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    • 2. 发明申请
    • Ferroelectric composition, ferroelectric vapor deposition target and method of making a ferroelectric vapor deposition target
    • 铁电成分,铁电体气相沉积靶和制造铁电性气相沉积靶的方法
    • US20020132721A1
    • 2002-09-19
    • US10143318
    • 2002-05-08
    • Honeywell International Inc.
    • Jianxing LiTim ScottTamara White
    • C04B035/468C04B035/472C04B035/495
    • C23C14/3414C04B35/462C23C14/08Y10S977/775Y10S977/777Y10S977/838Y10S977/891
    • The invention comprises ferroelectric vapor deposition targets and to methods of making ferroelectric vapor deposition targets. In one implementation, a ferroelectric physical vapor deposition target has a predominate grain size of less than or equal to 1.0 micron, and has a density of at least 95% of maximum theoretical density. In one implementation, a method of making a ferroelectric physical vapor deposition target includes positioning a prereacted ferroelectric powder within a hot press cavity. The prereacted ferroelectric powder predominately includes individual prereacted ferroelectric particles having a maximum straight linear dimension of less than or equal to about 100 nanometers. The prereacted ferroelectric powder is hot pressed within the cavity into a physical vapor deposition target of desired shape having a density of at least about 95% of maximum theoretical density and a predominate maximum grain size which is less than or equal to 1.0 micron. In one implementation, the prereacted ferroelectric powder is hot pressed within the cavity into a physical vapor deposition target of desired shape at a maximum pressing temperature which is at least 200null C. lower than would be required to produce a target of a first density of at least 85% of maximum theoretical density in hot pressing the same powder but having a predominate particle size maximum straight linear dimension of at least 1.0 micron at the same pressure and for the same amount of time, and a target density greater than the first density at the lower pressing temperature is achieved.
    • 本发明包括铁电气相沉积靶和制备铁电沉积靶的方法。 在一个实施方案中,铁电物理气相沉积靶具有小于或等于1.0微米的主要晶粒尺寸,并且具有至少95%的最大理论密度的密度。 在一个实施方案中,制造铁电物理气相沉积靶的方法包括将预反应的铁电粉末定位在热压腔内。 预反应的铁电粉末主要包括具有小于或等于约100纳米的最大直线尺寸的单个预反应的铁电颗粒。 将预反应的铁电粉末在空腔内热压成所需形状的物理气相沉积靶,其具有至少约95%的最大理论密度和最大粒度小于或等于1.0微米的最大粒度。 在一个实施方案中,将预反应的铁电粉末在空腔内热压成所需形状的物理气相沉积靶,其最大压制温度比产生第一密度的靶的要求低至少200℃ 在相同的压力和相同的时间量下热压相同的粉末但具有至少1.0微米的主要粒度最大直线尺寸的至少85%的最大理论密度,并且目标密度大于第一密度 在较低的压制温度下实现。