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    • 1. 发明专利
    • JPH05338729A
    • 1993-12-21
    • JP15037492
    • 1992-06-10
    • HITACHI LTDHITACHI NAKA ELECTRON KK
    • SAKAMOTO SHOZOAKAE TSUTOMUWAKIYAMA FUMITOSHITAKAHASHI NOBUYUKI
    • B65G1/06H01L21/677H01L21/68
    • PURPOSE:To provide a device which eliminates erroneous transfer of a wafer by moving a pair of wafer holding mechanisms in a vertical direction to a wafer flat surface while interlocking with the respective mechanisms, and mounting a wafer groove positioning mechanism which is provided with a position engaging with the positional reference of a wafer inserting groove in a wafer cassette. CONSTITUTION:Each of a pair of wafer holding sliders 5 can be moved only in a vertical direction to a wafer flat surface on a slider shaft 13, and interlock wafer holding mechanisms 3 through a wafer holder rotating shaft 12 without gaps. Besides, at least one conical projection 9 is provided on the respective surfaces of the wafer holder sliders 5 which faces a guide hole 10 in a cassette. The cassette guide hole 10 is formed so that the conical projection can be guided smoothly without gaps at the time of engagement. Because the wafer inserting groove 4 and the wafer guide groove 11 are held at an optimum position, it is thus possible to replace wafers smoothly even if these grooves do not meet each other before replacing the wafer.
    • 4. 发明专利
    • Multisensing ion selection fet
    • 多功能离子选择FET
    • JPS59217149A
    • 1984-12-07
    • JP9072983
    • 1983-05-25
    • Hitachi Ltd
    • AKAE TSUTOMUWATANABE MAKOTO
    • G01N27/00G01N27/414G01N27/30
    • G01N27/414
    • PURPOSE:To elevate the integration without degrading characteristics such as sensitivity and S/N ratio by arranging one source in common to a plurality of ion selection sensitive film to increase the integration of an ISFET with a reduced ratio of the source area to the total area. CONSTITUTION:A common source 2 and drains 11-14 are formed on a P type Si substrate and an SiO2 film 3 and an Si3N4 film 4 are attached thereon to make an insulator, on which Na selection sensitive film 31, a K selection sensitive film 32, a Co selection sensitive film 33 and a Cl selection sensitive film 34 are formed. In other words, the source 3 is arranged in common to reduce the ratio thereof 2 to the total area thereby elevating the sensitivity with an higher area ratio of the sensitive films 31-34. In addition, drains 11-14 of individual sesitive sections are arranged between a part of the common source 2 to improve the shield effect and the S/N ratio.
    • 目的:通过将多个离子选择敏感膜共同设置一个源来提高集成度,而不会降低灵敏度和信噪比等特性,从而增加ISFET与源区域与总区域的比例降低的积分 。 构成:在P型Si衬底上形成共同的源极2和漏极11-14,并且在其上附着有SiO 2膜3和Si 3 N 4膜4,以形成绝缘体,在其上形成Na +选择敏感膜31,K 选择感光膜32,Co ++选择敏感膜33和Cl - 选择敏感膜34。 换句话说,源3被共同布置,以将其比例2减小到总面积,从而以敏感膜31-34的较高面积比提高灵敏度。 此外,在公共源2的一部分之间设置单个节段的排水口11-14,以提高屏蔽效果和S / N比。
    • 7. 发明专利
    • Method for controlling concentrating vessel
    • 控制集装箱船的方法
    • JPS57127401A
    • 1982-08-07
    • JP1022381
    • 1981-01-28
    • Hitachi Ltd
    • AKAE TSUTOMU
    • B01D1/00
    • PURPOSE: To control the conc. of concd. liquid in correspondence to the fluctuations in the rate of treatment by comparing an optimum inflow steam rate and a max. suppliabale steam rate, adjusting the inflow steam rate and adjusting the inflow rate of raw liquid in accordance with the optimum flow rate for raw liquid.
      CONSTITUTION: Raw liquid F is fed to a concentrating vessel 1, and the resultant concd. liquid T is discharged. The flow rate and concd. of the liquid F are outputted from transmitters 2, 4 to an operator 14, which operates an optimum inflow steam flow rate together with a set value of the concn. of the concd. liquid, and outputs the same to an L-selector 19 via a correction operator 17. Also, the concn. of raw liquid and an inflow steam flow rate are outputted from transmitters 4, 7 to an operator 15, which calculates an optimum flow rate of raw liquid together with a set value of concn. of the concd. liquid, and outputs the optimum flow rate of raw liquid via a correction operator 18 to the L-selector 19. The L-selector 19 adjusts the inflow rate of the raw liquid with a control valve 3 from these sets of information and the max. suppliable inflow steam rate of a setter 13, and adjusts the steam inflow rate with a control valve 6 thereby controlling the concn. of the concd. liquid.
      COPYRIGHT: (C)1982,JPO&Japio
    • 目的:控制浓缩 的concd 通过比较最佳流入蒸汽速率和最大流量来对应于处理速率波动的液体。 供应蒸汽速率,根据原液的最佳流量调节流入的蒸汽速率并调节原液的流入速率。 构成:将原液F送入浓缩容器1, 液体T被排出。 流量和浓度 液体F从发射器2,4输出到操作器14,操作器14将最佳流入蒸汽流量与浓缩物的设定值一起运行。 的concd。 并通过校正算子17将其输出到L选择器19。 原料液体和流入蒸汽流量从发射器4,7输出到操作器15,操作器15计算原液的最佳流量以及浓度的设定值。 的concd。 液体,并通过校正操作器18将原液的最佳流量输出到L选择器19.L选择器19从这些信息集合中调节具有控制阀3的原液的流入速率。 设定器13的可供给的流入蒸汽速率,并且利用控制阀6调节蒸汽流入速率,从而控制冷凝器13的浓度。 的concd。 液体。