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1. 发明申请

US20050196059A1 Image input apparatus and inspection apparatus 审中-公开
标题翻译：图像输入装置和检查装置
公开(公告)号：US20050196059A1
公开(公告)日：2005-09-08
申请号：US11064014
申请日：2005-02-24
申请人： Hiromu Inoue , Tsuneo Terasawa , Shinichi Imai , Takehiko Nomura
发明人： Hiromu Inoue , Tsuneo Terasawa , Shinichi Imai , Takehiko Nomura
IPC分类号： G01B11/24 , G01N21/956 , G06K9/36 , G06T1/00 , H01L21/66
CPC分类号： G03F7/70616 , G01N21/9501 , G01N21/956 , G01N2021/95676
摘要： An image input apparatus for inputting an image of an object and outputting the image as an electric signal, the image input apparatus comprises a stage which supports the object, a laser interferometer which measures a position of the stage, a light source which emits a pulse light, an illumination optical system which irradiates the object with an illuminating light, a sensor which converts an image-formed optical image into an electric image signal, an imaging optical system which forms an image of the object on the sensor, a synchronization control circuit which controls a light-emission interval of the light source and synchronization of the sensor on the basis of position information of the laser interferometer, a light quantity monitor which measures a quantity of light, and a light quantity correction circuit which corrects the electric image signal on the basis of an output of the light quantity monitor.
摘要翻译：一种用于输入对象的图像并输出图像作为电信号的图像输入装置，所述图像输入装置包括支撑所述对象的平台，测量所述平台位置的激光干涉仪，发出脉冲的光源光，将照明光照射到物体上的照明光学系统，将图像形成的光学图像转换为电子图像信号的传感器，在传感器上形成物体的图像的成像光学系统，同步控制电路其基于激光干涉仪的位置信息，测量光量的光量监视器和校正电图像信号的光量校正电路来控制光源的发光间隔和传感器的同步基于光量监视器的输出。

2. 发明申请

US20080030719A1 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask 审中-公开
标题翻译：具有两个传感器的检查装置，用于检查物体的方法和用于制造光刻掩模的方法
公开(公告)号：US20080030719A1
公开(公告)日：2008-02-07
申请号：US11896146
申请日：2007-08-30
申请人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
发明人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N2021/95676
摘要： A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.
摘要翻译：光刻掩模检查装置具有至少两个传感器。一个传感器被配置为感测通过待检查对象传播的光，另一个传感器感测从物体反射的光。第一光学系统布置成用第一光束曝光物体的第一部分，并且第二光学系统布置成用第二光束暴露出与第一部分间隔开的物体的第二部分。第三光学系统将透射光聚焦到第一传感器，以及将反射光聚焦到第二传感器上。还提供缺陷检测电路，用于基于与反射和透射光相关联的图像数据来检测物体的缺陷。

3. 发明申请

US20050002020A1 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask 有权
标题翻译：具有两个传感器的检查装置，用于检查物体的方法和用于制造光刻掩模的方法
公开(公告)号：US20050002020A1
公开(公告)日：2005-01-06
申请号：US10852434
申请日：2004-05-25
申请人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
发明人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
IPC分类号： G01N21/956 , G03F1/84 , H01L21/66 , G01N21/88
CPC分类号： G01N21/956 , G01N2021/95676
摘要： A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.
摘要翻译：光刻掩模检查装置具有至少两个传感器。一个传感器被配置为感测通过待检查对象传播的光，另一个传感器感测从物体反射的光。第一光学系统布置成用第一光束曝光物体的第一部分，并且第二光学系统布置成用第二光束暴露出与第一部分间隔开的物体的第二部分。第三光学系统将透射光聚焦到第一传感器，以及将反射光聚焦到第二传感器上。还提供缺陷检测电路，用于基于与反射和透射光相关联的图像数据来检测物体的缺陷。

4. 发明授权

US07304730B2 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask 有权
标题翻译：具有两个传感器的检查装置，用于检查物体的方法和用于制造光刻掩模的方法
公开(公告)号：US07304730B2
公开(公告)日：2007-12-04
申请号：US10852434
申请日：2004-05-25
申请人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
发明人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N2021/95676
摘要： A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.
摘要翻译：光刻掩模检查装置具有至少两个传感器。一个传感器被配置为感测通过待检查对象传播的光，另一个传感器感测从物体反射的光。第一光学系统布置成用第一光束曝光物体的第一部分，并且第二光学系统布置成用第二光束暴露出与第一部分间隔开的物体的第二部分。第三光学系统将透射光聚焦到第一传感器，以及将反射光聚焦到第二传感器上。还提供缺陷检测电路，用于基于与反射和透射光相关联的图像数据来检测物体的缺陷。

5. 发明申请

US20110058729A1 PATTERN CHARACTERISTIC-DETECTION APPARATUS FOR PHOTOMASK AND PATTERN CHARACTERISTIC-DETECTION METHOD FOR PHOTOMASK 有权
标题翻译：用于光电子的图案特征检测装置和图案特征检测方法
公开(公告)号：US20110058729A1
公开(公告)日：2011-03-10
申请号：US12857906
申请日：2010-08-17
申请人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
发明人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
IPC分类号： G06K9/00
CPC分类号： G01N21/956 , G03F1/84 , G03F7/70525 , G03F7/70625 , G03F7/7065
摘要： According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.
摘要翻译：根据一个实施例，用于光掩模的图案特性检测装置包括检测数据创建部分，参考数据创建部分，提取部分，第一区域设置部分，检测部分和收集部分。检测数据创建部分被配置为基于形成在光掩模上的图案的光学图像来创建检测数据。参考数据创建部分被配置为创建该图案的参考数据。提取部分被提取用于图案特征检测的图案和提取的图案的位置信息。第一区域设定部被配置为设定要检测图案特性的区域，并且被配置为提取目标图案。检测部被配置为检测该区域内的目标图案的图案特性。此外，收集部分被配置为收集检测到的图案特征。

6. 发明申请

US20070200051A1 FOCUSING DEVICE, FOCUSING METHOD AND A PATTERN INSPECTING APPARATUS 失效
标题翻译：聚焦装置，聚焦方法和图案检查装置
公开(公告)号：US20070200051A1
公开(公告)日：2007-08-30
申请号：US11679411
申请日：2007-02-27
申请人： Hiromu Inoue , Tomohide Watanabe , Satoshi Endo , Masami Ikeda
发明人： Hiromu Inoue , Tomohide Watanabe , Satoshi Endo , Masami Ikeda
IPC分类号： G02B27/40
CPC分类号： G03F7/70641
摘要： A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.
摘要翻译：聚焦装置包括第一成像光学系统，第二成像光学系统，其在AF传感器的方向上分割光学图像，并进一步分割光学图像，使得其中焦点点在前面的前焦点图像在AF传感器上形成检查传感器上的光学图像的背焦点图像和焦点上的焦点位于检测传感器上的光学图像之后的焦点检测电路，该焦点检测电路基于检测传感器的最佳聚焦位置在前焦点位置处的前传感器图像的高频分量和后聚焦位置中的背传感器图像的高频分量的焦点控制电路，以及控制第一成像光学系统的聚焦在基础的焦点位置。

7. 发明授权

US06965687B2 Size checking method and apparatus 有权
标题翻译：尺寸检查方法和装置
公开(公告)号：US06965687B2
公开(公告)日：2005-11-15
申请号：US09883945
申请日：2001-06-20
申请人： Eiji Sawa , Hiromu Inoue
发明人： Eiji Sawa , Hiromu Inoue
IPC分类号： G01B11/02 , G01B11/24 , G06T5/00 , G06T7/00 , G06T7/60 , G06K9/00
CPC分类号： G01B11/028 , G01B11/2433 , G06T7/0006 , G06T7/12 , G06T7/168 , G06T7/62 , G06T2207/30148
摘要： A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.
摘要翻译：识别位于设计图案的宽度方向上观察的端部处的一对边缘。基于识别成对边缘的边缘方向，设计图案上的边缘点被检测为子像素。基于边缘点计算设计图案的宽度尺寸。此外，在与设计图案的宽度尺寸相同的位置处计算电路图案的宽度尺寸。基于计算出的宽度方向尺寸，检查半导体晶片电路图案。

8. 发明授权

US06849363B2 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device 有权
标题翻译：修复光掩模的方法，光掩模检查方法，光掩模的制造方法以及半导体装置的制造方法
公开(公告)号：US06849363B2
公开(公告)日：2005-02-01
申请号：US09870702
申请日：2001-06-01
申请人： Katsuki Ohashi , Hiromu Inoue , Akira Ono , Hiroyuki Ikeda
发明人： Katsuki Ohashi , Hiromu Inoue , Akira Ono , Hiroyuki Ikeda
IPC分类号： G01N21/956 , G03F1/00 , G03F1/84 , G03F7/20 , G03F9/00 , G06K9/00
CPC分类号： G03F7/70058 , G01N21/956 , G01N2021/95676 , G03F1/72 , G03F1/84 , Y10S430/146
摘要： A method for inspecting a photomask, comprising generating a laser beam, changing a phase of the laser beam to smooth the brightness distribution of the laser beam, applying the smoothed laser beam to the photomask, acquiring an image of the photomask using a sensor while the laser beam and the photomask are relatively moved, examining the image of the photomask for a defect of the mask-pattern of the photomask.
摘要翻译：一种用于检查光掩模的方法，包括产生激光束，改变激光束的相位以平滑激光束的亮度分布，将平滑的激光束施加到光掩模，使用传感器获取光掩模的图像，同时激光束和光掩模相对移动，检查光掩模的图像以获得光掩模的掩模图案的缺陷。

9. 发明授权

US4921623A Copper conductive coating composition 失效
标题翻译：铜导电涂料组合物
公开(公告)号：US4921623A
公开(公告)日：1990-05-01
申请号：US222532
申请日：1988-07-21
申请人： Shoji Yamaguchi , Kimiko Yamada , Katsuyoshi Yada , Koichi Sakaguchi , Hiromu Inoue
发明人： Shoji Yamaguchi , Kimiko Yamada , Katsuyoshi Yada , Koichi Sakaguchi , Hiromu Inoue
IPC分类号： C08K5/13 , C08K5/34 , C08K5/3472 , C08K5/3475 , C09D5/24 , C09D7/12 , H01B1/22 , H05K1/09
CPC分类号： H05K1/095 , C09D5/24 , H01B1/22
摘要： A copper-type conductive coating composition which comprises:(A) a copper powder,(B) a coating binder resin, and(C) at least one number selected from the group consisting of salicylic acid, its specific derivatives, and benzotriazolecarboxylic acid hydrazides.The copper-type conductive coating composition provides a conductive coating layer having excellent initial conductivity and capable of maintaining the level of it stable over a long period of the time.

10. 发明授权

US09841385B2 Pattern characteristic-detection apparatus for photomask and pattern characteristic-detection method for photomask 有权
公开(公告)号：US09841385B2
公开(公告)日：2017-12-12
申请号：US12857906
申请日：2010-08-17
申请人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
发明人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
IPC分类号： G03F1/84 , G01N21/956 , G03F7/20
CPC分类号： G01N21/956 , G03F1/84 , G03F7/70525 , G03F7/70625 , G03F7/7065
摘要： According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.

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