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1. 发明授权

US07737413B2 Corrector for charged-particle beam aberration and charged-particle beam apparatus 有权
公开(公告)号：US07737413B2
公开(公告)日：2010-06-15
申请号：US12183622
申请日：2008-07-31
申请人： Hiroyuki Ito , Yuko Sasaki , Yoshiya Higuchi , Takeshi Kawasaki
发明人： Hiroyuki Ito , Yuko Sasaki , Yoshiya Higuchi , Takeshi Kawasaki
IPC分类号： G21K1/08 , H01J3/14 , H01J3/26 , H01J49/42
摘要： In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.

2. 发明授权

US07872240B2 Corrector for charged-particle beam aberration and charged-particle beam apparatus 有权
标题翻译：带电粒子束像差校正器和带电粒子束装置
公开(公告)号：US07872240B2
公开(公告)日：2011-01-18
申请号：US12183622
申请日：2008-07-31
申请人： Hiroyuki Ito , Yuko Sasaki , Yoshiya Higuchi , Takeshi Kawasaki
发明人： Hiroyuki Ito , Yuko Sasaki , Yoshiya Higuchi , Takeshi Kawasaki
IPC分类号： G21K1/08 , H01J3/14 , H01J3/26 , H01J49/42
CPC分类号： H01J37/153 , H01J37/26 , H01J2237/1501 , H01J2237/1534 , H01J2237/24564
摘要： In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.
摘要翻译：在具有用于带电粒子束的高精度和高分辨率聚焦光学系统的带电粒子束装置中，一组线圈沿着射束发射轴排列，以延伸穿过每个从射束发射辐射的径向平面轮廓轴表示旋转轴，并且每个具有圆弧，其对应由圆周平面除以大于2的自然数产生的分割角，使得可以在带电粒子束的入射轴上产生叠加磁场，并且带电粒子束的轨迹可以通过叠加的磁场来控制。

3. 发明申请

US20090032722A1 CORRECTOR FOR CHARGED-PARTICLE BEAM ABERRATION AND CHARGED-PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束和充电颗粒光束装置的校正器
公开(公告)号：US20090032722A1
公开(公告)日：2009-02-05
申请号：US12183622
申请日：2008-07-31
申请人： Hiroyuki Ito , Yuko Sasaki , Yoshiya Higuchi , Takeshi Kawasaki
发明人： Hiroyuki Ito , Yuko Sasaki , Yoshiya Higuchi , Takeshi Kawasaki
IPC分类号： H01J3/14
CPC分类号： H01J37/153 , H01J37/26 , H01J2237/1501 , H01J2237/1534 , H01J2237/24564
摘要： In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.
摘要翻译：在具有用于带电粒子束的高精度和高分辨率聚焦光学系统的带电粒子束装置中，一组线圈沿着射束发射轴排列，以延伸穿过每个从射束发射辐射的径向平面轮廓轴表示旋转轴，并且每个具有圆弧，其对应由圆周平面除以大于2的自然数产生的分割角，使得可以在带电粒子束的入射轴上产生叠加磁场，并且带电粒子束的轨迹可以通过叠加的磁场来控制。

4. 发明授权

US08324594B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08324594B2
公开(公告)日：2012-12-04
申请号：US12370242
申请日：2009-02-12
申请人： Hiroyuki Ito , Yuko Sasaki , Tadashi Otaka
发明人： Hiroyuki Ito , Yuko Sasaki , Tadashi Otaka
IPC分类号： G01F23/00 , G21K5/08 , G21K5/10
CPC分类号： H01J37/28 , H01J37/20 , H01J37/30 , H01J2237/0216 , H01J2237/20214 , H01J2237/20221
摘要： A charged particle beam apparatus can be constructed with a smaller size (resulting in a small installation space) and a lower cost, suppress vibration, operate at higher speed, and be reliable in inspection. The charged particle beam apparatus is largely effective when a wafer having a large diameter is used. The charged particle beam apparatus includes: a plurality of inspection mechanisms, each of which is mounted on a vacuum chamber and has a charged particle beam mechanism for performing at least an inspection on the sample; a single-shaft transfer mechanism that moves the sample between the inspection mechanisms in the direction of an axis of the single-shaft transfer mechanism; and a rotary stage that mounts the sample thereon and has a rotational axis on the single-shaft transfer mechanism. The single-shaft transfer mechanism moves the sample between the inspection mechanisms in order that the sample is placed under any of the inspection mechanisms. The rotary stage positions the sample such that a target portion of the sample can be inspected by the inspection mechanism under which the sample is placed, and the inspection mechanisms inspect the sample.
摘要翻译：带电粒子束装置可以以较小的尺寸（导致小的安装空间）和较低的成本，抑制振动，更高的速度运行并且可靠地进行检查。当使用具有大直径的晶片时，带电粒子束装置很有效。带电粒子束装置包括：多个检查机构，每个检查机构安装在真空室上，并具有至少对样品进行检查的带电粒子束机构; 单轴传送机构，其在所述检查机构之间沿所述单轴传送机构的轴线的方向移动所述样本; 以及将样品安装在其上并在单轴传送机构上具有旋转轴的旋转台。单轴传送机构将样品移动到检查机构之间，以便将样品放置在任何检查机构下。旋转台定位样品，使得样品的目标部分可以通过放置样品的检查机构进行检查，检查机构检查样品。

5. 发明申请

US20080116391A1 Charged Particle Beam Orbit Corrector and Charged Particle Beam Apparatus 有权
标题翻译：带电粒子束轨道校正器和带电粒子束装置
公开(公告)号：US20080116391A1
公开(公告)日：2008-05-22
申请号：US11943241
申请日：2007-11-20
申请人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
发明人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
IPC分类号： G21K1/087 , G21K1/093
CPC分类号： H01J37/141 , H01J37/09 , H01J37/12 , H01J37/153 , H01J37/28 , H01J2237/142 , H01J2237/1534 , H01J2237/303
摘要： The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.
摘要翻译：本发明涉及一种用于带电粒子束的轨道校正方法，其目的在于解决常规像差校正系统中固有的问题，并提供一种用于带电粒子束的低成本，高精度，高分辨率的聚光系统。为此，所采用的是波束轨道受环形形式限制以形成朝向光束轨道中心收敛的电磁场分布的结构。因此，可以抵消以电子透镜的球面像差为代表的向外扩大的非线性动作。具体地说，这种效果可以通过设置在轴上的电子元件实现，并且经受电压以便于静电聚焦的发生。对于磁场，这种效果可以通过在旋转方向上等角地分割的表面上形成径向分布缠绕的线圈来实现，以控制磁通密度的收敛。

6. 发明授权

US07875858B2 Charged particle beam trajectory corrector and charged particle beam apparatus 有权
标题翻译：带电粒子束轨迹校正器和带电粒子束装置
公开(公告)号：US07875858B2
公开(公告)日：2011-01-25
申请号：US12349708
申请日：2009-01-07
申请人： Hiroyuki Ito , Yuko Sasaki , Ryoichi Ishii , Takashi Doi
发明人： Hiroyuki Ito , Yuko Sasaki , Ryoichi Ishii , Takashi Doi
IPC分类号： H01J1/50 , G21K1/08 , G21K1/093
CPC分类号： H01J37/153 , H01J37/145 , H01J37/28 , H01J2237/1534
摘要： The invention relates to a trajectory correction method for a charged particle beam, and provides a low-cost, high accuracy and high-resolution converging optical system for use with a charged particle beam to solve problems with conventional aberration correction systems. To this end, the present invention uses a configuration which forms electromagnetic field which is concentrated towards a center of a beam trajectory axis, causes oblique of the beam to make use of lens effects and bend the trajectory, and consequently, cancels out large external side non-linear effects such a spherical aberration of the electron lens. Specifically, the configuration generates an electric field concentration in a simple manner by providing electrodes above the axis and applying voltages to the electrodes. Further, the above configuration can be realized trough operations using lenses and deflectors with incident axes and image formation positions that are normal.
摘要翻译：本发明涉及一种用于带电粒子束的轨迹校正方法，并且提供了一种用于带电粒子束的低成本，高精度和高分辨率会聚光学系统，以解决常规像差校正系统的问题。为此，本发明使用形成朝向光束轨迹轴的中心集中的电磁场的结构，使得光束的倾斜利用透镜效果并弯曲轨迹，因此抵消了大的外侧电子透镜的非线性效应如球面像差。具体地说，该配置通过在轴上方设置电极并向电极施加电压，以简单的方式产生电场浓度。此外，可以通过使用具有入射轴和成像位置的透镜和偏转器的槽操作来实现上述配置。

7. 发明授权

US08946649B2 Charged particle beam device having an energy filter 有权
标题翻译：具有能量过滤器的带电粒子束装置
公开(公告)号：US08946649B2
公开(公告)日：2015-02-03
申请号：US14126792
申请日：2012-04-16
申请人： Yuko Sasaki , Hiroyuki Ito
发明人： Yuko Sasaki , Hiroyuki Ito
IPC分类号： H01J37/28 , H01J37/05 , H01J37/244 , H01J37/26
CPC分类号： H01J37/05 , H01J37/244 , H01J37/26 , H01J37/263 , H01J37/28 , H01J2237/057 , H01J2237/2446 , H01J2237/2448 , H01J2237/24485 , H01J2237/2801 , H01J2237/2806
摘要： Provided is a charged particle beam device to improve energy solution of its energy filter. In one embodiment, a charged particle beam device includes a deflector to deflect charged particles emitted from a sample to an energy filter, and a change in brightness value with the change of voltage applied to the energy filter is found for each of a plurality of deflection conditions for the deflector, and a deflection condition such that a change in the brightness value satisfies a predetermined condition is set as the deflection condition for the deflector.
摘要翻译：提供了一种用于改善其能量过滤器的能量解决方案的带电粒子束装置。在一个实施例中，带电粒子束装置包括偏转器，用于将从样品发射的带电粒子偏转到能量滤波器，并且针对多个偏转中的每一个发现随施加到能量滤波器的电压变化而引起的亮度值的变化偏转器的条件以及使得亮度值的变化满足预定条件的偏转条件被设定为偏转器的偏转状态。

8. 发明申请

US20090173887A1 CHARGED PARTICLE BEAM TRAJECTORY CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束光栅修正器和充电颗粒光束装置
公开(公告)号：US20090173887A1
公开(公告)日：2009-07-09
申请号：US12349708
申请日：2009-01-07
申请人： Hiroyuki ITO , Yuko Sasaki , Ryoichi Ishii , Takashi Doi
发明人： Hiroyuki ITO , Yuko Sasaki , Ryoichi Ishii , Takashi Doi
IPC分类号： H01J3/20
CPC分类号： H01J37/153 , H01J37/145 , H01J37/28 , H01J2237/1534
摘要： The invention relates to a trajectory correction method for a charged particle beam, and provides a low-cost, high accuracy and high-resolution converging optical system for use with a charged particle beam to solve problems with conventional aberration correction systems. To this end, the present invention uses a configuration which forms electromagnetic field which is concentrated towards a center of a beam trajectory axis, causes oblique of the beam to make use of lens effects and bend the trajectory, and consequently, cancels out large external side non-linear effects such a spherical aberration of the electron lens. Specifically, the configuration generates an electric field concentration in a simple manner by providing electrodes above the axis and applying voltages to the electrodes. Further, the above configuration can be realized trough operations using lenses and deflectors with incident axes and image formation positions that are normal.
摘要翻译：本发明涉及一种用于带电粒子束的轨迹校正方法，并且提供了一种用于带电粒子束的低成本，高精度和高分辨率会聚光学系统，以解决常规像差校正系统的问题。为此，本发明使用形成朝向光束轨迹轴的中心集中的电磁场的结构，使得光束的倾斜利用透镜效果并弯曲轨迹，因此抵消了大的外侧电子透镜的非线性效应如球面像差。具体地说，该配置通过在轴上方设置电极并向电极施加电压，以简单的方式产生电场浓度。此外，可以通过使用具有入射轴和成像位置的透镜和偏转器的槽操作来实现上述配置。

9. 发明申请

US20140124666A1 Charged Particle Beam Device 有权
标题翻译：带电粒子束装置
公开(公告)号：US20140124666A1
公开(公告)日：2014-05-08
申请号：US14126792
申请日：2012-04-16
申请人： Yuko Sasaki , Hiroyuki Ito
发明人： Yuko Sasaki , Hiroyuki Ito
IPC分类号： H01J37/05 , H01J37/26
CPC分类号： H01J37/05 , H01J37/244 , H01J37/26 , H01J37/263 , H01J37/28 , H01J2237/057 , H01J2237/2446 , H01J2237/2448 , H01J2237/24485 , H01J2237/2801 , H01J2237/2806
摘要： Provided is a charged particle beam device to improve energy solution of its energy filter. In one embodiment, a charged particle beam device includes a deflector to deflect charged particles emitted from a sample to an energy filter, and a change in brightness value with the change of voltage applied to the energy filter is found for each of a plurality of deflection conditions for the deflector, and a deflection condition such that a change in the brightness value satisfies a predetermined condition is set as the deflection condition for the deflector.
摘要翻译：提供了一种用于改善其能量过滤器的能量解决方案的带电粒子束装置。在一个实施例中，带电粒子束装置包括偏转器，用于将从样品发射的带电粒子偏转到能量滤波器，并且针对多个偏转中的每一个发现随施加到能量滤波器的电压变化而引起的亮度值的变化偏转器的条件以及使得亮度值的变化满足预定条件的偏转条件被设定为偏转器的偏转状态。

10. 发明授权

US07947964B2 Charged particle beam orbit corrector and charged particle beam apparatus 有权
标题翻译：带电粒子束轨道校正器和带电粒子束装置
公开(公告)号：US07947964B2
公开(公告)日：2011-05-24
申请号：US11943241
申请日：2007-11-20
申请人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
发明人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
IPC分类号： G21K1/087
CPC分类号： H01J37/141 , H01J37/09 , H01J37/12 , H01J37/153 , H01J37/28 , H01J2237/142 , H01J2237/1534 , H01J2237/303
摘要： The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.
摘要翻译：本发明涉及一种用于带电粒子束的轨道校正方法，其目的在于解决常规像差校正系统中固有的问题，并提供一种用于带电粒子束的低成本，高精度，高分辨率的聚光系统。为此，所采用的是波束轨道受环形形式限制以形成朝向光束轨道中心收敛的电磁场分布的结构。因此，可以抵消以电子透镜的球面像差为代表的向外扩大的非线性动作。具体地说，这种效果可以通过设置在轴上的电子元件实现，并且经受电压以便于静电聚焦的发生。对于磁场，这种效果可以通过在旋转方向上等角地分割的表面上形成径向分布缠绕的线圈来实现，以控制磁通密度的收敛。

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