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    • 3. 发明申请
    • Composition for forming antireflection coating
    • 用于形成抗反射涂层的组合物
    • US20070281098A1
    • 2007-12-06
    • US11882254
    • 2007-07-31
    • Taku HirayamaTomotaka YamadaDaisuke KawanaKouki TamuraKazufumi Sato
    • Taku HirayamaTomotaka YamadaDaisuke KawanaKouki TamuraKazufumi Sato
    • B05D3/00
    • C08G77/14C08G77/04C08G77/70C09D5/32C09D183/04C09D183/06G02B1/111G03F7/0757G03F7/091C08L2666/04
    • A composition for forming an antireflection coating, characterized in that it comprises an organic solvent and, dissolved therein, (A) a ladder silicone copolymer containing (a1) 10 to 90 mole % of a (hydroxyphenylalkyl)silsesquioxane unit, (a2) 0 to 50 mole % of a (alkoxyphenylalkyl)silsesquioxane unit and (a3) 10 to 90 mole % of an alkyl or phenylsilsesquioxane unit, (B) an acid generator generating an acid upon exposure to heat or light, and (C) a crosslinking agent, and is capable of forming an antireflection coating exhibiting an optional parameter (k value) for an ArF laser of the range of 0.002 to 0.95. The composition is soluble in an organic solvent, can be applied by a conventional spin coating method with ease, has good storage stability, and can exhibit an adjusted preventive capability for reflection through the introduction of a chromophoric group absorbing a radiation ray thereto.
    • 一种用于形成抗反射涂层的组合物,其特征在于,其包含有机溶剂,并且溶解于其中(A)含有(〜1/10)10〜90摩尔%的(羟基苯基烷基) 倍半硅氧烷单元,(a 2 O 2)0〜50摩尔%的(烷氧基苯基烷基)倍半硅氧烷单元和(〜3)10〜90摩尔%的烷基或苯基倍半硅氧烷单元, (B)在暴露于热或光时产生酸的酸发生剂,和(C)交联剂,并且能够形成对于0.002至约0.002的范围的ArF激光显示可选参数(k值)的抗反射涂层 0.95。 该组合物可溶于有机溶剂,可以通过常规的旋涂法容易地进行涂布,具有良好的储存稳定性,并且通过引入吸收辐射线的发色团,可以显示调整的防止反射能力。
    • 5. 发明申请
    • Composition for forming antireflection coating
    • 用于形成抗反射涂层的组合物
    • US20060021964A1
    • 2006-02-02
    • US11237913
    • 2005-09-29
    • Taku HirayamaTomotaka YamadaDaisuke KawanaKouki TamuraKazufumi Sato
    • Taku HirayamaTomotaka YamadaDaisuke KawanaKouki TamuraKazufumi Sato
    • H01B13/00
    • C08G77/14C08G77/04C08G77/70C09D5/32C09D183/04C09D183/06G02B1/111G03F7/0757G03F7/091C08L2666/04
    • A composition for forming an antireflection coating, characterized in that it comprises an organic solvent and, dissolved therein, (A) a ladder silicone copolymer containing (a1) 10 to 90 mole % of a (hydroxyphenylalkyl)silsesquioxane unit, (a2) 0 to 50 mole % of a (alkoxyphenylalkyl)silsesquioxane unit and (a3) 10 to 90 mole % of an alkyl or phenylsilsesquioxane unit, (B) an acid generator generating an acid upon exposure to heat or light, and (C) a crosslinking agent, and is capable of forming an antireflection coating exhibiting an optional parameter (k value) for an ArF laser of the range of 0.002 to 0.95. The composition is soluble in an organic solvent, can be applied by a conventional spin coating method with ease, has good storage stability, and can exhibit an adjusted preventive capability for reflection through the introduction of a chromophoric group absorbing a radiation ray thereto.
    • 一种用于形成抗反射涂层的组合物,其特征在于,其包含有机溶剂,并且溶解于其中(A)含有(〜1/10)10〜90摩尔%的(羟基苯基烷基) 倍半硅氧烷单元,(a 2 O 2)0〜50摩尔%的(烷氧基苯基烷基)倍半硅氧烷单元和(〜3)10〜90摩尔%的烷基或苯基倍半硅氧烷单元, (B)在暴露于热或光时产生酸的酸发生剂,和(C)交联剂,并且能够形成对于0.002至约0.002的范围的ArF激光显示可选参数(k值)的抗反射涂层 0.95。 该组合物可溶于有机溶剂,可以通过常规的旋涂法容易地进行涂布,具有良好的储存稳定性,并且通过引入吸收辐射线的发色团,可以显示调整的防止反射能力。
    • 6. 发明申请
    • Chemical amplification type silicone based positive photoresist composition
    • 化学放大型硅胶正性光致抗蚀剂组合物
    • US20060003252A1
    • 2006-01-05
    • US10537290
    • 2003-12-01
    • Taku HirayamaTomotaka YamadaDaisuke KawanaKouki TamuraKazufumi Sato
    • Taku HirayamaTomotaka YamadaDaisuke KawanaKouki TamuraKazufumi Sato
    • G03F7/021
    • G03F7/0757C08G77/04C08L83/06G03F7/0045
    • A chemical-amplification type silicone-based positive-working resist composition that can be prepared from compounds of good availability as the base materials through simple means and can provide a bilayer resist material from which a fine pattern of high resolution, high aspect ratio, desirable cross-sectional profile and low line edge roughness can be formed. In particular, a chemical-amplification type positive-working resist composition comprising an alkali soluble resin (A) and a photoacid generator (B) wherein a ladder-type silicone copolymer comprising (hydroxyphenylalkyl)silsesquioxane units (a1), (alkoxyphenylalkyl)silsesquioxane units (a2) and alkyl- or phenylsilsesquioxane units (a3) is used as the alkali soluble resin (A). The copolymer wherein, in the component (A), the units (a3) are phenylsilsesquioxane units is a novel compound.
    • 一种化学扩增型硅氧烷正性抗蚀剂组合物,其可以通过简单的方法由具有良好可用性的化合物制备,并且可以提供双层抗蚀剂材料,由此可以获得高分辨率,高纵横比的精细图案 可以形成横截面轮廓和低线边缘粗糙度。 特别是包含碱溶性树脂(A)和光酸产生剂(B)的化学增幅型正性抗蚀剂组合物,其中包含(羟基苯基烷基)倍半硅氧烷单元(a 1 SUB / >),(烷氧基苯基烷基)倍半硅氧烷单元(a 2 N 2)和烷基 - 或苯基倍半硅氧烷单元(a 3 SUB)用作碱溶性树脂(A)。 在组分(A)中,单元(a 3 SUB)是苯基倍半硅氧烷单元的共聚物是新的化合物。