专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2009210843A Substrate manufacturing method and manufacturing system 有权
标题翻译：基板制造方法及制造系统
公开(公告)号：JP2009210843A
公开(公告)日：2009-09-17
申请号：JP2008054247
申请日：2008-03-05
申请人： Hitachi Displays Ltd , 株式会社日立ディスプレイズ
发明人： WACHI TADAMICHI , ISHIKAWA SEIJI , OIDA JUN , MURAMATSU YOSHINORI , MATSUURA HIROYASU
IPC分类号： G03F9/00
摘要： PROBLEM TO BE SOLVED: To provide a substrate manufacturing method reducing the misalignment between an upper layer and a lower layer even when there is substrate distortion and work-starting exposure apparatuses for the upper and lower layers have apparatus dependence in exposure distortion, in the manufacture of substrate for forming a pattern on the substrate, and to provide a system thereof.
SOLUTION: A corrected exposure pattern for the next work-starting lot is prepared from exposure distortion data of the mask-less exposure apparatus exposing the upper layer, alignment log data of a previous-work-start lot, and misalignment inspection data on the misalignment of the upper and lower layers of the previous-work-start lot, and the corrected exposure pattern is exposed by using the mask-less exposure apparatus.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供即使存在基板变形也减小上层和下层之间的未对准的基板制造方法，上层和下层的起始曝光装置具有设备对曝光失真的依赖性，在用于在衬底上形成图案的衬底的制造中，并提供其系统。解决方案：根据暴露上层的无掩护曝光装置的曝光失真数据，前工作批次的对准对数数据和未对准检查数据，准备下一个起始批次的校正曝光图案在前工作批次的上层和下层的未对准上，并且通过使用无掩模曝光装置曝光校正的曝光图案。版权所有（C）2009，JPO＆INPIT

IPRDB

热门服务

关于我们

友情链接

联系方式