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    • 3. 发明申请
    • FABRICATION METHOD OF LITHOGRAPHY MASK AND FORMATION METHOD OF FINE PATTERN USING THE SAME
    • 使用其的精细图案的制作方法和形成方法
    • US20100015535A1
    • 2010-01-21
    • US12333566
    • 2008-12-12
    • Ho Young SongDong You KimWon Ho JungYoung Jin ChoYoung Chun Kim
    • Ho Young SongDong You KimWon Ho JungYoung Jin ChoYoung Chun Kim
    • G03F1/00G03F7/20
    • G03F1/68G03F1/50G03F1/60
    • There is provided a method of fabricating a lithography mask, the method including: forming a transparent polymer layer on a surface of a first substrate where a convex-concave pattern is formed; separating the transparent polymer layer from the first substrate, the transparent polymer layer having a convex-concave surface formed by the convex-concave pattern of the first substrate transferred thereonto; depositing a metal thin film on the convex-concave surface; forming a viscous film on a second substrate; disposing the transparent polymer layer on the second substrate such that the viscous film and metal thin film are partially bonded together; and separating the transparent polymer layer from the second substrate such that a portion of the metal thin film bonded to the viscous film is removed, wherein a metal thin film pattern having the portion of the metal thin film removed therefrom is formed on the convex-concave surface.
    • 提供一种制造光刻掩模的方法,该方法包括:在形成凸凹图案的第一基板的表面上形成透明聚合物层; 从所述第一基板分离所述透明聚合物层,所述透明聚合物层具有由其上转印有所述第一基板的凸凹图案形成的凸凹表面; 在所述凹凸表面上沉积金属薄膜; 在第二基板上形成粘性膜; 将所述透明聚合物层设置在所述第二基板上,使得所述粘性膜和金属薄膜部分地粘合在一起; 并且将透明聚合物层与第二基板分离,使得与粘性膜结合的金属薄膜的一部分被去除,其中从其上去除了金属薄膜部分的金属薄膜图案形成在凸凹 表面。
    • 4. 发明授权
    • Fabrication method of lithography mask and formation method of fine pattern using the same
    • 光刻掩模的制作方法和使用其的精细图案的形成方法
    • US08445166B2
    • 2013-05-21
    • US12333566
    • 2008-12-12
    • Ho Young SongDong You KimWon Ho JungYoung Jin ChoYoung Chun Kim
    • Ho Young SongDong You KimWon Ho JungYoung Jin ChoYoung Chun Kim
    • G03F1/00G03F1/08G03F7/00
    • G03F1/68G03F1/50G03F1/60
    • There is provided a method of fabricating a lithography mask, the method including: forming a transparent polymer layer on a surface of a first substrate where a convex-concave pattern is formed; separating the transparent polymer layer from the first substrate, the transparent polymer layer having a convex-concave surface formed by the convex-concave pattern of the first substrate transferred thereonto; depositing a metal thin film on the convex-concave surface; forming a viscous film on a second substrate; disposing the transparent polymer layer on the second substrate such that the viscous film and metal thin film are partially bonded together; and separating the transparent polymer layer from the second substrate such that a portion of the metal thin film bonded to the viscous film is removed, wherein a metal thin film pattern having the portion of the metal thin film removed therefrom is formed on the convex-concave surface.
    • 提供一种制造光刻掩模的方法,该方法包括:在形成凸凹图案的第一基板的表面上形成透明聚合物层; 从所述第一基板分离所述透明聚合物层,所述透明聚合物层具有由其上转印有所述第一基板的凸凹图案形成的凸凹表面; 在所述凹凸表面上沉积金属薄膜; 在第二基板上形成粘性膜; 将所述透明聚合物层设置在所述第二基板上,使得所述粘性膜和金属薄膜部分地粘合在一起; 并且将透明聚合物层与第二基板分离,使得与粘性膜结合的金属薄膜的一部分被去除,其中从其上去除了金属薄膜部分的金属薄膜图案形成在凸凹 表面。