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1. 发明授权

US08697331B2 Compound, polymer, and radiation-sensitive composition 有权
标题翻译：化合物，聚合物和辐射敏感组合物
公开(公告)号：US08697331B2
公开(公告)日：2014-04-15
申请号：US12949795
申请日：2010-11-19
申请人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
发明人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： C07C69/96 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/26 , C09D133/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.
摘要翻译：化合物由下式（1）表示，其中R1表示氢原子，甲基或三氟甲基，R2表示亚甲基，亚乙基，1-甲基亚乙基，2-甲基亚乙基，碳原子数4〜20的二价脂环式烃基或其衍生物，各R3表示碳原子数为4〜20的一价脂环族烃基，其衍生物和具有1个碳原子的直链或支链烷基中的至少一种至4个碳原子，条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子，并且X表示具有1个碳原子的直链或支链氟亚烷基至20个碳原子。

2. 发明申请

US20110151378A1 RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD 审中-公开
标题翻译：用于液体渗透光刻，聚合物和电阻形成方法的辐射敏感性树脂组合物
公开(公告)号：US20110151378A1
公开(公告)日：2011-06-23
申请号：US12949790
申请日：2010-11-19
申请人： Nobuji MATSUMURA , Akimasa Soyano , Yuusuke Asano , Takehiko Naruoka , Hirokazu Sakakibara , Makoto Shimizu , Yukio Nishimura
发明人： Nobuji MATSUMURA , Akimasa Soyano , Yuusuke Asano , Takehiko Naruoka , Hirokazu Sakakibara , Makoto Shimizu , Yukio Nishimura
IPC分类号： G03F7/004 , G03F7/20 , C08F220/28 , C08F220/22
CPC分类号： C07C69/96 , C08F220/18 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08F220/28 , C08F220/22
摘要： A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit.
摘要翻译：用于液浸光刻的辐射敏感性树脂组合物包括树脂组分，光致酸发生剂和溶剂。树脂组分包含大于50质量％的含酸解离基团的树脂。含酸解离基的树脂包括在重复单元的侧链中包含氟原子和酸解离基团的重复单元。

3. 发明申请

US20110104611A1 NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION 有权
标题翻译：新型化合物，聚合物和辐射敏感组合物
公开(公告)号：US20110104611A1
公开(公告)日：2011-05-05
申请号：US12949795
申请日：2010-11-19
申请人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
发明人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
IPC分类号： G03F7/004 , C07C69/96 , C08F120/22
CPC分类号： C07C69/96 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/26 , C09D133/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.
摘要翻译：化合物由下式（1）表示，其中R1表示氢原子，甲基或三氟甲基，R2表示亚甲基，亚乙基，1-甲基亚乙基，2-甲基亚乙基，碳原子数4〜20的二价脂环式烃基或其衍生物，各R3表示碳原子数为4〜20的一价脂环族烃基，其衍生物和具有1个碳原子的直链或支链烷基中的至少一种至4个碳原子，条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子，并且X表示具有1个碳原子的直链或支链氟亚烷基至20个碳原子。

4. 发明授权

US08722306B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US08722306B2
公开(公告)日：2014-05-13
申请号：US12602769
申请日：2008-05-26
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译：辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。其中R1，R2和R3分别表示碳原子数为1〜4的直链或支链烷基，R4表示氢原子，碳原子数2〜4的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。

5. 发明申请

US20100178608A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100178608A1
公开(公告)日：2010-07-15
申请号：US12602769
申请日：2008-05-26
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译：辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。其中R1，R2和R3分别代表具有1-4个碳原子的直链或支链烷基，R4代表氢原子，具有2至4个碳原子的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。

6. 发明申请

US20100255420A1 RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER 审中-公开
标题翻译：辐射敏感性树脂组合物和聚合物
公开(公告)号：US20100255420A1
公开(公告)日：2010-10-07
申请号：US12740111
申请日：2008-10-21
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Yoshifumi Ooizumi , Kentarou Harada , Takuma Ebata
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Yoshifumi Ooizumi , Kentarou Harada , Takuma Ebata
IPC分类号： G03C1/00 , C08F118/02
CPC分类号： G03F7/0397 , C08F220/18 , C08L2312/06 , C09D133/14 , C09D133/16 , G03F7/0045 , G03F7/0046 , G03F7/2041 , C08F220/24 , C08F220/38
摘要： A radiation-sensitive resin composition includes a polymer, an acid-labile group-containing resin, a radiation-sensitive acid generator, and a solvent, the polymer including repeating units shown by following general formulas (1) and (2). wherein R1 and R2 represent a hydrogen atom, a methyl group, or a trifluoromethyl group, R3 represents a linear or branched alkyl group having 1 to 6 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom, or a derivative thereof, and Z represents a group that includes a group that generates an acid upon exposure to light. The radiation-sensitive resin composition produces an excellent pattern shape, reduces the amount of elution into an immersion liquid upon contact during liquid immersion lithography, ensures that a high receding contact angle is formed by a resist film and an immersion liquid, and rarely causes development defects.
摘要翻译：辐射敏感性树脂组合物包括聚合物，含酸不稳定基团的树脂，辐射敏感性酸产生剂和溶剂，所述聚合物包括由以下通式（1）和（2）表示的重复单元。其中R 1和R 2表示氢原子，甲基或三氟甲基，R 3表示碳原子数1〜6的直链或支链烷基或碳原子数4〜20的脂环式烃基，其中至少一个氢原子被氟原子或其衍生物取代，Z表示包含在曝光时产生酸的基团的基团。放射线敏感性树脂组合物产生优异的图案形状，在液浸光刻期间减少接触时浸入液中的洗脱量，确保通过抗蚀剂膜和浸渍液形成高后退接触角，并且很少引起显影缺陷

7. 发明授权

US07897821B2 Sulfonium compound 有权
标题翻译：锍化合物
公开(公告)号：US07897821B2
公开(公告)日：2011-03-01
申请号：US12873265
申请日：2010-08-31
申请人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
发明人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
IPC分类号： C07C31/34
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A′ represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.
摘要翻译：下式（5）表示化合物，其中Rf基中的至少一个表示氟原子或具有1-10个碳原子的直链或支链全氟烷基，A'表示取代或未取代的直链或支链亚烷基具有1至20个碳原子，具有至少一个杂原子的亚烷基或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示鎓阳离子，m表示1的自然数至3，p表示1至8的自然数。

8. 发明授权

US07812105B2 Compound, polymer, and radiation-sensitive composition 有权
标题翻译：化合物，聚合物和辐射敏感组合物
公开(公告)号：US07812105B2
公开(公告)日：2010-10-12
申请号：US11914024
申请日：2006-05-11
申请人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
发明人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
IPC分类号： C08F14/18 , C08F28/02
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.
摘要翻译：提供了对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂，例如灵敏度，分辨率和图案形状，具有优异的基本性能，特别是提供宽DOF和高分辨率辐射敏感性树脂组合物优秀的LER。还提供了可用于组合物中的聚合物和用于合成聚合物的新型化合物。该新化合物由下式（2）表示，其中R4表示甲基，三氟甲基或氢原子，Rfs中的至少一个表示氟原子或具有1至10个的直链或支链全氟烷基碳原子，A表示二价有机基团或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示金属离子或鎓阳离子，m表示1〜3的整数，p表示是1〜8的整数。

9. 发明授权

US07589888B2 Optical amplifier having a constant gain profile 有权
标题翻译：具有恒定增益曲线的光放大器
公开(公告)号：US07589888B2
公开(公告)日：2009-09-15
申请号：US11364157
申请日：2006-02-28
申请人： Shinichi Aozasa , Hiroji Masuda , Makoto Shimizu
发明人： Shinichi Aozasa , Hiroji Masuda , Makoto Shimizu
IPC分类号： H04B10/17 , H04B10/12
CPC分类号： H04B10/296 , H01S3/005 , H01S3/0064 , H01S3/0078 , H01S3/06754 , H01S3/06758 , H01S3/094011 , H01S3/094023 , H01S3/10007 , H01S3/10023 , H01S3/1301 , H01S3/1302 , H01S3/131 , H01S3/1616 , H01S3/2383
摘要： An optical amplifier includes a rare-earth doped optical fiber or rare-earth doped optical waveguide serving as an amplification medium where rare-earth ions have been doped in its core and/or clad, an excitation mechanism for exciting the amplification medium, and a plurality of optical resonator that causes laser oscillation at a plurality of wavelengths of amplified spontaneous emission light produced in the amplification medium.
摘要翻译：光放大器包括稀土掺杂光纤或稀土掺杂光波导，其用作在其核和/或包层中掺杂稀土离子的放大介质，用于激发放大介质的激发机制，以及多个光谐振器，其在放大介质中产生的放大的自发发射光的多个波长处引起激光振荡。

10. 发明授权

US07538937B2 Optical amplifier 有权
标题翻译：光放大器
公开(公告)号：US07538937B2
公开(公告)日：2009-05-26
申请号：US11364633
申请日：2006-02-28
申请人： Shinichi Aozasa , Hiroji Masuda , Makoto Shimizu
发明人： Shinichi Aozasa , Hiroji Masuda , Makoto Shimizu
IPC分类号： H04B10/17 , H04B10/12
CPC分类号： H04B10/296 , H01S3/005 , H01S3/0064 , H01S3/0078 , H01S3/06754 , H01S3/06758 , H01S3/094011 , H01S3/094023 , H01S3/10007 , H01S3/10023 , H01S3/1301 , H01S3/1302 , H01S3/131 , H01S3/1616 , H01S3/2383
摘要： An optical amplifier includes a rare-earth doped optical fiber or rare-earth doped optical waveguide serving as an amplification medium where rare-earth ions have been doped in its core and/or clad, an excitation mechanism for exciting the amplification medium, an optical resonator that causes laser oscillation at one or more wavelength of spontaneous emission light produced and amplified in the amplification medium, a monitoring mechanism that monitors a power of at least one light selected from a power of at least one light with at least one prescribed wavelength band selected from the light inputted to the amplification medium and a power of at least one light selected from a power of at least one light with at least one prescribed wavelength band selected from the light outputted from the amplification medium, and a control unit that controls the excitation mechanism based on a value from monitoring mechanism.
摘要翻译：光放大器包括稀土掺杂光纤或稀土掺杂光波导，其用作在其核和/或包层中掺杂稀土离子的放大介质，用于激发放大介质的激发机制，光学谐振器，其在放大介质中产生和放大的自发发射光的一个或多个波长处引起激光振荡;监测机构，其监测从具有至少一个规定波长带的至少一个光的功率中选出的至少一个光的功率从输入到放大介质的光中选择的光和从从放大介质输出的光中选择的至少一个规定波长带的至少一种光的功率中选择的至少一种光的功率;以及控制单元，激励机制基于监测机制的价值。

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