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1. 发明专利

JP2008276168A Liquid crystal display device with evaluation pattern disposed thereon, and method for manufacturing the same 有权
标题翻译：具有评估图案的液晶显示装置及其制造方法
公开(公告)号：JP2008276168A
公开(公告)日：2008-11-13
申请号：JP2007271261
申请日：2007-10-18
申请人： Hitachi Displays Ltd , 株式会社日立ディスプレイズ
发明人： ISHIKAWA SEIJI , MATSUURA HIROYASU , HAMAMURA YUICHI , WACHI TADAMICHI
IPC分类号： G03F9/00 , G02F1/13
摘要： PROBLEM TO BE SOLVED: To solve such problems that direct exposure equipment having multiple heads generally conducts overlapping exposure at an exposure area boundary between heads, however, if the heads are misaligned, a flaw will occur in a pattern shape at an area that is subject to overlapping exposure.
SOLUTION: TEGs (test element groups) are disposed for evaluating line width and resistance at an overlapping exposure area between the exposure heads and at a returning exposure area formed when direct exposure equipment having a multi-head configuration exposes a substrate. By catching changes in measured values, misalignment in the multiple exposure heads can be detected.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题为了解决这样的问题，即具有多个头部的直接曝光设备通常在头部之间的曝光区域边界处进行重叠曝光，但是如果头部未对准，则在区域的图案形状中将出现缺陷这是接触重叠的。解决方案：设置TEG（测试元件组）以评估曝光头之间的重叠曝光区域和在具有多头构造的直接曝光设备暴露基板时形成的返回曝光区域的线宽和电阻。通过捕获测量值的变化，可以检测多个曝光头中的未对准。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2009210843A Substrate manufacturing method and manufacturing system 有权
标题翻译：基板制造方法及制造系统
公开(公告)号：JP2009210843A
公开(公告)日：2009-09-17
申请号：JP2008054247
申请日：2008-03-05
申请人： Hitachi Displays Ltd , 株式会社日立ディスプレイズ
发明人： WACHI TADAMICHI , ISHIKAWA SEIJI , OIDA JUN , MURAMATSU YOSHINORI , MATSUURA HIROYASU
IPC分类号： G03F9/00
摘要： PROBLEM TO BE SOLVED: To provide a substrate manufacturing method reducing the misalignment between an upper layer and a lower layer even when there is substrate distortion and work-starting exposure apparatuses for the upper and lower layers have apparatus dependence in exposure distortion, in the manufacture of substrate for forming a pattern on the substrate, and to provide a system thereof.
SOLUTION: A corrected exposure pattern for the next work-starting lot is prepared from exposure distortion data of the mask-less exposure apparatus exposing the upper layer, alignment log data of a previous-work-start lot, and misalignment inspection data on the misalignment of the upper and lower layers of the previous-work-start lot, and the corrected exposure pattern is exposed by using the mask-less exposure apparatus.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供即使存在基板变形也减小上层和下层之间的未对准的基板制造方法，上层和下层的起始曝光装置具有设备对曝光失真的依赖性，在用于在衬底上形成图案的衬底的制造中，并提供其系统。解决方案：根据暴露上层的无掩护曝光装置的曝光失真数据，前工作批次的对准对数数据和未对准检查数据，准备下一个起始批次的校正曝光图案在前工作批次的上层和下层的未对准上，并且通过使用无掩模曝光装置曝光校正的曝光图案。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2010271695A Exposure adjusting method and method of manufacturing liquid crystal display 审中-公开
标题翻译：曝光调整方法及制造液晶显示方法
公开(公告)号：JP2010271695A
公开(公告)日：2010-12-02
申请号：JP2010050965
申请日：2010-03-08
申请人： Hitachi Displays Ltd , 株式会社日立ディスプレイズ
发明人： WACHI TADAMICHI , MIYAZAKI TAKAHIRO , ISHIKAWA SEIJI , MIWA TOSHIHARU , OIDA ATSUSHI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To improve accuracy of exposure.
SOLUTION: Each of first exposure and second exposure is performed by scanning exposure of an exposure head 16 emitting a plurality of light beams. A first film pattern 30 is formed to include a pair of first film marks 32. A second film pattern 48 is formed to include a pair second film marks 50. A process for detecting misregistration includes: measurement of the position of the center point of each of the first film marks 32, measurement of the position of the center position of each of the second film marks 50, calculation of a first angle between a first straight line connecting the centers of a pair of first film marks 32 together and a reference straight line along the auxiliary scanning direction, and calculation of a second angle between a second straight line connecting the centers of a pair of second film marks 50 and the reference straight line. A process for adjusting includes rotation of the exposure head 16, which is used in at least one of the first exposure and the second exposure, in the direction to eliminate a difference between the first angle and the second angle.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提高曝光的准确性。解决方案：通过扫描曝光多个光束的曝光头16进行第一次曝光和第二次曝光。第一胶片图案30形成为包括一对第一胶片标记32.第二胶片图案48形成为包括一对第二胶片标记50.检测重合失调的方法包括：测量每个第一胶片标记的中心点的位置第一胶片标记32的测量，每个第二胶片标记50的中心位置的位置的测量，连接一对第一胶片标记32的中心的第一直线与参考直线之间的第一角度的计算并且计算连接一对第二胶片标记50的中心的第二直线与基准直线之间的第二角度。用于调整的处理包括在消除第一角度和第二角度之间的差异的方向上用于第一曝光和第二曝光中的至少一个的曝光头16的旋转。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2009244831A Maskless exposure method 有权
标题翻译： MASKLESS曝光方法
公开(公告)号：JP2009244831A
公开(公告)日：2009-10-22
申请号：JP2008203766
申请日：2008-08-07
申请人： Hitachi Displays Ltd , 株式会社日立ディスプレイズ
发明人： MATSUURA HIROYASU , ISHIKAWA SEIJI , WACHI TADAMICHI , ISHIGAKI TOSHIMASA
IPC分类号： G03F9/00 , H01L21/027
CPC分类号： G03F7/70791 , G03F7/70433
摘要： PROBLEM TO BE SOLVED: To provide a maskless exposure method, capable of accurately monitoring drawing by an exposing device without disturbing a flow of production, extracting calibration data from data thereof, and feeding back it to the exposing device. SOLUTION: A maskless exposure method includes: scanning, by the projection optical system, the substrate in a first direction; shifting a scanning region in a second direction; scanning the substrate in the first direction so that an overlapping part is formed. A plurality of marks different from the circuit pattern are exposed in a vicinity of the overlapping part. The plurality of marks are a set of marks at least including two marks disposed on one side of the overlapping part and two marks disposed on another side of the overlapping part. Deviations between the pair of the scanning regions, an inclination of exposing light, and a yawing angle of a stage are analyzed by measuring deviations of distances among the plurality of marks. Calibration data are obtained from a result of the analyzing. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种无掩模曝光方法，能够通过曝光装置精确地监视绘制而不干扰生产流程，从其数据中提取校准数据，并将其反馈给曝光装置。解决方案：无掩模曝光方法包括：通过投影光学系统沿第一方向扫描基板; 沿第二方向移动扫描区域; 在第一方向扫描基板，从而形成重叠部分。与电路图案不同的多个标记在重叠部分附近露出。多个标记是至少包括设置在重叠部分的一侧上的两个标记和设置在重叠部分的另一侧上的两个标记的一组标记。通过测量多个标记之间的距离的偏差来分析一对扫描区域之间的偏差，曝光的倾斜度和舞台的偏航角度。校准数据是从分析结果中获得的。版权所有（C）2010，JPO＆INPIT

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