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1. 发明授权

US06919274B2 LSI device etching method and apparatus thereof 失效
公开(公告)号：US06919274B2
公开(公告)日：2005-07-19
申请号：US10780670
申请日：2004-02-19
申请人： Hideyuki Kazumi , Tsuyoshi Yoshida , Eiji Ikegami , Kouichi Nakaune , Masamichi Sakaguchi , Yasuyuki Miyamoto , Akihiro Sano
发明人： Hideyuki Kazumi , Tsuyoshi Yoshida , Eiji Ikegami , Kouichi Nakaune , Masamichi Sakaguchi , Yasuyuki Miyamoto , Akihiro Sano
IPC分类号： H01L21/3065 , H01L21/311 , H01L21/3213 , H01L21/44
CPC分类号： H01L21/31116
摘要： An apparatus for performing a plasma-etching of a LSI device including a Cu interconnection, a low-k film, and a diffusion prevention film has a treatment chamber, into which an etching gas is introduced, and a support table which is equipped with electrodes and on which said LSI device is placed. In this apparatus, the etching gasses are turned into plasma by supplying radio frequency power to electrodes provided within the treatment chamber, so that the LSI device is etched with ions of the plasma. In this apparatus, a sulfur-containing gas and a fluorine-containing gas are mixed to the etching gasses, so that the diffusion prevention film is selectively etched against the low-k film.

2. 发明申请

US20050026431A1 LSI device etching method and apparatus thereof 失效
标题翻译： LSI器件蚀刻方法及其装置
公开(公告)号：US20050026431A1
公开(公告)日：2005-02-03
申请号：US10780670
申请日：2004-02-19
申请人： Hideyuki Kazumi , Tsuyoshi Yoshida , Eiji Ikegami , Kouichi Nakaune , Masamichi Sakaguchi , Yasuyuki Miyamoto , Akihiro Sano
发明人： Hideyuki Kazumi , Tsuyoshi Yoshida , Eiji Ikegami , Kouichi Nakaune , Masamichi Sakaguchi , Yasuyuki Miyamoto , Akihiro Sano
IPC分类号： H01L21/3065 , H01L21/311 , H01L21/3213 , H01L21/44
CPC分类号： H01L21/31116
摘要： An apparatus for performing a plasma-etching of a LSI device including a Cu interconnection, a low-k film, and a diffusion prevention film has a treatment chamber, into which an etching gas is introduced, and a support table which is equipped with electrodes and on which said LSI device is placed. In this apparatus, the etching gasses are turned into plasma by supplying radio frequency power to electrodes provided within the treatment chamber, so that the LSI device is etched with ions of the plasma. In this apparatus, a sulfur-containing gas and a fluorine-containing gas are mixed to the etching gasses, so that the diffusion prevention film is selectively etched against the low-k film.
摘要翻译：用于进行包括Cu互连，低k膜和防扩散膜的LSI器件的等离子体蚀刻的设备具有其中引入蚀刻气体的处理室和配备有电极的支撑台并在其上放置所述LSI器件。在该装置中，通过向设置在处理室内的电极提供射频功率使蚀刻气体变成等离子体，从而利用等离子体的离子蚀刻LSI器件。在该装置中，将含硫气体和含氟气体混合到蚀刻气体中，使得防扩散膜针对低k膜选择性地蚀刻。

3. 发明申请

US20080076259A1 Plasma Etching Method 审中-公开
标题翻译：等离子蚀刻法
公开(公告)号：US20080076259A1
公开(公告)日：2008-03-27
申请号：US11622525
申请日：2007-01-12
申请人： Yoshiyuki OOTA , Tsuyoshi Yoshida , Eiji Ikegami , Kenji Imamoto , Jyunji Adachi
发明人： Yoshiyuki OOTA , Tsuyoshi Yoshida , Eiji Ikegami , Kenji Imamoto , Jyunji Adachi
IPC分类号： H01L21/461 , H01L21/302
CPC分类号： H01L21/31116
摘要： The invention provides a plasma etching method that does not create any difference in profile between sparse and dense portions of the mask pattern in processing a device having a space width equal to or smaller than 100 nm. An added gas having a high C/F ratio such as C4F8 gas capable of increasing the generation of CF2 radicals that may become sidewall protection film components having a small attachment coefficient is added to the etching gas in order to form sidewall protection films on dense pattern portions, and in addition, Xe gas is added in order to suppress dissociation effect by lowering the electron temperature.
摘要翻译：本发明提供一种等离子体蚀刻方法，其在处理具有等于或小于100nm的空间宽度的器件时，不会在掩模图案的稀疏部分和致密部分之间产生任何差异。具有高C / F比例的添加气体，例如可以增加CF 2 N 2基团的产生的C 4 F 8 N 2气体，其可以变成在蚀刻气体中添加具有小附着系数的侧壁保护膜成分，以在密集图案部分上形成侧壁保护膜，另外，为了通过降低电子温度来抑制解离效果，另外添加Xe气体。

4. 发明授权

US07833792B2 Test strip measuring method 有权
标题翻译：试片测量方法
公开(公告)号：US07833792B2
公开(公告)日：2010-11-16
申请号：US11119704
申请日：2005-05-03
申请人： Masaaki Mori , Masao Ninomiya , Tomokuni Inoue , Eiji Ikegami , Akira Tanaka
发明人： Masaaki Mori , Masao Ninomiya , Tomokuni Inoue , Eiji Ikegami , Akira Tanaka
IPC分类号： G01N33/48
CPC分类号： G01N21/8483 , Y10T436/112499 , Y10T436/115831
摘要： In a test strip measuring method in which a coloration measurement is conducted while a test strip (4) is being moved, there are detected the optical characteristics R of the ground of a test strip and the optical characteristics T of a test line (4b) which has appeared on the test strip, and the test strip is judged based on the difference or ratio between R and T. Even though the ground of the test strip presents variations in optical characteristics, and even though there are variations among samples or among test strips, such variations can be absorbed, thus assuring an accurate judgment.
摘要翻译：在测试条（4）移动时进行着色测量的测试条测量方法中，检测测试条的接地的光学特性R和测试线（4b）的光学特性T，其出现在测试条上，并且基于R和T之间的差异或比例来判断测试条。即使测试条的地面呈现光学特性的变化，并且即使样品之间或测试中存在变化可以吸收这种变化，从而确保准确的判断。

5. 发明授权

US06274870B1 Method for spectrometrically measuring isotopic gas and apparatus thereof 有权
标题翻译：光谱测量同位素气体的方法及其装置
公开(公告)号：US06274870B1
公开(公告)日：2001-08-14
申请号：US09303427
申请日：1999-05-03
申请人： Yasuhiro Kubo , Katsuhiro Morisawa , Yasushi Zasu , Eiji Ikegami , Kazunori Tsutsui , Tamotsu Hamao , Masaaki Mori , Takashi Maruyama
发明人： Yasuhiro Kubo , Katsuhiro Morisawa , Yasushi Zasu , Eiji Ikegami , Kazunori Tsutsui , Tamotsu Hamao , Masaaki Mori , Takashi Maruyama
IPC分类号： G01N2135
CPC分类号： G01N21/3504 , A61B5/0059 , A61B5/0836 , A61B5/097 , A61B10/00 , A61B2010/0087 , G01N21/0332 , G01N21/11 , G01N21/274 , G01N21/314 , G01N33/0006 , G01N33/497
摘要： A correction curve (FIG. 19) is prepared by plotting 12CO2 concentrations and 13CO2/12CO2 concentration ratios which are determined on the basis of a calibration curve and 13CO2 and 12CO2 absorbances of gaseous samples having the same 13CO2/12CO2 concentration ratio but known different 12CO2 concentrations. A gaseous test sample containing 13CO2 and 12CO2 as component gases is introduced into a cell, and spectrometrically measured. A 12CO2 concentration of the gaseous test sample is determined by way of the spectrometric measurement. A concentration ratio correction value is obtained on the basis of the correction curve and the 12CO2 concentration of the gaseous test sample thus determined. A measured 13CO2/12CO2 concentration ratio is divided by the concentration ratio correction value thus obtained for correction of the 13CO2/12CO2 concentration ratio. Thus, the measurement accuracy of the concentration ratios of the component gases can be improved.
摘要翻译：通过绘制12CO2浓度和13CO2 / 12CO2浓度比，通过绘制12CO2浓度和13CO2 / 12CO2浓度比来制备校正曲线（13CO2 / 12CO2浓度比），这些浓度比是根据13CO2 / 12CO2浓度比相同但已知不同12CO2的气态样品的校正曲线和13CO2和12CO2吸光度确定的浓度将含有作为组分气体的13CO 2和12 CO 2的气态测试样品引入到电池中，并进行光谱测量。通过光谱测量法测定气态测试样品的12CO2浓度。基于如此确定的气体试样的校正曲线和12CO 2浓度获得浓度比校正值。测量的13CO 2 / 12CO 2浓度比除以由此获得的用于校正13CO 2 / 12CO 2浓度比的浓度比校正值。因此，能够提高成分气体的浓度比的测定精度。

6. 发明授权

US08900401B2 Plasma processing method and apparatus 有权
标题翻译：等离子体处理方法和装置
公开(公告)号：US08900401B2
公开(公告)日：2014-12-02
申请号：US12846403
申请日：2010-07-29
申请人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
发明人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
IPC分类号： H01L21/306 , H01J37/32
CPC分类号： H01J37/32963 , H01J37/32082 , H01J37/32091 , H01J37/321 , H01J37/3211 , H01J37/32192 , H01J37/32917 , H01J37/32926 , H01J37/32935 , H01J37/32981 , H01J37/3299 , H01J2237/1825 , H01J2237/327 , H01L21/67069 , H01L21/67242 , H05H1/46
摘要： Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time.
摘要翻译：在具有等离子体处理室的等离子体处理装置中进行多个基板的等离子体处理，该等离子体处理室具有用于在等离子体处理室内依次放置和保持多个基板的天线电极和下部电极，供给处理用气体供给装置气体进入处理室，用于经由真空阀从处理室排出气体的真空泵和用于在处理室内形成磁场的螺线管线圈。多个基板中的至少一个被放置在下电极上，并且处理气体被馈送到处理室中。 RF功率经由匹配网络馈送到天线电极，以在处理室内产生等离子体，其中已经由螺线管线圈形成了磁场。然后重复这种至少一个基板的放置和该处理气体的进料，直至完成所有多个基板的等离子体处理。当包括处理室的内部压力的参数在具有等离子体处理时间的稳定值变得稳定时，确定调味品的结束。

7. 发明授权

US08038896B2 Plasma processing method and apparatus 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US08038896B2
公开(公告)日：2011-10-18
申请号：US11502416
申请日：2006-08-11
申请人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
发明人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
IPC分类号： G01L21/30 , C23F1/00
CPC分类号： H01J37/32963 , H01J37/32082 , H01J37/32091 , H01J37/321 , H01J37/3211 , H01J37/32192 , H01J37/32917 , H01J37/32926 , H01J37/32935 , H01J37/32981 , H01J37/3299 , H01J2237/1825 , H01J2237/327 , H01L21/67069 , H01L21/67242 , H05H1/46
摘要： Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time.
摘要翻译：在具有等离子体处理室的等离子体处理装置中进行多个基板的等离子体处理，该等离子体处理室具有用于在等离子体处理室内依次放置和保持多个基板的天线电极和下部电极，供给处理用气体供给装置气体进入处理室，用于经由真空阀从处理室排出气体的真空泵和用于在处理室内形成磁场的螺线管线圈。多个基板中的至少一个被放置在下电极上，并且处理气体被馈送到处理室中。 RF功率经由匹配网络馈送到天线电极，以在处理室内产生等离子体，其中已经由螺线管线圈形成了磁场。然后重复这种至少一个基板的放置和该处理气体的进料，直至完成所有多个基板的等离子体处理。当包括处理室的内部压力的参数在具有等离子体处理时间的稳定值变得稳定时，确定调味品的结束。

8. 发明申请

US20070281478A1 Plasma processing method and apparatus 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US20070281478A1
公开(公告)日：2007-12-06
申请号：US11502416
申请日：2006-08-11
申请人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
发明人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
IPC分类号： C23F1/00 , H01L21/302 , C23C16/00
CPC分类号： H01J37/32963 , H01J37/32082 , H01J37/32091 , H01J37/321 , H01J37/3211 , H01J37/32192 , H01J37/32917 , H01J37/32926 , H01J37/32935 , H01J37/32981 , H01J37/3299 , H01J2237/1825 , H01J2237/327 , H01L21/67069 , H01L21/67242 , H05H1/46
摘要： Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time.
摘要翻译：在具有等离子体处理室的等离子体处理装置中进行多个基板的等离子体处理，该等离子体处理室具有用于在等离子体处理室内依次放置和保持多个基板的天线电极和下部电极，供给处理用气体供给装置气体进入处理室，用于经由真空阀从处理室排出气体的真空泵和用于在处理室内形成磁场的螺线管线圈。多个基板中的至少一个被放置在下电极上，并且处理气体被馈送到处理室中。 RF功率经由匹配网络馈送到天线电极，以在处理室内产生等离子体，其中已经由螺线管线圈形成了磁场。然后重复这种至少一个基板的放置和该处理气体的进料，直至完成所有多个基板的等离子体处理。当包括处理室的内部压力的参数在具有等离子体处理时间的稳定值变得稳定时，确定调味品的结束。

9. 发明申请

US20050191210A1 Test strip measuring method and device 有权
标题翻译：测试条测量方法和装置
公开(公告)号：US20050191210A1
公开(公告)日：2005-09-01
申请号：US11119704
申请日：2005-05-03
申请人： Masaaki Mori , Masao Ninomiya , Tomokuni Inoue , Eiji Ikegami , Akira Tanaka
发明人： Masaaki Mori , Masao Ninomiya , Tomokuni Inoue , Eiji Ikegami , Akira Tanaka
IPC分类号： G01N31/22 , G01N21/78 , G01N21/86 , G01N33/52
CPC分类号： G01N21/8483 , Y10T436/112499 , Y10T436/115831
摘要： In a test strip measuring method in which a coloration measurement is conducted while a test strip (4) is being moved, there are detected the optical characteristics R of the ground of a test strip and the optical characteristics T of a test line (4b) which has appeared on the test strip, and the test strip is judged based on the difference or ratio between R and T. Even though the ground of the test strip presents variations in optical characteristics, and even though there are variations among samples or among test strips, such variations can be absorbed, thus assuring an accurate judgment.
摘要翻译：在测试条（4）移动时进行着色测量的测试条测量方法中，检测测试条的接地的光学特性R和测试线的光学特性T（4 b ），并且基于R和T之间的差异或比例来判断测试条。即使测试条的地面呈现光学特性的变化，并且即使在样品之间或之间存在差异测试条可以吸收这种变化，从而确保准确的判断。

10. 发明授权

US5964712A Apparatus and breathing bag for spectrometrically measuring isotopic gas 失效
标题翻译：用于光谱测量同位素气体的仪器和呼吸袋
公开(公告)号：US5964712A
公开(公告)日：1999-10-12
申请号：US849351
申请日：1997-06-06
申请人： Yasuhiro Kubo , Katsuhiro Morisawa , Yasushi Zasu , Eiji Ikegami , Kazunori Tsutsui , Tamotsu Hamao , Masaaki Mori , Takashi Maruyama
发明人： Yasuhiro Kubo , Katsuhiro Morisawa , Yasushi Zasu , Eiji Ikegami , Kazunori Tsutsui , Tamotsu Hamao , Masaaki Mori , Takashi Maruyama
IPC分类号： A61B5/00 , A61B5/08 , A61B5/083 , A61B5/097 , A61B10/00 , G01N1/22 , G01N21/03 , G01N21/11 , G01N21/25 , G01N21/27 , G01N21/31 , G01N21/35 , G01N21/59 , G01N33/00 , G01N33/497 , G01N35/08 , B01L3/00
CPC分类号： G01N21/3504 , A61B10/00 , A61B5/097 , G01N21/0332 , G01N21/11 , G01N21/274 , G01N21/314 , A61B2010/0087 , A61B5/0059 , A61B5/0836 , G01N33/0006 , G01N33/497
摘要： A correction curve (FIG. 19) is prepared by plotting .sup.12 CO.sub.2 concentrations and .sup.13 CO.sub.2 /.sup.12 CO.sub.2 concentration ratios which are determined on the basis of a calibration curve and .sup.13 CO.sub.2 and .sup.12 CO.sub.2 absorbances of gaseous samples having the same .sup.13 CO.sub.2 /.sup.12 CO.sub.2 concentration ratio but known different .sup.12 CO.sub.2 concentrations. A gaseous test sample containing .sup.13 CO.sub.2 and .sup.12 CO.sub.2 as component gases is introduced into a cell, and spectrometrically measured. A .sup.12 CO.sub.2 concentration of the gaseous test sample is determined by way of the spectrometric measurement. A concentration ratio correction value is obtained on the basis of the correction curve and the .sup.12 CO.sub.2 concentration of the gaseous test sample thus determined. A measured .sup.13 CO.sub.2 /.sup.12 CO.sub.2 concentration ratio is divided by the concentration ratio correction value thus obtained for correction of the .sup.13 CO.sub.2 /.sup.12 CO.sub.2 concentration ratio. Thus, the measurement accuracy of the concentration ratios of the component gases can be improved. A breath sampling bag and gas measuring system is also disclosed where each is configured such that breath inlets of the gas measuring apparatus are prevented from being respectively connected to the wrong breath introduction pipes of the breath sampling bag.
摘要翻译： PCT No.PCT / JP96 / 02876 Sec。 371日期：1997年6月6日 102（e）日期1996年6月6日PCT提交1996年10月2日PCT公布。公开号WO97 / 14029 日期1997年04月17日通过绘制12CO2浓度和13CO2 / 12CO2浓度比，制备校正曲线（图19），其基于校准曲线确定，并且具有13CO 2 / 12CO 2浓度的气态样品的13CO 2和12 CO 2吸光度比例但已知不同的12CO2浓度。将含有作为组分气体的13CO 2和12 CO 2的气态测试样品引入到电池中，并进行光谱测量。通过光谱测量法测定气态测试样品的12CO2浓度。基于如此确定的气体试样的校正曲线和12CO 2浓度获得浓度比校正值。测量的13CO 2 / 12CO 2浓度比除以由此获得的用于校正13CO 2 / 12CO 2浓度比的浓度比校正值。因此，能够提高成分气体的浓度比的测定精度。还公开了一种呼吸取样袋和气体测量系统，其中每个呼气采样袋和气体测量系统被配置为使得气体测量装置的呼吸入口被防止分别连接到呼吸取样袋的错误的呼吸导管。

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