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    • 4. 发明专利
    • 多層配線基板およびその製造方法ならびに積層コイル部品
    • 多层布线板及其制造方法和层叠线圈组件
    • JP2015041693A
    • 2015-03-02
    • JP2013171748
    • 2013-08-21
    • 日立化成株式会社Hitachi Chemical Co Ltd
    • NAOYUKI SUSUMUTATENO KIICHIINADA TEIICHIHIROYAMA YUKIHISA
    • H05K3/46H05K1/16H05K3/20H05K3/28
    • 【課題】薄型化が可能であり、生産性に優れた多層配線基板およびその製造方法を提供する。また、薄型化が可能であり、生産性に優れた積層コイル部品を提供する。【解決手段】本発明の多層配線基板は、複数の配線層(1)を積層してなる多層配線基板であって、複数の配線層のうち、少なくとも1層の配線層(1)が、第1の主面(22)、第2の主面(24)および側面(26)を有しパターン状に形成された金属層(20)と金属層(20)の周囲に配置された第1の絶縁層(30)とからなる基材部(10)、金属層(20)の第1の主面(22)を覆う第2の絶縁層(40)、および金属層(20)の第2の主面(24)を覆う第3の絶縁層(50)を含み、金属層(20)の第1の主面(22)の一部は、第2の絶縁層(40)から露出し、金属層(20)の第2の主面(24)の一部は、第3の絶縁層(50)から露出している。【選択図】図3
    • 要解决的问题:提供可以变薄并且生产率高的多层布线板及其制造方法,并提供可以变薄并且生产率高的层叠线圈组件。解决方案:多层布线板是 层叠有多个布线层(1)的多层布线基板,所述多个布线层中的至少一个布线层(1)包含由具有第一主体(1)的金属层(20)构成的基材部(10) 表面(22),第二主表面(24)和侧表面(26)并形成图案形状;以及布置在金属层(20)周围的第一绝缘层(30) 覆盖金属层(20)的第一主表面(22)的第二绝缘层(40); 以及覆盖金属层(20)的第二主表面(24)的第三绝缘层(50)。 金属层(20)的第一主表面(22)的一部分从第二绝缘层(40)露出,金属层(20)的第二主表面(24)的一部分从第三绝缘层 绝缘层(50)。
    • 5. 发明专利
    • Method for manufacturing metal filter
    • 制造金属过滤器的方法
    • JP2014125652A
    • 2014-07-07
    • JP2012283158
    • 2012-12-26
    • Hitachi Chemical Co Ltd日立化成株式会社
    • SUZUKI TAKAHIRONAOYUKI SUSUMUUEHARA TOSHISHIGEKIKUHARA YOSHIHITO
    • C25D1/08C12M1/00C12M1/12C12M3/06G03F7/40
    • PROBLEM TO BE SOLVED: To provide a method for manufacturing a metal filter having no burrs on a hole inner wall of a through-hole and high process accuracy of a hole diameter of the through-hole.SOLUTION: The method for manufacturing a metal filter comprises: a deposition step of depositing a layer of a photosensitive resin on a copper substrate; an exposure step of exposing a predetermined part of the photosensitive resin layer; a development step of forming a resist pattern comprising a cured product of the photosensitive resin by developing the photosensitive resin; a first plating step of forming a first plating layer by subjecting the copper substrate with the resist pattern formed thereon to metal plating; a second plating step of forming a second plating layer by subjecting the copper substrate having the resist pattern and the first plating layer formed thereon to metal plating with a metal different from the metal of the first plating layer; a dissolution step of obtaining a structure composed of the resist pattern and the second plating layer by removing the copper substrate and the first plating layer by chemical dissolution; and a stripping step of obtaining the second plating layer by removing the resist pattern from the structure. The second plating layer serves as the metal filter.
    • 要解决的问题:提供一种用于制造在通孔的孔内壁上没有毛刺的金属过滤器的方法,并且通孔的孔径的加工精度高。解决方案:金属过滤器的制造方法 包括:在铜基板上沉积感光树脂层的沉积步骤; 曝光步骤,曝光所述感光性树脂层的预定部分; 通过显影感光性树脂形成包含感光性树脂的固化物的抗蚀剂图案的显影工序; 第一电镀步骤,通过使铜基板与其上形成的抗蚀剂图案进行金属镀覆来形成第一镀层; 第二电镀步骤,通过使形成有抗蚀剂图案的铜基板和形成在其上的第一镀层的铜基板与不同于第一镀层的金属的金属进行金属镀覆来形成第二镀层; 溶解步骤,通过化学溶解除去铜基材和第一镀层,得到由抗蚀剂图案和第二镀层组成的结构; 以及通过从结构中去除抗蚀剂图案来获得第二镀层的剥离步骤。 第二镀层用作金属过滤器。
    • 6. 发明专利
    • Member for mounting semiconductor element and semiconductor device using the same
    • 用于安装半导体元件和使用其的半导体器件的部件
    • JP2013182895A
    • 2013-09-12
    • JP2012043444
    • 2012-02-29
    • Hitachi Chemical Co Ltd日立化成株式会社
    • NAOYUKI SUSUMUINADA TEIICHITATENO KIICHI
    • H01L23/12H01L23/08H01L23/28
    • H01L2224/45144H01L2224/48091H01L2224/73204H01L2224/73265H01L2924/181H01L2924/00014H01L2924/00H01L2924/00012
    • PROBLEM TO BE SOLVED: To provide a member for mounting a semiconductor element which solves problems that when the size of an exposed part of a metal layer, on which a semiconductor element is mounted, becomes smaller than the size of the element due to the downsizing of a package, an insulation part of a pattern peripheral part blocks normal connection between the element and the metal layer or a capillary of a bonding device contacts with the insulation part and inhibits the wire connection during the wire bonding, and to provide a semiconductor device using the member for mounting the semiconductor element.SOLUTION: A member for mounting a semiconductor element includes a first conductive metal layer pattern and an insulation part on a carrier substrate. The first conductive metal layer pattern is covered by the insulation part in at least its peripheral part so as to have a partial exposed part, and a second metal layer is provided on an exposed surface of the first conductive metal layer pattern. A height of a surface of the second metal layer is equal to or higher than a height of the insulation part covering the peripheral part.
    • 要解决的问题:提供一种用于安装半导体元件的部件,其解决了当安装有半导体元件的金属层的暴露部分的尺寸变得小于由于尺寸小的元件的尺寸 封装的图案周边部分的绝缘部分阻挡元件和金属层之间的正常连接,或者接合装置的毛细管与绝缘部件接触并且在引线接合期间阻止电线连接,并且提供半导体器件 使用用于安装半导体元件的部件。解决方案:用于安装半导体元件的部件包括第一导电金属层图案和载体基板上的绝缘部分。 第一导电金属层图案至少在其周边部分被绝缘部件覆盖以具有部分暴露部分,并且第二金属层设置在第一导电金属层图案的暴露表面上。 第二金属层的表面的高度等于或高于覆盖周边部分的绝缘部分的高度。
    • 9. 发明专利
    • DE2838241A1
    • 1979-03-08
    • DE2838241
    • 1978-09-01
    • HITACHI CHEMICAL CO LTD
    • FUKUTOMI NAOKITSURU YOSHIYUKIKAWAGUCHI KUNIONAOYUKI SUSUMU
    • G03G15/05B41J2/395G01D15/06G11B11/08H04N1/24
    • A multistylus head device which comprises a vast plurality of insulated wires embedded in an insulating substrate having through-holes. The present multistylus device is characterized in that the insulated wires have their respective free terminals exposed on one edge of said insulating substrate and disposed in parallel at predetermined equal intervals in close proximity to each other to form electrodes and have their other terminals exposed respectively on the inner walls of said through-holes; and said other exposed terminals of the insulated wires are connected respectively to metal layers electrolessly deposited on the inner walls of the through-holes. The present multistylus head device is compact in size and excellent in reliability of terminal connection and is capable of recording a transmitted information with high density of printing. The exposed disposition of the wires at their respective free terminals in a parallel state at predetermined equal intervals are skillfully realized according to the method of the present invention. Thus, the present device can be produced at low cost, with reliability of the function of the produced device and is suitable for mass-production.