测液体的润湿性能来保持高的测量精度，以抑制粘附，并且容易且可靠地除去粘合剂残留液体。解决方案：在浸渍型玻璃电极10中，内部液体2和内部电极3被包围在电极体1中，玻璃薄膜部（响应部）4形成在电极体的前端 1，通过将电极体1浸入待测液体来测定待测液体的pH浓度。在浸渍型玻璃电极10中，除了末端的玻璃薄膜部4以外的电极体1的外表面部分被由氟树脂制成的涂膜（防水膜）7覆盖。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2004205230A Preparatory reducing furnace and pretreatment method for silicon sample using the same 审中-公开
公开(公告)号：JP2004205230A
公开(公告)日：2004-07-22
申请号：JP2002371286
申请日：2002-12-24
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： UCHIHARA HIROSHI , NOGUCHI SHINTARO
IPC分类号： G01N1/22 , G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a preparatory reducing furnace capable of certainly removing the oxidation film bonded and formed to the surface of a silicon sample at the time of analysis of a very small amount of oxygen contained in the silicon sample, and to provide a pretreatment method for the silicon sample using the same.
SOLUTION: In such a state that a graphite crucible 5 housing the silicon sample 15 is provided in an impulse furnace 1, the silicon sample 15 in the graphite crucible 5 is heated at a temperature below the melting point of the silicon sample 15 while supplying an inert gas G to reduce and remove the oxidation film on the surface of the silicon sample 15.
COPYRIGHT: (C)2004,JPO&NCIPI

7. 发明专利

JP2008157895A Sample introducing device 审中-公开
标题翻译：样品介绍设备
公开(公告)号：JP2008157895A
公开(公告)日：2008-07-10
申请号：JP2006350324
申请日：2006-12-26
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： UCHIHARA HIROSHI , KATO TAKAO , TAKAGI IKUE
IPC分类号： G01N21/73 , G01N27/62
摘要： PROBLEM TO BE SOLVED: To provide a sample introducing device for introducing a sample capable of carrying out elementary analysis with high sensitivity, by an element analyzer such as an ICP mass spectrometer and an ICP emission spectrophotometer.
SOLUTION: An infrared irradiation device 5 for emitting an infrared ray to an atomizing port of a nebulizer 2 to heat the sample is provided in this sample introducing device of the present invention constituted to atomize the sample fog-likely into a cyclone chamber 1 by the nebulizer 2, and to introduce the sample from a feed port 11 of the cyclone chamber 1 into a plasm torch or the like of the element analyzer. A gas supply pipe 41 for supplying a carrier gas to the nebulizer 2 is heated by a heating part 42, and a cooling part 46 cools a feed pipe 12 and an introducing pipe 46 communicated with the feed port 11 of the cyclone chamber 1. A particle size of the sample atomized by the nebulizer 2 is reduced by this manner, and only the sample of reduced particle size is introduced into the plasma torch.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：通过诸如ICP质谱仪和ICP发射分光光度计的元素分析仪来提供用于引入能够以高灵敏度进行元素分析的样品的样品引入装置。解决方案：在本发明的样品导入装置中设置有用于将红外线发射到雾化器2的雾化口以加热样品的红外线照射装置5，其用于将样品雾化成旋风室 1，并将样品从旋风室1的进料口11引入元件分析器的等离子体喷枪等。用于向喷雾器2供给载气的气体供给管41由加热部42加热，冷却部46冷却与旋风室1的供给口11连通的供给管12和导入管46。通过这种方式减少由喷雾器2雾化的样品的粒径，并且仅将粒径减小的样品引入等离子体焰炬中。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2008157799A Element analysis method and element analyzer in sample subjected to melting treatment in oxygen atmosphere 有权
标题翻译：元素分析方法和元素分析仪在氧气处理中的应用
公开(公告)号：JP2008157799A
公开(公告)日：2008-07-10
申请号：JP2006348017
申请日：2006-12-25
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： SAKAKURA SEIJI , UCHIHARA HIROSHI
IPC分类号： G01N31/00 , G01N21/61 , G01N30/00 , G01N30/26 , G01N30/88 , G01N31/12
摘要： PROBLEM TO BE SOLVED: To provide an element analysis method and an element analyzer having high measurement accuracy, capable of securing reliability to a measured value, concerning element analysis in a sample subjected to melting treatment in an oxygen atmosphere.
SOLUTION: The element analyzer has a melting furnace 1 for installing the sample S inside and performing melting treatment thereof, an oxygen supply path 1a for supplying oxygen into the melting furnace 1, a secondary treatment system 20 for performing secondary treatment of sample gas delivered from the melting furnace 1, and a gas analyzer 2 for measuring a specific component concentration in the sample gas subjected to the secondary treatment. The element analyzer is characterized by having an adsorption treatment part 3 having activated carbon built in the secondary treatment system 20.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种元素分析方法和具有高测量精度的元件分析仪，能够确保在氧气氛中进行熔融处理的样品中的元素分析的测量值的可靠性。元件分析仪具有用于将样品S安装在其内并进行熔融处理的熔化炉1，向熔化炉1供给氧气的供氧路径1a，二次处理试样的二次处理系统20 从熔化炉1输送的气体，以及用于测定经二次处理的样品气体中的特定成分浓度的气体分析装置2。元素分析仪的特征在于具有内置于二次处理系统20中的活性炭的吸附处理部分3.权利要求：（C）2008，JPO＆INPIT

9. 发明专利

JP2008039607A Quantitative analyzing method, quantitative analyzer and program 有权
标题翻译：量化分析方法，量化分析仪和程序
公开(公告)号：JP2008039607A
公开(公告)日：2008-02-21
申请号：JP2006214826
申请日：2006-08-07
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： TANAKA SATORU , OKAYAMA JUNJI , BANDO ATSUSHI , HIRANO AKIHIRO , UCHIHARA HIROSHI
IPC分类号： G01N31/00 , G01N31/12
摘要： PROBLEM TO BE SOLVED: To perform a quantitative analysis using an HF furnace type carbon densitometor and to sharply enhance the treatment speed of quantitative analysis even if both of an ER furnace carbon densitometor and the HF furnace type carbon densitometor are used.
SOLUTION: The mass of silicon carbide containing free carbon is measured before heating and the silicon carbide containing free carbon is heated at a predetermined temperature using a muffle furnace for a predetermined time. Thereafter, the masses of the silicon carbide after heating and the mass of silicon oxide are measured and both of silicon carbide and silicon oxide are succeedingly charged in an HF furnace 51 and combusted to measure the concentration of carbon after combustion. The content of free carbon is calculated by substituting masses before and after measurement and the concentration of carbon for a model formula led out on the basis the first reaction equation obtained in the case where silicon carbide containing free carbon is heated and the second reaction equation obtained in the case where silicon carbide and silicon oxide after heating are combusted.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：使用HF炉式碳密度计进行定量分析，并且即使使用ER炉碳密度计和HF炉型碳密度计两者，也能够显着提高定量分析的处理速度。解决方案：在加热之前测量含有碳化硅的游离碳的质量，并使用马弗炉将预定时间的碳化硅含碳游离碳在预定温度下加热。此后，测量加热后的碳化硅质量和氧化硅质量，并将碳化硅和氧化硅两者在HF炉51中继续充电，并燃烧以测量燃烧后的碳浓度。游离碳的含量是通过在测量之前和之后取代质量计算的，并且基于在加热含碳化硅的游离碳的情况下获得的第一反应方程式得到的模型公式的碳浓度，并且获得第二反应方程在加热后的碳化硅和氧化硅燃烧的情况下。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2008008796A Reference electrode and composite electrode 审中-公开
标题翻译：参考电极和复合电极
公开(公告)号：JP2008008796A
公开(公告)日：2008-01-17
申请号：JP2006180452
申请日：2006-06-29
申请人： Horiba Ltd , 株式会社堀場製作所
发明人： UCHIHARA HIROSHI , NISHIO TOMOYUKI
IPC分类号： G01N27/401 , G01N27/403
摘要： PROBLEM TO BE SOLVED: To provide an excellent reference electrode capable of acquiring excellent diffusion of internal liquid in an external sample by stabilizing an outflow quantity of the internal liquid, suppressing an inter-liquid potential error caused by adhesion of the sample, and performing highly accurate measurement. SOLUTION: This reference electrode is formed on a reference electrode support tube 21 itself for storing reference electrode internal liquid 24 and an internal electrode 23 for reference provided in the reference electrode internal liquid 24, and is equipped with a plurality of liquid junction holes 2X for diffusing the reference electrode internal liquid 24 to the external sample. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种优异的参考电极，其能够通过稳定内部液体的流出量来获得外部样品中的内部液体的优异扩散，抑制由样品的粘附引起的液体间潜在误差，并执行高精度测量。该参考电极形成在参考电极支撑管21本身上，用于存储参考电极内部液体24和用于参考电极内部液体24的基准电极23，并且配备有多个液体接合部孔2X，用于将参考电极内部液体24扩散到外部样品。版权所有（C）2008，JPO＆INPIT

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