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1. 发明授权

US08098335B2 Nonlinear processing device and image display apparatus 有权
标题翻译：非线性处理装置和图像显示装置
公开(公告)号：US08098335B2
公开(公告)日：2012-01-17
申请号：US12098084
申请日：2008-04-04
申请人： Hiroyuki Kobayashi , Naoya Matsuda , Makoto Haitani , Kenichiro Saito
发明人： Hiroyuki Kobayashi , Naoya Matsuda , Makoto Haitani , Kenichiro Saito
IPC分类号： H04N5/202
CPC分类号： H04N5/202 , G09G3/20 , G09G3/3611 , G09G2320/0276 , G09G2320/0285 , G09G2320/0666 , G09G2320/0673 , H04N9/69
摘要： A nonlinearly processed (gamma-corrected) video signal is subjected to three-dimensional signal level correction using three-dimensional correction values and corresponding to a position in a horizontal direction and a vertical direction of a pixel on a display screen of an image display unit and the signal level of the pixel data. Thereby, accurate gamma correction is made possible, and horizontal and vertical area information (grid block) can be disposed in an optimum positional relation according to resolution of the screen.
摘要翻译：使用三维校正值对非线性处理（伽马校正）视频信号进行三维信号电平校正，并对应于图像显示单元的显示屏上的像素的水平方向和垂直方向上的位置和像素数据的信号电平。从而，可以进行准确的伽马校正，并且可以根据屏幕的分辨率将水平和垂直面积信息（网格块）设置在最佳的位置关系中。

2. 发明授权

US07379057B2 Non-linear processing apparatus, image display apparatus 有权
标题翻译：非线性处理装置，图像显示装置
公开(公告)号：US07379057B2
公开(公告)日：2008-05-27
申请号：US10381347
申请日：2002-07-26
申请人： Hiroyuki Kobayashi , Naoya Matsuda , Makoto Haitani , Kenichiro Saito
发明人： Hiroyuki Kobayashi , Naoya Matsuda , Makoto Haitani , Kenichiro Saito
IPC分类号： G09G5/00
CPC分类号： H04N5/202 , G09G3/20 , G09G3/3611 , G09G2320/0276 , G09G2320/0285 , G09G2320/0666 , G09G2320/0673 , H04N9/69
摘要： A nonlinearly processed (gamma-corrected) video signal is subjected to three-dimensional signal level correction using three-dimensional correction values and corresponding to a position in a horizontal direction and a vertical direction of a pixel on a display screen of an image display unit and the signal level of the pixel data. Thereby, accurate gamma correction is made possible, and horizontal and vertical area information (grid block) can be disposed in an optimum positional relation according to resolution of the screen.
摘要翻译：使用三维校正值对非线性处理（伽马校正）视频信号进行三维信号电平校正，并对应于图像显示单元的显示屏上的像素的水平方向和垂直方向上的位置和像素数据的信号电平。从而，可以进行准确的伽马校正，并且可以根据屏幕的分辨率将水平和垂直面积信息（网格块）设置在最佳的位置关系中。

3. 发明申请

US20080246882A1 NONLINEAR PROCESSING DEVICE AND IMAGE DISPLAY APPARATUS 有权
标题翻译：非线性处理装置和图像显示装置
公开(公告)号：US20080246882A1
公开(公告)日：2008-10-09
申请号：US12098084
申请日：2008-04-04
申请人： Hiroyuki Kobayashi , Naoya Matsuda , Makoto Haitani , Kenichiro Saito
发明人： Hiroyuki Kobayashi , Naoya Matsuda , Makoto Haitani , Kenichiro Saito
IPC分类号： H04N5/00
CPC分类号： H04N5/202 , G09G3/20 , G09G3/3611 , G09G2320/0276 , G09G2320/0285 , G09G2320/0666 , G09G2320/0673 , H04N9/69
摘要： A nonlinearly processed (gamma-corrected) video signal is subjected to three-dimensional signal level correction using three-dimensional correction values and corresponding to a position in a horizontal direction and a vertical direction of a pixel on a display screen of an image display unit and the signal level of the pixel data. Thereby, accurate gamma correction is made possible, and horizontal and vertical area information (grid block) can be disposed in an optimum positional relation according to resolution of the screen.
摘要翻译：使用三维校正值对非线性处理（伽马校正）视频信号进行三维信号电平校正，并对应于图像显示单元的显示屏上的像素的水平方向和垂直方向上的位置和像素数据的信号电平。从而，可以进行准确的伽马校正，并且可以根据屏幕的分辨率将水平和垂直面积信息（网格块）设置在最佳的位置关系中。

4. 发明申请

US20050275640A1 Non-linear processing apparatus, image display apparatus 有权
标题翻译：非线性处理装置，图像显示装置
公开(公告)号：US20050275640A1
公开(公告)日：2005-12-15
申请号：US10381347
申请日：2002-07-26
申请人： Hiroyuki Kobayashi , Naoya Matsuda , Makoto Haitani , Kenichiro Saito
发明人： Hiroyuki Kobayashi , Naoya Matsuda , Makoto Haitani , Kenichiro Saito
IPC分类号： G09G3/20 , G09G3/36 , G09G5/00 , H04N5/202 , H04N9/69
CPC分类号： H04N5/202 , G09G3/20 , G09G3/3611 , G09G2320/0276 , G09G2320/0285 , G09G2320/0666 , G09G2320/0673 , H04N9/69
摘要： A nonlinearly processed (gamma-corrected) video signal is subjected to three-dimensional signal level correction using three-dimensional correction values and corresponding to a position in a horizontal direction and a vertical direction of a pixel on a display screen of an image display unit and the signal level of the pixel data. Thereby, accurate gamma correction is made possible, and horizontal and vertical area information (grid block) can be disposed in an optimum positional relation according to resolution of the screen.
摘要翻译：使用三维校正值对非线性处理（伽马校正）视频信号进行三维信号电平校正，并对应于图像显示单元的显示屏上的像素的水平方向和垂直方向上的位置和像素数据的信号电平。从而，可以进行准确的伽马校正，并且可以根据屏幕的分辨率将水平和垂直面积信息（网格块）设置在最佳的位置关系中。

5. 发明授权

US08128458B2 Polishing apparatus and substrate processing method 有权
标题翻译：抛光装置和基板处理方法
公开(公告)号：US08128458B2
公开(公告)日：2012-03-06
申请号：US11631417
申请日：2005-07-21
申请人： Kenichiro Saito , Akihiro Yazawa , Masanori Sasaki , Takashi Mitsuya
发明人： Kenichiro Saito , Akihiro Yazawa , Masanori Sasaki , Takashi Mitsuya
IPC分类号： B24B49/00
CPC分类号： B24B37/0053 , B24B49/12
摘要： A polishing apparatus detects the escape of a substrate from a top ring during polishing. The polishing apparatus includes a polishing table having a polishing pad, a top ring, and a substrate escape detection section for detecting escape of the substrate from the top ring. The detection section includes a light irradiation member for irradiating an area of the upper surface of the polishing pad with light, a controller for controlling the light irradiation of the light irradiation member, an image-taking member for taking an image of the area irradiated with the light, and an information processing member for processing information outputted from the image-taking member. The controller controls the light irradiation member in such a manner that it performs light irradiation at least for a period of time during which the substrate is regarded as being in contact with the polishing pad.
摘要翻译：抛光装置在抛光期间检测衬底从顶环的逸出。抛光装置包括具有抛光垫，顶环和用于检测基板从顶环的逸出的基板逸出检测部的抛光台。检测部分包括用于用光照射抛光垫的上表面的区域的光照射部件，用于控制光照射部件的光照射的控制器，用于拍摄被照射的区域的图像的摄像部件光，以及用于处理从摄像部件输出的信息的信息处理部件。控制器控制光照射部件，使得其至少在基板被认为与抛光垫接触的时间段内进行光照射。

6. 发明授权

US08100739B2 Substrate holding apparatus, polishing apparatus, and polishing method 有权
公开(公告)号：US08100739B2
公开(公告)日：2012-01-24
申请号：US12222908
申请日：2008-08-19
申请人： Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
发明人： Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
IPC分类号： B24B49/00
CPC分类号： B24B37/32
摘要： A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring includes a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member.

7. 发明申请

US20070232193A1 Substrate holding apparatus, polishing apparatus, and polishing method 有权
标题翻译：基板保持装置，抛光装置和抛光方法
公开(公告)号：US20070232193A1
公开(公告)日：2007-10-04
申请号：US11730142
申请日：2007-03-29
申请人： Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
发明人： Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
IPC分类号： B24B51/00
CPC分类号： B24B37/32
摘要： A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring comprises a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member.
摘要翻译：基板保持装置防止基板滑出并允许基板被稳定地抛光。基板保持装置具有用于将基板保持并压靠在研磨面上的顶环体，以及用于按压研磨面的保持环，保持环设置在顶环体的外周部。保持环包括由磁性材料制成的第一构件和具有设置在其表面上的磁体的第二构件，该磁体保持抵靠第一构件。

8. 发明授权

US07204658B2 Light-accumulating luminous road marking material and road structure 失效
标题翻译：蓄光发光道路标线材及路面结构
公开(公告)号：US07204658B2
公开(公告)日：2007-04-17
申请号：US10476270
申请日：2002-12-27
申请人： Kenichiro Saito , Mieko Sakai , Sumiyo Yamanashi
发明人： Kenichiro Saito , Mieko Sakai , Sumiyo Yamanashi
IPC分类号： C09K11/02 , E01F9/08
CPC分类号： C09K11/02 , C09D5/004 , C09D5/22 , C09K11/643 , E01F9/506
摘要： A photoluminescence road marking material which is useful for a marking of a lane of a road, has a high photoluminescence performance along with a required wear resistance and weather resistance, can find an application not only in a white line, but also various types of other color lines by suppressing a green color tone and can further be imparted with a non-slip performance. There is provided the photoluminescence road marking material in which a resin paste containing a transparent resin component and a photoluminescence pigment component is applied on a surface of a road to form a photoluminescence layer, and the resin paste is compounded with from 7% by weight to 95% by weight of the transparent resin component based on the entire weight of the resin paste.
摘要翻译：用于标记道路车道的光致发光道路标记材料具有高的光致发光性能以及所需的耐磨性和耐候性，不仅可以在白线中找到应用，还可以发现各种类型的其它通过抑制绿色色调，并且可以进一步赋予防滑性能。提供了一种光致发光道路标线材料，其中将含有透明树脂组分和光致发光颜料组分的树脂糊剂涂覆在道路表面上以形成光致发光层，并将树脂浆料与7重量％混合至基于树脂浆料的总重量，95重量％的透明树脂成分。

9. 发明申请

US20060101752A1 Artificial stone wall panel 失效
标题翻译：人造石墙板
公开(公告)号：US20060101752A1
公开(公告)日：2006-05-18
申请号：US10521190
申请日：2003-07-15
申请人： Mieko Sakai , Kenichiro Saito
发明人： Mieko Sakai , Kenichiro Saito
IPC分类号： E04F13/00 , E04F15/00
CPC分类号： B29C39/10 , B29C39/003 , B29C70/78 , B29K2709/00 , B29L2007/002 , C04B26/06 , C04B2103/0046 , C04B2103/0047 , C04B2111/34 , C04B2111/54 , E04F13/08 , E04F13/0819 , E04F13/147 , Y10T428/22 , Y10T428/24405 , Y10T428/2991 , Y10T428/2998 , C04B14/048 , C04B14/06 , C04B14/303 , C04B20/008 , C04B20/0076
摘要： A novel artificial stone wall panel comprising: an artificial stone, the composition of which comprises an inorganic fine powder component with a size of from 9.5 mm to 180 μm, an inorganic finely divided component with a size of less than 180 μm and a resin component in an amount of from 7 to 30% by weight based on the total artificial stone composition, the weight ratio of the inorganic fine powder component to the inorganic finely divided component (inorganic fine powder component:inorganic finely divided component) being in a range of from 1:1 to 5:1; and a support for installing the artificial stone on a wall surface, embedded to the artificial stone, wherein part of the support is exposed at the back surface or edge surface of the artificial stone, and a process for producing the same is provided. This artificial stone wall panel is realized by mold-integrating an artificial stone and a means for installing such artificial stone to an external wall surface, and may be used as an external wall material with excellent design having clear contrast and natural texture, which is easy to prepare and install, and which is advantageous in view of productivity, workability and cost.
摘要翻译：一种新型人造石墙板，包括：人造石，其组成包括尺寸为9.5mm至180μm的无机细粉组分，尺寸小于180μm的无机细分组分和树脂组分相对于总人造石组合物为7〜30重量％，无机细粉成分与无机细分成分（无机细粉成分：无机细分成分）的重量比在从1：1到5：1; 以及用于将人造石安装在嵌入人造石的墙面上的支撑体，其中，所述支撑体的一部分在所述人造石的后表面或边缘表面露出，并且提供其制造方法。这种人造石墙板通过将人造石和将这种人造石安装在外壁表面上的装置进行模具整合而实现，并且可以用作具有优异设计的具有明显的对比度和自然质感的外壁材料，这是容易的在制备和安装方面，鉴于生产率，可加工性和成本，这是有利的。

10. 发明授权

US06682408B2 Polishing apparatus 失效
公开(公告)号：US06682408B2
公开(公告)日：2004-01-27
申请号：US10026763
申请日：2001-12-27
申请人： Kunihiko Sakurai , Tetsuji Togawa , Nobuyuki Takada , Satoshi Wakabayashi , Kenichiro Saito , Masahiko Sekimoto , Takuji Hayama , Daisuke Koga
发明人： Kunihiko Sakurai , Tetsuji Togawa , Nobuyuki Takada , Satoshi Wakabayashi , Kenichiro Saito , Masahiko Sekimoto , Takuji Hayama , Daisuke Koga
IPC分类号： B24B100
CPC分类号： B24B37/345 , B24B37/042 , H01L21/30625
摘要： A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus comprises a turntable having a polishing surface, a top ring for holding a workpiece and pressing the workpiece against the polishing surface to polish the workpiece, at least three cleaning apparatuses for cleaning polished workpieces, and a transfer structure for transferring the polished workpieces between at least three cleaning apparatuses. The polishing apparatus further includes a rotary transporter disposed in a position which can be accessed by said top rings and having a plurality of portions positioned on a predetermined circumference from a center of rotation of the rotary transporter for holding the workpieces.

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