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1. 发明授权

US4599382A Rubber composition comprising a thermosetting resin and a functional rubber-like copolymer 失效
标题翻译：包含热固性树脂和功能橡胶状共聚物的橡胶组合物
公开(公告)号：US4599382A
公开(公告)日：1986-07-08
申请号：US714032
申请日：1985-03-20
申请人： Hozumi Sato , Shin-ichiro Iwanaga , Hiroji Enyo , Yasuhiko Takemura , Yoshiaki Kawamura
发明人： Hozumi Sato , Shin-ichiro Iwanaga , Hiroji Enyo , Yasuhiko Takemura , Yoshiaki Kawamura
IPC分类号： C08F236/04 , C08L19/00 , C08L33/06 , C08L61/00 , C08L61/10
CPC分类号： C08L19/006 , C08F236/04 , C08L33/062 , C08L61/00 , C08L61/06 , C08L61/24 , C08L61/28
摘要： A rubber composition consisting essentially of 5-99 parts by weight of a thermosetting resin and 94-1 parts by weight of one of the following functional rubber-like copolymers (I) to (III) having a Mooney viscosity ML.sub.1+4.sup.100 of 20-120:(I) a functional rubber-like copolymer consisting of 1-20% by weight of a monomer having epoxy groups, hydroxyl groups or amino groups, 15-50% by weight of acrylonitrile and 40-80% by weight of butadiene and/or isoprene as monomer units constituting the polymer,(II) a functional rubber-like copolymer consisting of 1-20% by weight of a monomer having epoxy groups, hydroxyl groups or amino groups, 40-99% by weight of an alkyl (meth)acrylate and/or an alkoxyalkyl (meth)acrylate and 0-30% by weight of monomers copolymerizable therewith other than butadiene and isoprene, as the monomer units constituting the polymer, and(III) a functional rubber-like copolymer consisting of 1-20% by weight of a monomer having epoxy groups, hydroxyl groups or amino groups, 15-50% by weight of acrylonitrile, 20-60% by weight of butadiene and/or isoprene and 5-65% by weight of an alkyl (meth)acrylate and/or an alkoxy (meth)acrylate as the monomer units constituting the polymer.Said functional rubber copolymer may include 10% by weight or less of a polyfunctional monomer as a monomer unit constituting the polymer. In this case, the ratio of the thermosetting resin to the functional rubber-like copolymer is 50-99 parts by weight of the former to 1-50 parts by weight of the latter.
摘要翻译：基本上由5-99重量份的热固性树脂和94-1重量份具有门尼粘度ML1 + 4100为20〜20的功能性橡胶状共聚物（I）〜（III）之一组成的橡胶组合物， 120：（I）由1-20重量％的具有环氧基，羟基或氨基的单体，15-50重量％的丙烯腈和40-80重量％的丁二烯组成的功能性橡胶状共聚物，以及 /或异戊二烯作为构成聚合物的单体单元，（II）由1-20重量％的具有环氧基，羟基或氨基的单体组成的官能橡胶状共聚物，40-99重量％的烷基（（甲基）丙烯酸酯和/或（甲基）丙烯酸烷氧基烷基酯和0-30重量％的除丁二烯和异戊二烯之外可共聚的单体作为构成聚合物的单体单元，和（III）由1 -20重量％的具有环氧基，羟基或氨基的单体，15 -50重量％的丙烯腈，20-60重量％的丁二烯和/或异戊二烯和5-65重量％的（甲基）丙烯酸烷基酯和/或烷氧基（甲基）丙烯酸酯作为构成聚合物的单体单元。所述功能橡胶共聚物可以包含10重量％以下的作为构成聚合物的单体单元的多官能单体。在这种情况下，热固性树脂与官能橡胶状共聚物的比例为前者的50-99重量份，后者的1-50重量份。

2. 发明授权

US4996134A Conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer 失效
标题翻译：共轭二烯共聚物，共聚物的制备方法和包含该共聚物的光敏组合物
公开(公告)号：US4996134A
公开(公告)日：1991-02-26
申请号：US716206
申请日：1985-03-26
申请人： Hiroji Enyo , Shin-ichiro Iwanaga , Yasuhiko Takemura
发明人： Hiroji Enyo , Shin-ichiro Iwanaga , Yasuhiko Takemura
IPC分类号： C08F236/04 , G03F7/033
CPC分类号： G03F7/033 , C08F236/04
摘要： A conjugated diene copolymer comprising (A) 10 to 60 mole % of a conjugated diene compound unit, (B) 5 to 50 mole % of an .alpha.,.beta.-ethylenically unsaturated carboxylic acid unit, (C) 0.1 to 20 mole % of a polyfunctional alkenyl compound unit, (D) 0 to 10 mole % of a diene compound unit having cyclic carbon-carbon double bonds and (E) 0 to 80 mole % of a monoolefinically unsaturated compound unit, the sum of the amounts of units (A), (B), (C), (D) and (E) being 100 mole %, said copolymer having an intrinsic viscosity [.eta.] of 0.01 to 3.0 dl/g as measured at 30.degree. C. in dimethylformamide. The copolymer is soluble in aqueous alkali solutions, excels in processability and photosetting property, and has excellent rubber elasticity and transparency even after photosetting. Accordingly, a photosensitive composition comprising the copolymer, a photopolymerizable unsaturated monomer and a photosensitizer can greatly improve the complicated process for the production of conventional rubber relief plates of flexographic printing, and shorten the production time.
摘要翻译：共轭二烯共聚物，其包含（A）10〜60摩尔％的共轭二烯化合物单元，（B）5〜50摩尔％的α，β-烯键式不饱和羧酸单元，（C）0.1〜20摩尔％多官能烯基化合物单元，（D）0〜10摩尔％的具有环状碳 - 碳双键的二烯化合物单元和（E）0〜80摩尔％的单烯属不饱和化合物单元，单位量（A ），（B），（C），（D）和（E）为100摩尔％，所述共聚物在30℃下在二甲基甲酰胺中的特性粘度η为0.01〜3.0dl / g。该共聚物可溶于碱性水溶液中，加工性和光固化性能优异，即使在光固化后也具有优异的橡胶弹性和透明度。因此，包含共聚物，光聚合性不饱和单体和光敏剂的感光性组合物可以大大改善用于制造常规的柔性版印刷橡胶释放板的复杂工艺，缩短生产时间。

3. 发明授权

US4632960A Resin composition comprising a thermosetting resin component and a functional, rubbery copolymer component 失效
标题翻译：树脂组合物，其包含热固性树脂组分和功能橡胶状共聚物组分
公开(公告)号：US4632960A
公开(公告)日：1986-12-30
申请号：US766347
申请日：1985-08-16
申请人： Hozumi Sato , Tatsuaki Matsunaga , Shin-ichiro Iwanaga , Hiroji Enyo , Yoshiaki Kawamura , Yasuhiko Takemura
发明人： Hozumi Sato , Tatsuaki Matsunaga , Shin-ichiro Iwanaga , Hiroji Enyo , Yoshiaki Kawamura , Yasuhiko Takemura
IPC分类号： C08L61/06 , C08L61/20 , C08L63/00
CPC分类号： C08L61/06 , C08L61/20 , C08L63/00
摘要： A resin composition comprising 100 parts by weight of a thermosetting resin and 1 to 100 parts by weight of a functional, rubbery copolymer containing among the monomer units which constitute the copolymer, at least one monomer containing a substituent selected from the group consisting of epoxy, hydroxyl, carboxyl and amino groups, said copolymer being prepared by one of three emulsion polymerization processes in which a nonionic surface active agent and/or ionic surface active agent is employed as the emulsifying agent.
摘要翻译：一种树脂组合物，其包含100重量份的热固性树脂和1至100重量份的包含构成共聚物的单体单元之间的功能性橡胶共聚物，至少一种含有选自环氧基，羟基，羧基和氨基，所述共聚物通过三种乳液聚合方法之一制备，其中使用非离子表面活性剂和/或离子表面活性剂作为乳化剂。

4. 发明授权

US4985513A Conjugated diene copolymer, process for producing the same, and photosensitive resin composition comprising the same 失效
标题翻译：共轭二烯共聚物，其制造方法以及含有该共轭二烯共聚物的感光性树脂组合物
公开(公告)号：US4985513A
公开(公告)日：1991-01-15
申请号：US336112
申请日：1989-04-11
申请人： Shin-ichiro Iwanaga , Tatsuaki Matsunaga , Ituo Nishiwaki , Hiroji Enyo
发明人： Shin-ichiro Iwanaga , Tatsuaki Matsunaga , Ituo Nishiwaki , Hiroji Enyo
IPC分类号： C08F2/00 , C08F2/44 , C08F2/48 , C08F2/50 , C08F236/04 , C08F236/14 , G03F7/032 , G03F7/033
CPC分类号： G03F7/033 , C08F236/04
摘要： A conjugated diene copolymer comprising (A) 40 to 90 mole % of a conjugated diene component, (B) 0.5 to 10 mole % of an alpha,beta-ethylenically unsaturated carboxylic acid component, (C) 0.1 to 5 mole % of a polyfunctional alkenyl compound component and (D) 5 to 58 mole % of a monoolefinically unsaturated compound component wherein the intrinsic viscosity [.eta.] of the copolymer as measured at 30.degree. C. in dimethylformamide is 0.01 to 3.0 dl/g, the width (.DELTA.Tg) of the endothermic transition temperature section determined by a differential scanning calorimetry is 45.degree. to 120.degree. C., and the limit temperature (T.sub.1) on the lower temperature side of the endothermic transition temperature section is -40.degree. C. or less. This copolymer, when combined with a photopolymerizable unsaturated monomer and a photosensitizer, provides a photosensitive resin composition which is soluble in aqueous alkali solutions, has an excellent processability and a photocurability, has an excellent rubber elasticity and a transparency even after curing, and has excellent water resistance.

5. 发明授权

US4927738A Conjugated diene copolymer, process for producing the same, and photosensitive resin composition comprising the same 失效
标题翻译：共轭二烯共聚物，其制造方法以及含有该共轭二烯共聚物的感光性树脂组合物
公开(公告)号：US4927738A
公开(公告)日：1990-05-22
申请号：US124870
申请日：1987-11-24
申请人： Shin-ichiro Iwanaga , Tatsuaki Matsunaga , Ituo Nishiwaki , Hiroji Enyo
发明人： Shin-ichiro Iwanaga , Tatsuaki Matsunaga , Ituo Nishiwaki , Hiroji Enyo
IPC分类号： C08F2/00 , C08F2/44 , C08F2/48 , C08F2/50 , C08F236/04 , C08F236/14 , G03F7/032 , G03F7/033
CPC分类号： G03F7/033 , C08F236/04
摘要： A conjugated diene copolymer comprising (A) 40 to 90 mole % of a conjugated diene component, (B) 0.5 to 10 mole % of an alpha,beta-ethylenically unsaturated carboxylic acid component, (C) 0.1 to 5 mole % of a polyfunctional alkenyl compound component and (D) 5 to 58 mole % of a monoolefinically unsaturated compound component wherein the intrinsic viscosity [.eta.] of the copolymer as measured at 30.degree. C. in dimethylformamide is 0.01 to 3.0 dl/g, the width (.DELTA.Tg) of the endothermic transition temperature section determined by a differential scanning calorimetry is 45.degree. to 120.degree. C. and the limit temperature (T.sub.1) on the lower temperature side of the endothermic transition temperature section is -40.degree. C. or less. This copolymer, when combined with a photopolymerizable unsaturated monomer and a photosensitizer, provides a photosensitive resin composition which is soluble in aqueous alkali solutions, has an excellent processability and a photocurability, has an excellent rubber elasticity and a transparency even after curing, and has excellent water resistance.

6. 发明授权

US06242161B1 Acrylic copolymer and reflection-preventing film-forming composition containing the same 有权
标题翻译：丙烯酸共聚物和含有它的防反射膜成膜组合物
公开(公告)号：US06242161B1
公开(公告)日：2001-06-05
申请号：US09320450
申请日：1999-05-27
申请人： Kazuo Kawaguchi , Akio Saito , Shin-ichiro Iwanaga
发明人： Kazuo Kawaguchi , Akio Saito , Shin-ichiro Iwanaga
IPC分类号： G03F711
CPC分类号： G03F7/091 , C08F220/18 , C08F220/58 , Y10T428/1462 , Y10T428/1471
摘要： A reflection-preventing film-forming composition including a copolymer having structural units represented by the following general formulas (1) and (2) and a solvent: wherein R1 represents a hydrogen atom, a halogen atom, a hydrocarbon group, etc.; R2 represents a hydrogen atom or a methyl group; and m represents an integer of 1 to 9; wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a hydrogen atom or an organic group. Reflection-preventing films formed of this composition have a high reflection-preventing effect, may cause no intermixing with the resist, have a high etching rate and also can form a resist pattern having superior resolution and precision.
摘要翻译：一种防反射膜成型组合物，其包含具有由以下通式（1）和（2）表示的结构单元的共聚物和溶剂：其中R1表示氢原子，卤素原子，烃基等; R2表示氢原子或甲基; m表示1〜9的整数，R 3表示氢原子或甲基，R 4表示氢原子或有机基团。由该组合物形成的防反射膜具有高防反射效果，可能不会与抗蚀剂混合，蚀刻速度高，并且还可以形成具有优异分辨率和精度的抗蚀剂图案。

7. 发明授权

US6136500A Radiation sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US6136500A
公开(公告)日：2000-10-24
申请号：US135855
申请日：1998-08-18
申请人： Eiichi Kobayashi , Makoto Shimizu , Takayoshi Tanabe , Shin-ichiro Iwanaga
发明人： Eiichi Kobayashi , Makoto Shimizu , Takayoshi Tanabe , Shin-ichiro Iwanaga
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/004 , Y10S430/115 , Y10S430/122
摘要： Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of "nano-edge roughness" or "coating surface roughness". The positive type radiation sensitive resin composition comprises (A) (a) an acid-decomposable group-containing resin, or (b) an alkali-soluble resin and an alkali dissolution controller, and (B) a photoacid generator comprising "a compound that upon exposure to radiation generates a carboxylic acid having a boiling point of 150.degree. C. or higher", and "a compound that upon exposure to radiation generates an acid other than a carboxylic acid". The negative type radiation sensitive resin composition comprises (C) an alkali-soluble resin, (D) a cross-linking agent, and the component (B) as described above.
摘要翻译：除了能够提供优异的分辨率和图案轮廓之外，正面和负面的辐射敏感性树脂组合物在避免“纳米边缘粗糙度”或“涂层表面粗糙度”的问题方面特别优异。正型辐射敏感性树脂组合物包含（A）（a）含酸可分解基团的树脂，或（b）碱溶性树脂和碱溶解控制剂，和（B）光酸产生剂，其包含“ 暴露于辐射后会产生沸点为150℃以上的羧酸“，”暴露于辐射后的化合物会产生羧酸以外的酸“。负型辐射敏感性树脂组合物包含（C）碱溶性树脂，（D）交联剂和如上所述的组分（B）。

8. 发明授权

US6007961A Radiation-sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US6007961A
公开(公告)日：1999-12-28
申请号：US988068
申请日：1997-12-10
申请人： Katsumi Inomata , Masahiro Akiyama , Shin-ichiro Iwanaga , Akira Tsuji
发明人： Katsumi Inomata , Masahiro Akiyama , Shin-ichiro Iwanaga , Akira Tsuji
IPC分类号： G03F7/022 , G03F7/023 , G03F7/30
CPC分类号： G03F7/022
摘要： A radiation-sensitive resin composition including an alkali soluble resin and a quinonediazide compound is provided. The quinonediazide compound has the formula (1), for example: ##STR1## wherein, R.sup.1 to R.sup.6 are an alkyl, cycloalkyl or aryl group; a and b are an integer of 1 to 3; D.sup.1 and D.sup.2 are independently a hydrogen atom or a 1,2-quinonediazidosulfonyl group, provided that at least one of D.sup.1 is a 1,2-quinonediazidosulfonyl group; A is a bonding such as single bond; and x and y are an integer of 0 to 2. The composition is suitable as a positive resist, which effectively restrains the occurrence of scum, and excellent in developability, pattern shape, sensitivity, resolution and focus latitude.
摘要翻译：提供了包含碱溶性树脂和醌二叠氮化合物的辐射敏感性树脂组合物。醌二叠氮化合物具有式（1），例如：其中，R 1至R 6为烷基，环烷基或芳基; a和b为1〜3的整数， D1和D2独立地为氢原子或1,2-醌二叠氮基磺酰基，条件是D1中的至少一个为1,2-醌二叠氮基磺酰基; A是单键键合; x和y为0〜2的整数。该组合物适合作为正性抗蚀剂，其有效地抑制浮渣的发生，显影性，图案形状，灵敏度，分辨率和聚焦纬度优异。

9. 发明申请

US20080097032A1 Positive Photosensitive Insulating Resin Composition And Cured Product Thereof 审中-公开
标题翻译：正极敏感绝缘树脂组合物及其固化产品
公开(公告)号：US20080097032A1
公开(公告)日：2008-04-24
申请号：US11718303
申请日：2005-10-28
申请人： Atsushi Ito , Ken-ichi Yokoyama , Katsumi Inomata , Shin-ichiro Iwanaga
发明人： Atsushi Ito , Ken-ichi Yokoyama , Katsumi Inomata , Shin-ichiro Iwanaga
IPC分类号： C08G73/00
CPC分类号： C08F212/14 , C08F8/12 , C08F212/12 , C08F2220/281 , C08G8/38 , C08J5/18 , C08K5/28 , C08L25/18 , C08L61/06 , C09D125/18 , G03F7/0226 , G03F7/0233 , G03F7/0751 , G03F7/40 , C08F112/14 , C08L2666/14 , C08F212/08
摘要： Disclosed is a positive photosensitive insulating resin composition which comprises: (A) a copolymer comprising (A1) 10 to 99 mol % of a structural unit of the formula (1) and (A2) 90 to 1 mol % of a structural unit of the formula (2); (B) a quinone diazide group-containing compound; (C) at least one compound selected from the group consisting of (C1) an aromatic compound containing a methylol group and/or an alkoxy methyl group (except for aromatic compounds containing an amino group), (C2) an aromatic aldehyde compound, (C3) an aliphatic aldehyde compound, (C4) an alkyl-etherified amino group-containing compound and (C5) an epoxy group-containing compound; (D) a solvent; and (E) an adhesion assistant. Disclosed also is a cured product obtainable from the composition. wherein Ra and Rb are each an alkyl group having 1 to 4 carbon atoms, alkoxy group or aryl group, Rb and Rc are each hydrogen or a methyl group, n is an integer of 0 to 3 and m is an integer of 1 to 3. The cured product has excellent resolution, electrical insulating properties, thermal shock resistance, adhesion and other properties.
摘要翻译：公开了一种正性感光性绝缘性树脂组合物，其包含：（A）包含（A1）10〜99摩尔％的式（1）和（A2）的结构单元的共聚物，90〜1摩尔％的结构单元公式（2）; （B）含醌二叠氮基的化合物; （C）至少一种选自（C1）含有羟甲基和/或烷氧基甲基的芳族化合物（除了含有氨基的芳香族化合物之外）的化合物，（C2）芳族醛化合物，（ C3）脂族醛化合物，（C4）烷基醚化氨基化合物和（C5）含环氧基化合物; （D）溶剂; 和（E）粘附助剂。还公开了可从该组合物获得的固化产物。其中，Ra和Rb分别为碳原子数1〜4的烷基，烷氧基或芳基，Rb和Rc分别为氢或甲基，n为0〜3的整数，m为1〜3的整数。固化产品具有优异的分辨率，电绝缘性能，耐热冲击性，附着力等特性。

10. 发明申请

US20070190450A1 Negative radiation-sensitive resin composition 有权
标题翻译：负辐射敏感树脂组合物
公开(公告)号：US20070190450A1
公开(公告)日：2007-08-16
申请号：US10593972
申请日：2005-03-24
申请人： Kouji Nishikawa , Tooru Kimura , Shin-ichiro Iwanaga
发明人： Kouji Nishikawa , Tooru Kimura , Shin-ichiro Iwanaga
IPC分类号： G03C1/00
CPC分类号： G03F7/40 , G03F7/033 , Y10S430/107 , Y10S430/111 , Y10S430/117 , Y10S430/119 , Y10S430/12 , Y10S430/121 , Y10S430/126
摘要： It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.
摘要翻译：本发明的目的是提供一种能够精确地制造诸如凸块或布线的大厚度镀覆成形制品的方法，优选用于该方法并具有优异灵敏度的负型辐射敏感性树脂组合物和分辨率，以及使用该组合物的转印膜。上述目的是通过负辐射敏感性树脂组合物实现的，其包含（A）含有由下式（1）和/或下式（2）表示的结构单元的聚合物，（B）具有至少一个烯键式不饱和双键和（C）辐射敏感自由基聚合引发剂，并使用该组合物形成负辐射敏感树脂膜。

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