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1. 发明授权

US06605335B2 Magnetic recording medium 失效
标题翻译：磁记录介质
公开(公告)号：US06605335B2
公开(公告)日：2003-08-12
申请号：US09861642
申请日：2001-05-22
申请人： Hiroshi Tani , Hiroyuki Matsumoto , Mitsuhiro Shyoda , Tomonori Kozaki , Takayuki Nakakawaji , Yoko Ogawa
发明人： Hiroshi Tani , Hiroyuki Matsumoto , Mitsuhiro Shyoda , Tomonori Kozaki , Takayuki Nakakawaji , Yoko Ogawa
IPC分类号： G11B572
CPC分类号： G11B5/725 , Y10T428/24355 , Y10T428/265 , Y10T428/30 , Y10T428/3154 , Y10T428/31678
摘要： The present invention provides a magnetic recording media made possible to improve reliability and durability of the magnetic recording media with an extremely thin overcoat. A magnetic recording media made by forming at least a magnetic coat and an overcoat on a substrate of non-magnetic magnetic disk on which surface a liquid lubricant having a structure of perfluoropolyether is coated, wherein average roughness of overcoat surface Ra is less than 0.8 nm, said overcoat being a diamond-like-carbon with a thickness in a range of 1.5-4.5 nm, and said lubricant on said carbon overcoat containing a lubricant component having a structure represented by chemical formula (1): (where, p=5-36, q=4-30, x=1-5).
摘要翻译：本发明提供一种磁记录介质，其可以改善具有极薄外涂层的磁记录介质的可靠性和耐久性。一种磁性记录介质，其通过在非磁性磁盘的基板上形成至少一层磁性涂层和外涂层而形成，其中涂覆有具有全氟聚醚结构的液体润滑剂的表面，其中外涂层表面Ra的平均粗糙度小于0.8nm 所述外涂层是厚度为1.5-4.5nm的类金刚石，所述碳外涂层上的所述润滑剂含有具有由化学式（1）表示的结构的润滑剂组分:(其中p = 5 -36，q = 4-30，x = 1-5）。

2. 发明授权

US07147943B2 Magnetic recording medium, the manufacturing method and magnetic recording apparatus using the same 有权
公开(公告)号：US07147943B2
公开(公告)日：2006-12-12
申请号：US10429704
申请日：2003-05-06
申请人： Toshinori Ono , Yuuichi Kokaku , Hiroyuki Matsumoto , Hiroshi Tani , Mitsuhiro Shoda , Tomonori Kozaki , Hiroshi Ishikawa , Toru Yatsue , Yoshinori Honda , Shigehiko Fujimaki
发明人： Toshinori Ono , Yuuichi Kokaku , Hiroyuki Matsumoto , Hiroshi Tani , Mitsuhiro Shoda , Tomonori Kozaki , Hiroshi Ishikawa , Toru Yatsue , Yoshinori Honda , Shigehiko Fujimaki
IPC分类号： G11B5/66 , G11B5/70
CPC分类号： G11B5/8408 , G11B5/72
摘要： This magnetic recording medium is characterized in that in the magnetic recording medium having a magnetic layer on a non-magnetic substrate by intercalating at least an under layer, the proportion of functional groups per 100 carbon atoms in a diamond-like carbon protective layer mainly composed of carbon for protecting the magnetic layer exceeds 20%. The bonding force between the protective layer and the lubricating layer of the magnetic recording medium is increased so that under high speed rotation, a decrease in the lubricating layer is not caused so as to provide a magnetic recording apparatus having high reliability.

3. 发明申请

US20060044688A1 Magnetic disk with protection film and magnetic disk manufacturing method 审中-公开
标题翻译：磁盘带保护膜和磁盘制造方法
公开(公告)号：US20060044688A1
公开(公告)日：2006-03-02
申请号：US11215533
申请日：2005-08-29
申请人： Yuichi Kokaku , Tomonori Kozaki , Toshinori Ono , Kazuhiro Ura
发明人： Yuichi Kokaku , Tomonori Kozaki , Toshinori Ono , Kazuhiro Ura
IPC分类号： G11B5/82
CPC分类号： G11B5/84 , G11B5/8408
摘要： Embodiments of the invention provide a magnetic disk capable of maintaining a satisfactory sliding resistance and having a high corrosion resistance and a manufacturing method thereof. The magnetic disk and the manufacturing method thereof are realized by forming a protection film having a less film thickness distribution on a magnetic film surface, particularly by reducing a film thickness distribution in a load/unload zone in addition to a reduction in film thickness of the protection film. In one embodiment, a shortest distance between a substrate and a supporting member is 10 mm or more in a step of forming the protection film, the substrate being mounted on a holder having claws for holding the substrate and supporting members for supporting the claws. In addition, the method is characterized by chamfering the face confronting the substrate of the supporting member and setting the shortest distance between the substrate and the supporting member to 5 mm or more.
摘要翻译：本发明的实施例提供一种能够保持令人满意的滑动阻力并具有高耐腐蚀性的磁盘及其制造方法。磁盘及其制造方法通过在磁性膜表面上形成具有较小膜厚分布的保护膜，特别是通过降低负载/卸载区域中的膜厚度分布，除了减小膜厚度保护膜在一个实施例中，在形成保护膜的步骤中，衬底和支撑构件之间的最短距离为10mm以上，衬底安装在具有用于保持衬底的支架和用于支撑爪的支撑构件的保持器上。此外，该方法的特征在于使面对面的支撑构件的基板倒角并将基板和支撑构件之间的最短距离设定为5mm以上。

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