专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08268546B2 Structure for pattern formation, method for pattern formation, and application thereof 失效
标题翻译：图案形成结构，图案形成方法及其应用
公开(公告)号：US08268546B2
公开(公告)日：2012-09-18
申请号：US12122833
申请日：2008-05-19
申请人： Hironori Kobayashi , Manabu Yamamoto , Daigo Aoki , Hironori Kamiyama , Shinichi Hikosaka , Mitsuhiro Kashiwabara
发明人： Hironori Kobayashi , Manabu Yamamoto , Daigo Aoki , Hironori Kamiyama , Shinichi Hikosaka , Mitsuhiro Kashiwabara
IPC分类号： G03F7/26
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
摘要翻译：一种用于图案形成的结构，用于光学地形成图案，其特征在于包括：设置在基底上的含光催化剂的层，所述含光催化剂的层含有通过在图案曝光时的光催化作用可润湿性的材料。

2. 发明授权

US07965446B2 Structure for pattern formation, method for pattern formation, and application thereof 有权
标题翻译：图案形成结构，图案形成方法及其应用
公开(公告)号：US07965446B2
公开(公告)日：2011-06-21
申请号：US11867842
申请日：2007-10-05
申请人： Hironori Kobayashi , Manabu Yamamoto , Daigo Aoki , Hironori Kamiyama , Shinichi Hikosaka , Mitsuhiro Kashiwabara
发明人： Hironori Kobayashi , Manabu Yamamoto , Daigo Aoki , Hironori Kamiyama , Shinichi Hikosaka , Mitsuhiro Kashiwabara
IPC分类号： G02B27/10
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
摘要翻译：一种用于图案形成的结构，用于光学地形成图案，其特征在于包括：设置在基底上的含光催化剂的层，所述含光催化剂的层含有通过在图案曝光时的光催化作用可润湿性的材料。

3. 发明授权

US07858274B2 Method for manufacturing color filter 有权
标题翻译：彩色滤光片制造方法
公开(公告)号：US07858274B2
公开(公告)日：2010-12-28
申请号：US11800489
申请日：2007-05-04
申请人： Hironori Kobayashi
发明人： Hironori Kobayashi
IPC分类号： G02B5/20 , G02F1/1335
CPC分类号： B82Y30/00 , G02F1/133516
摘要： In the present invention, a provision of a method for manufacturing a color filter capable of forming a highly sophisticated pattern, to be formed easily at a low cost is desired. The present invention achieves the above mentioned object by providing a method for manufacturing a color filter comprising: (1) forming a light shielding part on a transparent base material; (2) forming a wettability changeable layer which the wettability changes by the function of a photocatalyst, on the surface of the transparent base material on the side with the light shielding part formed; (3) placing the photocatalyst containing layer of the photocatalyst containing layer side substrate which is the photocatalyst containing layer containing a photocatalyst formed on the base member, and the wettability changeable layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a pixel part forming part comprising a lyophilic area where the contact angle to a liquid is lowered compared with the state before the energy irradiation to the wettability changeable layer, in a pattern; and (4) coloring the pixel part forming part by the ink jet method so as to form a pixel part.
摘要翻译：在本发明中，期望提供一种能够以低成本容易地形成能够形成高度复杂图案的滤色器的方法。本发明通过提供一种制造滤色器的方法来实现上述目的，包括：（1）在透明基材上形成遮光部分; （2）在形成有遮光部的一侧的透明基材的表面上形成润湿性由光催化剂的功能而变化的润湿性变化层; （3）将含有形成在基材上的含有光催化剂的光催化剂含有层的光催化剂含有层侧基材的含光催化剂层和间隙为200μm以下的润湿性变化层进行放置，形成像素部分形成部分，其形成部分包括亲液性区域，其中液体的接触角与向可润湿性变化层的能量照射之前的状态相比降低; 和（4）通过喷墨法着色像素部分形成部分以形成像素部分。

4. 发明授权

US07846647B2 Method of producing pattern-formed structure and photomask used in the same 有权
标题翻译：产生图案形成结构的方法和使用的光掩模
公开(公告)号：US07846647B2
公开(公告)日：2010-12-07
申请号：US10922217
申请日：2004-08-18
申请人： Hironori Kobayashi
发明人： Hironori Kobayashi
IPC分类号： G03F7/26 , G03F7/20
CPC分类号： B82Y30/00 , G03F7/0007 , G03F7/001 , G03F7/11 , G03F7/2014 , Y10S430/148
摘要： The present invention discloses a method of producing a pattern-formed structure, comprising the processes of: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer whose characteristic at a surface thereof can be modified by the action of photocatalyst; preparing a photocatalyst-containing-layer side substrate having a photocatalyst-containing layer formed on a base material, the photocatalyst-containing layer containing photocatalyst; arranging the substrate for a pattern-formed structure and the photocatalyst-containing-layer side substrate such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a clearance of no larger than 200 μm therebetween; and irradiating energy to the characteristic-modifiable layer from a predetermined direction, and modifying characteristic of a surface of the characteristic-modifiable layer, thereby forming a pattern at the characteristic-modifiable layer. According to this method, a highly precise pattern can be formed without necessity to carry out any post-treatment after exposure. Further, there is no concern that the pattern-formed structure itself deteriorates because the produced pattern-formed structure is free of the photocatalyst.
摘要翻译：本发明公开了一种图案形成结构的制造方法，其特征在于，包括以下工序：制备具有特征可修改层的图案形成结构的基板，其表面的特性可以通过光催化剂的作用进行改性; 制备含有形成在基材上的含光催化剂层的含光催化剂的层侧基材，含有光催化剂的层含有光催化剂; 将图案形成结构的基板和含有光催化剂的层侧基板排列成使得特征可修改层面对含有光催化剂的层，间隙不大于200μm; 以及从预定方向向特征可修改层照射能量，并修改特征可修饰层的表面的特性，从而在特征可修饰层形成图案。根据该方法，可以形成高精度图案，而不需要在曝光后进行任何后处理。此外，由于所生成的图案形成结构体不含光催化剂，因此不会担心图案形成结构本身会劣化。

5. 发明授权

US07781127B2 Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light 失效
标题翻译：图案成型体的制造方法，真空紫外线光掩模
公开(公告)号：US07781127B2
公开(公告)日：2010-08-24
申请号：US11523813
申请日：2006-09-15
申请人： Takashi Sawada , Masafumi Kamada , Kaori Yamashita , Hironori Kobayashi
发明人： Takashi Sawada , Masafumi Kamada , Kaori Yamashita , Hironori Kobayashi
IPC分类号： G03F1/00
CPC分类号： G03F7/2014 , G03F1/50 , G03F7/7035
摘要： A main object of the present invention is to provide a manufacturing method of a pattern formed body which makes it possible to form property varied patterns having a desired line width, even when plural pattern formed bodies are manufactured. To achieve the object, the invention provides a manufacturing method of pattern formed bodies, comprising: a pattern-forming step of radiating vacuum-ultraviolet light onto a patterning substrate, a surface property of which is varied by the vacuum-ultraviolet light, through a photomask having at least a transparent substrate and a light shielding part to form a pattern formed body having a property varied pattern, in which the surface property of the patterning substrate is varied; and a step of repeating the pattern-forming step to manufacture a plurality of the pattern formed bodies, wherein an interval between the transparent substrate and the patterning substrate upon the pattern-forming step is set into the range of 0.1 μm to 200 μm.
摘要翻译：本发明的主要目的是提供一种图案形成体的制造方法，即使制造多个图案形成体也能够形成具有期望的线宽的特性变化的图案。为了实现该目的，本发明提供了一种图案形成体的制造方法，其特征在于，包括：图案形成步骤，通过真空紫外线照射真空紫外光，使其表面特性由真空紫外线变化至少具有透明基板和遮光部的光掩模，形成具有不同图案的图案形成体，其中，图案形成基板的表面特性变化; 以及重复图案形成步骤以制造多个图案形成体的步骤，其中在图案形成步骤中，透明基板和图案形成基板之间的间隔被设定在0.1μm至200μm的范围内。

6. 发明授权

US07569334B2 Method of manufacturing for conductive pattern substrate 失效
标题翻译：导电图案基板的制造方法
公开(公告)号：US07569334B2
公开(公告)日：2009-08-04
申请号：US10417516
申请日：2003-04-17
申请人： Hironori Kobayashi , Yudai Yamashita
发明人： Hironori Kobayashi , Yudai Yamashita
IPC分类号： G03F7/16 , G03F7/20
CPC分类号： H05K3/1208 , G03F7/0007 , G03F7/0757 , G03F7/09 , G03F7/26 , H05K2203/107 , H05K2203/1173
摘要： In the present invention, the problem of stability deterioration of the obtained conductive pattern substrate at the time of forming a conductive pattern by an additive method when a layer having reactivity remains on the substrate is to be solved. According to pattern exposure with a photo catalyst substrate 4 having a photo catalyst layer 3 laminated on a second substrate 5 superimposed onto a wettability changeable substrate 1 with a wettability changeable layer 3 laminated on a first substrate 2, a wettability pattern is formed. And furthermore, by adhering a conductive coating solution, or the like, a conductive pattern substrate without containing a photo catalyst can be manufactured.
摘要翻译：在本发明中，解决了当具有反应性的层保留在基板上时通过添加法形成导电图案时所得到的导电图案基板的稳定性劣化的问题。根据图案曝光，具有层叠在第二基板5上的光催化剂层3的光催化剂基板4，第二基板5叠加在层叠在第一基板2上的可润湿性变化层3的润湿性可变基板1上，形成润湿性图案。此外，通过粘附导电性涂布液等，可以制造不含光催化剂的导电图案基板。

7. 发明授权

US07323225B2 Wettability changing layer and electronics device using same 失效
标题翻译：润湿性改变层和电子设备使用相同
公开(公告)号：US07323225B2
公开(公告)日：2008-01-29
申请号：US10651062
申请日：2003-08-29
申请人： Daigo Aoki , Masato Okabe , Hironori Kobayashi , Manabu Yamamoto , Tatsuya Miyoshi , Koji Arai , Hiroshi Kishimoto
发明人： Daigo Aoki , Masato Okabe , Hironori Kobayashi , Manabu Yamamoto , Tatsuya Miyoshi , Koji Arai , Hiroshi Kishimoto
IPC分类号： B32B9/04 , H01J1/62
CPC分类号： H01L51/0014 , H01L27/3239 , H01L27/3241 , H01L27/3281 , H01L51/0003 , H01L51/0023 , H01L51/56
摘要： An EL device comprising a first electrode, an EL layer formed on the first electrode, and a second electrode formed on the EL layer, wherein at least one layer of a material whose wettability changes when light is applied thereto is formed. The invention provides EL devices that can be simply produced, and processes for producing the same.
摘要翻译：一种EL器件，包括第一电极，形成在第一电极上的EL层和形成在EL层上的第二电极，其中至少一层当其上施加光时润湿性改变的材料层。本发明提供了可简单制造的EL器件及其制造方法。

8. 发明授权

US07320856B2 Manufacturing method of pattern formed body 失效
标题翻译：图案成型体的制造方法
公开(公告)号：US07320856B2
公开(公告)日：2008-01-22
申请号：US11527031
申请日：2006-09-26
申请人： Kaori Yamashita , Takashi Sawada , Hironori Kobayashi
发明人： Kaori Yamashita , Takashi Sawada , Hironori Kobayashi
IPC分类号： G03F7/00
CPC分类号： G03F1/82 , B08B7/0057 , G03F7/70925
摘要： A main object of the present invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously manufactured, their property varied patterns are each made into a target pattern form with high precision. To achieve the object, the invention provides a manufacturing method of a plurality of pattern formed bodies, comprising a pattern forming step and a foreign matter removing step, wherein the pattern forming step is a step of radiating vacuum-ultraviolet light through a photomask to a pattern forming substrate, varying a surface property by the vacuum-ultraviolet light, and forming a property varied pattern with the property varied on a surface of the pattern forming substrate to form a pattern formed body; the pattern forming step is repeated plural times to manufacture a plurality of the pattern formed bodies; and the foreign matter removing step is a step performed between the repeated pattern forming steps and of radiating vacuum-ultraviolet light from the same light source as used in the pattern forming step to the photomask, in a state where the photomask and the pattern forming substrate are not opposed to each other, to remove a foreign matter deposited onto the photomask.
摘要翻译：本发明的主要目的是提供一种多个图案成形体的制造方法，即使连续地制造图案形成体也能够将其特性变化的图案分别高精度地制成目标图案形状。为了实现该目的，本发明提供了一种多个图案成形体的制造方法，包括图案形成步骤和异物去除步骤，其中图案形成步骤是通过光掩模将真空紫外线照射到图案形成基板，通过真空紫外线改变表面特性，并且形成具有在图案形成基板的表面上变化的特性的变化图案以形成图案形成体; 重复多次图案形成步骤以制造多个图案形成体; 并且异物去除步骤是在重复图案形成步骤之间执行的步骤，并且在光掩模和图案形成基板的状态下，将与图案形成步骤中使用的相同的光源的真空紫外线照射到光掩模彼此不相对，以去除沉积在光掩模上的异物。

9. 发明申请

US20070218554A1 Cell Culture Patterning Substrate And Method For Manufacturing The Same 审中-公开
标题翻译：细胞培养图案基质及其制造方法
公开(公告)号：US20070218554A1
公开(公告)日：2007-09-20
申请号：US11587363
申请日：2005-04-25
申请人： Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi
发明人： Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi
IPC分类号： C12N5/02
CPC分类号： C12N5/0068 , C12M23/20 , C12M25/06 , C12M33/00 , C12N2535/10 , C12N2539/10
摘要： A main object of the present invention is to provide a cell culture patterning substrate and a method for manufacturing the same, which can be used to culture the cells on the substrate in an intended shape. To achieve the object, the present invention provides a cell culture patterning substrate comprising: a base material provided with a convex portion; and a cell culture region, which is a region for culturing a cell, formed on a surface of the base material, wherein the cell culture region is partitioned with the convex portion of the base material provided with the convex portion.
摘要翻译：本发明的主要目的在于提供一种细胞培养图案形成基板及其制造方法，其可以用于将基板上的细胞以期望的形状培养。为了达到上述目的，本发明提供一种细胞培养图案形成基板，其特征在于，具备：设置有凸部的基材; 和形成在基材表面上的细胞培养区域的细胞培养区域，其中细胞培养区域与设置有凸部的基材的凸部分隔开。

10. 发明申请

US20070190645A1 Vascular cell culture patterning substrate 审中-公开
标题翻译：血管细胞培养图案化底物
公开(公告)号：US20070190645A1
公开(公告)日：2007-08-16
申请号：US10592167
申请日：2005-03-10
申请人： Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi , Yusuke Uno
发明人： Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi , Yusuke Uno
IPC分类号： C12N5/06 , C12N5/08 , C12M3/00
CPC分类号： C12N5/069 , A61L27/3804 , A61L27/3895 , A61L27/507 , C12N2501/115 , C12N2533/90 , C12N2535/10
摘要： A vascular cell culture patterning substrate, which can efficiently form a plurality of blood vessels on one substrate. The vascular cell culture patterning substrate includes: a base material; a vascular cell adhesion portion formed in at least two substantially parallel lines on the base material, and having adhesive properties to a vascular cell which forms a blood vessel; and a vascular cell adhesion-inhibiting portion formed in between two adjacent vascular cell adhesion portions on the base material, and inhibiting adhesion to the vascular cell. The vascular cell adhesion-inhibiting portion contains a vascular cell adhesion-inhibiting material having vascular cell adhesion-inhibiting properties of inhibiting adhesion to the vascular cell.
摘要翻译：一种血管细胞培养图案化衬底，其能够在一个衬底上有效地形成多个血管。血管细胞培养图案形成基板包括：基材; 形成在所述基材上的至少两条基本上平行的线上的血管细胞粘附部分，并且对形成血管的血管细胞具有粘附性; 以及在基材上的两个相邻的血管细胞粘附部分之间形成的血管细胞粘附抑制部分，并且抑制对血管细胞的粘附。血管细胞粘附抑制部分含有具有抑制对血管细胞粘附的血管细胞粘附抑制性质的血管细胞粘附抑制物质。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式