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1. 发明授权

US06741327B2 Method of correcting projection optical system and method of manufacturing semiconductor device 有权
标题翻译：投影光学系统校正方法及制造半导体器件的方法
公开(公告)号：US06741327B2
公开(公告)日：2004-05-25
申请号：US09893631
申请日：2001-06-29
申请人： Hiroshi Nomura , Kenji Konomi , Manabu Takakuwa
发明人： Hiroshi Nomura , Kenji Konomi , Manabu Takakuwa
IPC分类号： G03B2768
CPC分类号： G03F7/706 , G03F7/70258
摘要： The method of correcting a residual aberration of a projection optical system, which is used for projecting a pattern of a photo mask onto a photosensitive film located on a substrate, the method includes calculating an effect of a residual aberration on a given pattern on the basis of the residual aberration of the projection optical system obtained by measurement, calculating a moving amount of an adjustable aberration in the projection optical system such that the effect of the residual aberration becomes minimum in a given area, and moving the adjustable aberration in accordance with the calculated moving amount.
摘要翻译：校正用于将光掩模的图案投影到位于基板上的感光膜上的投影光学系统的残余像差的方法，该方法包括基于在基础上计算给定图案上的残余像差的影响通过测量获得的投影光学系统的残余像差，计算投影光学系统中的可变像差的移动量，使得在给定区域中残余像差的影响变得最小，并且根据计算移动量。

2. 发明授权

US06940585B2 Evaluation mask, focus measuring method and aberration measuring method 有权
标题翻译：评估面膜，聚焦测量方法和像差测量方法
公开(公告)号：US06940585B2
公开(公告)日：2005-09-06
申请号：US10657251
申请日：2003-09-09
申请人： Hiroshi Nomura , Kenji Konomi
发明人： Hiroshi Nomura , Kenji Konomi
IPC分类号： G01B11/00 , G01M11/02 , G03F1/44 , G03F7/20 , G03F7/207 , H01L21/027 , G03B27/52 , G03B27/32 , G03B25/42
CPC分类号： G03F7/706 , G03F7/70641
摘要： An evaluation mask for evaluating a projection-type exposure apparatus, the mask including at least one diffraction grating pattern for producing a diffracted light of the positive first-order and a diffracted light of negative first-order, diffraction efficiencies of the diffracted lights being different respectively, one of the diffracted lights having a magnitude that is zero, and an image of the at least one diffraction grating pattern being projected onto a test substrate by the projection-type exposure apparatus, and a reference pattern for obtaining a reference image to measure a displacement of the image of the diffraction grating pattern, and an image of the reference pattern being projected onto the test substrate or the image detector by the projection-type exposure apparatus, wherein the images of the diffraction grating pattern and the reference pattern projected onto the test substrate or the image detector are used for evaluating the projection-type exposure apparatus.
摘要翻译：用于评估投影型曝光装置的评估掩模，所述掩模包括至少一个用于产生正一级的衍射光的衍射光栅图案和负一级的衍射光，衍射光的衍射效率不同分别具有大小为零的衍射光中的一个，并且通过投影型曝光装置将至少一个衍射光栅图案的图像投影到测试基板上，以及用于获得用于测量的参考图像的参考图案衍射光栅图案的图像的位移和通过投影型曝光装置投影到测试基板或图像检测器上的参考图案的图像，其中衍射光栅图案和参考图案的图像投影到使用测试基板或图像检测器来评估投影型曝光装置。

3. 发明授权

US06674511B2 Evaluation mask, focus measuring method and aberration measuring method 有权
标题翻译：评估面膜，聚焦测量方法和像差测量方法
公开(公告)号：US06674511B2
公开(公告)日：2004-01-06
申请号：US09923443
申请日：2001-08-08
申请人： Hiroshi Nomura , Kenji Konomi
发明人： Hiroshi Nomura , Kenji Konomi
IPC分类号： G03B2752
CPC分类号： G03F7/706 , G03F7/70641
摘要： An evaluation mask for evaluating a projection-type exposure apparatus, the mask including at least one diffraction grating pattern for producing a diffracted light of the positive first-order and a diffracted light of negative first-order, diffraction efficiencies of the diffracted lights being different respectively, one of the diffracted lights having a magnitude that is zero, and an image of the at least one diffraction grating pattern being projected onto a test substrate by the projection-type exposure apparatus, and a reference pattern for obtaining a reference image to measure a displacement of the image of the diffraction grating pattern, and an image of the reference pattern being projected onto the test substrate or the image detector by the projection-type exposure apparatus, wherein the images of the diffraction grating pattern and the reference pattern projected onto the test substrate or the image detector are used for evaluating the projection-type exposure apparatus.
摘要翻译：用于评估投影型曝光装置的评估掩模，所述掩模包括至少一个用于产生正一级的衍射光的衍射光栅图案和负一级的衍射光，衍射光的衍射效率不同分别具有大小为零的衍射光中的一个，并且通过投影型曝光装置将至少一个衍射光栅图案的图像投影到测试基板上，以及用于获得用于测量的参考图像的参考图案衍射光栅图案的图像的位移和通过投影型曝光装置投影到测试基板或图像检测器上的参考图案的图像，其中衍射光栅图案和参考图案的图像投影到使用测试基板或图像检测器来评估投影型曝光装置。

4. 发明申请

US20050036122A1 Evaluation mask, focus measuring method and aberration measuring method 有权
公开(公告)号：US20050036122A1
公开(公告)日：2005-02-17
申请号：US10657251
申请日：2003-09-09
申请人： Hiroshi Nomura , Kenji Konomi
发明人： Hiroshi Nomura , Kenji Konomi
IPC分类号： G01B11/00 , G01M11/02 , G03F1/44 , G03F7/20 , G03F7/207 , H01L21/027 , G03B27/42
CPC分类号： G03F7/706 , G03F7/70641
摘要： An evaluation mask for evaluating a projection-type exposure apparatus, the mask including at least one diffraction grating pattern for producing a diffracted light of the positive first-order and a diffracted light of negative first-order, diffraction efficiencies of the diffracted lights being different respectively, one of the diffracted lights having a magnitude that is zero, and an image of the at least one diffraction grating pattern being projected onto a test substrate by the projection-type exposure apparatus, and a reference pattern for obtaining a reference image to measure a displacement of the image of the diffraction grating pattern, and an image of the reference pattern being projected onto the test substrate or the image detector by the projection-type exposure apparatus, wherein the images of the diffraction grating pattern and the reference pattern projected onto the test substrate or the image detector are used for evaluating the projection-type exposure apparatus.

5. 发明授权

US08785329B2 Method for forming pattern and method for manufacturing semiconductor device 有权
标题翻译：形成图案的方法和制造半导体器件的方法
公开(公告)号：US08785329B2
公开(公告)日：2014-07-22
申请号：US13728495
申请日：2012-12-27
申请人： Shimon Maeda , Kenji Konomi
发明人： Shimon Maeda , Kenji Konomi
IPC分类号： H01L21/00
CPC分类号： H01L21/02318 , B81C1/00031 , B81C2201/0149 , H01L21/0271 , H01L21/32139
摘要： In a method for forming a pattern according to an embodiment, a first guide pattern and a second guide pattern for induced self organization of a DSA material are formed on substrate. On a first DSA condition, a first phase-separated pattern having regularity with respect to the first guide pattern is formed, and a first pattern is formed by processing the lower layer side. Subsequently, on a second DSA condition, a second phase-separated pattern having regularity with respect to the second guide pattern is formed, and a second pattern is formed by processing the lower layer side.
摘要翻译：在根据实施例的形成图案的方法中，在基底上形成用于DSA材料的诱导自组织的第一引导图案和第二引导图案。在第一DSA条件下，形成相对于第一引导图案具有规则性的第一相分离图案，并且通过处理下层侧形成第一图案。随后，在第二DSA条件下，形成相对于第二引导图案具有规则性的第二相分离图案，并且通过处理下层侧形成第二图案。

6. 发明申请

US20130328155A1 GENERATION OF ADDITIONAL SHAPES ON A PHOTOMASK FOR A MULTIPLE EXPOSURE PROCESS 审中-公开
标题翻译：在多个曝光过程中生成光电子照相的附加形状
公开(公告)号：US20130328155A1
公开(公告)日：2013-12-12
申请号：US13490646
申请日：2012-06-07
申请人： Kenji Konomi
发明人： Kenji Konomi
IPC分类号： G06F17/50 , H01L21/32 , H01L29/02
CPC分类号： G03F1/38 , G03F1/70 , G06F17/5068 , G06F2217/12 , H01L27/0207 , Y02P90/265
摘要： The disclosed aspects relate to controlling density of photomasks. One or more unprintable auxiliary patterns can be placed near a mask feature as well as onto a location of a feature of the main pattern. If a density is measured and is not within an acceptable density range, one or more printable auxiliary patterns can be replaced with unprintable auxiliary patterns and/or one or more unprintable auxiliary patterns can be replaced with printable auxiliary patterns. The disclosed aspects can be utilized to create a photomask and/or a semiconductor device, such as a large scale integrated circuit device, that comprises the photomask.
摘要翻译：所公开的方面涉及控制光掩模的密度。可以将一个或多个不可打印的辅助图案放置在掩模特征附近以及主图案的特征的位置附近。如果测量密度并且不在可接受的密度范围内，则可以用不可印刷的辅助图案替换一个或多个可印刷的辅助图案和/或可以用可印刷的辅助图案代替一个或多个不可打印的辅助图案。所公开的方面可以用于创建包括光掩模的光掩模和/或诸如大规模集成电路器件的半导体器件。

7. 发明授权

US09079602B2 Steering system and steering control apparatus 有权
标题翻译：转向系统和转向控制装置
公开(公告)号：US09079602B2
公开(公告)日：2015-07-14
申请号：US13699688
申请日：2011-05-20
申请人： Kenji Konomi , Yuji Ebihara
发明人： Kenji Konomi , Yuji Ebihara
IPC分类号： B62D6/00 , B62D6/02 , B62D6/04 , B62D6/08 , B62D5/04
CPC分类号： B62D6/007 , B62D5/0472 , B62D6/008 , B62D6/02 , B62D6/04 , B62D6/08
摘要： A steering system including a steering member provided in a vehicle and configured to be rotated, an adjustment apparatus configured to adjust a rotary direction vibration of the steering member, and a steering control apparatus configured to control the adjustment apparatus, in accordance with an operating condition of the vehicle, so as to adjust the vibration.
摘要翻译：一种转向系统，包括设置在车辆中并构造成旋转的转向构件，配置成调节转向构件的旋转方向振动的调节装置，以及被配置为根据操作条件控制调节装置的转向控制装置的车辆，以便调节振动。

8. 发明申请

US20140073141A1 METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：形成图案的方法和制造半导体器件的方法
公开(公告)号：US20140073141A1
公开(公告)日：2014-03-13
申请号：US13728495
申请日：2012-12-27
申请人： Shimon MAEDA , Kenji Konomi
发明人： Shimon MAEDA , Kenji Konomi
IPC分类号： H01L21/02
CPC分类号： H01L21/02318 , B81C1/00031 , B81C2201/0149 , H01L21/0271 , H01L21/32139
摘要： In a method for forming a pattern according to an embodiment, a first guide pattern and a second guide pattern for induced self organization of a DSA material are formed on substrate. On a first DSA condition, a first phase-separated pattern having regularity with respect to the first guide pattern is formed, and a first pattern is formed by processing the lower layer side. Subsequently, on a second DSA condition, a second phase-separated pattern having regularity with respect to the second guide pattern is formed, and a second pattern is formed by processing the lower layer side.
摘要翻译：在根据实施例的形成图案的方法中，在基底上形成用于DSA材料的诱导自组织的第一引导图案和第二引导图案。在第一DSA条件下，形成相对于第一引导图案具有规则性的第一相分离图案，并且通过处理下层侧形成第一图案。随后，在第二DSA条件下，形成相对于第二引导图案具有规则性的第二相分离图案，并且通过处理下层侧形成第二图案。

9. 发明申请

US20130073146A1 STEERING SYSTEM AND STEERING CONTROL APPARATUS 有权
标题翻译：转向系统和转向控制装置
公开(公告)号：US20130073146A1
公开(公告)日：2013-03-21
申请号：US13699688
申请日：2011-05-20
申请人： Kenji Konomi , Yuji Ebihara
发明人： Kenji Konomi , Yuji Ebihara
IPC分类号： B62D6/00 , B62D6/08 , B62D6/04 , B62D6/02
CPC分类号： B62D6/007 , B62D5/0472 , B62D6/008 , B62D6/02 , B62D6/04 , B62D6/08
摘要： A steering system including a steering member provided in a vehicle and configured to be rotated, an adjustment apparatus configured to adjust a rotary direction vibration of the steering member, and a steering control apparatus configured to control the adjustment apparatus, in accordance with an operating condition of the vehicle, so as to adjust the vibration.
摘要翻译：一种转向系统，包括设置在车辆中并构造成旋转的转向构件，配置成调节转向构件的旋转方向振动的调节装置，以及被配置为根据操作条件控制调节装置的转向控制装置的车辆，以便调节振动。

10. 发明授权

US08127256B2 Pattern data generation method, design layout generating method, and pattern data verifying program 失效
标题翻译：模式数据生成方法，设计布局生成方法和模式数据验证程序
公开(公告)号：US08127256B2
公开(公告)日：2012-02-28
申请号：US12252978
申请日：2008-10-16
申请人： Kenji Konomi
发明人： Kenji Konomi
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F17/5081
摘要： A pattern data generation method according to an example of the present invention includes based on design pattern data of a circuit including a plurality of MIS transistors having the same gate size, identifying types of the plurality of MIS transistors, setting size specs for gate patterns of the plurality of MIS transistors, the size specs being different for different types of the MIS transistors, and verifying whether gate patterns of the MIS transistors predicted by simulation using mask pattern data for forming the MIS transistors satisfy the size specs.
摘要翻译：根据本发明的示例的图案数据生成方法包括基于包括具有相同栅极尺寸的多个MIS晶体管的电路的设计图案数据，识别多个MIS晶体管的类型，设置栅极图案的尺寸规格所述多个MIS晶体管的尺寸规格对于不同类型的MIS晶体管是不同的，并且验证通过使用用于形成MIS晶体管的晶体管阵列数据的模拟来模拟的MIS晶体管的栅极图案是否满足尺寸规格。

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