专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07070650B2 Diamond film and method for producing the same 有权
标题翻译：金刚石薄膜及其制造方法
公开(公告)号：US07070650B2
公开(公告)日：2006-07-04
申请号：US10421562
申请日：2003-04-23
申请人： Hitoshi Noguchi , Yoshihiro Kubota
发明人： Hitoshi Noguchi , Yoshihiro Kubota
IPC分类号： C30B23/00
CPC分类号： C23C16/274 , C23C16/278 , C30B25/105 , C30B29/04
摘要： There is disclosed a method for producing a diamond film on a base material by a vapor phase reaction at least with introducing a raw material gas, wherein B(OCH3)3 gas is added to the raw material gas as a source of boron to be doped, and a diamond film is deposited on the base material by a vapor phase reaction utilizing the mixed raw material gas. There can be provided a method enabling easy and uniform production of a diamond film showing a low electric resistivity value with good reproducibility and few problems concerning handling such as serious bad influence on human bodies and explosiveness during the doping process.
摘要翻译：公开了至少通过引入原料气体，通过气相反应在基材上制备金刚石膜的方法，其中B（OCH 3 3）3气体作为待掺杂的硼源加入到原料气体中，并且通过利用混合原料气体的气相反应将金刚石膜沉积在基材上。可以提供一种能够容易且均匀地制造金刚石膜的方法，其具有低的电阻率值，具有良好的再现性，并且在掺杂过程中对诸如对人体的严重不良影响和爆炸性的处理问题很少。

2. 发明授权

US06465049B2 Method for preparation of diamond film 失效
标题翻译：金刚石膜的制备方法
公开(公告)号：US06465049B2
公开(公告)日：2002-10-15
申请号：US09741431
申请日：2000-12-21
申请人： Hitoshi Noguchi , Yoshihiro Kubota
发明人： Hitoshi Noguchi , Yoshihiro Kubota
IPC分类号： B05D122
CPC分类号： C23C16/274 , C23C16/0254
摘要： In subjecting a substrate of low electric conductivity to a pretreatment by holding the same within a fluidized bed of diamond particles for the formation of a diamond film on the substrate surface, a treatment method is disclosed which is capable of preventing decrease in the effect of the pretreatment. The pretreatment of the substrate is conducted within a fluidized bed of diamond particles by keeping the electrostatic potential of the substrate in the range from −1.5 to +1.5 kV. It is desirable that the relative humidity of the gas for the fluidization of diamond particles is controlled to be 40% or higher. It is more desirable that ion bombardment onto the substrate surface to effect neutralization of the electrostatic charges. The fluidizing gas is humidified preferably by using a bubbling apparatus or spraying apparatus.
摘要翻译：在将低电导率的基板保持在金刚石颗粒的流化床内以在基板表面上形成金刚石膜的情况下进行预处理，公开了一种能够防止在基板表面上形成金刚石膜的处理方法预处理。通过将衬底的静电电位保持在-1.5至+ 1.5kV的范围内，在金刚石颗粒的流化床内进行衬底的预处理。金属颗粒的流化气体的相对湿度优选为40％以上。更希望离子轰击到衬底表面上以实现静电电荷的中和。流化气体优选通过使用鼓泡装置或喷雾装置进行加湿。

3. 发明授权

US5308567A Method for the preparation of a resin membrane 失效
标题翻译：树脂膜的制备方法
公开(公告)号：US5308567A
公开(公告)日：1994-05-03
申请号：US908452
申请日：1992-07-06
申请人： Meguru Kashida , Yoshihiro Kubota , Yoshihiko Nagata , Hitoshi Noguchi
发明人： Meguru Kashida , Yoshihiro Kubota , Yoshihiko Nagata , Hitoshi Noguchi
IPC分类号： B29C41/12 , B29C41/28 , B29D7/01
CPC分类号： B29D7/01 , B29C41/28
摘要： A method is proposed for the preparation of a resin membrane suitable for use, for example, as a covering pellicle of a photolithographic mask for patterning of semiconductor devices in the electronic industry. The method comprises the steps of: (a) coating a continuous-length substrate with a solution of the resin by using a roller coater to form a coating layer of the resin solution; (b) drying the coating layer by evaporating the solvent to form a dry resin film on the substrate surface; and (c) peeling the resin film from the surface of the substrate, preferably, in water.
摘要翻译：提出了一种用于制备适用于电子工业中用于图案化半导体器件的光刻掩模的覆盖薄膜的树脂膜的方法。该方法包括以下步骤：（a）使用辊式涂布机用树脂溶液涂布连续长度的基材以形成树脂溶液的涂层; （b）通过蒸发溶剂干燥涂层以在基材表面上形成干树脂膜; 和（c）优选在水中从树脂膜的表面剥离树脂膜。

4. 发明授权

US5199055A X-ray lithographic mask blank with reinforcement 失效
标题翻译： X光平版印刷掩模板加强
公开(公告)号：US5199055A
公开(公告)日：1993-03-30
申请号：US908330
申请日：1992-07-06
申请人： Hitoshi Noguchi , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
发明人： Hitoshi Noguchi , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
IPC分类号： G03F1/22 , G03F7/20 , G21K1/06 , H01L21/027
CPC分类号： G03F1/22 , G03F7/70866 , G21K1/06
摘要： Proposed is a high-precision X-ray lithographic mask blank with reinforcement free from warping or distortion. The mask blank is an integral body comprising: (a) a frame made from a silicon wafer; (b) a membrane of an X-ray permeable material such as silicon carbide adhering to and supported by one surface of the frame; and (c) a reinforcing member made from a single crystal of silicon adhesively bonded to the other surface of the frame with (d) a layer of silicon oxide intervening between the frame and the reinforcing member. The mask blank can be prepared in a process of first forming a layer of silicon oxide on the surface of the silicon wafer and/or reinforcing member prior to deposition of the X-ray permeable film on the silicon wafer and heating them together at a temperature of 800.degree. C. or lower while they are in direct contact with each other with the silicon oxide layer intervening therebetween.
摘要翻译：提出了一种高精度的X光平版印刷掩模，无需翘曲或变形。掩模坯料是一体的主体，其包括：（a）由硅晶片制成的框架; （b）附着在框架的一个表面并由其支撑的诸如碳化硅的X射线透过材料的膜; 和（c）由硅的单晶制成的加强构件，其与（d）介于框架和加强构件之间的氧化硅层粘合地结合到框架的另一个表面。掩模坯料可以在将X射线透过膜沉积在硅晶片上之前首先在硅晶片和/或加强元件的表面上形成氧化硅层的过程中制备，并在温度 800℃以下，同时它们彼此直接接触，其间介于其间的氧化硅层。

5. 发明授权

US06509124B1 Method of producing diamond film for lithography 失效
标题翻译：制作光刻用金刚石薄膜的方法
公开(公告)号：US06509124B1
公开(公告)日：2003-01-21
申请号：US09705709
申请日：2000-11-06
申请人： Hitoshi Noguchi , Yoshihiro Kubota , Ikuo Okada
发明人： Hitoshi Noguchi , Yoshihiro Kubota , Ikuo Okada
IPC分类号： G03F900
CPC分类号： C23C16/274 , C23C16/01 , C23C16/0254 , C23C16/277 , G03F1/20
摘要： There is disclosed a method for producing a diamond film for lithography wherein a diamond film is formed on a silicon substrate on which an insulating film is formed or on an insulating substrate using a mixed gas of methane gas, hydrogen gas and oxygen gas as a raw material gas, and then the substrate is removed by etching treatment, and a method of producing a mask membrane for lithography wherein diamond particles fluidized with gas are brought into contact with a surface of a silicon substrate on which an insulating film is formed or an insulating substrate, a diamond film is grown on the substrate, and then the substrate is removed by etching treatment. There can be provided a method of producing a diamond film for lithography wherein a diamond film having high crystallinity and desired membrane stress can be formed on a substrate, and the film can be easily produced without degrading smoothness, membrane stress or the like after film formation.
摘要翻译：公开了一种用于制备用于光刻的金刚石膜的方法，其中金刚石膜形成在其上形成绝缘膜的硅基板上或绝缘基板上，使用甲烷气体，氢气和氧气的混合气体作为原料然后通过蚀刻处理去除衬底，以及制造用于光刻的掩模膜的方法，其中用气体流化的金刚石颗粒与其上形成绝缘膜的硅衬底的表面接触或绝缘膜在基板上生长金刚石膜，然后通过蚀刻处理去除衬底。可以提供一种制备用于光刻的金刚石膜的方法，其中可以在基底上形成具有高结晶度和所需膜应力的金刚石膜，并且可以容易地制备膜，而不会在成膜后降低平滑度，膜应力等。

6. 发明授权

US5691088A Pellicle for protection of photolithographic mask 失效
标题翻译：用于保护光刻掩模的防护薄膜
公开(公告)号：US5691088A
公开(公告)日：1997-11-25
申请号：US949389
申请日：1992-09-22
申请人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Kimitaka Kumagae
发明人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Kimitaka Kumagae
IPC分类号： C08L83/04 , C08J7/04 , G03F1/62 , G03F7/075 , H01L21/027 , H01L21/30 , G03F9/00
CPC分类号： G03F1/62 , Y10T428/161 , Y10T428/28 , Y10T428/2852
摘要： Disclosed is a frame-supported pellicle for dust-proofing of a photolithographic photomask used for patteriwse light exposure in the manufacturing process of, for example, semiconductor devices, which comprises (a) a frame member, (b) a transparent polymeric film supported by the frame member and (c) a coating layer of a sticky adhesive on one surface of the polymeric film to capture any dust particles in the space between the photomask and the pellicle. The inventive pellicle is imparted with a greatly improved serviceable life with stability against ultraviolet irradiation relative to the adhesive coating layer which is formed from a specific organo-polysiloxane-based adhesive composition.
摘要翻译：公开了一种用于防止在例如半导体器件的制造过程中用于眩光曝光的光刻光掩模的框架支撑的防护薄膜，其包括（a）框架构件，（b）由框架构件和（c）在聚合物膜的一个表面上的粘性粘合剂的涂层以捕获光掩模和防护薄膜之间的空间中的任何灰尘颗粒。赋予本发明的防护薄膜相对于由特定的有机聚硅氧烷类粘合剂组合物形成的粘合剂涂层，具有大大改善的使用寿命，具有抗紫外线照射的稳定性。

7. 发明授权

US5286567A Pellicle for photolithographic mask 失效
标题翻译：光刻胶膜用防护薄膜
公开(公告)号：US5286567A
公开(公告)日：1994-02-15
申请号：US912792
申请日：1992-07-13
申请人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi
发明人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi
IPC分类号： C08F214/06 , B29C35/08 , B29C59/16 , C08F34/00 , C08F214/26 , C08F234/02 , G03F1/40 , G03F1/62 , H01L21/027 , B32B27/00
CPC分类号： G03F1/62 , B29C59/16 , B29C2035/0827 , B29C2035/0838 , Y10T428/31544
摘要： A pellicle for dust-proofing of a photolithographic mask used for patterning in the manufacturing process of semiconductor devices. The drawback due to dust deposition can be greatly decreased in the use of a pellicle made from a fluorocarbon resin which is a copolymer of tetrafluoroethylene and another fluorocarbon monomer capable of introducing a cyclic perfluoroether group into the molecule when the pellicle film is rendered antistatically hydrophilic, for example, by a plasma treatment.
摘要翻译：用于在半导体器件的制造过程中用于图案化的光刻掩模的防尘薄膜组件。在使用由氟树脂制成的防护薄膜树脂时，由于粉尘沉积的缺点可以大大降低，因为当防护薄膜成为抗静电亲水性时，能够将环状全氟醚基团引入到分子中的四氟乙烯与另一氟碳单体的共聚物，例如通过等离子体处理。

8. 发明申请

US20050001512A1 Surface acoustic wave device 有权
标题翻译：表面声波装置
公开(公告)号：US20050001512A1
公开(公告)日：2005-01-06
申请号：US10836201
申请日：2004-05-03
申请人： Hitoshi Noguchi , Yoshihiro Kubota
发明人： Hitoshi Noguchi , Yoshihiro Kubota
IPC分类号： C23C16/27 , H01L41/08 , H01L41/09 , H03H3/02 , H03H9/02 , H03H9/25 , H03H9/64
CPC分类号： H03H9/02582 , H03H3/08
摘要： There is disclosed a surface acoustic wave device having at least a diamond film, a piezoelectric-material film, and an electrode on a base material wherein all or some part of the diamond film consists of an electroconductive diamond in which a dopant is doped. Thereby, there can be provided a surface acoustic wave device wherein breakage of the substrate due to generation of static electricity can be prevented in a device manufacturing process so that the device manufacture yield can be increased, and electrification can be prevented at the time of real use so that high performance can be maintained for a long time, even if it is a surface acoustic wave device using diamond.
摘要翻译：公开了一种表面声波装置，其至少具有金刚石膜，压电材料膜和基材上的电极，其中金刚石膜的全部或部分由掺杂掺杂剂的导电金刚石构成。因此，可以提供一种表面声波装置，其中在器件制造过程中可以防止由于静电产生导致的基板的断裂，从而可以提高器件的制造成品率，并且可以在实际的时候防止通电使用这样的高性能可以长时间保持，即使它是使用金刚石的表面声波装置。

9. 发明授权

US5300348A Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive 失效
标题翻译：用于光刻的框架支撑防护薄膜组件，包括含有氟聚合物的基于有机聚硅氧烷的粘合剂
公开(公告)号：US5300348A
公开(公告)日：1994-04-05
申请号：US959032
申请日：1992-10-08
申请人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Shinichi Sato , Hiroshi Inomata
发明人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Shinichi Sato , Hiroshi Inomata
IPC分类号： C09J183/14 , C08G77/48 , C08G77/50 , C08J5/12 , C08L83/02 , C08L83/04 , C08L83/05 , C08L83/14 , C09J183/00 , G03F1/62 , G03F7/075 , H01L21/027 , H01L21/30 , B32B9/60
CPC分类号： G03F1/64 , Y10T428/24793 , Y10T428/3154 , Y10T428/31663
摘要： An improvement is proposed in a frame-supported pellicle consisting of a frame member and a thin transparent polymer membrane adhesively bonded to the frame member used for dustproof covering of a photomask in a photolithograpic patterning work of electronic devices. The improvement comprises using a specific fluorocarbon group-containing organosiloxane-based polymeric composition as an adhesive for adhesively bonding the frame member and the polymer membrane. This adhesive is effective even when the polymeric membrane is formed from a fluorocarbon polymer which is hardly susceptible to adhesive bonding with conventional adhesives. In addition, the adhesive bonding by use of this specific adhesive is highly durable even under irradiation with ultraviolet light.
摘要翻译：在由电子设备的光刻图案化工作中的框架构件和薄透明聚合物膜组成的框架支撑防护薄膜组合物中，提出了粘合到用于光掩模的防尘覆盖物的框架构件的薄透明聚合物膜的改进。改进之处在于使用特定的含氟烃基的有机硅氧烷类聚合物组合物作为用于粘合框架构件和聚合物膜的粘合剂。即使聚合物膜由氟碳聚合物形成，该粘合剂也是有效的，该氟碳聚合物几乎不易受与常规粘合剂粘合的影响。此外，通过使用该特定粘合剂的粘合剂即使在用紫外线照射下也是非常耐用的。

10. 发明授权

US07122938B2 Surface acoustic wave device 有权
标题翻译：表面声波装置
公开(公告)号：US07122938B2
公开(公告)日：2006-10-17
申请号：US10836201
申请日：2004-05-03
申请人： Hitoshi Noguchi , Yoshihiro Kubota
发明人： Hitoshi Noguchi , Yoshihiro Kubota
IPC分类号： H03H9/25
CPC分类号： H03H9/02582 , H03H3/08
摘要： There is disclosed a surface acoustic wave device having at least a diamond film, a piezoelectric-material film, and an electrode on a base material wherein all or some part of the diamond film consists of an electroconductive diamond in which a dopant is doped. Thereby, there can be provided a surface acoustic wave device wherein breakage of the substrate due to generation of static electricity can be prevented in a device manufacturing process so that the device manufacture yield can be increased, and electrification can be prevented at the time of real use so that high performance can be maintained for a long time, even if it is a surface acoustic wave device using diamond.
摘要翻译：公开了一种表面声波装置，其至少具有金刚石膜，压电材料膜和基材上的电极，其中金刚石膜的全部或部分由掺杂掺杂剂的导电金刚石构成。因此，可以提供一种表面声波装置，其中在器件制造过程中可以防止由于静电产生导致的基板的断裂，从而可以提高器件的制造成品率，并且可以在实际的时候防止通电使用这样的高性能可以长时间保持，即使它是使用金刚石的表面声波装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式