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    • 4. 发明专利
    • Method of manufacturing semiconductor device
    • 制造半导体器件的方法
    • JP2011222593A
    • 2011-11-04
    • JP2010087200
    • 2010-04-05
    • Hitachi Chem Co Ltd日立化成工業株式会社
    • KAWAMORI TAKASHIHATAKEYAMA KEIICHIOZAKI YOSHINOBUMITSUKURA KAZUYUKIHASHIMOTO SHU
    • H01L21/301H01L21/52
    • H01L24/743H01L2224/743H01L2924/00
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device capable of sufficiently assuring manufacture yield even if a semiconductor wafer and an adhesive layer are reduced in thickness.SOLUTION: The method of manufacturing a semiconductor device includes an adhesive layer removal process, which is provided between an adhesive layer formation process and a dicing sheet pasting process, to remove an extra portion 4 of a photosensitive adhesive layer 3 formed outside the edge of a semiconductor wafer 1 in plan view. Accordingly, an adhesive sheet 2 is prevented from being directly connected to a dicing sheet 6 through the extra portion 4 of the photosensitive adhesive layer 3 in the dicing sheet pasting process that follows the adhesive layer removal process. Thus, occurrence of failure can be suppressed when the adhesive sheet 2 is peeled from the semiconductor wafer 1. Even if the semiconductor wafer 1 and the adhesive layer 3 are reduced in thickness, sufficient manufacture yield is assured.
    • 要解决的问题:提供即使半导体晶片和粘合剂层的厚度减小,也能够充分确保制造成品率的半导体器件的制造方法。 解决方案:制造半导体器件的方法包括在粘合剂层形成工艺和切割片粘贴工艺之间提供的粘合层去除工艺,以除去形成在外部的感光性粘合剂层3的额外部分4 半导体晶片1的边缘在平面图中。 因此,通过粘合剂层去除工序之后的切割片粘贴工序,防止粘合片2通过感光性粘接层3的多余部分4与切割片6直接连接。 因此,当粘合片2从半导体晶片1剥离时,可以抑制故障的发生。即使半导体晶片1和粘合剂层3的厚度减小,也确保了足够的制造成品率。 版权所有(C)2012,JPO&INPIT
    • 8. 发明专利
    • Manufacturing method of semiconductor chip with adhesive layer and manufacturing method of semiconductor device
    • 具有粘合层的半导体芯片的制造方法和半导体器件的制造方法
    • JP2013004811A
    • 2013-01-07
    • JP2011135615
    • 2011-06-17
    • Hitachi Chem Co Ltd日立化成工業株式会社
    • KAWAMORI TAKASHIOZAKI YOSHINOBUHATAKEYAMA KEIICHIMASUKO TAKASHI
    • H01L21/52H01L21/301
    • H01L24/27H01L2224/83191H01L2924/15747H01L2924/15788H01L2924/00
    • PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor chip with an adhesive layer capable of easily forming a semiconductor chip with an adhesive layer having a shape suitable for semiconductor chip mounting.SOLUTION: A manufacturing method of a semiconductor chip with an adhesive layer according to one embodiment comprises: a sticking step of sticking a plurality of semiconductor chips 27 arranged at intervals to an adhesive film 110 containing a photocurable component; an exposure step of irradiating the adhesive film 110 and a self-adhesive film 120 containing the photocurable component with light via the semiconductor chip 27 with the self-adhesive film 120 arranged on the opposite side the semiconductor chip 27 and with the adhesive film 110 sandwiched between the self-adhesive film 120 and the semiconductor chip 27; and picking up the semiconductor chip 27 to which the adhesive film 110 is attached after the exposure step.
    • 要解决的问题:提供具有能够容易地形成具有适于半导体芯片安装的形状的粘合剂层的半导体芯片的粘合剂层的半导体芯片的制造方法。 解决方案:根据一个实施方案的具有粘合剂层的半导体芯片的制造方法包括:将多个半导体芯片27粘贴到包含可光固化部件的粘合膜110上的粘贴步骤; 曝光步骤,通过半导体芯片27将包含光固化性成分的自粘合膜120和自粘合膜120配置在半导体芯片27的相反侧并且粘合膜110夹在中间 在自粘膜120和半导体芯片27之间; 并且在曝光步骤之后拾取附着有粘合膜110的半导体芯片27。 版权所有(C)2013,JPO&INPIT