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    • 9. 发明申请
    • Nonvolatile semiconductor memory device and manufacturing method thereof
    • 非易失性半导体存储器件及其制造方法
    • US20070291539A1
    • 2007-12-20
    • US11699334
    • 2007-01-30
    • Atsuhiro KinoshitaRiichiro ShirotaHiroshi WatanabeKenichi MurookaJunji Koga
    • Atsuhiro KinoshitaRiichiro ShirotaHiroshi WatanabeKenichi MurookaJunji Koga
    • G11C11/34H01L21/822
    • H01L27/115H01L27/11556H01L27/11568
    • A nonvolatile semiconductor memory device includes a semiconductor substrate, plural semiconductor columns arranged in a matrix form on the substrate, plural first conductive areas zonally formed in a column direction on the substrate between the semiconductor columns and functioning as word lines, plural second conductive areas formed at tops of the semiconductor columns, respectively, plural bit lines connecting the second conductive areas in a row direction, plural channel areas respectively formed in the semiconductor columns between the first and second conductive areas and contacting the first and second conductive areas, plural third conductive areas continuously formed via first insulating films above the substrate and opposite to the channel areas in the column direction between the semiconductor columns and functioning as control gates, and plural charge accumulation areas respectively formed via second insulating films at upper portions of the channel areas at a position higher than the third conductive areas.
    • 非易失性半导体存储器件包括:半导体衬底,以矩阵形式布置在衬底上的多个半导体柱,在半导体柱之间的衬底上的列方向上分区形成的多个第一导电区域,并且用作字线,形成多个第二导电区域 在半导体柱的顶部分别分别连接在行方向上的第二导电区域的多个位线,分别形成在第一和第二导电区域之间的半导体柱中并与第一和第二导电区域接触的多个沟道区域,多个第三导电 通过基板上方的第一绝缘膜连续形成的区域,并且与半导体柱之间的列方向上的沟道区域相对,并且用作控制栅极,以及分别在沟道区域的上部经由第二绝缘膜形成的多个电荷累积区域 位置高 她比第三个导电区域。