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    • 4. 发明授权
    • Echelon diffraction grating and optical waveguide element
    • 梯形衍射光栅和光波导元件
    • US06721485B1
    • 2004-04-13
    • US09806416
    • 2001-03-30
    • Koichiro NakamuraMasahiro HoriHiroaki Yamamoto
    • Koichiro NakamuraMasahiro HoriHiroaki Yamamoto
    • G02B600
    • G02B6/138G02B1/04G02B5/1814G02B5/1852C08L83/04
    • An echelon diffraction grating which has excellent heat resistance and can be produced at a low cost and an optical waveguide which has high heat resistance, small absorption of a communication wavelength of a near infrared range, and satisfies reliability and a low loss at an optical communication range. The echelon diffraction grating comprises a substrate, and an organopolysiloxane film having a maximum thickness of 1 &mgr;m to 1 mm formed on the surface of the substrate and has a plurality of steps having a predetermined width of 1 to 500 &mgr;m and a predetermined height of 5 to 500 &mgr;m formed on the organopolysiloxane film, and the organopolysiloxane film contains dimethylsiloxane and phenyl(or substituted phenyl)siloxane as essential ingredients.
    • 具有优异的耐热性并且可以低成本地生产的梯形衍射光栅和具有高耐热性,较小吸收近红外范围的通信波长的光波导,并且在光通信中满足可靠性和低损耗的光波导 梯形衍射光栅包括基板和形成在基板表面上的最大厚度为1μm至1mm的有机聚硅氧烷膜,并且具有预定宽度为1至500μm的多个台阶和预定高度 在有机聚硅氧烷膜上形成5〜500μm,有机聚硅氧烷膜含有二甲基硅氧烷和苯基(或取代的苯基)硅氧烷作为必要成分。
    • 7. 发明授权
    • Articles having an uneven surface and production process therefor
    • 具有不均匀表面的制品及其制造方法
    • US06555236B1
    • 2003-04-29
    • US09786484
    • 2001-03-06
    • Koichiro NakamuraMasahiro HoriHiroaki Yamamoto
    • Koichiro NakamuraMasahiro HoriHiroaki Yamamoto
    • B32B904
    • G02B3/0006G02B5/1852Y10T428/31507Y10T428/31612Y10T428/31663
    • A process for producing an article having a fine uneven surface, coated with a film which has high heat resistance, does not crack and does not peel off from a substrate. The process for producing the article comprises disposing a film-forming solution between a substrate and a mold in the form of a film so as to make the solution closely contact with the substrate and the mold, said solution being prepared by carrying out the hydrolysis and dehydration polycondensation reaction of a stock solution containing a specific silane compound (A) having an unhydrolyzable organic group and a hydrolyzable group, a specific silane compound (B) having a hydrolyzable group and a catalyst, and heating to form an article having an uneven film having a surface shape which is the inversion of the surface shape of the mold on the surface of the substrate. The film-forming solution contains the above silane compounds (A) and (B) in the form of unhydrolysates in amounts of 0.5 to 40 wt % and 0.5 to 60 wt % based on the amount of the above silane compound (A) and the amount of the above silane compound (B) contained in the stock solution, respectively. A condensate formed by the dehydration condensation reaction of the film-forming solution has a molecular weight of 300 to 1,900.
    • 制造具有微细凹凸表面的制品的方法,其涂覆有耐热性高的膜,不会破裂并且不会从基材上剥离。 制造该制品的方法包括以薄膜形式在基材和模具之间设置成膜溶液,以使溶液与基材和模具紧密接触,所述溶液通过进行水解和 含有具有不可水解的有机基团的特定硅烷化合物(A)和可水解基团的储备溶液的脱水缩聚反应,具有可水解基团的特定硅烷化合物(B)和催化剂,并加热形成具有不均匀膜的物品 具有表面形状,该表面形状是基板表面上模具的表面形状的倒转。 成膜溶液含有上述硅烷化合物(A)的量为0.5〜40重量%,0.5〜60重量%的非水解产物的上述硅烷化合物(A)和(B) 上述硅烷化合物(B)的含量分别为原料溶液。 由成膜溶液的脱水缩合反应形成的冷凝物的分子量为300〜1,900。