专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08104966B2 Bearing device 有权
标题翻译：轴承装置
公开(公告)号：US08104966B2
公开(公告)日：2012-01-31
申请号：US12227346
申请日：2007-05-10
申请人： Hiroshi Yamamoto , Motohide Sugihara , Atsushi Nagato
发明人： Hiroshi Yamamoto , Motohide Sugihara , Atsushi Nagato
IPC分类号： F16C33/10
CPC分类号： F16C17/02 , F16C33/1065 , F16C2240/30 , F16C2240/90 , F16C2350/26
摘要： In a bush (10) which relatively-rotatably supports a journal shaft (1) around its central axis by housing the journal shaft (1) in a formed bearing hole (11), the bush 10 includes an oil supply groove (16) formed spirally to supply lube oil to an inner surface of the bearing hole (11) which contacts to the journal shaft (1) when the journal shaft relatively rotates. A ratio of an area of the oil supply groove (16) to the inner surface area of the bearing hole (11) is equal to or less than 30%. A product of a distance in the central axis direction and a distance in the circumferential direction of the journal shaft (1) between the oil supply groove (16) in next to each other on the inner surface of the bearing hole (11) is within 50 to 300 mm2 range.
摘要翻译：在通过将轴颈轴（1）容纳在形成的轴承孔（11）中而相对地可旋转地支撑轴颈轴（1）的衬套（10）中，衬套10包括形成的供油槽（16）螺旋地将润滑油供给到当轴颈轴相对旋转时与轴颈轴（1）接触的轴承孔（11）的内表面。供油槽（16）的面积与轴承孔（11）的内表面积的比例等于或小于30％。在轴承孔（11）的内表面上彼此相邻的供油槽（16）之间的轴心方向上的距离和轴颈轴（1）的周向距离的乘积在内 50至300 mm2范围。

2. 发明申请

US20090268996A1 Bearing Device 有权
标题翻译：轴承装置
公开(公告)号：US20090268996A1
公开(公告)日：2009-10-29
申请号：US12227346
申请日：2007-05-10
申请人： Hiroshi Yamamoto , Motohide Sugihara , Atsushi Nagato
发明人： Hiroshi Yamamoto , Motohide Sugihara , Atsushi Nagato
IPC分类号： F16C33/10
CPC分类号： F16C17/02 , F16C33/1065 , F16C2240/30 , F16C2240/90 , F16C2350/26
摘要： In a bush (10) which relatively-rotatably supports a journal shaft (1) around its central axis by housing the journal shaft (1) in a formed bearing hole (11), the bush 10 includes an oil supply groove (16) formed spirally to supply lube oil to an inner surface of the bearing hole (11) which contacts to the journal shaft (1) when the journal shaft relatively rotates. A ratio of an area of the oil supply groove (16) to the inner surface area of the bearing hole (11) is equal to or less than 30%. A product of a distance in the central axis direction and a distance in the circumferential direction of the journal shaft (1) between the oil supply groove (16) in next to each other on the inner surface of the bearing hole (11) is within 50 to 300 mm2 range.
摘要翻译：在通过将轴颈轴（1）容纳在形成的轴承孔（11）中而相对地可旋转地支撑轴颈轴（1）的衬套（10）中，衬套10包括形成的供油槽（16）螺旋地将润滑油供给到当轴颈轴相对旋转时与轴颈轴（1）接触的轴承孔（11）的内表面。供油槽（16）的面积与轴承孔（11）的内表面积的比例等于或小于30％。在轴承孔（11）的内表面上彼此相邻的供油槽（16）之间的轴心方向上的距离和轴颈轴（1）的周向距离的乘积在内 50至300 mm2范围。

3. 发明授权

US06693790B2 Static electricity chuck apparatus and semiconductor producing apparatus provided with the static electricity chuck apparatus 失效
标题翻译：具有静电卡盘装置的静电卡盘装置和半导体制造装置
公开(公告)号：US06693790B2
公开(公告)日：2004-02-17
申请号：US10121557
申请日：2002-04-12
申请人： Teruyuki Matsuki , Motohide Sugihara , Kanichi Kadotani
发明人： Teruyuki Matsuki , Motohide Sugihara , Kanichi Kadotani
IPC分类号： H01L2168
CPC分类号： H01L21/67017
摘要： Insulative viscous fluid or gel material having low hardness is used for at least a first electricity insulating layer as an insulating layer of a static electricity chuck. Since a holding surface of the first electricity insulating layer is deformed in accordance with a back surface shape of a wafer, a substantially entire surface of the holding surface comes into intimate contact with the wafer uniformly. An exposing surface of the electricity insulating layer may be coated with a second electricity insulating layer having corrosion resistance. With this structure, adhesion between the back surface of the wafer and the static electricity chuck apparatus is enhanced, which reduces the contact thermal resistance, and it is possible to obtain a static electricity chuck apparatus which is capable of controlling temperature of a surface of the wafer with high precision and has high plasma resistance and durability.
摘要翻译：作为静电卡盘的绝缘层的至少第一电绝缘层使用具有低硬度的绝缘粘性流体或凝胶材料。由于第一电绝缘层的保持表面根据晶片的背面形状而变形，所以保持表面的大致整个表面均匀地与晶片紧密接触。电绝缘层的暴露表面可以涂覆有具有耐腐蚀性的第二电绝缘层。利用这种结构，提高了晶片的背面与静电卡盘装置之间的粘附性，这降低了接触热阻，并且可以获得能够控制表面的温度的静电卡盘装置晶圆精度高，等离子电阻和耐久性好。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式