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    • 7. 发明授权
    • Liquid crystal display with black matrix formed by a black resin optical shielding layer and a blue filter layer
    • 由黑色树脂光学屏蔽层和蓝色滤光层形成的具有黑色矩阵的液晶显示器
    • US06392729B1
    • 2002-05-21
    • US09452170
    • 1999-12-01
    • Akiya IzumiMasao YoshiokaTatsuo HamamotoNorimasa Akiyama
    • Akiya IzumiMasao YoshiokaTatsuo HamamotoNorimasa Akiyama
    • G02F11333
    • G02F1/133512G02F1/133514G02F1/133516
    • Disclosed are a liquid crystal display device capable of obtaining preferable display images, whose manufacturing cost is low, and which does not deteriorate the environment at the time of fabrication and a method for fabricating the same. According to the invention, there is provided a liquid crystal display device comprising: a first substrate on which a black matrix, a color filter, and a counter electrode are formed; a second substrate on which a plurality of gate signal lines and a plurality of source signal lines which are disposed so as to cross each other via a gate insulating film, thin film transistors disposed in intersecting points of the gate signal lines and the source signal lines, and pixel electrodes in a matrix disposed in the areas surrounded by the gate signal lines and the source signal lines are formed; and a liquid crystal layer provided between the first substrate and the second substrate, wherein the black matrix is formed by a black resin optical shielding layer and a blue filter layer. In a method for fabricating the liquid crystal display device according to the invention, the black matrix part formed by the blue filter layer is constructed by a photoresist film in which a blue pigment is dispersed and the photoresist film is patterned by using back side exposure.
    • 公开了一种液晶显示装置及其制造方法,其能够获得制造成本低的优选显示图像,并且不会使制造时的环境劣化。 根据本发明,提供了一种液晶显示装置,包括:形成黑矩阵,滤色器和对电极的第一基板; 第二基板,多个栅极信号线和多条源极信号线,其经由栅极绝缘膜彼此交叉设置,薄膜晶体管设置在栅极信号线和源极信号线的交叉点 并且形成设置在由栅极信号线和源极信号线包围的区域中的矩阵中的像素电极; 以及设置在第一基板和第二基板之间的液晶层,其中黑色矩阵由黑色树脂光学屏蔽层和蓝色滤色器层形成。 在根据本发明的液晶显示装置的制造方法中,由蓝色滤色层形成的黑色矩阵部分由其中分散有蓝色颜料的光致抗蚀剂膜构成,并且通过背面曝光对光致抗蚀剂膜进行图案化。