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    • 6. 发明申请
    • Bi-directional DC-DC converter and control method
    • 双向DC-DC转换器及控制方法
    • US20070139975A1
    • 2007-06-21
    • US11641662
    • 2006-12-20
    • Tatsumi YamauchiHiroyuki ShojiSeigou YukutakeToshikazu Okubo
    • Tatsumi YamauchiHiroyuki ShojiSeigou YukutakeToshikazu Okubo
    • H02M3/335
    • H02M3/33584B60L11/1868B60L2210/10Y02T10/7005Y02T10/7066Y02T10/7216Y10T307/685
    • The inventive bi-directional DC-DC converter addresses a problem of an insufficient step-up ratio during the step-up operation that is caused when a turns ratio of the transformer is determined to, for example, match the step-up operation and also address a contrary problem of an insufficient step-down ratio during the step-down operation that is caused when a turns ratio is determined to match the step-up operation. In the inventive bi-directional DC-DC converter that uses a transformer for both step-down and step-up operations, a switching frequency for operating a switching device is set separately for the step-down and step-up operations. For example, when the switching frequency during the step-up operation is lower than the switching frequency during the step-down operation, the range in which the duty ratio in PWM control can be controlled is widened, compensating for step-up ratio insufficiency. Conversely, step-down ratio insufficiency is compensated for by making the switching frequency during the step-down operation lower than the switching frequency during the step-up operation.
    • 本发明的双向DC-DC转换器解决了在升压操作期间由于变压器的匝数比被确定为例如与升压操作相匹配而引起的升压比不足的问题,并且还 解决了当匝数比被确定为与升压操作相匹配时在降压操作期间不足的降压比的相反问题。 在本发明的使用变压器用于降压和升压操作的双向DC-DC转换器中,用于操作开关装置的开关频率分别设置用于降压和升压操作。 例如,当升压操作期间的开关频率低于降压操作期间的开关频率时,可以控制PWM控制中的占空比的范围变大,从而补偿升压比不足。 相反,通过在降压操作期间使开关频率低于升压操作期间的开关频率来补偿降压比不足。
    • 7. 发明授权
    • SRAM having load transistor formed above driver transistor
    • 具有形成在驱动晶体管上方的负载晶体管的SRAM
    • US5834851A
    • 1998-11-10
    • US460641
    • 1995-06-02
    • Shuji IkedaSatoshi MeguroSoichiro HashibaIsamu KuramotoAtsuyoshi KoikeKatsuro SasakiKoichiro IshibashiToshiaki YamanakaNaotaka HashimotoNobuyuki MoriwakiShigeru TakahashiAtsushi HiraishiYutaka KobayashiSeigou Yukutake
    • Shuji IkedaSatoshi MeguroSoichiro HashibaIsamu KuramotoAtsuyoshi KoikeKatsuro SasakiKoichiro IshibashiToshiaki YamanakaNaotaka HashimotoNobuyuki MoriwakiShigeru TakahashiAtsushi HiraishiYutaka KobayashiSeigou Yukutake
    • H01L27/11
    • H01L27/11H01L27/1104Y10S257/903Y10S257/904
    • Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially. The two transfer MISFETs of the memory cell have their individual gate electrodes connected with two respective word lines spaced from each other and extended in an identical direction. The region defined by the two word lines is arranged therein with the two drive MISFETs and the source lines.The source line is formed of a conductive layer identical to that of the word line. The individual data lines of the complementary data line are formed of an identical conductive layer which is different from that of the word line and the source line. The identical conductive layer between the word line and source line and the complementary data line is formed with two word lines: a main word line extended in the first direction identical to that of the word line and source line and used by adopting the divided word line system: and a sub-word line used by adopting the double word line system.
    • 这里公开了一种半导体集成电路器件,其包括具有其存储单元的SRAM,SRAM由通过字线控制的转移MISFET和驱动MISFET构成。 驱动MISFET的栅电极和存储单元的转移MISFET的栅电极和字线分别由不同的导电层形成。 驱动MISFET和转移MISFET分别布置成在栅极长度方向上彼此交叉。 字线在驱动MISFET的栅电极的栅极长度方向上延伸,并且部分地与驱动MISFET的栅电极交叉。 存储器单元的两个转移MISFET的各自的栅极电极与彼此间隔开并沿相同方向延伸的两个相应字线连接。 由两个字线限定的区域配置有两个驱动MISFET和源极线。 源极线由与字线的导电层相同的导电层形成。 互补数据线的各个数据线由与字线和源极线不同的导电层形成。 字线和源极线与互补数据线之间的相同的导电层由两条字线形成:主字线在第一方向上延伸,与字线和源极线相同,并通过采用分割字线 系统:采用双字线系统使用的子字线。