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1. 发明申请

US20120087222A1 DISC INSPECTING METHOD AND DISC INSPECTING DEVICE 失效
标题翻译： DISC检查方法和光盘检测设备
公开(公告)号：US20120087222A1
公开(公告)日：2012-04-12
申请号：US13235836
申请日：2011-09-19
申请人： Hiroaki KOBAYASHI , Toru Aida , Akitoshi Suzuki
发明人： Hiroaki KOBAYASHI , Toru Aida , Akitoshi Suzuki
IPC分类号： G11B20/18
CPC分类号： G11B7/00458
摘要： A disc inspecting method includes: forming recording marks on a disc; scanning the recording marks from inside to outside or from outside to inside of the disc by a pickup unit to read a reproduction signal while rotating a spindle to move a slider by each predetermined width; acquiring reproduction data from the reproduction signal in a signal acquiring unit; and determining whether or not the reproduction data is proper in a calculation unit, and optimizing a formation condition of the recording marks when it is determined that the reproduction data is not proper.
摘要翻译：盘检查方法包括：在盘上形成记录标记; 通过拾取单元从盘内的内部或外部到外部扫描记录标记，以在旋转主轴的同时读取再现信号以使滑块移动每个预定宽度; 在信号获取单元中从再现信号获取再现数据; 以及在计算单元中确定再现数据是否合适，以及当确定再现数据不正确时优化记录标记的形成条件。

2. 发明授权

US08446804B2 Disc inspecting method and disc inspecting device 失效
标题翻译：光盘检查方法和光盘检测装置
公开(公告)号：US08446804B2
公开(公告)日：2013-05-21
申请号：US13235836
申请日：2011-09-19
申请人： Hiroaki Kobayashi , Toru Aida , Akitoshi Suzuki
发明人： Hiroaki Kobayashi , Toru Aida , Akitoshi Suzuki
IPC分类号： G11B15/52
CPC分类号： G11B7/00458
摘要： A disc inspecting method includes: forming recording marks on a disc; scanning the recording marks from inside to outside or from outside to inside of the disc by a pickup unit to read a reproduction signal while rotating a spindle to move a slider by each predetermined width; acquiring reproduction data from the reproduction signal in a signal acquiring unit; and determining whether or not the reproduction data is proper in a calculation unit, and optimizing a formation condition of the recording marks when it is determined that the reproduction data is not proper.
摘要翻译：盘检查方法包括：在盘上形成记录标记; 通过拾取单元从盘内的内部或外部到外部扫描记录标记，以在旋转主轴的同时读取再现信号，以使滑块以预定的宽度移动; 在信号获取单元中从再现信号获取再现数据; 以及在计算单元中确定再现数据是否合适，以及当确定再现数据不正确时优化记录标记的形成条件。

3. 发明授权

US08089843B2 Recording drive waveform adjusting method for manufacturing master disc, master disc manufacturing method, master disc manufacturing apparatus, and master disc 失效
标题翻译：用于制造母盘，母盘制造方法，母盘制造装置和母盘的记录驱动波形调节方法
公开(公告)号：US08089843B2
公开(公告)日：2012-01-03
申请号：US12166974
申请日：2008-07-02
申请人： Toru Aida , Akitoshi Suzuki , Shinobu Hayashi , Akiya Saito
发明人： Toru Aida , Akitoshi Suzuki , Shinobu Hayashi , Akiya Saito
IPC分类号： G11B7/007
CPC分类号： G11B7/00456 , G11B7/261
摘要： A recording drive waveform adjusting method for manufacturing a master disc is provided. The method includes forming an exposed area in an inorganic resist layer for test exposure by irradiating a master disc having the inorganic resist layer with laser light of a recording power based on a recording drive waveform according to a test recording signal. The method also includes obtaining reflected-light information by irradiating the exposed area formed in the test exposure with laser light of a reproducing power, determining whether the recording drive waveform is appropriate by using the reflected-light information, and correcting the recording drive waveform if the recording drive waveform is determined to be inappropriate in the determination.
摘要翻译：提供一种用于制造母盘的记录驱动波形调节方法。该方法包括根据测试记录信号，通过用基于记录驱动波形的具有记录功率的激光照射具有无机抗蚀剂层的母盘，在用于测试曝光的无机抗蚀剂层中形成曝光区域。该方法还包括通过用再现功率的激光照射在测试曝光中形成的曝光区域来获得反射光信息，通过使用反射光信息确定记录驱动波形是否合适，并且如果在确定中确定记录驱动波形不合适。

4. 发明申请

US20090041933A1 RECORDING DRIVE WAVEFORM ADJUSTING METHOD FOR MANUFACTURING MASTER DISC, MASTER DISC MANUFACTURING METHOD, MASTER DISC MANUFACTURING APPARATUS, AND MASTER DISC 失效
标题翻译：用于制造主盘，主盘制造方法，主盘制造装置和主盘的记录驱动波形调整方法
公开(公告)号：US20090041933A1
公开(公告)日：2009-02-12
申请号：US12166974
申请日：2008-07-02
申请人： Toru Aida , Akitoshi Suzuki , Shinobu Hayashi , Akiya Saito
发明人： Toru Aida , Akitoshi Suzuki , Shinobu Hayashi , Akiya Saito
IPC分类号： B05D5/06
CPC分类号： G11B7/00456 , G11B7/261
摘要： A recording drive waveform adjusting method for manufacturing a master disc is provided. The method includes forming an exposed area in an inorganic resist layer for test exposure by irradiating a master disc having the inorganic resist layer with laser light of a recording power based on a recording drive waveform according to a test recording signal. The method also includes obtaining reflected-light information by irradiating the exposed area formed in the test exposure with laser light of a reproducing power, determining whether the recording drive waveform is appropriate by using the reflected-light information, and correcting the recording drive waveform if the recording drive waveform is determined to be inappropriate in the determination.
摘要翻译：提供一种用于制造母盘的记录驱动波形调节方法。该方法包括根据测试记录信号，通过用基于记录驱动波形的具有记录功率的激光照射具有无机抗蚀剂层的母盘，在用于测试曝光的无机抗蚀剂层中形成曝光区域。该方法还包括通过用再现功率的激光照射在测试曝光中形成的曝光区域来获得反射光信息，通过使用反射光信息确定记录驱动波形是否合适，并且如果在确定中确定记录驱动波形不合适。

5. 发明申请

US20110207035A1 Exposure apparatus and exposure method 审中-公开
标题翻译：曝光装置和曝光方法
公开(公告)号：US20110207035A1
公开(公告)日：2011-08-25
申请号：US12932033
申请日：2011-02-16
申请人： Akiya Saito , Akitoshi Suzuki , Toru Aida , Shinobu Hayashi
发明人： Akiya Saito , Akitoshi Suzuki , Toru Aida , Shinobu Hayashi
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03B27/52 , G11B7/1267 , G11B7/261 , G11B7/263
摘要： An exposure apparatus includes an exposure unit selectively performing exposure on a resist layer with a first laser beam, focused by a lens system, in a pattern including pits and lands arranged in a scanning direction; a detecting unit detecting a reflection of a second laser beam applied through the lens system to the resist layer selectively exposed to the first laser beam, the second laser beam being produced by changing a focal length of the lens system such that the resist layer is prevented from responding thereto; a calculating unit calculating, from a result of the detection, a displacement between center axes of signal waveforms representing beams reflected from first and second portions of the pattern having a smallest width and a larger width, respectively; a setting unit setting the focal length of the lens system to such a value that the displacement is maximal; and a control unit controlling the exposure unit to expose the resist layer to the first laser beam focused with the focal length set by the setting unit.
摘要翻译：曝光装置包括曝光单元，其以包括沿扫描方向布置的凹坑和平台的图案以由透镜系统聚焦的第一激光束选择性地对抗蚀剂层进行曝光; 检测单元，其检测通过透镜系统施加的第二激光束对选择性地暴露于第一激光束的抗蚀剂层的反射，第二激光束是通过改变透镜系统的焦距而产生的，以防止抗蚀剂层从响应; 计算单元，从所述检测结果计算分别表示从具有最小宽度和较大宽度的图案的第一和第二部分反射的光束的信号波形的中心轴之间的位移; 设置单元，将透镜系统的焦距设定为位移最大的值; 以及控制单元，其控制所述曝光单元将所述抗蚀剂层暴露于由所述设定单元设定的所述焦距聚焦的所述第一激光束。

6. 发明申请

US20130108922A1 ELECTROLYTIC COPPER FOIL, ELECTROLYTIC COPPER FOIL FOR LITHIUM ION SECONDARY BATTERY, ELECTRODE FOR LITHIUM ION SECONDARY BATTERY USING THE ELECTROLYTIC COPPER FOIL, AND LITHIUM ION SECONDARY BATTERY USING THE ELECTRODE 审中-公开
标题翻译：用于锂离子二次电池的电解铜箔，电解铜箔，使用电解铜箔的锂离子二次电池电极和使用电极的锂离子二次电池
公开(公告)号：US20130108922A1
公开(公告)日：2013-05-02
申请号：US13807137
申请日：2011-06-28
申请人： Kensaku Shinozaki , Akitoshi Suzuki
发明人： Kensaku Shinozaki , Akitoshi Suzuki
IPC分类号： H01M4/66 , H01M4/70 , H01M4/134
CPC分类号： H01M4/661 , C25D3/38 , C25D7/0614 , H01M4/13 , H01M4/134 , H01M4/662 , H01M4/70 , H01M10/0525
摘要： A lithium ion secondary battery, which uses a negative electrode wherein an active material is deposited on a collector, and which is characterized in that no wrinkles are formed on the collector, the collector does not fracture, the adhesion between the active material and the collector is high, and stable performance can be maintained for a long period of time; an electrode for the secondary battery; and an electrolytic copper foil that constitutes the electrode. Specifically disclosed is an electrolytic copper foil for a lithium ion secondary battery, in which a surface-roughened layer of copper or copper alloy particles having a particle diameter of 0.1-3 μm is formed on both surfaces of an untreated copper foil by roughening treatment by means of electrolysis, and the surface-roughened layers on both surfaces have a surface roughness Rz of 1.0-5 μm and a surface roughness Ra of 0.25-0.7 μm, with the Rz difference between the front and back surfaces being within 3 μm and the Ra differences between the front and back surfaces being within 0.3 μm.
摘要翻译：一种锂离子二次电池，其使用负极，其中活性材料沉积在集电体上，其特征在于，在集电体上不形成褶皱，集电体不会断裂，活性材料与集电体之间的粘附高性能，长时间保持稳定性能; 用于二次电池的电极; 以及构成电极的电解铜箔。具体公开了一种用于锂离子二次电池的电解铜箔，其中通过粗糙化处理在未处理的铜箔的两个表面上形成具有0.1-3μm的粒径的铜或铜合金颗粒的表面粗糙化层电解方式，两面的表面粗糙化层的表面粗糙度Rz为1.0-5μm，表面粗糙度Ra为0.25〜0.7μm，前后表面之间的Rz差在3μm以内，前后表面之间的差异在0.3μm以内。

7. 发明授权

US07656618B2 Disk device and manufacturing method therefor 失效
标题翻译：磁盘装置及其制造方法
公开(公告)号：US07656618B2
公开(公告)日：2010-02-02
申请号：US11699459
申请日：2007-01-30
申请人： Akitoshi Suzuki
发明人： Akitoshi Suzuki
IPC分类号： G11B5/54
CPC分类号： G11B5/54 , G11B21/22
摘要： According to one embodiment, a disk device includes a case having a bottom wall, a disk-shaped recording medium located in the case, a drive motor which is located in the case and supports and rotates the recording medium, a head which performs information processing for the recording medium, a head actuator, and an inertial latch mechanism which latches and holds the head actuator in a retracted position when an external force is subjected. The inertial latch mechanism is modularized and includes a base plate, a first pivot and a second pivot set up on the base plate, a latch arm supported for rocking motion around the first pivot, an inertial arm which is rockably supported on the second pivot, and a stopper portion which prevents the latch arm and the inertial arm from slipping off the first and second pivots.
摘要翻译：根据一个实施例，盘装置包括具有底壁，位于壳体中的盘形记录介质的壳体，位于壳体中并支撑并旋转记录介质的驱动马达，执行信息处理的磁头用于记录介质，头部致动器和惯性闩锁机构，其在外力受到时将头致动器锁定并保持在缩回位置。惯性闭锁机构是模块化的，包括基板，第一枢轴和设置在基板上的第二枢轴，支撑在第一枢轴周围的摆动运动的锁臂，可旋转地支撑在第二枢轴上的惯性臂，以及阻止所述闩锁臂和所述惯性臂从所述第一枢轴和所述第二枢轴滑落的止动部。

8. 发明授权

US06654337B2 Magneto-optical recording medium having pit pitch greater than groove pitch 失效
标题翻译：具有凹坑间距大于凹槽间距的磁光记录介质
公开(公告)号：US06654337B2
公开(公告)日：2003-11-25
申请号：US09922731
申请日：2001-08-07
申请人： Sohmei Endoh , Manabu Satoh , Mitsuo Arima , Jun Shimizu , Etsuro Ikeda , Hirotaka Ozawa , Akitoshi Suzuki , Masayuki Takakuwa
发明人： Sohmei Endoh , Manabu Satoh , Mitsuo Arima , Jun Shimizu , Etsuro Ikeda , Hirotaka Ozawa , Akitoshi Suzuki , Masayuki Takakuwa
IPC分类号： G11B724
CPC分类号： G11B7/0079 , G11B7/24079 , G11B7/24082 , G11B7/24085 , G11B7/261 , G11B11/10582 , G11B11/10584
摘要： A recording medium and a recoding medium master, and a method of manufacturing the recording medium which comply with the standard of recording/reproducing characteristic established in the MD standard while enabling precise discrimination of the pit track and groove track and optical detection of the pits by optical pickup and the like are provided. Pits and grooves are arranged on a surface of a disc-shaped substrate so as to form a grooves and the ratio is from 1.00 exclusive to 1.13 inclusive. It is preferable that the track pitch of the grooves is from 1.50 &mgr;m inclusive to 1.70 &mgr;m exclusive. The width of the pits and grooves in the radial direction of the substrate is the same.
摘要翻译：一种记录介质和记录介质主机，以及一种制造符合MD标准中建立的记录/再现特性标准的记录介质的方法，同时能够通过凹坑轨道和凹槽轨迹的精确识别以及凹坑的光学检测光拾取器等。凹坑和凹槽布置在盘形基底的表面上以形成凹槽，该比率为1.00，独占于1.13（含）。凹槽的轨道间距优选为1.50μm至1.70μm。基板的径向宽度与凹槽的宽度相同。

9. 发明授权

US5851589A Method for thermal chemical vapor deposition 失效
标题翻译：热化学气相沉积方法
公开(公告)号：US5851589A
公开(公告)日：1998-12-22
申请号：US311438
申请日：1994-09-26
申请人： Izumi Nakayama , Akitoshi Suzuki , Yoshiro Kusumoto , Kazuo Takakuwa , Tetsuya Ikuta
发明人： Izumi Nakayama , Akitoshi Suzuki , Yoshiro Kusumoto , Kazuo Takakuwa , Tetsuya Ikuta
IPC分类号： C23C16/08 , C23C16/44 , C23C16/455 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/08 , C23C16/455 , C23C16/45504
摘要： A method and an apparatus for a CVD comprising feeding a first gas flow, including a reactive gas, in a laminar flowing state and in a sheet state parallel to the surface of a substrate and feeding a second gas flow, including a non-reactive gas, in a direction perpendicular to that of said first gas flow, externally controlling the flow rates of the first and second gases so as to retain the laminar flowing state of said first gas flow and concentrate said first gas flow in the vicinity of said substrate and externally controlling the flow rate of said second gas flow to provide control and uniformity in the thickness of the layer to be formed.
摘要翻译：一种用于CVD的方法和装置，包括以层流流动状态和平行于基底表面的片状状馈送包括反应性气体的第一气流，并且馈送包括非反应性气体的第二气流在垂直于所述第一气流的方向上，外部控制第一和第二气体的流速，以便保持所述第一气流的层流状态，并将所述第一气流集中在所述衬底附近，并且在外部控制所述第二气流的流量以提供待形成的层的厚度的控制和均匀性。

10. 发明授权

US5125360A Vacuum processing apparatus 失效
标题翻译：真空加工设备
公开(公告)号：US5125360A
公开(公告)日：1992-06-30
申请号：US299935
申请日：1989-01-23
申请人： Izumi Nakayama , Akitoshi Suzuki , Hiroyuki Nawa , Motohiro Kaneko
发明人： Izumi Nakayama , Akitoshi Suzuki , Hiroyuki Nawa , Motohiro Kaneko
IPC分类号： C23C16/509 , C23C16/54 , H01J37/32 , H01L21/67
CPC分类号： H01J37/32862 , C23C16/5096 , C23C16/54 , H01J37/32623 , H01L21/67
摘要： A vacuum processing apparatus in which a DC bias to be produced on the surfaces of substrates which are to be processed in a vacuum chamber can be mechanically and easily controlled by adjusting the position of a susceptor in respect to an electrode body, and the susceptor and other components in the vacuum chamber can be easily cleaned while maintaining a desired evacuated condition and a desired processing performance in the vacuum chamber.
摘要翻译：一种真空处理装置，其中在真空室中待处理的基板的表面上产生的直流偏压可以通过调节基座相对于电极体的位置而机械地和容易地控制，并且基座和真空室中的其它部件可以容易地清洁，同时保持真空室中所需的抽真空条件和期望的加工性能。

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