专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2003017541A Yield estimation method, yield estimation program, and yield estimation system for thin film product 审中-公开
标题翻译： YIELD估算方法，YIELD估计程序和薄膜产品的评估系统
公开(公告)号：JP2003017541A
公开(公告)日：2003-01-17
申请号：JP2001200302
申请日：2001-07-02
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： KIRINO KEIKO , ONO MAKOTO , IWATA HISAFUMI , HAMAMURA YUICHI , KUMAZAWA TAKAAKI
IPC分类号： H01L21/66 , H01L21/82
摘要： PROBLEM TO BE SOLVED: To implement a higher-precision and more rational technique for analyzing the yield caused by occurred defects by using layout data in the field of manufacturing thin film product.
SOLUTION: The determination of how critical a defect on a layout of a thin film product is performed by calculating the distance of a coordinate of the occurred defect from a graphical vector on the layout. A minimum distance connecting to two different graphics at the same time is determined as a critical defect dimension, and the determination result is stored, thus when a request is made for estimation and computation of the yield of defect cause, a critical probability of defect dimension is calculated from a ratio indicating a certain defective dimension which most probably causes a defect, and the yield estimation result is provided in real time from a defect distribution. The aforementioned estimation of the yield of defect cause in an easy way before product manufacturing allows changing to a layout designed to be resistant to defect, and managing quantitatively the relationship between cleanliness and yield of manufacturing process.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：通过使用制造薄膜产品领域的布局数据，实现更高精度更合理的技术来分析由发生的缺陷引起的产量。解决方案：通过从布局图形矢量中计算发生的缺陷坐标的距离来确定薄膜产品的布局上的缺陷的关键程度。将两个不同图形同时连接的最小距离确定为临界缺陷维度，并且确定结果被存储，因此当提出要求用于估计和计算缺陷原因的产量时，缺陷维度的临界概率由指示一定缺陷维度的比率计算出，其最可能导致缺陷，并且从缺陷分布实时提供产量估算结果。在产品制造之前，上述对缺陷产率的估计以简单的方式导致可以改变为设计为抗缺陷的布局，并且定量地管理清洁度和制造过程的产量之间的关系。

2. 发明专利

JP2004326637A Intellectual document retrieval system 审中-公开
公开(公告)号：JP2004326637A
公开(公告)日：2004-11-18
申请号：JP2003123136
申请日：2003-04-28
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISHIKAWA SEIJI , KIRINO KEIKO , FUKUI MUNETOSHI , SUGIMOTO ARITOSHI
IPC分类号： G06F17/30
摘要： PROBLEM TO BE SOLVED: To facilitate document grouping and document retrieval in a document group, thereby attaining not only sharing of results but also sharing of the process of technique formation and experience accumulation to make it easy to pass down techniques and experiences.
SOLUTION: Information such as data, an individual summary material, and a formal registration material is added as attributes of a document, and correlation information such as basis data, a document reference and a summary is registered as a relationship between documents. The relationship between the documents is networked and visualized by the correlation information, and skeletonization of displaying only documents having a designated attribute is carried out at the time of display.
COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JPH08286722A OFF-LINE TEACHING METHOD USING CAD DATA AND ITS SYSTEM 失效
公开(公告)号：JPH08286722A
公开(公告)日：1996-11-01
申请号：JP8947595
申请日：1995-04-14
申请人： HITACHI LTD
发明人： KIRINO KEIKO , YAMAGUCHI KAZUO , OHARA KOICHIRO , KAMIYA NORIYUKI
IPC分类号： G05B19/4097
摘要： PURPOSE: To provide an off-line teaching method using the CAD data which can extremely simplify the input jobs of an operator and also to provide a system which can accurately carry out the off-line teaching method. CONSTITUTION: When an operator inputs the teaching data through a teaching data input means 2, an initialization generation means 3 generates the job environment data based on the input teaching data. Then a job path generation means 5 roughly generates true job path data on a control object equipment, and a job operation generation means 12 generates the job operation data on the control object equipment. A control program generation means 14 generates a control program, and a control program output device 16 outputs the control program and drives the control object equipment. Therefore, it is not required for the operator to successively input the initialization data, the job path data and the job operation data respectively.

4. 发明专利

JPH11219996A THIN FILM QUALITY COMPREHENSIVE ANALYSIS SUPPORT SYSTEM 失效
公开(公告)号：JPH11219996A
公开(公告)日：1999-08-10
申请号：JP2062898
申请日：1998-02-02
申请人： HITACHI LTD
发明人： KIRINO KEIKO
IPC分类号： H01L21/66
摘要： PROBLEM TO BE SOLVED: To allow efficient failure analysis, by providing effective combination of failure analysis attribute and analysis tool and assay tool. SOLUTION: A storage device 4 comprises a characteristics factor knowledge data 1 where factor items related to target factor for each process are accumulated, an analysis tool knowledge data 2 where an analysis tool information usable for each type of data, and an assay tool knowledge data 3 where an assay tool information assayable for each data to be a factor are accumulated. A control device 9 deduces a factor based on the characteristics factor knowledge data 1 by user's input of abnormality causing factor, deduces an analysis tool corresponding to each of interested factor based on the analysis tool knowledge data 2, deduces an assay tool corresponding to each of interested factor based on the assay tool knowledge data 3, and outputs it to an output device.

5. 发明专利

JPH10275842A MANUFACTURE OF THIN-FILM PRODUCT AND PRODUCTION LINE CONTROL SYSTEM FOR THIN-FILM PRODUCT 失效
公开(公告)号：JPH10275842A
公开(公告)日：1998-10-13
申请号：JP7992797
申请日：1997-03-31
申请人： HITACHI LTD
发明人： KIRINO KEIKO
IPC分类号： C23C14/54 , C23F4/00 , H01L21/02 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To quickly find a malfunctioning manufacturing equipment and to shorten failure analysis time so as to enhance a thin-film product in yield by a method, wherein a processing reliability level is given to each manufacturing equipment corresponding to its processing history to a work, and a production line is maintained or controlled at the processing reliability level given to the manufacturing equipment corresponding to their histories. SOLUTION: A manufacturing equipment condition monitoring system 13 calculates the processing reliability level of each manufacturing equipment which is classified by a processing condition which it targets, based on at least one or more data out of various data controlled by a host system 12, the calculated processing reliability level data of each manufacturing equipment for each processing history is controlled. The manufacturing equipment condition monitoring system 13 provides the processing reliability level data of a manufacturing equipment at a starting point, corresponding to a work processing starting history to a user. Based on the data, the user is capable of carrying out a failure analysis at which a manufacturing facility problem process was carried out is located, when there is abnormality in a work.

6. 发明专利

JPH0916550A METHOD AND DEVICE FOR SUPPORTING ASSEMBLING PROCESS DESIGN 失效
公开(公告)号：JPH0916550A
公开(公告)日：1997-01-17
申请号：JP16329695
申请日：1995-06-29
申请人： HITACHI LTD
发明人： KIRINO KEIKO
IPC分类号： G06F17/50 , B23P21/00 , G06F17/00 , G06F19/00 , G06Q50/00 , G06Q50/04
摘要： PURPOSE: To utilize assembling information data and assembling process data for a manufacturing preparation by combining data, to present an assembling work instruc tion to an assembling worker and to use assembling process bottle neck item data contents when the examination and the design request are performed for a designer. CONSTITUTION: This device is composed of a three-dimensional CAD system 13, an assembling information data preparation part 14, a design supporting computer 10, an assembling process data preparation part 23, a manual aid assembling work process execution part 25, an automatic assembling work process execution part 26, an assembling process edition part 24, an assembling process design supporting computer 20, a video display equipment 35, a video display equipment control part 32, location/ attitude detectors 36a, to 36c, location/attitude detector control part 33, manual operation detectors 37a and 37b, a manual operation detector control part 34, a virtual space processing computer 30 having a virtual space processing data control part 31 controlling each of these control parts, a three-dimensional CAD data base 40, an assembling information data base 41, a manufacturing information data base 42, an assembling process bottle neck item data base 43 and an assembling process data base 44.

7. 发明专利

JP2002141384A INSPECTION SYSTEM AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE 失效
公开(公告)号：JP2002141384A
公开(公告)日：2002-05-17
申请号：JP2000334915
申请日：2000-10-30
申请人： HITACHI LTD
发明人： ONO MAKOTO , IWATA HISAFUMI , KIRINO KEIKO
IPC分类号： G01B11/30 , G01N21/95 , G01N21/956 , G06T1/00 , H01L21/00 , H01L21/66 , H01L21/82 , H01L21/822 , H01L27/04
摘要： PROBLEM TO BE SOLVED: To provide a method and a system for preferentially analyzing a defect with the possibility of becoming an electrical failure in the inspection of the foreign matter and pattern defect of a work forming an electronic device such as a semiconductor integrated circuit. SOLUTION: Defect map data are read in a defect map data read processing 11 and failure probability data are read in a failure probability data read processing 12. Then, in a failure probability calculation processing 13 for each defect, the failure probability of each defect in the defect map data is calculated and the defect map data with the failure probability are prepared. Further, in a review object selection processing 14, the defects are aligned and narrowed from the defect map data with the failure probability and a review object is selected.

8. 发明专利

JP2002006935A MANUFACTURING SYSTEM AND MANUFACTURING MANAGEMENT SYSTEM 失效
公开(公告)号：JP2002006935A
公开(公告)日：2002-01-11
申请号：JP2000192663
申请日：2000-06-22
申请人： HITACHI LTD
发明人： KIRINO KEIKO
IPC分类号： G05B19/418 , G06Q10/00 , G06Q10/06 , G06Q10/10 , G06Q50/00 , G06Q50/04 , G06F17/60
摘要： PROBLEM TO BE SOLVED: To support observance of a development schedule to shorten a development term by performing progress prediction/determination/instructions of the development schedule for development products particularly, in a field of manufacturing of film products. SOLUTION: The manufacturing management system has the following means. There are integrated management data of lot progress collected from a manufacturing line, progress prediction data found by a progress prediction simulation, and development schedule data including a progress plan for development lot planned every kind of the development products and relation between lots, to unify and manage progress data of plan/results/prediction. Based on relation between the development lots which affects the whole development project, there is determined the progress of the mutually related lot by a difference between target speed necessary for observing a due date of a specific lot and prediction speed. There is set lot priority for observing progress up to a checkpoint, an operation order is instructed to an actual line, to manufacture.

9. 发明专利

JP2003263462A INFORMATION PROCESSOR AND DATA MANAGING METHOD 审中-公开
公开(公告)号：JP2003263462A
公开(公告)日：2003-09-19
申请号：JP2002062878
申请日：2002-03-08
申请人： HITACHI LTD
发明人： KIRINO KEIKO , ISHIKAWA SEIJI
IPC分类号： G06F17/30
摘要： PROBLEM TO BE SOLVED: To allow a plurality of users to utilize communized and computerized data in a more effective manner. SOLUTION: A knowledge management server 1202 holds a knowledge description file with knowledge information described therein including link information expressing referential relations among computerized data belonging to a document group for each of groups which a plurality of computerized data belong to, the data being accessible via a network. When the server 1202 receives retrieval conditions 13 on a document group from a client, knowledge information 14 including link information of a document group agreeing with the retrieval conditions is taken out of the description file and the knowledge information 14 is sent back to the client. COPYRIGHT: (C)2003,JPO

10. 发明专利

JP2000218477A PRODUCTION MANAGING SYSTEM 失效
公开(公告)号：JP2000218477A
公开(公告)日：2000-08-08
申请号：JP1662699
申请日：1999-01-26
申请人： HITACHI LTD
发明人： KIRINO KEIKO , ICHINOSE TOSHIAKI , KASHI SATOSHI , TAKEO YOSHIHISA
IPC分类号： B23Q41/08 , G05B19/418 , G06F19/00 , G06Q50/00 , G06Q50/04 , G06F17/60
摘要： PROBLEM TO BE SOLVED: To strictly keep the initial development schedule by comprising a means for centralizationally managing the progress data of plan, result, prediction, determining the lot priority considering the relationship of the development lots having the influence to the total development plan, and giving the instruction of working to an actual line for the manufacturing. SOLUTION: A progress prediction simulation means 7 executes the progress prediction simulation by using the initial priority of each production lot in a case of a mixture line with products, and automatically changes the interim priority on the basis of the difference between the planned date of the termination of the commencement in the final prodess and the due date. The development schedule setting/managing means 8 uses the lot information data 9 and the process development staff data 13, and the development manager of every developed product forms the data on the purpose (main body, working advance, back-up and the like) of the development lot, and the link relationship among the planned date of the start of commencement, the planned date of the termination of commencement and the lot, and the like, and registers the same in the development schedule data 14.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式