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    • 1. 发明申请
    • Workpiece processing system using a common imaged optical assembly to shape the spatial distributions of light energy of multiple laser beams
    • 工件处理系统,使用共同的成像光学组件来形成多个激光束的光能的空间分布
    • US20060114948A1
    • 2006-06-01
    • US11000330
    • 2004-11-29
    • Ho LoYunlong SunRichard HarrisBrian Baird
    • Ho LoYunlong SunRichard HarrisBrian Baird
    • H01S3/10H01S3/08
    • B23K26/067B23K26/0673
    • A workpiece processing system employs a common modular imaged optics assembly and an optional variable beam expander for optically processing multiple laser beams. In one embodiment, a laser and a fixed beam expander cooperate to produce a laser beam that propagates through a beam switching device to produce multiple laser beams that propagate along separate propagation path portions and subsequently merge into a common path portion through an imaged optics assembly and optional variable expander. The beam expander sets the shape of the laser beams in the form of a Gaussian spatial distribution of light energy. The imaged optics assembly shapes the Gaussian spatial distribution of the laser beams to form output beams of uniform spatial distribution. In an alternative embodiment, the beam switching device is removed and the laser beams propagate from separate laser sources associated with separate optional beam expanders.
    • 工件处理系统采用通用的模块化成像光学组件和用于光学处理多个激光束的可选可变光束扩展器。 在一个实施例中,激光器和固定光束扩展器协作以产生通过光束切换装置传播的激光束,以产生沿分离的传播路径部分传播并随后通过成像的光学组件并入公共路径部分的多个激光束, 可选扩展器。 光束扩展器以光能的高斯空间分布的形式设置激光束的形状。 成像光学组件对激光束的高斯空间分布进行整形,形成均匀空间分布的输出光束。 在替代实施例中,去除光束切换装置,并且激光束从与单独的可选光束扩展器相关联的分离的激光源传播。
    • 2. 发明申请
    • Semiconductor structure processing using multiple laser beam spots overlapping lengthwise on a structure
    • 使用在结构上纵向重叠的多个激光束点的半导体结构处理
    • US20050282319A1
    • 2005-12-22
    • US11051261
    • 2005-02-04
    • Kelly BrulandBrian BairdHo LoRichard HarrisYunlong Sun
    • Kelly BrulandBrian BairdHo LoRichard HarrisYunlong Sun
    • B23K26/06B23K26/067H01L21/00H01L21/26H01L21/302H01L21/324H01L21/42H01L21/461H01L21/477H01L21/84H01L23/525
    • B23K26/067B23K26/0604B23K26/0613H01L21/76894H01L23/5258H01L27/1052H01L27/10894H01L2924/0002H01L2924/00
    • Methods and systems use laser pulses to process a selected structure on or within a semiconductor substrate. The structure has a surface, a width, and a length. The laser pulses propagate along axes that move along a scan beam path relative to the substrate as the laser pulses process the selected structure. The method simultaneously generates on the selected structure first and second laser beam pulses that propagate along respective first and second laser beam axes intersecting the selected structure at distinct first and second locations. The first and second laser beam pulses impinge on the surface of the selected structure respective first and second beam spots. Each beam spot encompasses at least the width of the selected link. The first and second beam spots are spatially offset from one another along the length of the selected structure to define an overlapping region covered by both the first and the second beam spots and a total region covered by one or both of the first and second beam spots. The total region is larger than the first beam spot and also larger than the second beam spot. The method sets respective first and second energy values of the first and second laser beam pulses to cause complete depthwise processing of the selected structure across the width of the structure in at least a portion of the total region.
    • 方法和系统使用激光脉冲来处理半导体衬底上或其中的选定结构。 该结构具有表面,宽度和长度。 随着激光脉冲处理所选择的结构,激光脉冲沿着沿扫描光束路径相对于衬底移动的轴传播。 所述方法同时在所选择的结构上产生沿相应的第一和第二激光束轴线在不同的第一和第二位置与所选择的结构相交的第一和第二激光束脉冲。 第一和第二激光束脉冲冲击所选结构的表面上相应的第一和第二光束点。 每个光束点至少包含所选链接的宽度。 第一和第二光束斑点沿着所选择的结构的长度在空间上彼此偏移以限定由第一和第二光束点两者覆盖的重叠区域,以及由第一和第二光束斑点中的一个或两个覆盖的总区域 。 总区域大于第一束斑,并且大于第二束斑。 该方法设置第一和第二激光束脉冲的相应的第一和第二能量值,以便在整个区域的至少一部分中跨结构的宽度对所选结构进行完全深度处理。